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Dynamic Plowing Lithography is employed to carve holes in a PMMA surface by indenting the sample during Tapping Mode imaging. The dependence of the dimensions of the holes on the tip shape, on the modulation voltage amplitude, and on the number of contacts between the tip and sample is studied. The results give some insights in the physico-chemical mechanisms accompanying such rapid modifications. Two-dimensional arrays of holes have also been carved, in order to study the result of the superposition of single holes.
Two different methods of nanolithography, namely dynamic plowing lithography (DPL) and indentation by means of force-displacement curves (FDI), have been compared by performing them on two different polymers, poly (methylmethacrylate) and polystyrene. No fundamental differences can be found out in the efficiency of the two methods, i.e., in the depth of the lithographed structure as a function of the scanning parameters. The main drawback of FDI is that it is much more time consuming than DPL. On the other hand, when the sample is lithographed with DPL, the border walls that surround the lithographed structure are very much bigger than the border walls created through FDI. The physicochemical properties of the border walls created through DPL have been investigated. Several experimental data reveal that such border walls are very much softer and looser than unmodified polymers and suggest that during DPL the fast oscillating tip is able to break polymer chains. This does not happen with FDI, where border walls are simply made up of the material carved out by the tip. A method to eliminate these undesirable border walls is suggested.
Poly(methyl methacrylate) (PMMA) surfaces have been modified by dynamic plowing lithography. The resulting modified structures, presenting regions of different densities and stiffnesses, have been studied by forcedisplacement curves. The elasto-plastic response, the stiffness, and the adhesion of the modified samples have been characterized. Forcedisplacement curves are able to distinguish between unmodified PMMA and two different structures resulting from the lithography, i.e. compressed PMMA and low density PMMA. In particular, the low density regions are made up of cluster-like globular particles, whose elasto-plastic response and adhesion are measured and whose contribution to the total elasto-plastic response and to the adhesion has been studied in detail.
The adhesion of poly(methyl methacrylate) (PMMA) and polystyrene (PS) films, whose surface has been previously structured by dynamic plowing lithography (DPL), has been measured by means of forcedisplacement curves. The different adhesion of modified and unmodified PS leads to the assumption that polymer chains are broken during DPL. After measuring the energy dissipated by the tip during DPL, in order to check that the transferred energy is sufficient to break covalent bonds, the polymer chain scission caused by the lithographic process has been definitely confirmed by size exclusion chromatography measurements of the lithographed films.