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Metrology for spatially resolved chemical analysis at the micro and nanometre scales Surface Analysis Working Group (SAWG) - Report for 17th Meeting (2018/19)

  • The SAWG was established as an ad-hoc working group in 2003 before being established as a permanent working group. The first comparison was in 2007. Dr Unger recalled the terms of reference for the group, which paralleled those of the CCQM itself, with a focus on spatially resolved chemical surface analysis at the micro- and nano-scale. The group also had a remit to act as a forum for exchange of information on research and development of surface analysis, establish contact with relevant stakeholders and promote the development of SI traceable chemical surface measurements. The group currently had participants from 18 institutes, although five had not sent participants to recent meetings. Reporting progress on studies, Dr Unger said that P-190CCQM-K-157 (measurement of HfO2 in thin film) had been completed, and the subsequent K-157 approved is ongoing and that for CCQM-K153 (Measurement of Specific Adsorption of N2 and Kr on nonporous SiO2 at liquid nitrogen temperature by BET) wasThe SAWG was established as an ad-hoc working group in 2003 before being established as a permanent working group. The first comparison was in 2007. Dr Unger recalled the terms of reference for the group, which paralleled those of the CCQM itself, with a focus on spatially resolved chemical surface analysis at the micro- and nano-scale. The group also had a remit to act as a forum for exchange of information on research and development of surface analysis, establish contact with relevant stakeholders and promote the development of SI traceable chemical surface measurements. The group currently had participants from 18 institutes, although five had not sent participants to recent meetings. Reporting progress on studies, Dr Unger said that P-190CCQM-K-157 (measurement of HfO2 in thin film) had been completed, and the subsequent K-157 approved is ongoing and that for CCQM-K153 (Measurement of Specific Adsorption of N2 and Kr on nonporous SiO2 at liquid nitrogen temperature by BET) was at the draft B was completed stageand distributed to CCQM WG chairpersons for approval. Dr Unger reported that CCQM-K-153 had covered measurement of specific absorption of nitrogen or krypton on nonporous silica at liquid nitrogen [ambient] temperature. This included an application of the BET method, a standard method for determination of surface area. This fitted into the ‘nonporous’ region of the SAWG measurement space, which included microporous, mesoporous and microporous regions. Of these regions, CCQM-K136 and CCQM-K153 demonstrated capability in meso- and microporous media respectively. CCQM-K153 involved two measurands; amount of absorbed gas at liquid nitrogen temperature, expressed as specific absorption, and the BET surface area. Specific absorption could in principle be traceable to the SI; BET was operationally defined. Five institutes participated. A detailed uncertainty budget was available for both measurands. Results had been excellent, with all laboratories agreeing well within their uncertainties and all in agreement with the reference value. Reporting on CCQM P190, Dr Unger described the study objective measurand (amount of substance of HfO2 in a thin film), samples and methods. After showing transmission electron microscope images obtained in the study, he briefly reviewed the conclusions. The study identified a need to handle carbon contamination, harmonise the XPS measurement protocol, determine emission angle and identify a consensus value for attenuation length. These conclusions had informed the design of the proposed ongoing K157 study approved at the 24th Meeting of te CCQM. The group planned a number of comparisons for the next three years: 2019: A pilot study on the amount of substance in a thin organic layer (previously approved). 2020: CCQMK-157, Measurement of the amount of substance of HfO2; A Key comparison on specific gas adsorption on microporous samples and a Pilot study on Homogeneous surface composition of an ionic liquid. 2021: A key comparison measuring the amount of substance in a thin organic layer. Dr Unger additionally described a recently proposed pilot study to examine chemical composition in a deep nanoscale layer. This was important for the electronics industry. Four participants had expressed interest. The measurand will be the amount of Ir(ppy)2(acac) in a thin organic layer within an organic layer stack on a silicon substrate. He also reported that SAWG had started work on characterisation of graphene material grown by chemical vapour decomposition (CVD). The work would examine coverage on the substrate, number of layers, level of disorder, uncertainty budgets associated with the measurement, and data analysis. A link to VAMAS Technical Work Area 41 “Graphene and Related 2D Materials“ would also be established. Looking forward, Dr Unger said the group had established a task group on application of Raman spectroscopy. This had important applications but was currently seen as qualitative. He presented the terms of reference for the task group for approval by the CCQM. Dr Unger reviewed the SAWG activities that have progressed the state of the art in measurement science. He listed the past and ongoing comparisons that had addressed new and challenging measurement problems, and drew attention to a number of key publications in surface analysis. He additionally described stakeholder engagement activities, including collaboration with VAMAS, input to ISO TC 201, contributions to Euramet projects, and contributions to two recent stakeholder workshops.zeige mehrzeige weniger

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Metadaten
Autor*innen:Wolfgang UngerORCiD
Dokumenttyp:Vortrag
Veröffentlichungsform:Präsentation
Sprache:Englisch
Jahr der Erstveröffentlichung:2019
Organisationseinheit der BAM:6 Materialchemie
6 Materialchemie / 6.1 Oberflächen- und Dünnschichtanalyse
DDC-Klassifikation:Naturwissenschaften und Mathematik / Chemie / Analytische Chemie
Freie Schlagwörter:International Meter Convention; Metrology; Surface chemical analysis
Themenfelder/Aktivitätsfelder der BAM:Chemie und Prozesstechnik
Veranstaltung:25th meeting of the Consultative Committee for Amount of Substance: Metrology in Chemistry and Biology (CCQM)
Veranstaltungsort:Paris, France
Beginndatum der Veranstaltung:11.04.2019
Enddatum der Veranstaltung:12.04.2019
Verfügbarkeit des Dokuments:Datei im Netzwerk der BAM verfügbar ("Closed Access")
Datum der Freischaltung:20.05.2019
Referierte Publikation:Nein
Eingeladener Vortrag:Nein
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