Filtern
Erscheinungsjahr
Dokumenttyp
- Zeitschriftenartikel (11)
- Beitrag zu einem Tagungsband (5)
- Vortrag (3)
- Posterpräsentation (2)
- Corrigendum (1)
- Forschungsbericht (1)
Schlagworte
- Imaging XPS (4)
- Haftfestigkeit (3)
- Zentrifugentechnologie (3)
- Centrifuge technology (2)
- Degradation (2)
- Ellipsometry (2)
- Field of View (2)
- Härteprüfung (2)
- Impurities (2)
- Klebfestigkeit (2)
Organisationseinheit der BAM
Eingeladener Vortrag
- nein (3)
Für Prüfungen in der Beanspruchung auf Zug zur Bestimmung der Haft- bzw. Klebfestigkeit bzw. in der Beanspruchung auf Druck zur Bestimmung der Härte wurden bisher Zug- bzw. Härteprüfmaschinen als Ein-Proben-Prüfungen verwendet. In der Beanspruchung auf Zug ist die Probe beidseitig, und um das Einleiten von Querkräften zu verhindern, oft doppeltkardanisch einzuspannen. In jedem Falle handelt es sich um Ein-Proben-Prüfungen. Bei der Zentrifugentechnologie kann mit der Zentrifugalkraft als Prüfkraft unter Verwendung eines Trommelrotors erstmals in einer Mehr-Proben- Anordnung gearbeitet werden. Da die Proben nur einseitig unterstützt werden, ist die Beladung über einfaches Einstecken realisierbar.
Mit dem Auf-Tisch-Prüfsystem können bis zu acht Proben gleichzeitig auf Zug oder Druck beansprucht werden. Ein aufgeklebter oder anderweitig mit dem Prüfkörper verbundener und unter Einwirkung der Zentrifugalkraft in einer Führungshülse radial nach außen laufender Prüfstempel beansprucht dann die Klebung, die Beschichtung oder den Verbund auf Zug bis zum Versagen. Im Augenblick des Abrisses wird ein positionscodiertes und drehzahlkorreliertes Signal gesendet und so die Bestimmung von Kleb-, Haft- bzw. Verbundfestigkeiten im Mehr-Proben-Versuch möglich. Analog beansprucht ein in einer Führungshülse radial innen an den Proben anliegender ggf. mit entsprechenden Eindringkörpern ausgerüsteter nach außen gerichteter Prüfstempel die Proben auf Druck.
Aus Drehzahl, Radius und Prüfstempelmasse können dann Kleb-, Haft- bzw, Verbundfestigkeiten oder aber Brinell-, Kugeldruck- oder Vickers-Härtewerte bestimmt werden.
Die Oberflächentechnik ist eine Schlüsseltechnologie in nahezu zu allen industriellen Branchen. Mit Ausnahme der mechanischen Stabilität, die das Substrat bereitstellt, werden verschiedenartigste Funktionen materialsparend, zum Teil hochintegriert mit maßgeschneiderten Schichtdesigns unter Ausnutzung von Nano- und Quanteneffekten auf Oberflächen appliziert. Ein Großteil der Fertigungskosten in der Mikro- und Nanotechnik wird durch Reinräume und die Umsetzung ausgeklügelter Reinigungsstrategien zur Vermeidung von Restverschmutzungen und partikulären Belegungen
verursacht, da diese unweigerlich zum Bauteilversagen führen. Die Validierung des Reinigungszustandes ist somit von zentraler Bedeutung für die Schichtqualität und Produktfunktionalität. Dies gilt in Abhängigkeit von der Applikation und den vertikalen Schicht- bzw. lateralen Strukturdimensionen sowohl für Fertigungsprozesse im Reinraum als auch für solche in robuster Umgebung. In der Praxis kommt es häufig vor, dass man mikroskopisch scheinbar saubere Substrate erst durch die Beschichtung „enttarnt" und dann Defekte oft mit bloßem Auge sichtbar werden. Noch problematischer ist der Einbau von Verunreinigungen während der Schichtabscheidung, die zunächst nicht sichtbar sind, dann aber zum Bauteilversagen führen.
In contact with aqueous media glass tends to corrode leading to different surface properties. For the precision application this alteration might cause product failure. Hence precise knowledge of the surface interactions is essential. We performed an extensive investigation on the behavior of borosilicate glass under corrosive attack in order to identify critical processes. We identified appropriate investigation methods including sequential chemical analysis, ATR-IR, ellipsometry and SNMS. These techniques allow to identify the influence of specific production processes.
