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First results of an inter-laboratory comparison (27 participants in Europe, Japan and USA) of XPS data obtained with non-conducting samples are presented. Binding energies of Al 2s for alumina, N 1s and imide C 1s for Kapton and Sr 3p3/2 for a strontium titanate film on glass were obtained after static charge referencing with the help of 15 nm gold particles deposited at the surface of the test samples. For the alumina sample C 1s static charge referenced data are also presented. Repeat standard deviations (sr), between standard deviations (sb), reproducibility standard deviations (sR) and total means are evaluated from the experimental data. It can be stated that although the repeat standard deviation is as small as 0.05 eV in the best case, the standard deviation characterizing the reproducibility of the method is obviously not better than 0.15 eV in the best case at the present time. The knowledge of these standard deviations is important for metrology, validations of analytical procedures relying on qualitative photoelectron spectroscopy and XPS databanking.
Selected FTIR, XPS and NEXAFS spectroscopy results obtained with films deposited with different plasma polymerization processes and different monomers (styrene, acetylene, ethylene and butadiene) are presented. In detail FTIR spectra, XPS surveys, XPS valence bands and core level signals including shake-up features as well as carbon K-edge absorption spectra are qualitatively and, in some cases, semi-quantitatively considered. Information on the film formation, the chemistry of the films and the film stability against air exposure are derived from spectroscopic features. With styrene chemically rather well defined plasma polymer layers can be formed with rather high deposition rates applying a pulse plasma process. Using ethylene, acetylene or butadiene as a monomer in the plasma deposition process the deposition rates are smaller. Using these monomers plasma polymer films can be obtained with a primary chemical structure which is similar to each other but more or less different from those of the respective conventional polymers. The main difference between these samples is their individual concentration of unsaturated carbon species. Finally, a technologically relevant example, i.e. a plasma deposited polymer barrier layer deposited on the inner wall of a poly(ethylene) vessel is briefly considered.
Results are reported from a pilot study under the Consultative Committee for Amount of Substance (CCQM) to compare measurements of and resolve any relevant measurement issues in, the amount of thermal SiO2 oxide on (100) and (111) orientation Si wafer substrates in the thickness range 1.5 - 8 nm. As a result of the invitation to participate in this activity, 45 sets of measurements have been made in different laboratories using 10 analytical methods: medium-energy ion scattering spectrometry (MEIS), nuclear reaction analysis (NRA), RBS, elastic backscattering spectrometry (EBS), XPS, SIMS, ellipsometry, grazing-incidence x-ray reflectrometry (GIXRR), neutron reflectometry and transmission electron microscopy (TEM). The measurements are made on separate sets of 10 carefully prepared samples, all of which have been characterised by a combination of ellipsometry and XPS using carefully established reference conditions and reference parameters.
The results have been assessed against the National Physical Laboratory (NPL) data and all show excellent linearity. The remaining data sets correlate with the NPL data with average root-mean-square scatters of 0.15 nm, half being better than 0.1 nm and a few at or better than 0.05 nm. Each set of data allows a relative scaling constant and a zero thickness offset to be determined. Each method has an inherent zero thickness offset between 0 nm and 1 nm and it is these offsets, measured here for the first time, that have caused many problems in the past. There are three basic classes of offset: water and carbonadeous contamination equivalent to ~1 nm as seen by ellipsometry; adsorbed oxygen mainly from water at an equivalent thickness of 0.5 nm as seen by MEIS, NRA, RBS and possibly GIXRR; and no offset as seen by XPS using the Si 2p peaks. Each technique has a different uncertainty for the scaling constant and consistent results have been achieved. X-Ray photoelectron spectroscopy has large uncertainties for the scaling constant but a high precision and, critically, if used correctly, has zero offset. Thus, a combination of XPS and the other methods allows the XPS scaling constant to be determined with low uncertainty, traceable via the other methods. XPS laboratories returning results early were invited to test a new reference procedure. All showed very significant improvements. The reference attenuation lengths thus need scaling by 0.986 ± 0.009 (at an expansion factor of 2) deduced from the data for the other methods. Several other methods have small offsets and, to the extent that these can be shown to be constant or measurable, then these methods will also show low uncertainty. Recommendations are provided for parameters for XPS, MEIS, RBS and NRA to improve their accuracy.
Thin polyamide-6 films were exposed to fluorine gas and analysed with photoelectron and infrared spectroscopies. Fluorine cleaves the amide CN bond resulting in the formation of the COOH and NF2 terminal groups. This is evident from large shifts in the N1s binding energy (+5 eV) and C=O stretching frequency (~80 cm-1), appearance of ester oxygen in the XPS spectra, as well as by the 19F nmr spectra of volatile products consistent with a terminal NF2 group.
