• Treffer 90 von 115
Zurück zur Trefferliste

Unraveling the dynamics of thin films of a miscible PVME/PS blend

  • Dielectric spectroscopy (BDS) was employed to investigate the dynamics of thin films (7 – 200 nm) of a Poly (vinyl methyl ether) (PVME) / Polystyrene (PS) blend (50:50 wt%). For the BDS measurements Nano-Structured Capacitors (NSC) were employed, where films have a free surface. This method was applied for film thicknesses up to 36 nm. Thicker films were prepared between Crossed Electrodes Capacitors (CEC). The spectra of the films showed multiple processes. The first process was assigned to the -relaxation of a bulk-like layer. For films measured by NSC, its rates were higher compared to that of the bulk blend. This behavior was related to a PVME-rich free-surface layer. A second process was observed for films measured by CEC (process X) and the 36 nm film measured by NSC (process X2). This process was assigned to fluctuations of PVME constraint by PS. Its activation energy was found to be thickness dependent, due to the evidenced thickness dependency of the compositionalDielectric spectroscopy (BDS) was employed to investigate the dynamics of thin films (7 – 200 nm) of a Poly (vinyl methyl ether) (PVME) / Polystyrene (PS) blend (50:50 wt%). For the BDS measurements Nano-Structured Capacitors (NSC) were employed, where films have a free surface. This method was applied for film thicknesses up to 36 nm. Thicker films were prepared between Crossed Electrodes Capacitors (CEC). The spectra of the films showed multiple processes. The first process was assigned to the -relaxation of a bulk-like layer. For films measured by NSC, its rates were higher compared to that of the bulk blend. This behavior was related to a PVME-rich free-surface layer. A second process was observed for films measured by CEC (process X) and the 36 nm film measured by NSC (process X2). This process was assigned to fluctuations of PVME constraint by PS. Its activation energy was found to be thickness dependent, due to the evidenced thickness dependency of the compositional heterogeneity. Finally, a third process with an activated temperature-dependence was observed for all films measured by NSC (process X1). It resembled the molecular fluctuations in an adsorbed layer found for films of pure PVME.zeige mehrzeige weniger

Volltext Dateien herunterladen

  • Schoenhals_APS_2018_2.pdf
    eng

Metadaten exportieren

Weitere Dienste

Teilen auf Twitter Suche bei Google Scholar Anzahl der Zugriffe auf dieses Dokument
Metadaten
Autor*innen:Andreas SchönhalsORCiD
Koautor*innen:Sherif Madkour, Paulina Szymoniak
Dokumenttyp:Vortrag
Veröffentlichungsform:Präsentation
Sprache:Englisch
Jahr der Erstveröffentlichung:2018
Organisationseinheit der BAM:6 Materialchemie
6 Materialchemie / 6.6 Physik und chemische Analytik der Polymere
DDC-Klassifikation:Naturwissenschaften und Mathematik / Chemie / Analytische Chemie
Technik, Medizin, angewandte Wissenschaften / Ingenieurwissenschaften / Ingenieurwissenschaften und zugeordnete Tätigkeiten
Freie Schlagwörter:Thin polymeric films
Themenfelder/Aktivitätsfelder der BAM:Chemie und Prozesstechnik
Material
Veranstaltung:Anual Meeting of the American Physical Society
Veranstaltungsort:Los Angeles, CA, USA
Beginndatum der Veranstaltung:05.03.2018
Enddatum der Veranstaltung:09.03.2018
Verfügbarkeit des Dokuments:Datei im Netzwerk der BAM verfügbar ("Closed Access")
Datum der Freischaltung:08.03.2018
Referierte Publikation:Nein
Eingeladener Vortrag:Nein
Einverstanden
Diese Webseite verwendet technisch erforderliche Session-Cookies. Durch die weitere Nutzung der Webseite stimmen Sie diesem zu. Unsere Datenschutzerklärung finden Sie hier.