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Eingeladener Vortrag
- nein (120)
Barrier properties of plasma and chemically fluorinated polypropylene and polyethyleneterephthalate
(1995)
The functionalization, perfluorination or an coating of polypropylene (PP) and polyethyleneterephthalate (PET) surfaces in different plasma atmospheres and in an F[2] + N[2] gas mixture were investigated. The aim of this work was to form a barrier layer against solvent and fuel permeation. Typical test solvents were n-pentane, toluene, tetrachloroethylene and mixtures of n-pentane and methanol. The permeation was gravimetrically measured. The permeation of the solvent mixtures was analyzed by mass spectrometry and Fourier transform IR spectroscopy. The permeation of the solvent mixtures through the plasma-modified polymer samples was associated with increased absorption of polar solvent components in the polymer film. The thickness of the plasma-fluorinated PP surface layer was 10-100 nm and that of chemically fluorinated PP about 5000 nm. Nearly the same barrier efficiency was measured for both plasma- and chemically fluorinated samples.
NEXAFS analysis of a plasma treated, partially crystalline poly(ehtylene terephtalate) surface
(1996)
Reactions and Intermediates at the Metal-Polymer Interface - Detected by XPS and NEXAFS Spectroscopy
(1998)
Modelling plasma-induced reactions on polymer surfaces using aliphatic self-assembling and LB layers
(1998)
Different types of plasma, irradiative and chemical activation were compared in terms of surface functionalization. Corona and spark jet plasmas are characterized by low gas temperatures and high rates in surface modification. UV irradiation in the presence of ozone does not involve any particle bombardment and acts only by enhanced photooxidative processes. Although ion implantation can be avoided, this method is not free of radiative damage in both the surface-near region and the bulk of polymers. Furthermore, its functionalization rate is low. In relation to low-pressure O2 plasma modification, all treatments mentioned here have a low efficiency in adhesion promotion due to oxidative degradation of macromolecules and formation of molecular debris known as the ''weak boundary layer''.
Catalyst characterization
(1998)
Self-assembled octadecyltrichlorosilane (CH3(CH2)17SiCl3, OTS) films were deposited on an oxidized silicon wafer. They were carefully exposed to a low-pressure oxygen direct current (dc) plasma and/or Cr vapor. Subsequently, they were characterized by X-ray photoelectron spectroscopy, near-edge X-ray absorption fine structure spectroscopy, and atomic force microscopy. Detailed information on the oxygen functionalization and the molecular conformation of the OTS films was obtained. The main result was that functionalization conditions can be found where the order of the film remains almost unaffected. Similarly, Cr evaporation of pure OTS films revealed only slight effects on the order in the film. Cr evaporation of an ordered but functionalized OTS film immediately changes its state toward a fully isotropic one. In the course of interaction, oxygen sites at the surface of the functionalized OTS film are reduced whereas Cr becomes oxidized. A redox reaction scheme is proposed for this interfacial reaction. Finally, it is concluded that the given study should be of importance for advanced plasma processing of polyolefins.
Neues vom Urkilogramm
(1999)
The chemical and morphological stabilities of polymer segments in the near-surface layer were investigated by spectroscopic methods such as X-ray photoelectron spectroscopy and near-edge X-ray absorption fine structure spectroscopy. Model studies were undertaken with LangmuirBlodgett films, self-assembled monolayers and oligomer films. For thin polymer layers (30 to 500 nm), the changes in molecular-weight distributions of some polymers were investigated systematically by size exclusion chromatography, matrix-assisted laser desorption/ionizationtime-of-flight mass spectrometry and thermal-field flow fractionation for oxygen- and helium-plasma exposures. The polymer surfaces were found to be relatively stable at exposure to an oxygen low-pressure plasma up to ca. 2 s. This is important information to get maximum adhesion to metals in composites. In correlation to their redox potentials, potassium, aluminium and chromium react with oxygen functional groups at the polymer/metal interface. In a dedicated study, chromium was found to attack aromatic rings and form different reaction products.
