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Depth profiling of electrically non-conductive layered samples by RF-GDOES and HFM plasma SNMS
(2001)
The work is intended to compare the capabilities of two similar depth profiling techniques to analyse electrically non-conductive samples. In order to get a better evaluation of the depth resolution, various multilayer sandwiches, such as SiO2/TiO2 and Si3N4/SiO2 deposited on glass substrates have been investigated. Optimised depth profiles are presented for both methods, glow discharge optical emission spectrometry (GDOES) and radiofrequency mode (known as HFM in the SNMS literature) of plasma secondary neutral mass spectrometry (SNMS). The optimisation procedure, necessary to get the best set of plasma parameters, which result in the optimal depth resolution, is also described for one selected sample. Additionally, sputtering crater profilometry was carried out in order to check out the flatness of the sputtered crater. The influence of the thickness of the sample substrate on the sputtering rate is discussed. Finally, advantages and disadvantages of the use of these two depth profiling methods, especially for the non-conductive samples, are concluded from this comparative study. Time-of-flight secondary ion mass spectrometry (ToF-SIMS) analysis of a cross-sectioned sample was carried out in order to get supplementary information.
Pulsed-plasma-deposited ethylene films were studied by time-of-flight static secondary ion mass spectrometry (ToF-SSIMS) before and after exposure to ambient air. The influence of the external plasma parameters on the secondary ion mass spectra of plasma-deposited ethylene films was investigated. From these data, information on the chemical character of the plasma-deposited ethylene films was derived. The investigation of the effect of external plasma parameters on the chemical character of the plasma-deposited ethylene films revealed that there were some drastic changes in the secondary ion mass spectra of the films. It was found that fragmentation and re-arrangement of the monomer molecules in the plasma, which affects the chemical character of the deposited films, vary according to the external plasma parameters. When the plasma polymers are exposed to air, extensive oxygen incorporation occurs. The oxygen uptake is high at the beginning and then it levels of. Some indications for the formation and decay of peroxy radicals (COO) and, subsequently, hydroperoxides (COOH) are found. It was observed that the oxygen uptake of the plasma deposited ethylene films increase when the plasma conditions become harder.
The effect of the composite plasma parameter P/F, where P is the plasma power and F is the monomer flow rate, on the chemical character of pulsed plasma deposited allyl alcohol films was investigated by ToF-SSIMS. Information on the unsaturated character, the cross-linked and/or branched character of the plasma polymer films was derived in detail. The problem of the retention of OH groups in plasma deposited allyl alcohol films was elucidated in detail using SSIMS data. The lowest conversion rate from the monomer's hydroxyl groups to other oxygen functionalities in the plasma was concluded for the plasma polymer film produced at a P/F ratio of 0.05 W · sccm-1. It was found that the overall oxygen content of the films decreased vs. increasing P/F ratio. Because the freshly prepared films were investigated without air exposure, ageing on ambient air could be studied in detail. It was found that in the case of plasma deposited allyl alcohol films the ageing on air is probably based on two competing processes which are discussed in detail. Additionally, a review of literature data on the characterization of plasma deposited allyl alcohol films is given.
Es wird gezeigt, dass mit einer Kombination der Oberflächenanalyseverfahren ESCA, ToF- SIMS und XAS eine erfolgreiche chemische Charakterisierung von Plasmapolymerfilmen erreicht werden kann. Es werden Elemente und Bindungstypen identifiziert und (semi-)quantitativ bestimmt. Eine Korrelation zwischen Abscheidebedingungen und chemischen Eigenschaften der Plasmapolymerschichten kann hergestellt werden; eine kontrollierte Abscheidung wird damit möglich. Alterungsprozesse, die als Folge einer Atmosphärenexposition auftreten, können beobachtet werden. Die direkte Verbindung der Analysetechniken mit einem Plasmareaktor ermöglicht es, die Alterungsphänomene der Schichten systematisch mit Bezug auf eine frisch abgeschiedene und keinerlei Atomsphäre ausgesetzte Plasmapolymerschicht zu studieren.
Die Verfahrensweise wird exemplarisch am Beispiel von Ethylen-, Allylamin- und Allylalkohol-Plasmapolymerschichten demonstriert.
The formation of plasma-deposited materials made from organic molecules is a technologically attractive way to obtain films with unique properties, e.g. adhesion, wettability, conductivity or selected chemical functionalization. A detailed chemical characterization of these films is a great challenge for the analyst because of the co-existence of a large number of chemical species in plasma-deposited films. We investigated these types of organic films using photoelectron spectroscopy for chemical analysis (ESCA, XPS), near edge X-ray absorption fine structure (NEXAFS) spectroscopy at synchrotron radiation source BESSY II and time-of-flight secondary ion mass spectroscopy (ToF-SIMS). A dedicated plasma preparation chamber was designed and added to the main analysis chamber of the respective spectrometers. This approach offers the possibility of studying plasma-deposited films without exposure to air before analysis (often called in-situ analysis) and the influence of post-plasma reactions, i.e. the ageing process. The present investigations are aimed at finding correlations between basic chemical properties of the deposited films and the plasma deposition parameters, e.g. duty cycle in pulsed plasmas and the power of discharge.
Static ToF-SIMS analysis of plasma chemically deposited ethylene/allyl alcohol co-polymer films
(2006)
A plasma co-polymerization of ethylene as a chain extending monomer and allyl alcohol as a carrier monomer for hydroxyl groups was studied. The composition of the feed gas was systematically varied and the plasma co-polymers were analyzed in terms of their relative concentrations of OH functional groups by static Time of Flight Secondary Ion Mass Spectrometry (ToF-SIMS) immediately after their preparation without any air contact, i.e., under so called in situ conditions.
The relative OH group concentration involved in the CH2OH groups was derived from the normalized yields of the CH3O+ secondary fragment ion. The density of functional groups in the plasma co-polymers was found to vary non-linearly with respect to the mole percentage of the monomers in the feed gas.
Co-polymerization phenomena, i.e. chemical interactions and recombination reactions taking place between monomer molecules in the plasma and/or during the deposition process, become evident in ToF-SIMS spectra.
Plasma deposited styrene/allyl alcohol and ethylene/allyl alcohol copolymer films were prepared and characterized using XPS, NEXAFS and ToF-SIMS. The relative partial flow rates of the co-monomers are used as deposition process parameters to vary and all other process parameters were constrained to conditions optimized for retention of functional groups. By doing this it is possible to control certain chemical properties of the copolymer films such as unsaturation, oxygen and hydroxyl group relative surface contents. The aging behavior of the plasma copolymer films on air was studied, too. Non-linear variations of relative oxygen contents, contents of C—OR species and contents of carbonyl species are obtained vs. variation of feed gas composition for both monomer combinations. The chemical character of the plasma copolymer films varies between the limits given by the respective plasma homopolymers. The observed non-linear correlations are discussed in terms of approaches developed for classic radical copolymerization. The aging behavior of the different plasma copolymers films depends on the feed gas composition. Principally these aging phenomena known from plasma polymer aging studies of that respective monomer which dominates the character of the plasma copolymer are observed.
It is known that aminosilanized Si wafers may be used as microarray platforms. Results of an XPS study of a cleaning applied to Si wafers prior to aminosilanization are presented and discussed. Furthermore, the results of an aminosilanization protocol optimized in terms of nitrogen chemistry are described. After optimization of the protocol a free amine content of 94% was reached. The surface chemistry was investigated in this study by using XPS, time of flight (ToF)-SIMS and near-edge X-ray absorption fine structure (NEXAFS) spectroscopy. Reference to aminosilanization protocols reported in the literature has been made.