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- 2001 (5) (entfernen)
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- Acethylene (1)
- Butadiene (1)
- Chemical characterization (1)
- Crater shape (1)
- Deposition process (1)
- Depth resolution (1)
- Doping with metal atoms (1)
- ESCA (1)
- Encapsulation of nanoparticles (1)
- Ethylene (1)
Elastomeric sealants may contain organic silicon compounds. The use of these sealants for housings for electronic components is harmful for the reliability of electric contacts inside. In order to prevent electronic components from malfunction, quality control of elastomeric sealants is required. An analytical procedure developed to fulfil this requirement was developed. It is based on electron spectroscopy for chemical analysis (ESCA). Information on the silicon compounds existing at the surface of elastomeric sealants is provided by this method. Silicon in organic and inorganic compounds can be differentiated with the help of Si 2p photoelectron spectra. Quantitative results can be obtained too. The uncertainty budget of the quantitative procedure is estimated.
Selected FTIR, XPS and NEXAFS spectroscopy results obtained with films deposited with different plasma polymerization processes and different monomers (styrene, acetylene, ethylene and butadiene) are presented. In detail FTIR spectra, XPS surveys, XPS valence bands and core level signals including shake-up features as well as carbon K-edge absorption spectra are qualitatively and, in some cases, semi-quantitatively considered. Information on the film formation, the chemistry of the films and the film stability against air exposure are derived from spectroscopic features. With styrene chemically rather well defined plasma polymer layers can be formed with rather high deposition rates applying a pulse plasma process. Using ethylene, acetylene or butadiene as a monomer in the plasma deposition process the deposition rates are smaller. Using these monomers plasma polymer films can be obtained with a primary chemical structure which is similar to each other but more or less different from those of the respective conventional polymers. The main difference between these samples is their individual concentration of unsaturated carbon species. Finally, a technologically relevant example, i.e. a plasma deposited polymer barrier layer deposited on the inner wall of a poly(ethylene) vessel is briefly considered.
Several possibilities exist to produce a modified polymer surface with a high density of only one sort of functional group such as: (i) the plasma grafting of unfragmented monomer molecules and their polymerization forms OH, NH2, COOH groups, etc. in concentrations of approximately 25 groups per 100 C atoms; (ii) selective plasma bromination provides 1025 CBr groups; (iii) the plasma oxidation of polymer surfaces in an O2 plasma followed by the chemical reduction of all O-containing groups to OH groups by diborane, vitride (Na complex) or LiAlH4 yields 914 OH groups per 100 carbon atoms; and (iv) the grafting of spacers with different endgroups onto OH or CBr groups produces 710 spacer molecules/100 C. This work was focused on the formation of thin plasma deposited polymer layers with a maximum of (homo)functional groups and with a minimum of chemical irregularities using the pulsed plasma technique. The monomers were allylalcohol, allylamine, acrylonitrile and acrylic acid. The further intent was to study the interactions of functional groups (OH, COOH, NH2) and deposited metals (Cr, Al, Ti). It was expected that more basic (NH2), weakly basic or neutral (OH) or more acidic (COOH) groups would show different interactions and chemical reactions with metal atoms.
The retention of chemical structure and functional groups during plasma polymerization was investigated. Usually plasma polymer layers, prepared by a continuous wave radio-frequency plasma, are often chemically irregular in their structure and composition. To minimize these irregularities low wattages and the pulsed plasma technique were applied to avoid fragmentations. The first goal was to produce plasma polymers comprising double or triple bonds as precursors for electrically conducting polymers. Acetylene, ethylene, butadiene and polystyrene were used as monomers and deposited as thin polymer films by pulsed plasmas of low wattages. Styrene polymerization was strongly enhanced in the dark phase (plasma off) of a pulsed r.f. plasma caused by the reactivity of the vinyl-type double bond. This could be confirmed by a verification of a rather high chemical regularity of the film sample. The oxygen content of this film measured by X-ray photoelectron spectrometry (XPS) was in situ 0% and after 24 h exposure to air lower than 1%. Additionally, post-plasma oxidations of trapped radicals with air could be suppressed using NO gas as radical quencher. Such quenched plasma polymer layers were completely stable against oxidation for a number of weeks. During the low-wattage pulse plasma polymerization metal atoms were simultaneously or layer by layer evaporated into the growing layer and in situ measured by XPS. These metal atoms are acting as dopants. Here, Li, K, Mg and Cr were used at different concentrations providing electrical conductivity and magnetic properties for the film.
Depth profiling of electrically non-conductive layered samples by RF-GDOES and HFM plasma SNMS
(2001)
The work is intended to compare the capabilities of two similar depth profiling techniques to analyse electrically non-conductive samples. In order to get a better evaluation of the depth resolution, various multilayer sandwiches, such as SiO2/TiO2 and Si3N4/SiO2 deposited on glass substrates have been investigated. Optimised depth profiles are presented for both methods, glow discharge optical emission spectrometry (GDOES) and radiofrequency mode (known as HFM in the SNMS literature) of plasma secondary neutral mass spectrometry (SNMS). The optimisation procedure, necessary to get the best set of plasma parameters, which result in the optimal depth resolution, is also described for one selected sample. Additionally, sputtering crater profilometry was carried out in order to check out the flatness of the sputtered crater. The influence of the thickness of the sample substrate on the sputtering rate is discussed. Finally, advantages and disadvantages of the use of these two depth profiling methods, especially for the non-conductive samples, are concluded from this comparative study. Time-of-flight secondary ion mass spectrometry (ToF-SIMS) analysis of a cross-sectioned sample was carried out in order to get supplementary information.