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Ion Assisted vs. Plasma Assisted PVD: Preparation of Optical Multilayers in a Versatile Cluster System Implementing Electron Beam and Sputter Technology

  • Functionality of optical systems requires optical coatings of high quality which have to be adapted to the application in terms of the performance of optical parameters such as reflectivity (AR, low, defined, high), the substrate material of interest (polymers, ceramics, and glass), the environmental conditions (such as temperature or humidity), and the service conditions (such spectral range and power density). Moreover, in many cases, additional non-optical requirements have to be met, including mechanical features such as scratch resistance, hardness and modulus. Consequently, thickness and overall uniformity requirements are steadily increasing. In general, these demands can usually not be achieved by a single film or coating. Instead, films with specific design features (such as gradients), layer stacks and multilayers are a prerequisite for high quality layers and their reliability. For the development of such layer systems, a versatile cluster deposition system consisting ofFunctionality of optical systems requires optical coatings of high quality which have to be adapted to the application in terms of the performance of optical parameters such as reflectivity (AR, low, defined, high), the substrate material of interest (polymers, ceramics, and glass), the environmental conditions (such as temperature or humidity), and the service conditions (such spectral range and power density). Moreover, in many cases, additional non-optical requirements have to be met, including mechanical features such as scratch resistance, hardness and modulus. Consequently, thickness and overall uniformity requirements are steadily increasing. In general, these demands can usually not be achieved by a single film or coating. Instead, films with specific design features (such as gradients), layer stacks and multilayers are a prerequisite for high quality layers and their reliability. For the development of such layer systems, a versatile cluster deposition system consisting of three clusters and a cluster-to-cluster handler has been designed. Besides a PECVD cluster for DLC coatings, two PVD clusters implement ion assisted electron beam evaporation and plasmabased sputter technology. In addition to metallic films, preparation of oxide and nitride optical coatings (SiO2, TiO2, Ta2O5, ITO, Al2O3, TiN, AlN) in various process modifications (nonreactive, partially reactive, full-reactive; rf-, dc-, mf- mode; PEM control) has been carried out. Within this paper, the effect of several process parameters on layer quality (optical constants, density, and uniformity) is discussed for selected applications examples (AR- and HR coatings, applications at elevated temperatures and applications of enhanced mechanical performance). It has been shown that specific features of ion and plasma assisted PVD processes, including ion-beam and plasma preand post-treatment of substrates and layer systems, may widen the application range and improve functionality features of given coating/substrate systems.zeige mehrzeige weniger

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Metadaten
Autor*innen:Uwe Beck, Andreas HertwigORCiD, Georg Reiners, Matthias Weise, J. Hartung, E. Reinhold, J. Strümpfel
Dokumenttyp:Zeitschriftenartikel
Veröffentlichungsform:Verlagsliteratur
Sprache:Englisch
Titel des übergeordneten Werkes (Englisch):Society of vacuum coaters
Jahr der Erstveröffentlichung:2004
Herausgeber (Institution):Society of Vacuum Coaters
Verlagsort:Albuquerque, NM
Erste Seite:86
Letzte Seite:90
Freie Schlagwörter:Cluster deposition system; Ion assisted PVD; Optical multilayers; Plasma assisted PVD
Veranstaltung:47th Annual Technical Conference Proceedings
Veranstaltungsort:Dallas, TX, United States of America
Beginndatum der Veranstaltung:2004-04-24
Enddatum der Veranstaltung:2004-04-29
URL:http://www.knovel.com/knovel2/Toc.jsp?BookID=1082
ISSN:0737-5921
ISSN:1539-2236
Verfügbarkeit des Dokuments:Physisches Exemplar in der Bibliothek der BAM vorhanden ("Hardcopy Access")
Bibliotheksstandort:Sonderstandort: Publica-Schrank
Datum der Freischaltung:19.02.2016
Referierte Publikation:Nein
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