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Eingeladener Vortrag
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Static TOF-SIMS results strongly underpin earlier conclusions from ESCA, XANES, and tracer studies that the accumulation of fluorine and chlorine at the surface of chromia by a heterogeneous reaction with a chlorofluorocarbon compound results in the formation of mixed chromium oxide halide species and not in the nucleation of CrCl3 and/or CrF3 phases.
The formation of plasma-deposited materials made from organic molecules is a technologically attractive way to obtain films with unique properties, e.g. adhesion, wettability, conductivity or selected chemical functionalization. A detailed chemical characterization of these films is a great challenge for the analyst because of the co-existence of a large number of chemical species in plasma-deposited films. We investigated these types of organic films using photoelectron spectroscopy for chemical analysis (ESCA, XPS), near edge X-ray absorption fine structure (NEXAFS) spectroscopy at synchrotron radiation source BESSY II and time-of-flight secondary ion mass spectroscopy (ToF-SIMS). A dedicated plasma preparation chamber was designed and added to the main analysis chamber of the respective spectrometers. This approach offers the possibility of studying plasma-deposited films without exposure to air before analysis (often called in-situ analysis) and the influence of post-plasma reactions, i.e. the ageing process. The present investigations are aimed at finding correlations between basic chemical properties of the deposited films and the plasma deposition parameters, e.g. duty cycle in pulsed plasmas and the power of discharge.
Ageing studies of plasma deposited organic films by surface chemical analysis (ESCA, ToF-SIMS, XAS)
(2007)
Plasma deposited ethylene/allylamine and styrene/allylamine copolymer films were prepared and analyzed using XPS, NEXAFS and ToF-SIMS. The relative partial flow rate of the each monomer was used as the variable deposition parameter, while the other deposition parameters were kept constant at optimized values for the retention of functional groups. The effect of the variation in the relative partial flow rates of co-monomers on various chemical aspects of the films like unsaturation, nitrogen retention and branching was investigated revealing several non-linear correlations. This observation is taken as an indication for chemical copolymerization processes during film deposition. An attempt is made to compare these non-linear correlations with approaches which have been developed for classic radical copolymerization processes. The aging behavior of these plasma copolymer films was also studied; the results indicated a stabilization against oxidation in comparison to the aging of allylamine plasma homopolymers.
XPS and NEXAFS spectroscopy were used for the chemical characterization of pulsed plasma-deposited ethylene films before and after exposure to ambient air. The influence of external plasma parameters on the spectroscopic results was investigated. Information on the chemical character of the plasma-polymerized films, such as the regularity of the primary structure, the amount of long-living radicals, and branching or cross-linking or both was derived from this data. Irregularity and radical concentration for post-plasma reactions of the plasma-deposited films increased with the duty cycle or power. A decreased level of monomer fragmentation and, consequently, an increase in regularity is partially concluded from the experimental data when the monomer pressure is increased. The concentration of surface radicals available for post-plasma reactions also increased with monomer pressure. The correlation found between the degree of the post-plasma oxygen incorporation and the variation of the various external parameters agreed with earlier ToF-SSIMS findings.
Chemical properties of plasma-polymerized styrene films can be effectively controlled by the appropriate choice of external plasma parameters, such as duty cycle, power and monomer pressure. Chemical properties here are the regularity of the primary structure, the amount of long living radicals and branching or cross-linking or both in plasma polymerized styrene films, which can be indirectly monitored by X-ray photoelectron spectroscopy (XPS) and near edge X-ray absorption fine structure (NEXAFS) spectroscopy. Principally, XPS and NEXAFS spectra of plasma-polymerized styrene show all the spectroscopic fingerprints characteristic of atactic polystyrene indicating an inherent similarity of the respective primary chemical structures. There is an increase in irregularity and radical concentration for the plasma deposited films with increasing duty cycle or power. With an increase in monomer pressure, a decreased level of monomer fragmentation and, consequently, an increase in regularity must be concluded from the experimental data. The applied power regulates the fragmentation of the monomers as monitored by spectroscopic signals correlated to the aromatic rings. A trend in the extent of the post-plasma oxygen incorporation according to the variation of the various external plasma parameters was deduced, which agrees with earlier ToF-SIMS findings