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Eingeladener Vortrag
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A detailed diagnostic study of the interaction of nanosecond laser pulses from the near-ultraviolet into the near-infrared
wavelength range with various types of contemporary and ancient parchments is presented. The advantages of laser
cleaning due to the absence of chemical agents, spectroscopic selectivity, micro-precision, computer-aided handling can
only be verified when physico-chemical diagnostics guarantee destructionless processing. Scanning Electron Microscopy
(SEM) data are correlated with morphological changes in dependence on the laser fluence and wavelength. The
question, to what extent the chemical degradation of collagen is affected by various laser treatment parameters, could be
resolved by Transmission Electron Microscopy (TEM) of collagen fibres collected from the outermost laser-exposed
surface layer. It is also shown how Diffuse Reflectance Infrared Fourier Transform Spectroscopy (DRIFT), and
Pyrolysis Capillary Gaschromatography (PY-CGC) can be employed in the chemical diagnostics of laser cleaning of
parchment. This study suggests that the ageing status of parchment artefacts plays a major role in assessing the laser
cleaning limits.
Single-pulse damage thresholds of hydrogenated amorphous carbon (a-C:H) films were measured for 8-ns laser pulses at 532-nm wavelength. Layer thicknesses from below the optical penetration depth to above the thermal diffusion length (60 nm13 µm) were examined. After correction of the damage-threshold values for the fraction of energy effectively absorbed by the material, the damage threshold was found to increase linearly with the layer thickness, also for film thicknesses below the optical penetration depth of a-C:H. The threshold fluence reached the bulk value for a layer thickness equal to the thermal diffusion length. The thermal diffusion coefficient was obtained from fitting the experimental data. Several phenomena like graphitization, blistering, exfoliation, and ablation were observed for different fluence regimes and film thicknesses.
One of the most important materials presenting and witnessing human culture is paper. The cleaning of paper is often necessary because contamination must be removed so that the fragile organic substrate can be preserved. The conventional cleaning methods are mechanical or involve the application of chemicals. These methods can damage drawings or print layers to some extent or make the original paper substrate brittle. More specifically, the use of a scalpel blade can cause damage to fibers. Chemical cleaning is difficult to perform locally, can dissolve foreign matter that then migrates into the paper substrate, or involves volatile organic compounds that can be harmful to the conservator. There is, therefore, a need for new conservation technologies aimed at the safe cleaning of paper. Lasers have proved to be an appropriate tool for cleaning as the energy dose and penetration depth at the specific point of contamination can be controlled. Additionally, if used properly, laser cleaning is not destructive to the paper.
Towards an industrial laser doping process for the selective emitter using phosphoric acid as dopant
(2011)
Different laser supported approaches have already been realized, proving the great potential of laserdoped selective emitters (LDSE). However, it is challenging to establish a low-cost process by using pulsed laser tools. So far a single-step process only leads to satisfying results utilizing cw-lasers. In this paper we have examined a two-step process to produce laser-doped selective emitters on multicrystalline textured standard silicon photovoltaic wafers (90-Ω/sq-Emitter, SiN-antireflection coating (ARC)). The precise ARC removal by near-infrared fs-laser pulses (30 fs, 800 nm), and the doping of uncoated silicon wafers by ns-laser pulses (8 ns, 532 nm) were systematically investigated. In the fs-experiment, optimum conditions for ARC removal were identified. In the nsexperiments under suitable conditions (melting regime), the phosphorous concentration underneath the wafer surface was significantly increased and the sheet resistance was reduced by nearly a factor of two. Moreover, electrical measurements on fired metallization fingers deposited on the laser processed wafers showed low contact resistances. Hence, wafer conditioning with combined fs-laser- and ns-laser-processes are expected to be a promising technology for producing selective emitters.
Laser cleaning of soiled paper is a challenging task due to the fact that a contamination has to be removed and a fragile organic material has to be preserved. The ejection of particles forms a significant channel for the removal of unwanted surface contaminations and can be exploited for an in-situ monitoring of the cleaning procedure. 532-nm-nanosecond single and multi pulse laser cleaning of artificially soiled Whatman© paper was performed. Particles were registered with a dust monitor. These in-situ experiments were combined with ex-situ investigations of cleaning and substrate damage thresholds by means of light and scanning electron microscopic techniques. The cleaning efficiency measured by a multi-spectral imaging system was compared to the in-situ particle monitoring. Additionally, possible color changes of the paper substrate were evaluated.
Characterization of laser-generated microparticles by means of a dust monitor and SEM imaging
(2006)
Nanosecond laser (1064 nm wavelength) cleaning of artificially soiled paper as a model sample simulating a real-world artwork was performed. During the cleaning process, the ejection of particles was monitored in situ by means of a dust monitor (8 size classes, ranging from 0.3 µm to >2 µm) and ex situ using a mini-cascade impactor (MKI, 5 stages). The cleaning result was analyzed by scanning electron microscopy (SEM) considering possible laser-induced damages to the substrate. Size distributions of emitted particles were measured depending on the processing parameters: laser fluence, F, and pulse number per spot, N. High numbers of large (>2 µm) particles were collected by the mini-cascade impactor indicating a gas dynamical liftoff process. Obviously, these particles were not affected by the laser-matter interaction. The different methods (SEM, MKI, and dust monitor) are compared with respect to their usefulness for a proper interpretation of the cleaning results.
This contribution compares traditional cleaning and laser methods. Partial laser cleaning with a nanosecond pulse laser (wavelength of 532 nm) has proved very promising for future application in paper conservation-restoration. Traditional cleaning methods are not always sufficient or successful in surface cleaning of objects of art. Comparative studies of traditional paper cleaning methods and laser cleaning were made on several historic picture postcards printed with the chromolithography technique.
Laser cleaning for works of art on paper might be a supplemental, noncontact method to overcome some of the limitations of traditional dry cleaning techniques. Three different types of paper (pure-cellulose filter paper, rag paper, and wood-pulp paper) were mechanically soiled with pulverized charcoal in a standardized procedure to make model samples. These samples were characterized microscopically and by means of lightness measurements using a multi-spectral imaging system. A prototype laser workstation with Laser Class I conditions for the operator was used for the cleaning experiments. For 10-ns laser pulses at a wavelength of 532 nm, a set of laser parameters was established for a successful cleaning of the samples avoiding damage to the paper substrate. Single- and multi-pulse illumination conditions were tested. An extensive microscopic analysis after laser treatment of the cleaned parts of the samples provided insight into the remaining soiling on the surface and in the bulk of the paper material.