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- Bariumalumoborosilicate glass (1)
- Bariumalumoborosilicate glass surfaces (1)
- Ceramics (1)
- Femtosecond laser ablation (1)
- Femtosecond techniques (1)
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Eingeladener Vortrag
- nein (3)
Near-ablation threshold investigations focusing on the generation of periodic nanostructures and their correlation with physico-chemical
properties of the solid phase such as e.g., the material-dependent surface energy, were conducted. Molecular dynamic modelling in the
sub-picosecond time domain was used to consider ultrafast opto-electronic processes triggering surface reorganization reactions.
Fluid containment of solid interfaces showed strong influence on the resulting micro- and nanostructures due to its drastic reduction of the
surface energy. The phenomena are discussed in respect to the minimization of the surface free energy in dependence of material composition
and interfacial structure.
Ultra-short pulse laser seeding techniques for silicon crystallite growth on amorphous substrates
(1999)
Laser cleaning of delicate biological composite materials such as ancient parchment manuscripts from the 15th and 16th century and printed paper from the 19th century is demonstrated with an ultraviolet excimer pulsed laser at 308 nm. Laser fluence levels must stay below the ablation and destruction threshold of the parchment or paper substrate, and have to surpass the threshold of the contaminant matter. Foreign layers to be removed must exhibit a higher optical density than the artifact substrates. Synthetic carbonaceous dirt modelled by water-soluble black crayons showed a characteristically weak featureless laser-induced plasma spectroscopy spectrum near the noise limit. It turned out that laser-induced plasma spectroscopy is of limited use in monitoring halting points (or etch-stops) because it relies on the destruction not only of the laterally inhomogenously distributed contaminant but also of pigment phases on a microscopically rough parchment substrate. Laser-induced fluorescence spectroscopy, however, promises to be a valuable non-destructive testing technique for etch-stop monitoring.