Industrial quality control (QC) nowadays requires the visualization of surface modifications from the macro-scopic to the microscopic or even nanoscopic scale. This is a prerequisite to the evaluation of functionality and reliability, the detection of defects and their separation of artefacts. The diversity of applications ranges from low-E glazings and solar panels, micro- and optoelectronics, micro- and smart devices to sensor-on-chip and lab-on-chip systems [1]. Optical microcopy (light, confocal laser scanning, white light interference) as established QC-tool is operated at normal incidence, i.e. p- and s-polarization are undistinguishable. Either light-intensity in terms of grey scale and colour or intensity-correlated effects of phase shifts are used. In case of ellipsometry, operated at oblique incidence, p- and s-polarization matter, and amplitude ratios and phase shifts upon reflection are measured. Hence, information content must be much higher.
The visualization of surface modifications may be very challenging for coating/substrate systems of either al-most identical optical constants, e.g. transparent films on substrates of the same material, or minor film thick-ness, substance quantity and affected area, e.g. ultra-thin or island films. Ellipsometry gives access to the con-trast of intensity (I), amplitude ratio (Ψ), and phase shift (Δ) with nanometer-scaled vertical and micrometer-scaled lateral sensitivity, one is able to identify tiny changes within an unmodified surface. As both mapping ellipsometry (ME) and imaging ellipsometry (IE) are operated in the optical far-field, surface inspection is also possible on the macroscopic scale. Near the Brewster-angle of the bare, undamaged, clean, and fresh substrate, the contrast to add-on and sub-off features is superior.
Fig. 1 shows three examples of ellipsometric imaging, i.e. a thin SnO:Ni film on SiO2/Si (Fig. 1a), a dried stain of an anti-body solution on cyclo-olefin-polymer (COP) shown in Fig. 1b, and a polyimide film residue on SiO2/Si (Fig. 1c). For all of these examples, ellipsometry provides much better contrast between substrate and surface modification than optical microscopy, sometimes primarily caused by the oblique incidence (Figs. 1a and 1c), in other cases related to the phase sensitivity of ellipsometry (Fig. 1b). Other examples are laser surface modifications and the corrosion of glass. In these cases, optical microscopy and IE yield to similar results, how-ever only ellipsometry gives access to modelling.
Further investigated coating/substrate systems are 100Cr6 steel, native oxide on silicon, borosilicate glass, and the polymer polycarbonate with deposited films of graphene and ta-C:H, printed and dried pattern of liquids such as water, cleaning agents, and dissolved silicone. Besides imaging ellipsometry, referenced spectral ellipsometry (RSE) has been applied, combining the advantages of both optical microscopy (fast measurement) and ellipsometry (high sensitivity to tiny modifications).
The paper addresses the “Conventional Single-Sample vs. Multiple-Sample Hardness Testing: Hardness Testing Machine vs. Centrifuge” and the follow points are discussed in more detail: Principle of the centrifuge test, components of the centrifuge test, indenter geometries, microscopic measurement of Brinell and Vickers indents, and hardness testing: conventional vs. centrifuge.
Visualization of surface modifications may be very challenging for coating/substrate systems of either almost identical optical constants, e.g. transparent films on substrates of the same material, or minor film thickness, substance quantity and affected area, e.g. ultra-thin or island films. Methods for visualization are optical microscopy (OM), imaging ellipsometry (IE), and referenced spectroscopic ellipsometry (RSE). Imaging ellipsometry operates at oblique incidence near Brewster angle of the bare, clean or unmodified substrate. In this configuration, reflected intensities are rather weak. However, the contrast to add-on and sub-off features may be superior. Referenced spectroscopic ellipsometry operates in a two-sample configuration but with much higher intensities. In many cases, both ellipsometric techniques reveal and visualize thin films, printed-pattern, laser-induced changes, and impurities better than optical microscopy. In particular for stratified homogeneous modifications, ellipsometric techniques give access to modelling and hence thickness determination. Modifications under investigation are polymer foil residue on silicon, laser-induced changes of ta-C:H coatings on 100Cr6 steel, imperfections of ta-C:H on thermal silicon oxide, degradation of glass, thin film tin oxide pattern on silicon, printed and dried pattern of liquids such as deionized water, cleaning agents, and dissolved silicone. © 2016 Elsevier B.V. All rights reserved.