Die Akkreditierung für Prüfverfahren in der Oberflächenanalytik wird gemeinhin als sehr schwierig angesehen. Durch das unlängst eingeführte flexible Konzept der Akkreditierung, auch Prüfartenakkreditierung genannt, eröffnen sich nunmehr neue Möglichkeiten. Aus dem Bereich des Normenwesens in der Oberflächenanalytik erhalten die Prüflaboratorien zusätzliche Unterstützung. Die Validierung von ESCA-Prüfverfahren und ein wohldokumentiertes Prüfmittelmanagement sind weitere Bausteine auf dem Weg zur erfolgreichen Akkreditierung. Oberflächenanalyseverfahren sind akkreditierfähig.
Overlayers of SiO2 (nominally 4, 6 and 8 nm thick) on silicon, prepared by thermal oxidation, were investigated using x-ray photoelectron spectroscopy (XPS). The thickness of these overlayers was obtained from a measurement of the photoelectron intensities originating from the substrate and the oxide overlayer by applying an appropriate quantitative model. The uncertainty budget of that thickness measurement method is given. The relative combined standard uncertainty of the method was found to be 15%. The effective attenuation lengths or the corresponding electron inelastic mean free paths are of considerable importance for both the estimated values of overlayer thickness and combined standard uncertainties. The XPS results were compared with ellipsometry data.
First results of an inter-laboratory comparison (27 participants in Europe, Japan and USA) of XPS data obtained with non-conducting samples are presented. Binding energies of Al 2s for alumina, N 1s and imide C 1s for Kapton and Sr 3p3/2 for a strontium titanate film on glass were obtained after static charge referencing with the help of 15 nm gold particles deposited at the surface of the test samples. For the alumina sample C 1s static charge referenced data are also presented. Repeat standard deviations (sr), between standard deviations (sb), reproducibility standard deviations (sR) and total means are evaluated from the experimental data. It can be stated that although the repeat standard deviation is as small as 0.05 eV in the best case, the standard deviation characterizing the reproducibility of the method is obviously not better than 0.15 eV in the best case at the present time. The knowledge of these standard deviations is important for metrology, validations of analytical procedures relying on qualitative photoelectron spectroscopy and XPS databanking.
Eine neue Generation von alterungsbeständigen Plasmapolymeren mit definierter chemischer Struktur
(2000)
Polymeroberflächenfunktionalisierungen im gepulsten Plasma mit nachfolgender chemischer Behandlung
(2000)
Elastomeric sealants may contain organic silicon compounds. The use of these sealants for housings for electronic components is harmful for the reliability of electric contacts inside. In order to prevent electronic components from malfunction, quality control of elastomeric sealants is required. An analytical procedure developed to fulfil this requirement was developed. It is based on electron spectroscopy for chemical analysis (ESCA). Information on the silicon compounds existing at the surface of elastomeric sealants is provided by this method. Silicon in organic and inorganic compounds can be differentiated with the help of Si 2p photoelectron spectra. Quantitative results can be obtained too. The uncertainty budget of the quantitative procedure is estimated.
Powder x-ray diffraction (XRD) defined -Al2O3 has been investigated by x-ray photoelectron spectroscopy (XPS) and x-ray excited Auger electron spectroscopy (XAES). The Au 4f7/2 orbital is used for static charge referencing. This feature originates from well-defined and chemically inert 20 nm highly dispersed gold particles deposited on the sample surface. The particles, with a narrow particle size distribution, were obtained from a highly purified colloidal solution (sodium concentration below 1 mg/l). This procedure allows a determination of gold-referenced XPS and XAES data sets. ©2001 American Vacuum Society.
