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- 2012 (3) (entfernen)
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Schlagworte
- Elemental composition (2)
- Quantification (2)
- CCQM (1)
- ED-EPMA (1)
- Energy dispersive electron probe microanalysis (ED-EPMA) (1)
- Fe-Ni (1)
- Fe-Ni alloy (1)
- Film thickness (1)
- K-values (1)
- Key comparison (1)
An international interlaboratory comparison of the measurement capabilities of four National Metrology Institutes (NMIs) and one Designated Institute (DI) in the determination of the chemical composition of thin Fe-Ni alloy films was conducted via a key comparison (K-67) of the Surface Analysis Working Group of the Consultative Committee for Amount of Substance. This comparison was made using XPS (four laboratories) and AES (one laboratory) measurements. The uncertainty budget of the measured chemical composition of a thin alloy film was dominated by the uncertainty of the certified composition of a reference specimen which had been determined by inductively coupled plasma mass spectrometry using the isotope dilution method. Pilot study P-98 showed that the quantification using relative sensitivity factors (RSFs) of Fe and Ni derived from an alloy reference sample results in much more accurate result in comparison to an approach using RSFs derived from pure Fe and Ni films. The individual expanded uncertainties of the participants in the K-67 comparison were found to be between 2.88 and 3.40 atomic %. The uncertainty of the key comparison reference value (KCRV) calculated from individual standard deviations and a coverage factor (k) of 2 was 1.23 atomic %.
The elemental composition of thin Fe-Ni alloy films deposited on silicon substrates were determined by electron probe microanalysis with an energy dispersive spectrometer using the STRATAGem software. The work was part of ample inter-laboratory comparisons organized in the frame of CCQM/SAWG (Consultative Committee for Amount of Substance/Surface Analysis Working Group). Therefore, the evaluation of the measurement uncertainties is treated in detail. By having the mass coverage and estimating a layer density, the layer thickness could be derived.
Characterization of Pd-Ni-Co alloy thin films by ED-EPMA with application of the STRATAGEM software
(2012)
Ternary thin film alloys based on Pd, Ni and Co on silicon wafers have been characterized in order to determine elemental composition and thickness. A broad variety of alloy compositions was obtained on one and the same substrate by magnetron dc-co-sputter deposition. Energy-dispersive electron probe X-ray microanalysis of these 'multi' alloy composition samples is performed in a non-destructive, precise and, if optimized, also in a time-saving way. The local thickness of the layers under study was in between 50 nm and 250 nm. Pure element bulk materials have been employed as reference specimens. The results attained in this study are compared to those obtained by other analytical methods as Auger electron spectroscopy and X-ray photo electron spectroscopy.