Das Projekt KONTRAST adressiert die Qualitätskontrolle (QC) zur Erfassung nano- und mikroskaliger Belegung/Degradation mittels abbildender Ellipsometrie (IE). Das BAM-Teilvorhaben beinhaltet das Screening von Benchmark-Materialsystemen und die Validierung von Messstrategien. Im Ergebnis erfolgte eine Fokussierung auf das im Vergleich zur off Null Ellipsometrie (ONE) aussichtereichere Verfahren der referenzkompensierten Ellipsometrie(RKE), das marktstrategisch in RSE (referenced spectral ellipsometry) umbenannt wurde. Alle Materialsysteme der BAM-Unterauftragnehmer konnten mit IE visualisiert werden, mit dem RSE-System in wesentlich kürzeren Zeiten, auf größeren Flächen, bei vergleichbarer Empfindlichkeit und Auflösung, Komplementärverfahren waren für den schnellen Nachweis nano- und mikroskaliger Belegung nicht konkurrenzfähig, wobei zusätzliche Materialsysteme mit niedrigem Kontrast (SnO:Ni auf Glas bzw. Cr auf Chromstahl) in der BAM hergestellt wurden. Die öffentliche Präsentation des RSE-Prototyps erfolgte auf der ICSE-7 2016 mit der Publikation 2017 in Applied Surface Science.
Mit der Zentrifugentechnologie ist seit einigen Jahren ein neuartiges Mehr-Proben-Prüf-verfahren auf dem Markt etabliert, welches die klassische Zugprüfung in den Trommelrotor einer Tischzentrifuge überträgt. In der Beanspruchung auf Zug ist die Prüfung der Verbundfestigkeit seit 2017 nach DIN EN ISO/IEC 17025 akkreditiert, wobei die Verbundfestigkeit von Klebungen direkt bestimmt wird und in Abhängigkeit von den Versagensformen Rückschlüsse auf die Klebfestigkeit von Klebstoffen/Klebebändern oder die Haftfestigkeit von Beschichtungen gezogen werden können.
Bei der zerstörenden Beanspruchung auf Zug ist zu beachten, dass es sich bei der Verbundfestigkeit um eine Systemeigenschaft handelt, d.h. nicht nur die chemischen und topografischen Oberflächeneigenschaften, sondern auch die plasto-elastischen Volumeneigenschaften des Klebstoffes und der Fügeteile haben Einfluss auf die ermittelten Kennwerte. Dabei ist eine qualitative Bestimmung der Versagensformen und Bruchbilder nach DIN EN ISO 10365 zwingend erforderlich, um eine Aussage über die Art des Versagens treffen zu können.
Mit der Erweiterung der Zentrifugentechnologie um Beanspruchungen auf Druck wurde dann der Nachweis erbracht, dass auch die klassische Härteprüfung in einer Zentrifuge als Mehr-Proben-Prüfung durchgeführt werden kann. Im Verbundvorhaben QUO VADIS PLUS werden derzeit invasive Beanspruchungen auf Druck zur Bestimmung der Härte von Materialien, der Kompressibilität von Metallschäumen sowie der Kompaktierbarkeit von Pulvern untersucht, was das Anwendungspotential der Zentrifugentechnologie nochmals erweitert. Dazu gehören auch kombinierte Beanspruchungen wie Zug-Scher- und Druck-Scher-Prüfungen.
Die Verbundfestigkeit von CFK-Platten in Abhängigkeit der Beanspruchungsart (Zug vs. Zug-Scher) bzw. der Faserorientierung (0°, 45°, 90°), die Klebfestigkeit von Klebstoffen bzw. Klebebändern auf unterschiedlichen Fügeteilwerkstoffen in Abhängigkeit von der Vorbehandlung, die Haftfestigkeit optischer Schichten auf Kunststoffen, die Bestimmung der Vickers-, Brinell- bzw. Kugeldruck-Härte sowie die Kompressibilität von metallischen Schäumen und Federn werden als ausgewählte Beispiele diskutiert.
Small Area Photoelectron Spectroscopy (XPS) is a powerful tool for investigating small surface features. It is often unclear, if the signal in the spectrum is an unwanted contamination of the Field of View (FoV) or is it originated from outside. The reason is, that XPS-spectra are affected by beam shapes. Scheithauer proposed to measure Pt apertures of different diameters and normalize the Pt4f count rate by a second measurement on the Pt metal. New reference materials were developed and tested in the VAMAS TWA2 A22 Project.
