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Self-assembled octadecyltrichlorosilane (CH3(CH2)17SiCl3, OTS) films were deposited on an oxidized silicon wafer. They were carefully exposed to a low-pressure oxygen direct current (dc) plasma and/or Cr vapor. Subsequently, they were characterized by X-ray photoelectron spectroscopy, near-edge X-ray absorption fine structure spectroscopy, and atomic force microscopy. Detailed information on the oxygen functionalization and the molecular conformation of the OTS films was obtained. The main result was that functionalization conditions can be found where the order of the film remains almost unaffected. Similarly, Cr evaporation of pure OTS films revealed only slight effects on the order in the film. Cr evaporation of an ordered but functionalized OTS film immediately changes its state toward a fully isotropic one. In the course of interaction, oxygen sites at the surface of the functionalized OTS film are reduced whereas Cr becomes oxidized. A redox reaction scheme is proposed for this interfacial reaction. Finally, it is concluded that the given study should be of importance for advanced plasma processing of polyolefins.
Barrier properties of plasma and chemically fluorinated polypropylene and polyethyleneterephthalate
(1995)
The functionalization, perfluorination or an coating of polypropylene (PP) and polyethyleneterephthalate (PET) surfaces in different plasma atmospheres and in an F[2] + N[2] gas mixture were investigated. The aim of this work was to form a barrier layer against solvent and fuel permeation. Typical test solvents were n-pentane, toluene, tetrachloroethylene and mixtures of n-pentane and methanol. The permeation was gravimetrically measured. The permeation of the solvent mixtures was analyzed by mass spectrometry and Fourier transform IR spectroscopy. The permeation of the solvent mixtures through the plasma-modified polymer samples was associated with increased absorption of polar solvent components in the polymer film. The thickness of the plasma-fluorinated PP surface layer was 10-100 nm and that of chemically fluorinated PP about 5000 nm. Nearly the same barrier efficiency was measured for both plasma- and chemically fluorinated samples.
Overlayers of SiO2 (nominally 4, 6 and 8 nm thick) on silicon, prepared by thermal oxidation, were investigated using x-ray photoelectron spectroscopy (XPS). The thickness of these overlayers was obtained from a measurement of the photoelectron intensities originating from the substrate and the oxide overlayer by applying an appropriate quantitative model. The uncertainty budget of that thickness measurement method is given. The relative combined standard uncertainty of the method was found to be 15%. The effective attenuation lengths or the corresponding electron inelastic mean free paths are of considerable importance for both the estimated values of overlayer thickness and combined standard uncertainties. The XPS results were compared with ellipsometry data.
The dismutation of CCl2F2 was used to probe the effect of halogenation of chromia by Cl/F exchange reactions to find out the difference between the halogenated inactive and active catalysts. The heterogeneous reactions were performed in a continuous flow Ni reactor and also under simulated reaction conditions in a reactor where after the reaction X-ray photoelectron spectroscopy (XPS) and X-ray excited Auger electron spectroscopy (XAES) analyses are possible without air exposure of the catalyst, i.e., under so-called "in situ" conditions. The Cr(III) 2p XP spectra, which revealed multiplet splitting features and satellite emission, were used for chemical analysis by using a simple evaluation procedure which neglects this inherent complexity. Chemical analysis was also applied by using chemical state plots for Cr 3s in order to cross-check Cr 2p related results. Both ex and in situ XPS show that as soon as Cr2O3 is exposed to CCl2F2 at 390°C fluorination as well as chlorination takes place at the catalyst surface. When the XPS surface composition reaches approximately 4 at. % fluorination and 6 at. % chlorination, maximum catalytic activity was obtained. Application of longer reaction times did not change significantly the obtained surface composition of the activated chromia. The fluorination and chlorination of chromia was further investigated by various HF and HCl treatments. The activated chromia samples and the Cr2O3, Cr(OH)3, CrF2OH, CrF3·H2O, α-CrF3, β-CrF3, and CrCl3 reference samples with well-known chemical structures were also characterized by X-ray absorption near edge structure (XANES), time-of-flight secondary ion mass spectroscopy (TOF-SIMS), pyridine-FTIR, wet chemical (F and Cl) analysis, X-ray powder diffraction (XRD), and surface area (BET) analysis. The results suggest that the formation of chromium oxide chloride fluoride species, e.g., chromium oxide halides, at the surface is sufficient to provide catalytic activity. The presence of any CrF3 and/or CrCl3 phases on the activated chromia samples was not found.