Selected FTIR, XPS and NEXAFS spectroscopy results obtained with films deposited with different plasma polymerization processes and different monomers (styrene, acetylene, ethylene and butadiene) are presented. In detail FTIR spectra, XPS surveys, XPS valence bands and core level signals including shake-up features as well as carbon K-edge absorption spectra are qualitatively and, in some cases, semi-quantitatively considered. Information on the film formation, the chemistry of the films and the film stability against air exposure are derived from spectroscopic features. With styrene chemically rather well defined plasma polymer layers can be formed with rather high deposition rates applying a pulse plasma process. Using ethylene, acetylene or butadiene as a monomer in the plasma deposition process the deposition rates are smaller. Using these monomers plasma polymer films can be obtained with a primary chemical structure which is similar to each other but more or less different from those of the respective conventional polymers. The main difference between these samples is their individual concentration of unsaturated carbon species. Finally, a technologically relevant example, i.e. a plasma deposited polymer barrier layer deposited on the inner wall of a poly(ethylene) vessel is briefly considered.
Several possibilities exist to produce a modified polymer surface with a high density of only one sort of functional group such as: (i) the plasma grafting of unfragmented monomer molecules and their polymerization forms OH, NH2, COOH groups, etc. in concentrations of approximately 25 groups per 100 C atoms; (ii) selective plasma bromination provides 1025 CBr groups; (iii) the plasma oxidation of polymer surfaces in an O2 plasma followed by the chemical reduction of all O-containing groups to OH groups by diborane, vitride (Na complex) or LiAlH4 yields 914 OH groups per 100 carbon atoms; and (iv) the grafting of spacers with different endgroups onto OH or CBr groups produces 710 spacer molecules/100 C. This work was focused on the formation of thin plasma deposited polymer layers with a maximum of (homo)functional groups and with a minimum of chemical irregularities using the pulsed plasma technique. The monomers were allylalcohol, allylamine, acrylonitrile and acrylic acid. The further intent was to study the interactions of functional groups (OH, COOH, NH2) and deposited metals (Cr, Al, Ti). It was expected that more basic (NH2), weakly basic or neutral (OH) or more acidic (COOH) groups would show different interactions and chemical reactions with metal atoms.
The retention of chemical structure and functional groups during plasma polymerization was investigated. Usually plasma polymer layers, prepared by a continuous wave radio-frequency plasma, are often chemically irregular in their structure and composition. To minimize these irregularities low wattages and the pulsed plasma technique were applied to avoid fragmentations. The first goal was to produce plasma polymers comprising double or triple bonds as precursors for electrically conducting polymers. Acetylene, ethylene, butadiene and polystyrene were used as monomers and deposited as thin polymer films by pulsed plasmas of low wattages. Styrene polymerization was strongly enhanced in the dark phase (plasma off) of a pulsed r.f. plasma caused by the reactivity of the vinyl-type double bond. This could be confirmed by a verification of a rather high chemical regularity of the film sample. The oxygen content of this film measured by X-ray photoelectron spectrometry (XPS) was in situ 0% and after 24 h exposure to air lower than 1%. Additionally, post-plasma oxidations of trapped radicals with air could be suppressed using NO gas as radical quencher. Such quenched plasma polymer layers were completely stable against oxidation for a number of weeks. During the low-wattage pulse plasma polymerization metal atoms were simultaneously or layer by layer evaporated into the growing layer and in situ measured by XPS. These metal atoms are acting as dopants. Here, Li, K, Mg and Cr were used at different concentrations providing electrical conductivity and magnetic properties for the film.
Plasma-Polymerized C60 Films
(2001)
We studied the polymerization of C60 under different Ar plasma conditions. Films were either deposited in the pressure range between 1.3 and 40 Pa applying input power of 50 W or evaporated C60 films were exposed to Ar plasma of 30 and 50 W. The films were investigated by Raman spectroscopy, X-ray photoelectron spectroscopy (XPS) and carbon K near-edge X-ray-absorption fine structure spectroscopy (NEXAFS). The films were non-uniform and consisted of unpolymerized C60, dimers, linear chains and polymeric planes. In comparison with evaporated C60 the XPS C 1s peak is broader and asymmetric for the C60 polymer and its shake-up satellites diminished. Furthermore, the features of the valence band as well as the features of the p * antibonding orbitals of the C60 polymer are broader and reduced in intensity.
