Filtern
Erscheinungsjahr
Dokumenttyp
- Zeitschriftenartikel (37)
Referierte Publikation
- ja (37) (entfernen)
Schlagworte
- XPS (18)
- ToF-SIMS (9)
- NEXAFS (6)
- ESCA (4)
- Microarrays (4)
- Surface analysis (4)
- Carbohydrates (3)
- Plasma polymers (3)
- Self-assembled monolayer (3)
- Amino-functionalized surfaces (2)
AZ31 Mg alloy sheet was welded using a gas-tungsten arc (GTA) process over inserts containing 2.3-9.3 wt.% Al. The welded specimens were susceptible to SCC in distilled water, with susceptibility increasing with decreasing weld metal Al (or β particle) concentration. Primary stress corrosion cracks initiated at the weld metal-HAZ interface by stress-assisted localised dissolution and propagated through the weld and base metals by transgranular and intergranular H-assisted fracture (TG-HAF and IG-HAF) respectively. The IG fracture mode may be intrinsic to the texture imparted upon the base metal by rolling. The increase in SCC susceptibility with decreasing weld metal Al concentration is contrary to the purported roles of β particles in promoting localised corrosion and as crack nucleation sites, but corresponds with increases in weld - base metal galvanic current density and weld metal localised corrosion susceptibility.
Self-assembled octadecyltrichlorosilane (CH3(CH2)17SiCl3, OTS) films were deposited on an oxidized silicon wafer. They were carefully exposed to a low-pressure oxygen direct current (dc) plasma and/or Cr vapor. Subsequently, they were characterized by X-ray photoelectron spectroscopy, near-edge X-ray absorption fine structure spectroscopy, and atomic force microscopy. Detailed information on the oxygen functionalization and the molecular conformation of the OTS films was obtained. The main result was that functionalization conditions can be found where the order of the film remains almost unaffected. Similarly, Cr evaporation of pure OTS films revealed only slight effects on the order in the film. Cr evaporation of an ordered but functionalized OTS film immediately changes its state toward a fully isotropic one. In the course of interaction, oxygen sites at the surface of the functionalized OTS film are reduced whereas Cr becomes oxidized. A redox reaction scheme is proposed for this interfacial reaction. Finally, it is concluded that the given study should be of importance for advanced plasma processing of polyolefins.
Overlayers of SiO2 (nominally 4, 6 and 8 nm thick) on silicon, prepared by thermal oxidation, were investigated using x-ray photoelectron spectroscopy (XPS). The thickness of these overlayers was obtained from a measurement of the photoelectron intensities originating from the substrate and the oxide overlayer by applying an appropriate quantitative model. The uncertainty budget of that thickness measurement method is given. The relative combined standard uncertainty of the method was found to be 15%. The effective attenuation lengths or the corresponding electron inelastic mean free paths are of considerable importance for both the estimated values of overlayer thickness and combined standard uncertainties. The XPS results were compared with ellipsometry data.
First results of an inter-laboratory comparison (27 participants in Europe, Japan and USA) of XPS data obtained with non-conducting samples are presented. Binding energies of Al 2s for alumina, N 1s and imide C 1s for Kapton and Sr 3p3/2 for a strontium titanate film on glass were obtained after static charge referencing with the help of 15 nm gold particles deposited at the surface of the test samples. For the alumina sample C 1s static charge referenced data are also presented. Repeat standard deviations (sr), between standard deviations (sb), reproducibility standard deviations (sR) and total means are evaluated from the experimental data. It can be stated that although the repeat standard deviation is as small as 0.05 eV in the best case, the standard deviation characterizing the reproducibility of the method is obviously not better than 0.15 eV in the best case at the present time. The knowledge of these standard deviations is important for metrology, validations of analytical procedures relying on qualitative photoelectron spectroscopy and XPS databanking.
Results from a study conducted between National Metrology Institutes (NMIs) for the measurements of the absolute thicknesses of ultra-thin layers of SiO2 on Si are reported. These results are from a key comparison and associated pilot study under the auspices of the Consultative Committee for Amount of Substance. ´Amount of substance´ may be expressed in many ways, and here the measurand is the thickness of the silicon oxide layers with nominal thicknesses in the range 1.5-8 nm on Si substrates, expressed as the thickness of SiO2. Separate samples were provided to each institute in containers that limited the carbonaceous contamination to approximately < 0.3 nm. The SiO2 samples were of ultra-thin on (100) and (111) orientated wafers of Si. The measurements from the laboratories which participated in the study were conducted using ellipsometry, neutron reflectivity, X-ray photoelectron spectroscopy or X-ray reflectivity, guided by the protocol developed in an earlier pilot study. A very minor correction was made in the different samples that each laboratory received. Where appropriate, method offset values attributed to the effects of contaminations, from the earlier pilot study, were subtracted. Values for the key comparison reference values (agreed best values from a Consultative Committee study) and their associated uncertainties for these samples are then made from the weighted means and the expanded weighted standard deviations of the means of these data. These results show a dramatic improvement on previous comparisons, leading to 95% uncertainties in the range 0.09-0.27 nm, equivalent to 0.4-1.0 monolayers over the 1.5-8.0 nm nominal thickness range studied. If the sample-to-sample uncertainty is reduced from its maximum estimate to the most likely value, these uncertainties reduce to 0.05-0.25 nm or ~1.4% relative standard uncertainties. The best results achieve ~1% relative standard uncertainty. It is concluded that XPS has now been made fully traceable to the SI, for ultra-thin thermal SiO2 on Si layers, by calibration using wavelength methods in an approach that may be extended to other material systems.
