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Eingeladener Vortrag
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The formation of plasma-deposited materials made from organic molecules is a technologically attractive way to obtain films with unique properties, e.g. adhesion, wettability, conductivity or selected chemical functionalization. A detailed chemical characterization of these films is a great challenge for the analyst because of the co-existence of a large number of chemical species in plasma-deposited films. We investigated these types of organic films using photoelectron spectroscopy for chemical analysis (ESCA, XPS), near edge X-ray absorption fine structure (NEXAFS) spectroscopy at synchrotron radiation source BESSY II and time-of-flight secondary ion mass spectroscopy (ToF-SIMS). A dedicated plasma preparation chamber was designed and added to the main analysis chamber of the respective spectrometers. This approach offers the possibility of studying plasma-deposited films without exposure to air before analysis (often called in-situ analysis) and the influence of post-plasma reactions, i.e. the ageing process. The present investigations are aimed at finding correlations between basic chemical properties of the deposited films and the plasma deposition parameters, e.g. duty cycle in pulsed plasmas and the power of discharge.
Plasma deposited allylamine films were studied by in situ ToF-SSIMS, XPS and NEXAFS Spectroscopy before exposure to ambient air. The influence of external plasma parameters such as duty cycle, plasma power, and monomer flow rate on (i) unsaturation, (ii) branching and cross-linking, (iii) nitrogen surface concentration and (iv) retention of amino groups was investigated. Harder plasma conditions, which can be obtained when high duty cycles, high plasma power, and low monomer flow rates are employed, increase the unsaturated, branched and cross-linked character of the plasma deposited films, while the surface concentration of N as well as the retention of the monomer's amino group decrease. As proven by NEXAFS findings and cross-checked by ToF-SSIMS results, the allylamine monomer's primary amino groups are partially transformed into other nitrogen functionalities during its plasma polymerization. Amongst them imines and nitriles are the conversion products with the highest probabilities of formation. Another conversion channel is the formation of nitrogen species not participating in the film growth. This is the reason for an increased N loss in plasma deposited allylamine films as observed independently by XPS and ToF-SSIMS when the plasma parameters are changed from mild to hard.
Static ToF-SIMS analysis of plasma chemically deposited ethylene/allyl alcohol co-polymer films
(2006)
A plasma co-polymerization of ethylene as a chain extending monomer and allyl alcohol as a carrier monomer for hydroxyl groups was studied. The composition of the feed gas was systematically varied and the plasma co-polymers were analyzed in terms of their relative concentrations of OH functional groups by static Time of Flight Secondary Ion Mass Spectrometry (ToF-SIMS) immediately after their preparation without any air contact, i.e., under so called in situ conditions.
The relative OH group concentration involved in the CH2OH groups was derived from the normalized yields of the CH3O+ secondary fragment ion. The density of functional groups in the plasma co-polymers was found to vary non-linearly with respect to the mole percentage of the monomers in the feed gas.
Co-polymerization phenomena, i.e. chemical interactions and recombination reactions taking place between monomer molecules in the plasma and/or during the deposition process, become evident in ToF-SIMS spectra.
Chemical properties of plasma-polymerized styrene films can be effectively controlled by the appropriate choice of external plasma parameters, such as duty cycle, power and monomer pressure. Chemical properties here are the regularity of the primary structure, the amount of long living radicals and branching or cross-linking or both in plasma polymerized styrene films, which can be indirectly monitored by X-ray photoelectron spectroscopy (XPS) and near edge X-ray absorption fine structure (NEXAFS) spectroscopy. Principally, XPS and NEXAFS spectra of plasma-polymerized styrene show all the spectroscopic fingerprints characteristic of atactic polystyrene indicating an inherent similarity of the respective primary chemical structures. There is an increase in irregularity and radical concentration for the plasma deposited films with increasing duty cycle or power. With an increase in monomer pressure, a decreased level of monomer fragmentation and, consequently, an increase in regularity must be concluded from the experimental data. The applied power regulates the fragmentation of the monomers as monitored by spectroscopic signals correlated to the aromatic rings. A trend in the extent of the post-plasma oxygen incorporation according to the variation of the various external plasma parameters was deduced, which agrees with earlier ToF-SIMS findings
Pulsed-plasma-deposited ethylene films were studied by time-of-flight static secondary ion mass spectrometry (ToF-SSIMS) before and after exposure to ambient air. The influence of the external plasma parameters on the secondary ion mass spectra of plasma-deposited ethylene films was investigated. From these data, information on the chemical character of the plasma-deposited ethylene films was derived. The investigation of the effect of external plasma parameters on the chemical character of the plasma-deposited ethylene films revealed that there were some drastic changes in the secondary ion mass spectra of the films. It was found that fragmentation and re-arrangement of the monomer molecules in the plasma, which affects the chemical character of the deposited films, vary according to the external plasma parameters. When the plasma polymers are exposed to air, extensive oxygen incorporation occurs. The oxygen uptake is high at the beginning and then it levels of. Some indications for the formation and decay of peroxy radicals (COO) and, subsequently, hydroperoxides (COOH) are found. It was observed that the oxygen uptake of the plasma deposited ethylene films increase when the plasma conditions become harder.
Pulsed plasma deposited styrene and ethylene films were studied by Time of Flight Static Secondary Ion Mass Spectrometry (ToF-SSIMS) before and after exposure to ambient air. The influence of the external plasma parameters on the secondary ion mass spectra of plasma deposited films was investigated. Approaches for the interpretation of SSIMS spectra of organic materials were reviewed and applied to the evaluation of SSIMS data of plasma deposited films. From these data, information on the chemical character of the plasma deposited films was derived.
When the plasma polymers are exposed to air oxygen incorporation occurs. The oxygen uptake is high at the beginning and then it levels of.
A relation that higher the regularity of the film lower is the oxygen uptake was found. Harder plasma conditions, which could be obtained by applying higher plasma power or lower monomer flow rate, result in higher oxygen uptake and vice versa.
Plasma polymerised films of acrylic acid, allyl alcohol and allyl amine were prepared and studied by XPS (X-ray photoelectron spectroscopy) and XAS (X-ray absorption spectroscopy). The influence of external plasma parameters on certain chemical aspects of the films was investigated. The use of XPS and NEXAFS (near edge X-ray absorption fine structure) as complimentary tools in the surface characterisation of thin films has been highlighted. Certain chemical aspects of the plasma polymerised films such as presence of ROCdouble bond; length as m-dashO in the case of plasma polymerised acrylic acid films, presence of RCdouble bond; length as m-dashO and RCOR bonds in case of plasma polymerised allyl alcohol films and presence of RCdouble bond; length as m-dashN and C?N in case of plasma polymerised allyl amine films were studied. The concentration of ROCdouble bond; length as m-dashO species was found to decrease with increase in r.f. duty cycle in the case of plasma polymerised acrylic acid films. In case of plasma polymerised allyl alcohol films there is a decrease in the concentration of RCdouble bond; length as m-dashO species and increase in the concentration of RCOR species at higher pressures, while in the case of plasma polymerised allyl amine films the concentration of RCdouble bond; length as m-dashN and C?N increases at higher powers, with an increase in C?N more pronounced at higher powers.