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Elastomeric sealants may contain organic silicon compounds. The use of these sealants for housings for electronic components is harmful for the reliability of electric contacts inside. In order to prevent electronic components from malfunction, quality control of elastomeric sealants is required. An analytical procedure developed to fulfil this requirement was developed. It is based on electron spectroscopy for chemical analysis (ESCA). Information on the silicon compounds existing at the surface of elastomeric sealants is provided by this method. Silicon in organic and inorganic compounds can be differentiated with the help of Si 2p photoelectron spectra. Quantitative results can be obtained too. The uncertainty budget of the quantitative procedure is estimated.
Results of an interlaboratory comparison of XPS data obtained with stainless steel are presented. Only one photoelectron spectrometer model was used. The stainless-steel sample surfaces were analysed in different states by XPS: as received, after sputtering to I(C 1s)/I(Fe 2p3/2) 0.025 and after removing a chromium-enriched oxide layer following a certain protocol. The Fe, Cr and Ni elemental concentrations were evaluated from the respective XPS data submitted by the participants of the interlaboratory test experiment. Total means, repeat standard deviations (sr) and reproducibility standard deviations (sR) are presented. The best reproducibility standard deviations were obtained for the XPS analysis after removal of a chromium-enriched oxide layer and quantification of the XPS intensities without taking the contamination elements of carbon and oxygen into account. The absolute reproducibility standard deviation of the elemental concentrations in that case is as small as 1.1-1.5 at.%. This gives 2%, 6% and 16% for the relative reproducibility standard deviation of the concentrations of iron, chromium and nickel, respectively. The total means of the iron, chromium and nickel concentrations finally obtained agree within 2sR with bulk values determined by wavelength-dispersive x-ray fluorescence spectroscopy. Comparison to an earlier interlaboratory test experiment shows that using only one model of photoelectron spectrometer reduces the reproducibility standard deviations efficiently. Copyright © 2002 John Wiley & Sons, Ltd.
Accessing radiation damage to biomolecules on the nanoscale by particle-scattering simulations
(2023)
Radiation damage to DNA plays a central role in radiation therapy to cure cancer. The physico-chemical and biological processes involved encompass huge time and spatial scales. To obtain a comprehensive understanding on the nano and the macro scale is a very challenging tasks for experimental techniques alone. Therefore particle-scattering simulations are often applied to complement measurements and aide their interpretation, to help in the planning of experiments, to predict their outcome and to test damage models. In the last years, powerful multipurpose particle-scattering framework based on the Monte-Carlo simulation (MCS) method, such as Geant4 and Geant4-DNA, were extended by user friendly interfaces such as TOPAS and TOPAS-nBio. This shifts their applicability from the realm of dedicated specialists to a broader range of scientists. In the present review we aim to give an overview over MCS based approaches to understand radiation interaction on a broad scale, ranging from cancerous tissue, cells and their organelles including the nucleus, mitochondria and membranes, over radiosensitizer such as metallic nanoparticles, and water with additional radical scavenger, down to isolated biomolecules in the form of DNA, RNA, proteins and DNA-protein complexes. Hereby the degradation of biomolecules by direct damage from inelastic scattering processes during the physical stage, and the indirect damage caused by radicals during the chemical stage as well as some parts of the early biological response is covered. Due to their high abundance the action of hydroxyl radicals (•OH) and secondary low energy electrons (LEE) as well as prehydrated electrons are covered in additional detail. Applications in the prediction of DNA damage, DNA repair processes, cell survival and apoptosis, influence of radiosensitizer on the dose distribution within cells and their organelles, the study of linear energy transfer (LET), the relative biological effectiveness (RBE), ion beam cancer therapy, microbeam radiation therapy (MRT), the FLASH effect, and the radiation induced bystander effect are reviewed.
CrN film coatings were prepared by magnetron sputter deposition at different nitrogen partial pressures. The film characterisation by XRD and DTG gives average bulk compositions of Cr2N and CrN for the coatings. Highly sensitive XPS investigations were performed and the chemical and phase compositions of a film surface range of about 10 nm thickness was estimated quantitatively from the deconvoluted peak intensities. It is demonstrated that the composition of the surface of chromium nitride thin films differs from the core and is more complex in constitution. Not only chromium nitrides (Cr2N and CrN) but also chromium oxynitrides and chromium oxides (CrOx and CrOxHy) were detected. Metallic chromium was also found in films prepared at higher nitrogen flow. The concentration of the estimated phases shows dependence on film preparation and additional heat treatment.
