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Eingeladener Vortrag
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Die metallischen Verunreinigungen in Metallen lassen sich mittels hochauflösender Massenspektrometer relativ einfach ermitteln. Die Glimmentladungs-Massenspektrometrie (GD-MS) stellt hierfür eine schnelle Multielementmethode dar. Aufgrund ihrer höheren Anregungs- und Ionisationsenergien ist die Bestimmung von Nichtmetallen eine weit größere Herausforderung. Außerdem fehlt es an für die direkte Feststofftechnik notwendigen Kalibrierstandards z.B. in Form zertifizierter Referenzmaterialien. Für die quantitative Bestimmung von Verunreinigungen wurden mit Standards dotierte Pulverpresslinge und dotierte, gesinterte Materialien auf ihre Eignung als Kalibrierstandards für die GD-MS untersucht. Dabei kamen unterschiedliche Plasmabedingungen (gepulster/ kontinuierlicher Betrieb; verschiedene Plasmagase) zum Einsatz. Ein Überblick über analytische Kenngrößen und Grenzen der verwendeten Kalibrierstrategien wird gegeben. Zur Validierung des Verfahrens wurde die hochauflösende Continuum Source Absorptionsspektrometrie (HR-CS-MAAS) verwendet. Die analytische Nutzung der Molekül-absorptionsspektrometrie zur Bestimmung von Halogenen basiert auf der Bildung insitu-generierter zweiatomiger Moleküle (AlCl, GaF). Die entstehenden Molekülspektren werden im Echelle-Spektrometer aufgespalten und mittels CCD-Array detektiert, was eine sehr empfindliche Messung und präzise Quantifizierung ermöglicht.
The analytical potential of a nanosecond laser ablation coupled plasma mass spectrometer (ns-LA-ICP-SFMS)system is investigated for fast and highly spatially resolved (~µm) elemental distribution within single cells. The size, morphology and overlapping of laser-induced craters has been investigated with Atomic Force Microscopy (AFM).
The performance of glow discharge mass spectrometry (GD-MS) is investigated for the accurate quantification of metallic impurities and oxygen in solid samples using the fast flow source GD-MS instrument ELEMENT GD.
Different quantification approaches based on relative and absolute sensitivity factors are evaluated for the determination of metallic impurities using three sample matrixes (Al, Cu and Zn). The effect of the discharge conditions (voltage, current, discharge gas pressure/flow) on the sensitivity is investigated and the parameters are optimized to favour matrix independent calibrations. Improved standard relative sensitivity factors (StdRSFs) are calculated under optimal conditions based on multi-matrix calibrations. The sputtering rate corrected calibration is also presented as a multi-matrix calibration approach.
The capabilities of GD-MS for oxygen determination are also investigated using a set of new conductive samples containing oxygen with mass fractions in the percent range in three different matrices (Al, Mg and Cu) produced by a sintering process. Poor limits of detection (in the order of g/kg) were obtained as consequence of the reduced sensitivity of oxygen in GD-MS and high oxygen background signal intensity as well as its variations. The absolute sensitivity procedure is shown as a matrix-independent approach, which provides quantitative values consistent with those obtained by carrier gas hot extraction (CGHE).
Plasmas as atomization and ionization/excitation sources have been used for more than 50 years. The term plasma spectrochemistry was introduced in the 1980s and is nowadays a topic of annual reviews and different conferences such as the Winter Conference on Plasma Spectrochemistry (held in USA), the European Winter Conference on Plasma Spectrochemistry, and The Nordic conference on Plasma Spectrochemistry.
The development of advanced materials is inherently connected with improvements in analytical chemistry, and often is the driving force for method development in plasma-based spectrometry. Besides the determination of physical characteristics such as tensile strength, density, and conductivity, the investigation of their chemical constituents down to the trace and ultra-trace levels becomes more and more important and, therefore, the demand of sensitive and precise analytical methods is growing. In some cases, the determination of the average content is a sufficient result, for instance for the characterisation of raw material or waste management. However, lately laterally resolved analysis, depth profiling of layered materials and characterization of high purity materials are of growing importance. The aim of this article is to give an introduction into plasma spectrometry and its application in materials science. A theoretical overview of the used plasma techniques and a review on applications with a special focus on direct solid sampling will be presented.
