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CCQM key comparison K-129 for the quantitative analysis of Cu(In,Ga)Se2 (CIGS) films has been performed by the Surface Analysis Working Group (SAWG) of the Consultative Committee for Amount of Substance (CCQM). The objective of this key comparison is to compare the equivalency of the National Metrology Institutes (NMIs) and Designated Institutes (DIs) for the measurement of mole fractions of Cu, In, Ga and Se in a thin CIGS film. The measurand of this key comparison is the average mole fractions of Cu, In, Ga and Se of a test CIGS alloy film in the unit of mole fraction (mol/mol). Mole fraction with the metrological unit of mol/mol can be practically converted to atomic fraction with the unit of at%.
In this key comparison, a CIGS film with certified mole fractions was supplied as a reference specimen to determine the relative sensitivity factors (RSFs) of Cu, In, Ga and Se. The mole fractions of the reference specimen were certified by isotope dilution - inductively coupled plasma/mass spectrometry (ID-ICP/MS) and are traceable to the SI. A total number counting (TNC) method was recommended as a method to determine the signal intensities of the constituent elements acquired in the depth profiles by Secondary Ion Mass Spectrometry (SIMS), X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES). Seven NMIs and one DI participated in this key comparison. The mole fractions of the CIGS films were measured by depth profiling based-SIMS, AES and XPS. The mole fractions were also measured by non-destructive X-Ray Fluorescence (XRF) Analysis and Electron Probe Micro Analysis (EPMA) with Energy Dispersive X-ray Spectrometry (EDX).
In this key comparison, the average degrees of equivalence uncertainties for Cu, In, Ga and Se are 0.0093 mol/mol, 0.0123 mol/mol, 0.0047 mol/mol and 0.0228 mol/mol, respectively. These values are much smaller than that of Fe in a Fe-Ni alloy film in CCQM K-67 (0.0330 mol/mol). This means that the quantification of multi-element alloy films is possible by depth profiling analysis using the TNC method.
Quantitative Analysis and 2D/3D Elemental Imaging of Cocoa Beans Using X‑ray Fluorescence Techniques
(2023)
As an important raw material for the confectionery industry, the cocoa bean (Theobroma cacao L.) has to meet certain legal requirements in terms of food safety and maximum contaminant levels in order to enter the cocoa market. Understanding the enrichment and distribution of essential minerals but also toxic metals is of utmost importance for improving the nutritional quality of this economically important raw food material. We present three X-ray fluorescence (XRF) techniques for elemental bio-imaging of intact cocoa beans and one additional XRF technique for quantitative analysis of cocoa pellets. The interrelation of all the methods presented gives a detailed picture of the content and 3D-resolved distribution of elements in complete cocoa beans for the first time.
Characterization of bio-molecular nano-layers by means of reference-free X-ray Spectrometry
An increasing field of application, e.g. in biotechnology is the dedicated adjustment of surface properties by functionalization with organic molecules. For a detailed understanding and further development of such nano-layers, a quantitative determination of the surface density of molecular species is required.
By means of reference-free X-Ray Fluorescence (XRF) spectrometry such surfaces can be analyzed quantitatively by detecting specific marker elements. Using calibrated instrumentation and a quantification approach based on atomic fundamental parameters a SI-traceable quantitative analysis without any calibration sample or reference material is possible. A chemical analysis of molecular bonds can be accomplished by X-Ray Absorption Spectroscopy in the Near-Edge region (NEXAFS). Especially in the soft X-ray range an access to relevant light elements like Carbon C, Nitrogen N and Oxygen is possible.
Here, aminated surfaces with varying densities of amino groups prepared from binary mixtures of silanes were investigated. In a complementary analysis by X-Ray Photoelectron Spectroscopy (XPS) and Fluorescence measurements based on laser-excitation in the optical light spectrum the functional-group density of silane monolayers were determined. The nitrogen atom in the head-group of the silane-molecule could be used as specific marker for the reference-free quantitative XRF analysis and were used for traceable calibration of XPS and Fluorescence Spectroscopy.
X-ray fluorescence (XRF) analysis is a well suited methodology for thin film analysis. With XRF the mass deposition of elements can be non-destructively determined. By knowledge of the density of the thin film as well the thickness can be given. In the field of industrial thin film manufacturing various material systems and layer structures are used. the analysis relies on well-known calibration samples or even reference materials to determine absolute analytical results from the measurement values recorded. Within this concept of chemical traceability the calibration sample has to be as similar as possible to the industrial thin film sample with respect to the spatial distribution of elemental composition in order to minimize matrix effects or analysis related uncertainties. The procurement of such certified similar calibration samples or reference materials including their required traceability is a challenge due to limited number of available calibration samples or reference materials, in particular at the nanoscale. There are only few providers of calibration standards for layer or coating thicknesses which are suitable for XRF analysis. The limited number of available certified reference materials (CRMs) for XRF thin film analysis and in parallel the growing market of novel thin film materials induces a growing gap of required calibration samples for XRF analysis.
The exploitation of process-near samples benefits from a leverage effect: on one hand reference materials are needed for calibration and alignment procedures for X-ray fluorescence devices. They are customized for the special need of the end-user, e.g. a company producing thin film solar cells. On the other hand the market for EDXRF devices develops positively by providing novel thin film calibration samples for industry and end user-related production processes or application. Two aspects are hereby being addressed; the improvement of product quality which in certain sectors like aerospace and automotive industry directly translates to product safety as well as the expansion of the sales potential of EDXRF measuring devices.