Plasma deposited ethylene/allylamine and styrene/allylamine copolymer films were prepared and analyzed using XPS, NEXAFS and ToF-SIMS. The relative partial flow rate of the each monomer was used as the variable deposition parameter, while the other deposition parameters were kept constant at optimized values for the retention of functional groups. The effect of the variation in the relative partial flow rates of co-monomers on various chemical aspects of the films like unsaturation, nitrogen retention and branching was investigated revealing several non-linear correlations. This observation is taken as an indication for chemical copolymerization processes during film deposition. An attempt is made to compare these non-linear correlations with approaches which have been developed for classic radical copolymerization processes. The aging behavior of these plasma copolymer films was also studied; the results indicated a stabilization against oxidation in comparison to the aging of allylamine plasma homopolymers.
Es wird gezeigt, dass mit einer Kombination der Oberflächenanalyseverfahren ESCA, ToF- SIMS und XAS eine erfolgreiche chemische Charakterisierung von Plasmapolymerfilmen erreicht werden kann. Es werden Elemente und Bindungstypen identifiziert und (semi-)quantitativ bestimmt. Eine Korrelation zwischen Abscheidebedingungen und chemischen Eigenschaften der Plasmapolymerschichten kann hergestellt werden; eine kontrollierte Abscheidung wird damit möglich. Alterungsprozesse, die als Folge einer Atmosphärenexposition auftreten, können beobachtet werden. Die direkte Verbindung der Analysetechniken mit einem Plasmareaktor ermöglicht es, die Alterungsphänomene der Schichten systematisch mit Bezug auf eine frisch abgeschiedene und keinerlei Atomsphäre ausgesetzte Plasmapolymerschicht zu studieren.
Die Verfahrensweise wird exemplarisch am Beispiel von Ethylen-, Allylamin- und Allylalkohol-Plasmapolymerschichten demonstriert.
A survey is given on how a combination of modern methods of surface analysis with appropriate data evaluation procedures can be used to provide a thorough chemical characterization of plasma polymerized organic films often called plasma polymers. Technologically relevant parameters can be monitored versus variation of plasma process parameters and during ageing of the films on air. The level of development of analytical approaches reached during the last ten years opens many options which are useful to be applied in plasma process development, optimization and control. However, in a number of important cases further development of analytical methods is required. Another future challenge is to develop standards with metrological underpinning to reach comparability of measurements in the community.
Translated Abstract
Chemische Oberflächencharakterisierung von Plasmapolymerschichten: Was leisten die Messverfahren heute?
Es wird ein Überblick gegeben, wie mit dem kombinierten Einsatz moderner Methoden der Oberflächenanalytik und fortgeschrittener Datenreduktionsverfahren eine umfassende chemische Charakterisierung von plasmachemisch abgeschiedenen organischen Schichten, oft als Plasmapolymere bezeichnet, erreicht werden kann. Die chemischen Eigenschaften sind bestimmend für wichtige technologische Parameter der Schichten und können sowohl durch Plasmaprozessparameter als auch von der Liegezeit bestimmt werden. Eine Standardisierung von Prozeduren der Oberflächenanalytik zur Charakterisierung von Plasmapolymeren und ihre metrologische Begründung sind Schwerpunkte in der weiteren Entwicklung.
First results of an inter-laboratory comparison (27 participants in Europe, Japan and USA) of XPS data obtained with non-conducting samples are presented. Binding energies of Al 2s for alumina, N 1s and imide C 1s for Kapton and Sr 3p3/2 for a strontium titanate film on glass were obtained after static charge referencing with the help of 15 nm gold particles deposited at the surface of the test samples. For the alumina sample C 1s static charge referenced data are also presented. Repeat standard deviations (sr), between standard deviations (sb), reproducibility standard deviations (sR) and total means are evaluated from the experimental data. It can be stated that although the repeat standard deviation is as small as 0.05 eV in the best case, the standard deviation characterizing the reproducibility of the method is obviously not better than 0.15 eV in the best case at the present time. The knowledge of these standard deviations is important for metrology, validations of analytical procedures relying on qualitative photoelectron spectroscopy and XPS databanking.