Filtern
Dokumenttyp
Schlagworte
- Functional groups (2)
- Grafting (2)
- Plasma bromination (2)
- Polymer surfaces (2)
- Selective plasma process (2)
- Spacer (2)
- 17000er Reihe (1)
- Akkreditierung (1)
- CE-Zeichen (1)
- DAR (1)
Eingeladener Vortrag
- nein (4)
Rapid Measuring Techniques for Electrical Contact Resistance Applied to Lubricant Additives Studies
(1976)
Rapid Measuring Techniques for Electrical Contact Resistance Applied to Lubricant Additives Studies
(1976)
A new device for simultaneous measurement of friction force, normal force and friction coefficient
(1975)
Scattering of Ions - V. Elastic Scattering on the Symmetric Rare Gas Ion - Rare Gas Atom Systems
(1974)
In contrast to other plasma modification processes of polymer surfaces, the bromination is very selective and shows a high yield in C—Br groups. The most convenient bromination process was found using bromoform, which was thus preferred to elemental bromine, allyl bromide, vinyl bromide or tert-butylbromide. The bromoform process give yields in C—Br up to 40 C—Br or more, with only 2-3% co-introduction of O-functionalities whereas allyl bromide results in yields of about 20 C—Br and more, but in more than 10% oxygen-containing by-products. C—Br groups serve as anchoring points for grafting of molecules, oligomers and pre-polymers of diole or diamine character.