Bulk samples and thin films of polyamides (PA6 and PA12) were exposed to fluorine (1 - 10 vol.-% F2 in N2) and analysed with photoelectron (XPS) and infrared spectroscopy. Fluorination affects both, the amide and the hydrocarbon parts of the polymers. However, only the carbon atom next to the carbonyl is readily fluorinated. Chemical modification of the amide group is apparent in a large binding energy shift (+5 eV) of the N1s level and the appearance of a CO band at 1734 cm-1. It is concluded that the amide C-N bond is cleaved in the fluorination process and that COOH and NF2 end groups are formed. This conclusion is corroborated by the appearance of ester oxygen in the XPS and by the 19F NMR spectra of the volatile products that show fluorine signals chemically shifted about 200 ppm towards lower field as compared with the CHF environment.
The mechanism of the recrystallization of nano-scale bacterial surface protein layers (S-layers) on solid substrates is of fundamental interest in the understanding and engineering of biomembranes and e.g. biosensors. In this context, the influence of the charging state of the substrate had to be clarified. Therefore, the electrochemical behaviour of the S-layers on gold electrodes has been investigated by in-situ electrochemical quartz microbalance (EQMB) measurements, scanning force microscopy (SFM) and small-spot X-ray photoelectron spectroscopy (SS-XPS) of potentiostatically emersed substrates. It was shown that the negatively charged bonding sites of the S-layer units (e.g. carboxylates) can bond with positively charged Au surface atoms in the positively charged electrochemical double layer region positive of the point of zero charge (not, vert, similar-0.8 V vs. saturated mercury-mercurous sulphate electrode). Surface conditions in other potential regions decelerated the recrystallization and fixation of S-layers. Time-resolved in-situ and ex-situ measurements demonstrated that two-dimensional S-layer crystal formation on gold electrodes can occur within few minutes in contrast to hours common in self-assembled monolayer (SAM) generation. These results proved that the recrystallization and fixation of 2D-crystalline S-layers on an electronic conductor can be influenced and controlled by direct electrochemical manipulation.
CrOx/La2O3 mixed oxides, prepared by impregnating La2O3 with appropriate aqueous solutions of (NH4)2CrO4 and calcining at 600 °C for 4 h, have been investigated by means of XRD, TPR, XPS, DRIFTS, and Raman spectroscopy (RS). The formation of the compounds La2CrO6, La(OH)CrO4 and LaCrO4 under these conditions was evidenced. Strong peaks at 864, 884, 913, and 921 cm-1, as well as weak peaks at 136, 180, 354, 370, and 388 cm-1 in the RS spectrum of CrOx/La2O3 have been assigned to La2CrO6.
X-ray photoelectron spectroscopy (XPS) and cross-sectional transmission electron microscopy (XTEM) were used to study the formation of AlN films by N+2 ion implantation of aluminium at energies of 3 keV and 100 keV. In both cases, a two-stage mechanism was found, comprising first the oriented precipitation of small particles of the hexagonal AlN-phase, followed by growth and coalescence finally forming a continuous AlN-layer while increasing the implantation dose from 1×1017 cm-2 to 2×1017 cm-2. The results of both methods are in excellent agreement and furthermore provide complementary information concerning chemical composition and binding energies as well as microstructural details.
Organic thin films with defined chemical structures and physical properties are required for various applications. Plasma polymerization is of technological interest, since the deposition of plasma polymers is possible on any material of any shape in the desired thickness. We report on the TOF-SIMS (TOF: time-of-flight) and XPS investigations of pulse plasma poly(acetylene) and alkali metal doped pulse plasma poly(acetylene) films. The combination of TOF-SIMS and XPS supplies detailed information on the surface chemistry of these films. Application of both methods provides the possibility for cross-checking certain results. Moreover the different sensitivities of the methods can be utilized. According to the TOF-SIMS and XPS data it can be concluded that the interaction of alkali metals with plasma poly(acetylene) results in electrovalent bonds of the type Me?+C?- between carbon and metal. Furthermore carbonoxygenmetal interactions were observed. These interactions are of the type C=O?-cdots, three dots, centeredMe?+ and/or CO?-Me?+.
Redox behaviour of La-Cr compounds formed in CrOX/La2O3 mixed oxides and CrOX/La2O3/ZrO2 catalysts
(2003)
The redox behaviour of chromium oxide in CrOx/La2O3, CrOx/La2O3/ZrO2 and CrOx/ZrO2 mixed oxide systems has been investigated by temperature-programmed reduction (TPR), photoelectron spectroscopy (XPS) and Raman spectroscopy (RS). The formation of La-Cr compounds such as La2CrO6, LaCrO4 was shown to occur by calcination of CrOx/La2O3 and CrOx/La2O3/ZrO2 at 600 °C. With a Cr content of ca. 4 wt.%, it was revealed that, having been reduced to Cr3+-containing compounds, La2CrO6 and/or LaCrO4 in both systems may be restored by reoxidation at 600 °C. In the case of CrOx/La2O3/ZrO2 catalysts, it is suggested that these compounds were real surface species anchored as an overlayer on zirconia. Such a structure may stabilise, on the one hand, the tetragonal modification of zirconia and, on the other hand, highly dispersed state of Cr species in calcined as well as in reduced catalysts.