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Polymeroberflächenfunktionalisierungen im gepulsten Plasma mit nachfolgender chemischer Behandlung
(2000)
Several approaches were investigated to produce monosort functionalized polymer surfaces with a high density and homogeneity of functional groups: (i) Plasma oxidation followed by wet-chemical reduction, (ii) formation of radicals and grafting on of functional group carrying molecules, (iii) plasma bromination followed by (iv) Williamson or Gabriel-like synthesis of spacer molecules, and (v) a pulsed plasma polymerization of functional groups bearing monomers or (vi) their copolymerisation with other comonomers. The formation of hydroxyl (OH), primary amino (NH2), and carboxyl (COOH) groups was studied in detail. The oxygen plasma treatment (i) in a low-pressure non-isothermal glow discharge results in the formation of a wide variety of O functional groups, polymer degradation and crosslinking. Low power densities and short exposure times (0.1 to 2 s) are required to functionalize a surface while preserving the original polymer structure. Carbonate, ester, and aromatic groups are rapidly degraded by an oxygen plasma treatment leading to scissions of polymer backbones and loss in molecular weight. Also the formation of macrocycles and C=C bonds was observed in a region of around 4 nm in depth. The investigated polymers could be classified by their degradation behaviour on exposure to the oxygen plasma.___TAGSTART___BR___TAGEND___ In order to maximize the process selectivity for OH groups, the variety of oxygen functionalities formed by the oxygen plasma was wet-chemically reduced by diborane, vitridetrade (Na complex), and LiAlH4. Typical yields were 9 to 14 OH groups per 100 carbon atoms.___TAGSTART___BR___TAGEND___ Plasma bromination (iii) (40 Br per 100 C atoms) of polymers, followed by grafting of spacer molecules (iv), has been proved to be a highly selective reaction.___TAGSTART___BR___TAGEND___ Another way to produce high densities of monosort functionalities was the pulsed plasma polymerization of functional group bearing monomers such as allylamine, allylalcohol or acrylic acid (v). The retention of chemical structure and functional groups during plasma polymerization was achieved by using low power densities and the pulsed plasma technique. The maximum yields were 30 OH, 18 NH2, and 24 COOH groups per 100 C atoms. To vary the density of functional groups a chemical copolymerization with ''chain-extending'' comonomers such as butadiene and ethylene was initiated in the pulsed plasma (vi). Additionally, the often-observed post-plasma oxidations of such layers initiated by reaction of trapped radicals with oxygen from the air were successfully suppressed by using NO gas as radical quencher.
The retention of chemical structure and functional groups during plasma polymerization was investigated. Usually plasma polymer layers, prepared by a continuous wave radio-frequency plasma, are often chemically irregular in their structure and composition. To minimize these irregularities low wattages and the pulsed plasma technique were applied to avoid fragmentations. The first goal was to produce plasma polymers comprising double or triple bonds as precursors for electrically conducting polymers. Acetylene, ethylene, butadiene and polystyrene were used as monomers and deposited as thin polymer films by pulsed plasmas of low wattages. Styrene polymerization was strongly enhanced in the dark phase (plasma off) of a pulsed r.f. plasma caused by the reactivity of the vinyl-type double bond. This could be confirmed by a verification of a rather high chemical regularity of the film sample. The oxygen content of this film measured by X-ray photoelectron spectrometry (XPS) was in situ 0% and after 24 h exposure to air lower than 1%. Additionally, post-plasma oxidations of trapped radicals with air could be suppressed using NO gas as radical quencher. Such quenched plasma polymer layers were completely stable against oxidation for a number of weeks. During the low-wattage pulse plasma polymerization metal atoms were simultaneously or layer by layer evaporated into the growing layer and in situ measured by XPS. These metal atoms are acting as dopants. Here, Li, K, Mg and Cr were used at different concentrations providing electrical conductivity and magnetic properties for the film.