Unsaturated carbon species at polymer surfaces: The potential of X-ray absorption spectroscopy
(2001)
Depth profiling of electrically non-conductive layered samples by RF-GDOES and HFM plasma SNMS
(2001)
The work is intended to compare the capabilities of two similar depth profiling techniques to analyse electrically non-conductive samples. In order to get a better evaluation of the depth resolution, various multilayer sandwiches, such as SiO2/TiO2 and Si3N4/SiO2 deposited on glass substrates have been investigated. Optimised depth profiles are presented for both methods, glow discharge optical emission spectrometry (GDOES) and radiofrequency mode (known as HFM in the SNMS literature) of plasma secondary neutral mass spectrometry (SNMS). The optimisation procedure, necessary to get the best set of plasma parameters, which result in the optimal depth resolution, is also described for one selected sample. Additionally, sputtering crater profilometry was carried out in order to check out the flatness of the sputtered crater. The influence of the thickness of the sample substrate on the sputtering rate is discussed. Finally, advantages and disadvantages of the use of these two depth profiling methods, especially for the non-conductive samples, are concluded from this comparative study. Time-of-flight secondary ion mass spectrometry (ToF-SIMS) analysis of a cross-sectioned sample was carried out in order to get supplementary information.
Results of the inter-laboratory comparison "Determination of nanometric step heights with AFM"
(2002)
Results of an interlaboratory comparison of XPS data obtained with stainless steel are presented. Only one photoelectron spectrometer model was used. The stainless-steel sample surfaces were analysed in different states by XPS: as received, after sputtering to I(C 1s)/I(Fe 2p3/2) 0.025 and after removing a chromium-enriched oxide layer following a certain protocol. The Fe, Cr and Ni elemental concentrations were evaluated from the respective XPS data submitted by the participants of the interlaboratory test experiment. Total means, repeat standard deviations (sr) and reproducibility standard deviations (sR) are presented. The best reproducibility standard deviations were obtained for the XPS analysis after removal of a chromium-enriched oxide layer and quantification of the XPS intensities without taking the contamination elements of carbon and oxygen into account. The absolute reproducibility standard deviation of the elemental concentrations in that case is as small as 1.1-1.5 at.%. This gives 2%, 6% and 16% for the relative reproducibility standard deviation of the concentrations of iron, chromium and nickel, respectively. The total means of the iron, chromium and nickel concentrations finally obtained agree within 2sR with bulk values determined by wavelength-dispersive x-ray fluorescence spectroscopy. Comparison to an earlier interlaboratory test experiment shows that using only one model of photoelectron spectrometer reduces the reproducibility standard deviations efficiently. Copyright © 2002 John Wiley & Sons, Ltd.
The dismutation of CHClF2 to CHF3 and CHCl3 was used to probe the effect of γ-Al2O3 fluorination on fluorine-against-chlorine (Cl/F) exchange reactions. X-ray photoelectron spectroscopy (XPS), X-ray excited Auger electron spectroscopy (XAES) and X-ray absorption near edge structure (XANES) spectroscopy were employed to probe the modifications at the surface of γ-Al2O3 accompanying the initial stages of fluorination. The results suggest that fluorine uptake by γ-Al2O3 starts initially at the surface of the oxide particles, with the formation of a fluorine species that is characterised by a single bond and a high effective charge q. Catalytic Cl/F-exchange is only observed after accumulation of higher fluorine concentrations, for which insertion of fluorine into the sub-surface region of the oxide crystallites has commenced. Quantitative XPS shows that the fluorination level must exceed approximately 10 atom% of the anions to achieve catalytic activity. The spectroscopic evidence suggests that the formation of aluminium oxofluorides is sufficient to provide catalytic activity. The presence of an AlF3 phase is not a condition for the observation of catalytic activity, even though defect-rich AlF3 is ultimately the endpoint of the fluorination process and is itself a Cl/F exchange catalyst.