Core–shell nanoparticles (CSNPs) have become indispensable in various industrial applications. However, their real internal structure usually deviates from an ideal core–shell structure. To control how the particles perform with regard to their specific applications, characterization techniques are required that can distinguish an ideal from a nonideal morphology. In this work, we investigated poly(tetrafluoroethylene)–poly(methyl methacrylate) (PTFE–PMMA) and poly(tetrafluoroethylene)–polystyrene (PTFE–PS) polymer CSNPs with a constant core diameter (45 nm) but varying shell thicknesses (4–50 nm). As confirmed by transmission scanning electron microscopy (T-SEM), the shell completely covers the core for the PTFE–PMMA nanoparticles, while the encapsulation of the core by the shell material is incomplete for the PTFE–PS nanoparticles. X-ray photoelectron spectroscopy (XPS) was applied to determine the shell thickness of the nanoparticles. The software SESSA v2.0 was used to analyze the intensities of the elastic peaks, and the QUASES software package was employed to evaluate the shape of the inelastic background in the XPS survey spectra. For the first time, nanoparticle shell thicknesses are presented, which are exclusively based on the analysis of the XPS inelastic background. Furthermore, principal component analysis (PCA)-assisted time-of-flight secondary-ion mass spectrometry (ToF-SIMS) of the PTFE–PS nanoparticle sample set revealed a systematic variation among the samples and, thus, confirmed the incomplete encapsulation of the core by the shell material. As opposed to that, no variation is observed in the PCA score plots of the PTFE–PMMA nanoparticle sample set. Consequently, the complete coverage of the core by the shell material is proved by ToF-SIMS with a certainty that cannot be achieved by XPS and T-SEM.
Small-area/spot photoelectron spectroscopy (SAXPS) is a powerful tool for the investigation of small surface features like microstructures of electronic devices, sensors or other functional surfaces, and so forth. For evaluating the quality of such microstructures, it is often crucial to know whether a small signal in a spectrum is an unwanted contamination of the field of view (FoV), defined by the instrument settings, or it originated from outside. To address this issue, the d80/20 parameter of a line scan across a chemical edge is often used. However, the typical d80/20 parameter does not give information on contributions from the long tails of the X-ray beam intensity distribution or the electron-optical system as defined by apertures. In the VAMAS TWA2 A22 project “Applying planar, patterned, multi-metallic samples to assess the impact of analysis area in surface-chemical analysis,” new test specimen was developed and tested. The here presented testing material consists of a silicon wafer substrate with an Au-film and embedded Cr circular and square spots with decreasing dimensions from 200 μm down to 5 μm. The spot sizes are traceable to the length unit due to size measurements with a metrological SEM. For the evaluation of the FoV, we determined the Au4f intensities measured with the center of the FoV aligned with the center of the spot and normalized to the Au4f intensity determined on the Au-film. With this test specimen, it was possible to characterize, as an example, the FoV of a Kratos AXIS Ultra DLD XPS instrument.
Small-area/spot photoelectron spectroscopy (SAXPS) is a powerful tool for the investigation of small surface features like microstructures of electronic devices, sensors or other functional surfaces. For evaluating the quality of such microstructures, it is crucial to know whether a small signal in a spectrum is an unwanted contamination of the field of view (FoV), defined by the instrument settings, or it originated from outside. The aperture has a major influence on the signal-contribution from the outside. For the evaluation of the FoV, we determined the Au4f intensities measured with the center of the FoV aligned with the center of the spot and normalized to the Au4f intensity determined on the Au-film. With this test specimen, it was possible to characterize the FoV: The signal-contribution from the outside is reduceable down to lower than 50 %, when the aperture is 30 % of the structure dimension for our Kratos AXIS Ultra DLD system.
Small-area/spot photoelectron spectroscopy (SAXPS) is a powerful tool for the investigation of small surface features like microstructures of electronic devices, sensors or other functional surfaces. For evaluating the quality of such microstructures, it is crucial to know whether a small signal in a spectrum is an unwanted contamination of the field of view (FoV), defined by the instrument settings, or it originated from outside. The aperture has a major influence on the signal-contribution from the outside. For the evaluation of the FoV, we determined the Au4f intensities measured with the center of the FoV aligned with the center of the spot and normalized to the Au4f intensity determined on the Au-film. With this test specimen, it was possible to characterize the FoV: The signal-contribution from the outside is reduceable down to lower than 50 %, when the aperture is 30 % of the structure dimension for our Kratos AXIS Ultra DLD system.
This is a corrigendum to the original article "Determining the thickness and completeness of the shell of polymer core-shell nanoparticles by X-ray photoelectron spectroscopy, secondary ion mass spectrometry, and transmission scanning electron microscopy" that was published in "The journal of physical chemistry C", vol. 123 (2019), no. 49 pp. 29765-29775.