The combination of complementary characterization techniques such as SEM (Scanning Electron Microscopy), T-SEM (Scanning Electron Microscopy in Transmission Mode), EDX (Energy Dispersive X-ray Spectroscopy) and SAM (Scanning Auger Microscopy) has been proven to be a powerful and relatively quick characterization strategy for comprehensive morphological and chemical characterization of individual silica and titania nanoparticles. The selected real life test materials, silica and titania, are listed in the OECD guidance manual as representative examples because they are often used as commercial nanomaterials. Imaging by high resolution SEM and in the transmission mode by T-SEM allows almost simultaneous surface and in-depth inspection of the same particle using the same instrument. EDX and SAM enable the chemical characterization of bulk and surface of individual nanoparticles. The core–shell properties of silica based materials are addressed as well. Titania nominally coated by silane purchased from an industrial source has been found to be inhomogeneous in terms of chemical composition.
In this study, epoxy-terminated silicon oxide surfaces were chemically derivatized with trifluoroacetic anhydride (TFAA) and 4-(trifluoromethyl)-benzylamine (TFMBA) and analyzed by X-ray photoelectron spectroscopy, near-edge X-ray absorption fine structure spectroscopy and water contact angle measurements. TFAA was used for quantitative derivatization to determine the amount of reactive epoxy groups on these surfaces. Furthermore, epoxy-terminated surfaces were derivatized with TFMBA (a model compound for biomolecules with an amino linker) yielding secondary amines because of formation of covalent C–N bonds between TFMBA and the epoxy films. Fluorine being part of TFAA and TFMBA composition was used to follow the progress of the chemical derivatization reaction. Both derivatization agents – TFAA and TFMBA – gave comparable reaction yields of ~60% on epoxy silicon surfaces, whereas on epoxy glass slides, the derivatization yields were considerably lower (30–40%).The protocol for attachment of TFMBA (model compound) on epoxy-modified surfaces was adapted to (bio)molecules with an amino linker, e.g. carbohydrates to prepare carbohydrate-functionalized biointerfaces.
We investigated the ageing of amine-terminated
self-assembled monolayers (amine-SAMs) on different silica
substrates due to exposure to different ambient gases,
pressures, and/or temperatures using time-of-flight secondary
ion mass spectrometry (ToF-SIMS) with principal component
analysis and complementary methods of surface
analysis as X-ray photoelectron spectroscopy (XPS) and
near edge X-ray absorption fine structure (NEXAFS). The
goal of this study is to examine the durability of primary
amine groups of amine-SAMs stored in a user laboratory
prior to being used as supports for biomolecule immobilization
and other applications. We prepared amine-SAMs on
the native oxides of silicon wafers and glass slides using 3-
aminopropyl triethoxysilane, by using optimized conditions
such as anhydrous organic solvent and reaction time scale of
hours to avoid multilayer growth. Selected commercial
amine-SAM slides have been investigated, too. When the
amine-SAMs are exposed to air, oxygen incorporation
occurs, followed by formation of amide groups. The formation
of oxygen species due to ageing was proved by ToFSIMS,
XPS, and NEXAFS findings such as CNO- secondary
ion emission at m/z 42, observation of the N 1s HNC=O
component peak at 400.2400.3 eV in XPS, and, last but not
least, by formation of a π*(HNC=O) resonance at 401 eV in
the N K-edge X-ray absorption spectrum. It is concluded
that the used multi-method approach comprising complementary
ToF-SIMS, XPS, and NEXAFS analyses is well
suited for a thorough study of chemical aspects of ageing
phenomena of amine-SAM surfaces.
An international interlaboratory comparison of the measurement capabilities of four National Metrology Institutes (NMIs) and one Designated Institute (DI) in the determination of the chemical composition of thin Fe-Ni alloy films was conducted via a key comparison (K-67) of the Surface Analysis Working Group of the Consultative Committee for Amount of Substance. This comparison was made using XPS (four laboratories) and AES (one laboratory) measurements. The uncertainty budget of the measured chemical composition of a thin alloy film was dominated by the uncertainty of the certified composition of a reference specimen which had been determined by inductively coupled plasma mass spectrometry using the isotope dilution method. Pilot study P-98 showed that the quantification using relative sensitivity factors (RSFs) of Fe and Ni derived from an alloy reference sample results in much more accurate result in comparison to an approach using RSFs derived from pure Fe and Ni films. The individual expanded uncertainties of the participants in the K-67 comparison were found to be between 2.88 and 3.40 atomic %. The uncertainty of the key comparison reference value (KCRV) calculated from individual standard deviations and a coverage factor (k) of 2 was 1.23 atomic %.