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On the Applicability of Plasma Assisted Chemical Micropatterning to Different Polymeric Biomaterials
(2002)
A plasma process sequence has been developed to prepare chemical micropatterns on polymeric biomaterial surfaces. These patterns induce a guided localized cell layover at microscopic dimension. Two subsequent plasma steps are applied. In the first functionalization step a microwave ammonia plasma introduces amino groups to obtain areas for very good cell adhesion; the second passivation step combines pattern generation and creation of cell repelling areas. This downstream microwave hydrogen plasma process removes functional groups and changes the linkages of polymer chains at the outermost surfaces. Similar results have been obtained on different polymers including polystyrene (PS), polyhydroxyethylmethacrylate (PHEMA), polyetheretherketone (PEEK), polyethyleneterephthalate (PET) and polyethylenenaphthalate (PEN). Such a rather universal chemical structuring process could widen the availability of biomaterials with specific surface preparations.
Results of an interlaboratory comparison of XPS data obtained with stainless steel are presented. Only one photoelectron spectrometer model was used. The stainless-steel sample surfaces were analysed in different states by XPS: as received, after sputtering to I(C 1s)/I(Fe 2p3/2) 0.025 and after removing a chromium-enriched oxide layer following a certain protocol. The Fe, Cr and Ni elemental concentrations were evaluated from the respective XPS data submitted by the participants of the interlaboratory test experiment. Total means, repeat standard deviations (sr) and reproducibility standard deviations (sR) are presented. The best reproducibility standard deviations were obtained for the XPS analysis after removal of a chromium-enriched oxide layer and quantification of the XPS intensities without taking the contamination elements of carbon and oxygen into account. The absolute reproducibility standard deviation of the elemental concentrations in that case is as small as 1.1-1.5 at.%. This gives 2%, 6% and 16% for the relative reproducibility standard deviation of the concentrations of iron, chromium and nickel, respectively. The total means of the iron, chromium and nickel concentrations finally obtained agree within 2sR with bulk values determined by wavelength-dispersive x-ray fluorescence spectroscopy. Comparison to an earlier interlaboratory test experiment shows that using only one model of photoelectron spectrometer reduces the reproducibility standard deviations efficiently. Copyright © 2002 John Wiley & Sons, Ltd.
Overlayers of SiO2 (nominally 4, 6 and 8 nm thick) on silicon, prepared by thermal oxidation, were investigated using x-ray photoelectron spectroscopy (XPS). The thickness of these overlayers was obtained from a measurement of the photoelectron intensities originating from the substrate and the oxide overlayer by applying an appropriate quantitative model. The uncertainty budget of that thickness measurement method is given. The relative combined standard uncertainty of the method was found to be 15%. The effective attenuation lengths or the corresponding electron inelastic mean free paths are of considerable importance for both the estimated values of overlayer thickness and combined standard uncertainties. The XPS results were compared with ellipsometry data.