Imaging and small-spot (small area) XPS have become increasingly important components of surface chemical analysis during the last three decades, and its use is growing. Some ambiguity in the use of terminology, understanding of concepts, and lack of appropriate reference materials leads to confusing and not always reproducible data. In this paper, it is shown that by using existing knowledge, appropriate test specimens, and standardized approaches, problems of comparability and such reproducibility issues recently observed for XPS data reported in the scientific literature can be overcome. The standardized methods of ISO 18516:2019, (i) the straight-edge, (ii) the narrow-line, and (iii) the grating method, can be used to characterize and compare the lateral resolution achieved by imaging XPS instruments and are described by reporting examples. The respective measurements are made using new test specimens. When running an XPS instrument in the small-spot (small area) mode for a quantitative analysis of a feature of interest, the question arises as to what contribution to the intensity originates from outside the analysis area. A valid measurement approach to control the intensity from outside the nominal analysis area is also described. As always, the relevant resolution depends on the specific question that needs to be addressed. The strengths and limitations of methods defining resolution are indicated.
Hydrogen economy is a central aspect of future energy supply, as hydrogen can be used as energy storage and fuel. In order tomake water electrolysis efficient, the limiting oxygen evolution reaction (OER) needs to be optimized. Therefore, C-based composite materials containing earth-abundant Fe and Mn were synthesized, characterized and tested in the OER. For pyrolysis temperatures above 700°C N-rich multi-walled carbon nanotubes (MWCNT) are obtained. Inside the tubes Fe3C particles are formed, Fe and Mn oxides are incorporated in the carbon matrix and metal spinel nanoparticles cover the outer surface. The best catalyst prepared at 800°C achieves a low overpotential of 389 mV (at 10 mA/cm2) and high stability (22.6 h). From electrochemical measurements and characterization it can be concluded that the high activity is mainly provided by MWCNT, Fe3C and the metal oxides in the conductive carbon matrix. The metal spinel nanoparticles in
contrast protect the MWCNT from oxidation and thereby contribute to the high stability.
ISO 18516:2019 Surface chemical analysis—Determination of lateral resolution and sharpness in beam-based methods with a range from nanometres to micrometres revises ISO 18516:2006 Surface chemical analysis—Auger electron spectroscopy and X-ray photoelectron spectroscopy—Determination of lateral resolution. It implements three different methods delivering parameters useful to express the lateral resolution: (1) the straight edge method, (2) the narrow line method and (3) the grating method. The theoretical background of these methods is introduced in ISO/TR 19319:2013 Surface chemical analysis—Fundamental approaches to determination of lateral resolution and sharpness in beam-based methods. The revised International Standard ISO 18516 delivers standardized procedures for the determination of the (1) effective lateral resolution by imaging of square-wave gratings, the (2) lateral resolution expressed as the parameter D12–88 characterizing the steepness of the sigmoidal edge spread function (ESF) determined by imaging a straight edge and (3) the lateral resolution expressed as the full width of half maximum of the line spread function (LSF), wLSF, determined by imaging a narrow line. The last method also delivers information on the shape of the LSF, which characterizes an individual imaging instrument. Finally, the implementation of all three standardized methods in the field of imaging laboratory X-ray photoelectron spectroscopy (XPS) is shortly presented. This part of the letter is based on the use of a new test sample developed at ETH Zurich, Switzerland. This test sample displays a micrometre scaled pattern motivated by the resolving power of recent imaging XPS instruments.
Surface self-assembly of spherical nanoparticles of sizes below 10 nm into hierarchical heterostructures is under arising development despite the inherent difficulties of obtaining complex ordering patterns on a larger scale. Due to template-mediated interactions between oil-dispersible superparamagnetic nanoparticles (MNPs) and polyethylenimine-stabilized gold nanoparticles (Au(PEI)NPs) at the water–oil interface of microemulsions, complex nanostructured films can be formed. Characterization of the reverse microemulsion phase by UV–vis absorption revealed the formation of heteroclusters from Winsor type II phases (WPII) using Aerosol-OT (AOT) as the surfactant. SAXS measurements verify the mechanism of initial nanoparticle clustering in defined dimensions. XPS suggested an influence of AOT at the MNP surface. Further, cryo-SEM and TEM visualization demonstrated the elongation of the reverse microemulsions into cylindrical, wormlike structures, which subsequently build up larger nanoparticle superstructure arrangements. Such WPII phases are thus proven to be a new form of soft template, mediating the self-assembly of different nanoparticles in hierarchical network-like filaments over a substrate during solvent evaporation.