Das Suchergebnis hat sich seit Ihrer Suchanfrage verändert. Eventuell werden Dokumente in anderer Reihenfolge angezeigt.
  • Treffer 3 von 3
Zurück zur Trefferliste

Microstructural characterization of binary and ternary hard coating systems for wear protection - Part I: PVD coatings

  • Different wear-resistant coatings produced by physical vapour deposition (PVD) were characterized with the aid of cross-sectional transmission electron microscopy (XTEM). All coating systems were optimized by the producers and exhibited good properties with respect to their special applications. The microstructure, texture and chemical composition of binary and ternary systems produced by the arc process [TiN, CrN, Cr2N (Ti, Cr)N on steel substrates] and magnetron sputtering process [TiN, CrN on steel substrates, (Ti, Al)N on Si-substrate] were investigated. All coatings had a more or less columnar microstructure, which was interrupted by interlayers in some cases. Whereas arc coatings always did show some kind of substrate modification, the latter was not observed after magnetron sputtering. Electron diffraction normally revealed a mono-phase fcc structure, except at sites very near to the interface. Only for the systems Cr–N and (Ti, Cr)–N were different additional phases observed atDifferent wear-resistant coatings produced by physical vapour deposition (PVD) were characterized with the aid of cross-sectional transmission electron microscopy (XTEM). All coating systems were optimized by the producers and exhibited good properties with respect to their special applications. The microstructure, texture and chemical composition of binary and ternary systems produced by the arc process [TiN, CrN, Cr2N (Ti, Cr)N on steel substrates] and magnetron sputtering process [TiN, CrN on steel substrates, (Ti, Al)N on Si-substrate] were investigated. All coatings had a more or less columnar microstructure, which was interrupted by interlayers in some cases. Whereas arc coatings always did show some kind of substrate modification, the latter was not observed after magnetron sputtering. Electron diffraction normally revealed a mono-phase fcc structure, except at sites very near to the interface. Only for the systems Cr–N and (Ti, Cr)–N were different additional phases observed at low nitrogen partial pressures.zeige mehrzeige weniger

Metadaten exportieren

Weitere Dienste

Teilen auf Twitter Suche bei Google Scholar Anzahl der Zugriffe auf dieses Dokument
Metadaten
Autor*innen:Ilona Dörfel, Werner ÖsterleORCiD, Ingrid Urban, E. Bouzy
Dokumenttyp:Zeitschriftenartikel
Veröffentlichungsform:Verlagsliteratur
Sprache:Englisch
Titel des übergeordneten Werkes (Englisch):Surface and coatings technology
Jahr der Erstveröffentlichung:1999
Verlag:Elsevier Science
Verlagsort:Lausanne
Jahrgang/Band:111
Ausgabe/Heft:2-3
Erste Seite:199
Letzte Seite:209
Freie Schlagwörter:Arc bond sputtering; Arc deposition; Magnetron sputtering; TEM; XTEM
DOI:10.1016/S0257-8972(98)00735-X
URL:http://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6TVV-3VTRSCY-G&_user=963821&_coverDate=01%2F29%2F1999&_rdoc=14&_fmt=summary&_orig=browse&_srch=doc-info(%23toc%235544%231999%23998889997%2360972%23FLA%23display%23Volume)&_cdi=5544&_sort=d&_docanch
ISSN:0257-8972
Verfügbarkeit des Dokuments:Physisches Exemplar in der Bibliothek der BAM vorhanden ("Hardcopy Access")
Bibliotheksstandort:Sonderstandort: Publica-Schrank
Bibliotheksstandort:ZS 45
Datum der Freischaltung:19.02.2016
Referierte Publikation:Ja
Datum der Eintragung als referierte Publikation:24.03.2003
Einverstanden
Diese Webseite verwendet technisch erforderliche Session-Cookies. Durch die weitere Nutzung der Webseite stimmen Sie diesem zu. Unsere Datenschutzerklärung finden Sie hier.