Modeling Equilibrium Chemistry in Laser Induced Plasmas and Plasma Chemical Reactors
- A brief introduction will be given on modeling chemical reactions in laser induced plasmas using stoichiometric and non-stoichiometric approaches. Several applications will be considered, which can benefit from such modeling. Those include plasma enhanced chemical vapor deposition (PECVD), surface modification and surface coating, and molecular analysis by LIBS. Each application will be illustrated by simulations of relevant chemical systems. For PECVD, chemical systems are BCl3/H2/Ar, BF3/H2/Ar, BCl3/BF3, Mo/BF3/H2; for surface modification/coating it is Ti/air; for molecular LIBS they are CaCO3/Ar, Ca(OH)2/Ar, and CaCl2/Ar. Advantages and shortcomings of equilibrium chemical hydrodynamic models of laser induced plasmas will be discussed.
Autor*innen: | Igor B. GornushkinORCiD |
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Dokumenttyp: | Vortrag |
Veröffentlichungsform: | Präsentation |
Sprache: | Englisch |
Jahr der Erstveröffentlichung: | 2022 |
Organisationseinheit der BAM: | 1 Analytische Chemie; Referenzmaterialien |
1 Analytische Chemie; Referenzmaterialien / 1.3 Instrumentelle Analytik | |
DDC-Klassifikation: | Naturwissenschaften und Mathematik / Chemie / Analytische Chemie |
Freie Schlagwörter: | Emission spectroscopy; Hydrodynamic model; Laser ablation; Laser induced plasma deposition; Plasma chemistry; Surface coating; Titanium dioxide |
Themenfelder/Aktivitätsfelder der BAM: | Chemie und Prozesstechnik |
Veranstaltung: | 1st NIP Conference National Institute of Physics (IKF), the Albanian Academy of Sciences |
Veranstaltungsort: | Online meeting |
Beginndatum der Veranstaltung: | 10.02.2022 |
Enddatum der Veranstaltung: | 11.02.2022 |
Verfügbarkeit des Dokuments: | Datei im Netzwerk der BAM verfügbar ("Closed Access") |
Datum der Freischaltung: | 14.02.2022 |
Referierte Publikation: | Nein |
Eingeladener Vortrag: | Nein |