Study of magnetron sputtering deposited ultrathin FeSnOx films for Surface Plasmon Resonance sensors towards gas sensing applications
- In this study, series of coatings with the goal of sensitising gold SPR sensors towards CO, NH4, etc. were prepared. To better understand the mechanism behind the sensitizing effect and to enable the targeted production of optimized layers, the wide range of coatings was studied by multiple methods from spectroscopic ellipsometry for their dielectric function, by XPS for chemical composition and SEM, TEM to determine their microscopic structure. The coatings were deposited at inert Ar gas and reactive Ar/O2 gas mixture by RF magnetron sputtering or DC pulsed magnetron sputtering with settable RF bias on the substrates. The plasma processes were monitors by mass spectrometry. The metal oxide coatings in SPR sensors have to be prepared reproducible with thickness about 5 nm therefore lower deposition rate conditions were advantages.
Autor*innen: | M. Kormunda |
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Koautor*innen: | Andreas HertwigORCiD, Uwe Beck, Daniel Fischer |
Dokumenttyp: | Posterpräsentation |
Veröffentlichungsform: | Präsentation |
Sprache: | Englisch |
Jahr der Erstveröffentlichung: | 2017 |
DDC-Klassifikation: | Naturwissenschaften und Mathematik / Chemie / Analytische Chemie |
Technik, Medizin, angewandte Wissenschaften / Ingenieurwissenschaften / Ingenieurwissenschaften und zugeordnete Tätigkeiten | |
Freie Schlagwörter: | FeSnOx; Magnetron sputtering; Surface Plasmon Resonance |
Veranstaltung: | THE 14th INTERNATIONAL SYMPOSIUM ON SPUTTERING & PLASMA PROCESSES,ISSP 2017 |
Veranstaltungsort: | Kanazawa, Japan |
Beginndatum der Veranstaltung: | 05.07.2017 |
Enddatum der Veranstaltung: | 07.07.2017 |
Verfügbarkeit des Dokuments: | Datei im Netzwerk der BAM verfügbar ("Closed Access") |
Datum der Freischaltung: | 22.12.2017 |
Referierte Publikation: | Nein |