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The progress of the VAMAS interlaboratory comparison Project P13 "Lateral size of graphene oxide flakes by SEM" within the Technical Working Area 41 "Graphene and Related 2D Materials" is presented. The challenges at sample preparation on substrates for accurate measurement and image analysis as well as two different analysis approaches, containing exact guidance how to measure the main descriptors for the lateral size measurement of the imaged graphene oxide flakes with Scanning Electron Microscopy are highlighted. The implementation of the results into the corresponding ISO technical specification AWI/TS 23879 is also discussed and planned, in relation with the AFM part.
Accurate characterisation of the morphology (size) and chemistry of graphene-related 2D materials (GR2M) is key in understanding their extraordinary functionalities. Hence, not only the tailoring of these functionalities aiming at applications of increased-performance becomes possible, but also the correlation of the physico-chemical properties with the understanding of the potential toxicity eventually enables a safe and sustainable development of the GR2M for new applications. Whilst AFM and Raman Spectroscopy are recommended to measure the thickness of GO flakes, Scanning Electron Microscopy (SEM) is the most suited method to assess their lateral size, which varies between tens of µm down to below 100 nm. In this paper, procedures for the accurate determination of lateral size of graphene oxide (GO) flakes by SEM are presented. The prerequisite for accurate flake size analysis is the proper sample preparation, i.e. deposition of ideally isolated flakes on a substrate, with the flakes being unfolded, non-overlapped, parallel with the substrate, and having a high coverage density. Examples of optimum image caption conditions and image analysis procedures will be presented. The size descriptors and their measurement are described in the context of the corresponding analysis approach: i) length and width of the flakes with a quick and rough, but robust procedure, and ii) exact contouring of the flakes as part of a highly accurate, but more time-consuming measurement approach. The possibility of application of automated image analysis is discussed as the alternative to the manual flakes analysis.
The basic principles of generation of electrons and X-rays and the operation of SEM/EDS instruments are presented. Examples, recent successes and challenges in the analysis of nano-structures are given. Multi-method analytical approaches with the focus on imaging the nanoscale are highlighted. Details on the sample preparation and persepective on the automated analysis (sample preparation, measurement, data analyis and storage) are given. Metrological aspects, standardisation, and reference materials are also emphasized by examples.