Messergebnisse in der chemischen Analyse müssen vergleichbar sein. Dies wird durch die metrologische Rückführbarkeit (traceability) auf SI realisiert. In der Chemie dienen Reinststoffe als Primärnormale, deren Reinheit mit einer Unsicherheit von < 0.01% ermittelt werden soll. Ein eleganter Weg, die Reinheit eines realen Materials mit hoher Präzision zu bestimmen, ist, alle Verunreinigungen zu messen, diese aufzusummieren und von der idealen Reinheit von 100 Prozent abzuziehen. Die metallischen Verunreinigungen in Metallen lassen sich mittels hochauflösender Massenspektrometer ermitteln. Eine weit größere Herausforderung ist die Bestimmung von Nichtmetallen wie Sauerstoff, Wasserstoff und Stickstoff im Metall, zumal diese auch oft die Hauptverunreinigung darstellen. Für die quantitative Bestimmung von Verunreinigungen wurden mit Standards dotierte Pulverpresslinge und mit H, O und N dotierte, gesinterte Materialien auf ihre Eignung als Kalibrierstandards für die GD-OES und GD-MS untersucht. Dabei kamen unterschiedliche Plasmabedingungen (pulsed/ continuous mode; verschiedene Plasmagase) zum Einsatz. Ein Überblick über analytische Kenngrößen und Grenzen der verwendeten Kalibrierstrategien wird gegeben.
Die Junganalytiker der Fachgruppe „Analytische Chemie“ der Gesellschaft Deutscher Chemiker (GDCh) veranstalteten in Zusammenarbeit mit der BAM eine Herbstschule zum Thema „Qualitätssicherung in der Analytischen Chemie“.
Schulung v.a. für Doktoranden, um den Umgang mit qualitätssichernden Aspekte bei der Entwicklung analytischer Methoden zu erlernen.
Die wichtigsten Grundbegriffe der Genauigkeitskenngrößen von Messgrößen werden in diesem Vortrag vermittelt.
Analytical glow discharges with optical (GD-OES) and mass spectrometric (GD-MS) detection are able to obtain depth resolved information about the light elements hydrogen, carbon, nitrogen and oxygen in solid samples, where most of the other analytical techniques fail. However, the interpretation or even quantification of the measured signals is still very challenging. Problems arise due to physical effects (plasma processes such as the ‘Hydrogen effect’, the Doppler effect, self absorption or diffusion of hydrogen in the sample during sputtering) chemical effects(e.g. formation of compounds with argon or the matrix, poisoning of the sample or gettering) as well as instrumental difficulties (e.g. of the sensitivity, calibration and vacuum quality)..
The GD techniques are direct solid sampling methods and require reference materials for calibration. Unfortunately the list of available certified reference materials (CRM) suited for calibration of light elements in different matrix is relatively short Therefore, sintered materials doped with the analytes H2, O2 and N2 were produced at IFW Dresden and applied as calibration standards for hydrogen, oxygen and nitrogen. Due to the high analyte concentration added, it is very likely that the real concentration agree well with the added amount of light elements in the corresponding phases. The validation of the determination of the light element concentration in the sintered samples was possible in some cases only due to the lack of suitable techniques. This fact proves the need for the development of a reliable quantification of light elements by GDS.
A systematic dependence of the sputtering rate on the composition was found and can be explained by basic principles.
Using mixtures of TiH2 and ZrH2 with Cu the ratio of hydrogen and Cu lines has a good correlation with the corresponding concentration ratio. The hydrogen emission yield however decreases over 0.3 m% hydrogen and finally the hydrogen intensity may even decrease. This behaviour can be explained by a very similar quenching of the hydrogen and copper intensity caused by the hydrogen effect. First experiments with GD-MS show no saturation of the hydrogen ion current and thus confirm the quenching of the emission yield in GD-OES.
Sintered material for the oxygen calibration (Al2O3, CuO, Cu2O and MgO mixed with Cu, Al and Mg) confirmed the blue line shift effect at O I 130.22 nm, first time reported by Köster 2009 [1]. The effect is more pronounced at Mg than in Al and Cu, which due to line interference leads to a matrix dependent EY. This effect is negligible at O I 777.19 nm and the EY is matrix independent. Using GD-MS first promising results for the calibration of oxygen with these sintered samples could be obtained, when the sputtering rate was included in the evaluation.
More recently also sintered material for nitrogen calibration (AlN mixed with Al and Si3N4 mixed with Cu) was produced and points to a matrix independent emission yield of nitrogen
Reference materials are essential, when the accuracy and reliability of measurement results need to be guaranteed in order to generate confidence in the analysis.
These materials are frequently used for determining measurement uncertainty, for validation of methods, suitability testing and quality assurance. Especially direct solid sampling methods require reference materials for calibration.
They guarantee that measurement results can be compared to recognized reference values.
This presentation gives an overview about the use of GDMS in various certification procedures. Because it represents a fast, sensitive, multielement analyses technique without extensive sample preparation it plays a special role for the purity determination of high purity standards. Various calibration strategies and the preparation of traceable matrix matched calibration standards will be discussed.
For the certification of analyte content in matrix materials mainly techniques with solvent sample preparation are used. Here GD-MS is used to identify possible loss or contamination with analytes during the sample preparation step. Typically used acids to dissolve matrices lead to interferences in the ICP- mass spectrometric detection of various analytes and their quantification. Here GD-MS as direct method can also add an important contribution in the certification process.