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An AFM-ESEM Hybride
(2003)
Bulk samples and thin films of polyamides (PA6 and PA12) were exposed to fluorine (1 - 10 vol.-% F2 in N2) and analysed with photoelectron (XPS) and infrared spectroscopy. Fluorination affects both, the amide and the hydrocarbon parts of the polymers. However, only the carbon atom next to the carbonyl is readily fluorinated. Chemical modification of the amide group is apparent in a large binding energy shift (+5 eV) of the N1s level and the appearance of a CO band at 1734 cm-1. It is concluded that the amide C-N bond is cleaved in the fluorination process and that COOH and NF2 end groups are formed. This conclusion is corroborated by the appearance of ester oxygen in the XPS and by the 19F NMR spectra of the volatile products that show fluorine signals chemically shifted about 200 ppm towards lower field as compared with the CHF environment.
Thin polyamide-6 films were exposed to fluorine gas and analysed with photoelectron and infrared spectroscopies. Fluorine cleaves the amide CN bond resulting in the formation of the COOH and NF2 terminal groups. This is evident from large shifts in the N1s binding energy (+5 eV) and C=O stretching frequency (~80 cm-1), appearance of ester oxygen in the XPS spectra, as well as by the 19F nmr spectra of volatile products consistent with a terminal NF2 group.
Chemical, morphological and accumulation phenomena in ultrashort-pulse laser ablation of TiN in air
(2000)
Ultrashort-pulse laser ablation (F=130 fs, 5=800 nm, repetition rate 2-20 Hz) of titanium nitride was investigated for laser fluences between 0.3 and 4.5 J/cm2 using the direct focusing technique in air. The influence of the laser pulse number and the peak fluence was investigated by means of several surface analytical techniques (optical microscopy, dynamic friction atomic force microscopy, scanning Auger electron microscopy and small-spot electron spectroscopy for chemical analysis). The correlation of the results about optical, physical and chemical properties of the irradiated areas allows us to propose a simple oxidation model, which explains different observed phenomena associated with surface damage such as mound formation and crater widening and clarifies the incubation behavior reported earlier for this material.
Two different methods of nanolithography, namely dynamic plowing lithography (DPL) and indentation by means of force-displacement curves (FDI), have been compared by performing them on two different polymers, poly (methylmethacrylate) and polystyrene. No fundamental differences can be found out in the efficiency of the two methods, i.e., in the depth of the lithographed structure as a function of the scanning parameters. The main drawback of FDI is that it is much more time consuming than DPL. On the other hand, when the sample is lithographed with DPL, the border walls that surround the lithographed structure are very much bigger than the border walls created through FDI. The physicochemical properties of the border walls created through DPL have been investigated. Several experimental data reveal that such border walls are very much softer and looser than unmodified polymers and suggest that during DPL the fast oscillating tip is able to break polymer chains. This does not happen with FDI, where border walls are simply made up of the material carved out by the tip. A method to eliminate these undesirable border walls is suggested.