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Controlled radical polymerization and in-depth mass-spectrometric characterization of poly(ionic liquid)s and their photopatterning on surfaces

  • The preparation and characterization of poly(ionic liquid)s (PILs) bearing a polystyrene backbone via reversible addition fragmentation chain transfer (RAFT) polymerization and their photolithographic patterning on silicon wafers is reported. The controlled radical polymerization of the styrenic ionic liquid (IL) monomers ([BVBIM]X, X = Cl− or Tf2N−) by RAFT polymerization is investigated in detail. We provide a general synthetic tool to access this class of PILs with controlled molecular weight and relatively narrow molecular weight distribution (2000 g mol−1 ≤ Mn ≤ 10 000 g mol−1 with dispersities between 1.4 and 1.3 for p([BVBIM]Cl); 2100 g mol−1 ≤ MP ≤ 14 000 g mol−1 for p([BVBIM]Tf2N)). More importantly, we provide an in-depth characterization of the PILs and demonstrate a detailed mass spectrometric analysis via matrix-assisted laser desorption ionization (MALDI) as well as – for the first time for PILs – electrospray ionization mass spectrometry (ESI-MS). Importantly,The preparation and characterization of poly(ionic liquid)s (PILs) bearing a polystyrene backbone via reversible addition fragmentation chain transfer (RAFT) polymerization and their photolithographic patterning on silicon wafers is reported. The controlled radical polymerization of the styrenic ionic liquid (IL) monomers ([BVBIM]X, X = Cl− or Tf2N−) by RAFT polymerization is investigated in detail. We provide a general synthetic tool to access this class of PILs with controlled molecular weight and relatively narrow molecular weight distribution (2000 g mol−1 ≤ Mn ≤ 10 000 g mol−1 with dispersities between 1.4 and 1.3 for p([BVBIM]Cl); 2100 g mol−1 ≤ MP ≤ 14 000 g mol−1 for p([BVBIM]Tf2N)). More importantly, we provide an in-depth characterization of the PILs and demonstrate a detailed mass spectrometric analysis via matrix-assisted laser desorption ionization (MALDI) as well as – for the first time for PILs – electrospray ionization mass spectrometry (ESI-MS). Importantly, p([BVBIM]Cl) and p([DMVBIM]Tf2N) were photochemically patterned on silicon wafers. Therefore, a RAFT agent carrying a photoactive group based on ortho-quinodimethane chemistry – more precisely photoenol chemistry – was photochemically linked for subsequent controlled radical polymerization of [BVBIM]Cl and [DMVBIM]Tf2N. The successful spatially-resolved photografting is evidenced by surface-sensitive characterization methods such as X-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectrometry (ToF-SIMS). The presented method allows for the functionalization of diverse surfaces with poly(ionic liquid)s.zeige mehrzeige weniger

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Metadaten
Autoren/innen:J. Steinkönig, F. R. Bloesser, B. Huber, A. Welle, V. Trouillet, Steffen Weidner, L. Barner, P. W. Roesky, J. Yuan, A. S. Goldmann, C. Barner-Kowollik
Dokumenttyp:Zeitschriftenartikel
Veröffentlichungsform:Verlagsliteratur
Sprache:Englisch
Titel des übergeordneten Werkes (Englisch):Polymer Chemistry
Jahr der Erstveröffentlichung:2016
Organisationseinheit der BAM:1 Analytische Chemie; Referenzmaterialien
1 Analytische Chemie; Referenzmaterialien / 1.3 Strukturanalytik
Veröffentlichende Institution:Bundesanstalt für Materialforschung und -prüfung (BAM)
Verlag:Royal Society of Chemistry
Verlagsort:Cambridge
Jahrgang/Band:7
Erste Seite:451
Letzte Seite:461
DDC-Klassifikation:Naturwissenschaften und Mathematik / Chemie / Analytische Chemie
Freie Schlagwörter:mass spectrometry; polyionic liquids; reversible addition fragmentation chain transfer (RAFT) polymerization; surface modification
Themenfelder/Aktivitätsfelder der BAM:Analytical Sciences
Analytical Sciences / Strukturanalytik und Materialographie
DOI:https://doi.org/10.1039/C5PY01320H
URN:urn:nbn:de:kobv:b43-355202
URL:http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=Alerting&SrcApp=Alerting&DestApp=WOS&DestLinkType=FullRecord;UT=WOS:000367318800021
Verfügbarkeit des Dokuments:Datei für die Öffentlichkeit verfügbar ("Open Access")
Lizenz (Deutsch):License LogoCreative Commons - Namensnennung
Datum der Freischaltung:14.03.2016
Referierte Publikation:Ja
Datum der Eintragung als referierte Publikation:28.04.2016
Schriftenreihen ohne Nummerierung:Wissenschaftliche Artikel der BAM