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Investigations on PECVD boron carbonitride layers by means of ERDA, XPS and nano-indentation measurements

  • The deposition of boron carbonitride layers on silicon substrates by a microwave plasma enhanced chemical vapour deposition (MW-PECVD) process using N-trimethylborazine (TMB) and benzene as precursors is presented. As plasma gases argon and nitrogen were used. In this investigation we focus on the influence of the gas composition, substrate temperature and -bias on the layer composition, layer structure as well as the thermal stability. The films were analyzed with respect to their composition and bonding structure using elastic recoil detection analysis (ERDA) and X-ray photoelectron spectroscopy (XPS). Furthermore, nanoindentation measurements before and after annealing tests at 500 and 700°C were performed. The measurements show a strong dependence of the structure and mechanical properties on the substrate temperature. The hydrogen content strongly decreases to 8 at.% with higher substrate temperatures. Simultaneously, the layer hardness and Young’s modulus increase up to 21The deposition of boron carbonitride layers on silicon substrates by a microwave plasma enhanced chemical vapour deposition (MW-PECVD) process using N-trimethylborazine (TMB) and benzene as precursors is presented. As plasma gases argon and nitrogen were used. In this investigation we focus on the influence of the gas composition, substrate temperature and -bias on the layer composition, layer structure as well as the thermal stability. The films were analyzed with respect to their composition and bonding structure using elastic recoil detection analysis (ERDA) and X-ray photoelectron spectroscopy (XPS). Furthermore, nanoindentation measurements before and after annealing tests at 500 and 700°C were performed. The measurements show a strong dependence of the structure and mechanical properties on the substrate temperature. The hydrogen content strongly decreases to 8 at.% with higher substrate temperatures. Simultaneously, the layer hardness and Young’s modulus increase up to 21 and 173 GPa, respectively. The hardness does not decrease after annealing for 1 hour at 700°C.zeige mehrzeige weniger

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Metadaten
Autor*innen:T. Thamm, D. Wett, W. Bohne, Erik Strub, J. Röhrich, R. Szargan, G. Marx, W.A. Goedel
Dokumenttyp:Zeitschriftenartikel
Veröffentlichungsform:Verlagsliteratur
Sprache:Englisch
Titel des übergeordneten Werkes (Englisch):Microchimica acta
Jahr der Erstveröffentlichung:2006
Verlag:Springer
Verlagsort:Wien
Jahrgang/Band:156
Ausgabe/Heft:1-2
Erste Seite:53
Letzte Seite:56
Freie Schlagwörter:Annealing tests; BCN; ERDA; Hardness; PECVD; XPS
DOI:10.1007/s00604-006-0702-y
ISSN:0026-3672
ISSN:1436-5073
Verfügbarkeit des Dokuments:Physisches Exemplar in der Bibliothek der BAM vorhanden ("Hardcopy Access")
Bibliotheksstandort:Sonderstandort: Publica-Schrank
Datum der Freischaltung:19.02.2016
Referierte Publikation:Ja
Datum der Eintragung als referierte Publikation:19.12.2006
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