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Analyzing materials composed of multiple elements with spectroscopic techniques such as X-ray Photoelectron Spectroscopy (XPS), Auger-Electron Spectroscopy (AES) or Electron Probe Microanalysis (EPMA), can be challenging due to spectral overlap. Moreover, each analytical method introduces its own set of challenges, e.g., the strong secondary fluorescence effect for neighbor elements in EPMA, thus, making the accurate elemental quantification in such materials difficult. When the material is available as thin film, additional constraints are inherently present. To provide a reference material for these analytical challenges high entropy alloys (HEAs) are excellent candidates. Currently, there is no thin film reference available containing more than 2 elements.
Unlike traditional alloys, which typically consist of one or two main elements and smaller amounts of secondary elements, HEAs are characterized by the presence of multiple principal elements in almost equal proportions. This unique composition results in a high degree of disorder at the atomic level, leading to exceptional mechanical, physical, and often unexpected properties. HEAs have garnered significant attention in materials science and engineering due to their potential applications in a wide range of industries, from aerospace and automotive to electronics and renewable energy.
For the preparation of a dedicated thin film reference material, we have chosen to prepare HEAs by magnetron sputtering, since it is not associated with elemental segregation that may occur due to the high configurational entropy of HEAs, which promotes atomic rearrangements. Our goal was to prepare films with a homogeneous thickness and defined chemical composition to be analyzed by various methods dedicated to surface analysis.
The material, consisting of titanium, chromium, manganese, iron, and nickel was deposited as film on silicon substrates - to our knowledge the first HEA thin film of this type reported in literature. A set of different thickness of the films was chosen, on the one hand to facilitate the analysis with different techniques, and on the other side to evaluate the limitations of the respective methods. The films morphology was characterized as prepared by SEM followed by the analysis of their 2D compositional homogeneity by EDX, XRF, ToF-SIMS and XPS. in-depth chemical composition was evaluated by ToF-SIMS and AES. The outcomes of analyzing the initial batches of films will be presented.
In this study, series of coatings with the goal of sensitising gold SPR sensors towards CO, NH4, etc. were prepared. To better understand the mechanism behind the sensitizing effect and to enable the targeted production of optimized layers, the wide range of coatings was studied by multiple methods from spectroscopic ellipsometry for their dielectric function, by XPS for chemical composition and SEM, TEM to determine their microscopic structure. The coatings were deposited at inert Ar gas and reactive Ar/O2 gas mixture by RF magnetron sputtering or DC pulsed magnetron sputtering with settable RF bias on the substrates. The plasma processes were monitors by mass spectrometry.
The metal oxide coatings in SPR sensors have to be prepared reproducible with thickness about 5 nm therefore lower deposition rate conditions were advantages.
In this study, series of coatings with the goal of sensitising gold SPR sensors towards CO, NH4, etc. were prepared. To better understand the mechanism behind the sensitizing effect and to enable the targeted production of optimized layers, the wide range of coatings was studied by multiple methods from spectroscopic ellipsometry for their dielectric function, by XPS for chemical composition and SEM, TEM to determine their microscopic structure. The coatings were deposited at inert Ar gas and reactive Ar/O2 gas mixture by RF magnetron sputtering or DC pulsed magnetron sputtering with settable RF bias on the substrates. The plasma processes were monitors by mass spectrometry.
The metal oxide coatings in SPR sensors have to be prepared reproducible with thickness about 5 nm therefore lower deposition rate conditions were advantages.
Iron-doped SnO2 coatings were deposited in a 50 kHz DC-pulsed magnetron sputtering discharge. The pulses had a duration of 4 µs in selected gas mixtures from pure argon up to
60% of oxygen at a constant total pressure of 0.2 Pa. A single target of SnO2 with Fe inset was used. The mass spectrometry study detected the gas-related ions Ar+, O2+ and O+, where the last one becomes the dominant positive ion at higher oxygen contents. Atomic oxygen ions had a higher energy as it resulted from the collision-caused dissociation on the target surface. The tin-related species were detected as Sn+ and SnO+. SnO2+ species were not detected. The deposition rate decreased by using gas mixtures with oxygen as well as the corresponding amount of Sn-related species in the plasma. The increase of oxygen also increased significantly the sheet resistance of the films. The XPS study showed that the iron concentration decreased by using additional oxygen. But the O/Sn ratio in the coatings was constant, contrary to the increased FeO/Fe ratio in the films. An additional analysis of the coatings by spectroscopic ellipsometry has shown a dependence of the polarizability and the permittivity on the amount of oxygen used during the deposition. In contrast, the study has found no such dependence for the absorption of the layers.
Ti/TiN multilayer coatings with multilayer periods in the range 550 nm and a final thickness of 2 µm were deposited on steel substrates by cyclic modulation of nitrogen gas flow into the chamber of a PVD sputtering device. Coating characterization was performed by cross-sectional transmission electron microscopy, glancing-angle X-ray diffraction and instrumental indentation testing. Individual a-titanium and titanium nitride layers were always observed, although for the finer microstructures, the TiN layers were thicker than the Ti layers by a factor three. The plastic hardness of the films increased steadily with decreasing layer spacing, following a HallPetch relationship. Finally, a hardness value of 42 GPa was reached, which is similar to that of a thick TiN monolayer, prepared under the same coating conditions.
Different wear-resistant coatings produced by physical vapour deposition (PVD) were characterized with the aid of cross-sectional transmission electron microscopy (XTEM). All coating systems were optimized by the producers and exhibited good properties with respect to their special applications. The microstructure, texture and chemical composition of binary and ternary systems produced by the arc process [TiN, CrN, Cr2N (Ti, Cr)N on steel substrates] and magnetron sputtering process [TiN, CrN on steel substrates, (Ti, Al)N on Si-substrate] were investigated. All coatings had a more or less columnar microstructure, which was interrupted by interlayers in some cases. Whereas arc coatings always did show some kind of substrate modification, the latter was not observed after magnetron sputtering. Electron diffraction normally revealed a mono-phase fcc structure, except at sites very near to the interface. Only for the systems CrN and (Ti, Cr)N were different additional phases observed at low nitrogen partial pressures.