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Laser induced gas breakdown in reactive mixtures

  • Plasma-chemical approach is used for synthesis of various gaseous, liquid, and solid substances since 1960th. Nowadays, the method of plasma enhanced chemical vapor deposition (PECVD) is used for production of thin films, protective coatings, carbon-based nanostructures, high purity isotopic materials, biomaterials, and other products. Plasma for PECVD is typically created in various electrical discharges, e.g. DC and AC glow discharges or discharges operated at audio (10-20 kHz), radio (13.56 MHz), and microwave (2.45 GHz) frequencies. Plasma induced by a laser, a laser induced plasma (LIP), is rarely used to deposit materials from the gas phase as in PECVD. This work is aimed at reviving interest to this latter technology and showing its efficiency and potential. We run several pilot experiments. First, LIP is excited in BCl3 or BF3 plus H2 or CH4 to evaluate the efficiency of deposition of solid boron and boron carbide, the materials, which are largely used for refractoryPlasma-chemical approach is used for synthesis of various gaseous, liquid, and solid substances since 1960th. Nowadays, the method of plasma enhanced chemical vapor deposition (PECVD) is used for production of thin films, protective coatings, carbon-based nanostructures, high purity isotopic materials, biomaterials, and other products. Plasma for PECVD is typically created in various electrical discharges, e.g. DC and AC glow discharges or discharges operated at audio (10-20 kHz), radio (13.56 MHz), and microwave (2.45 GHz) frequencies. Plasma induced by a laser, a laser induced plasma (LIP), is rarely used to deposit materials from the gas phase as in PECVD. This work is aimed at reviving interest to this latter technology and showing its efficiency and potential. We run several pilot experiments. First, LIP is excited in BCl3 or BF3 plus H2 or CH4 to evaluate the efficiency of deposition of solid boron and boron carbide, the materials, which are largely used for refractory coatings. Second, we investigate a possibility of synthesis of fluorochlorosilanes SiFxCl4-x (x = 1, 2, 3) by LIP induced in SiF4 + SiCl4 gas mixtures. Using fluorochlorosilanes with different combinations of F and Cl in the SiFxCly molecule may add flexibility in processes of silicon deposition and etching. Third, LIP is excited in reactive mixture MoF6+H2+BF3 or on a Mo target ablated into H2/BF3 atmosphere. The goal is obtaining superhard molybdenum borides MoB, Mo2B, or MoB2. The gases used and solid deposits are analyzed by optical emission spectroscopy (OES), IR and mass spectrometry (MS). We also model the plasma and perform static equilibrium chemistry calculations to see if the desired reaction products are thermodynamically favorable. Dynamic calculations of the expanding plasma plume are performed using a hydrodynamic code combined with the open source chemical software.zeige mehrzeige weniger

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Metadaten
Autor*innen:Igor B. GornushkinORCiD
Koautor*innen:P. Sennikov, R. Kornev
Dokumenttyp:Vortrag
Veröffentlichungsform:Präsentation
Sprache:Englisch
Jahr der Erstveröffentlichung:2021
Organisationseinheit der BAM:1 Analytische Chemie; Referenzmaterialien
1 Analytische Chemie; Referenzmaterialien / 1.3 Instrumentelle Analytik
DDC-Klassifikation:Naturwissenschaften und Mathematik / Chemie / Analytische Chemie
Freie Schlagwörter:Emission spectroscopy; Hydrodynamic model; Laser ablation; Laser induced plasma deposition; Plasma chemistry; Surface coating
Themenfelder/Aktivitätsfelder der BAM:Chemie und Prozesstechnik
Veranstaltung:SciX 2021, The Federation of Analytical Chemistry and Spectroscopy Societies (FACSS)
Veranstaltungsort:Providence, RI, USA
Beginndatum der Veranstaltung:September 26, 2021
Enddatum der Veranstaltung:October 1, 2021
Verfügbarkeit des Dokuments:Datei im Netzwerk der BAM verfügbar ("Closed Access")
Datum der Freischaltung:20.10.2021
Referierte Publikation:Nein
Eingeladener Vortrag:Nein
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