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Quantitative XRF analysis of industrial thin film samples by calibration using thin film RMs

  • X-ray fluorescence (XRF) analysis is a well suited methodology for thin film analysis. With XRF the mass deposition of elements can be non-destructively determined. By knowledge of the density of the thin film as well the thickness can be given. In the field of industrial thin film manufacturing various material systems and layer structures are used. the analysis relies on well-known calibration samples or even reference materials to determine absolute analytical results from the measurement values recorded. Within this concept of chemical traceability the calibration sample has to be as similar as possible to the industrial thin film sample with respect to the spatial distribution of elemental composition in order to minimize matrix effects or analysis related uncertainties. The procurement of such certified similar calibration samples or reference materials including their required traceability is a challenge due to limited number of available calibration samples or referenceX-ray fluorescence (XRF) analysis is a well suited methodology for thin film analysis. With XRF the mass deposition of elements can be non-destructively determined. By knowledge of the density of the thin film as well the thickness can be given. In the field of industrial thin film manufacturing various material systems and layer structures are used. the analysis relies on well-known calibration samples or even reference materials to determine absolute analytical results from the measurement values recorded. Within this concept of chemical traceability the calibration sample has to be as similar as possible to the industrial thin film sample with respect to the spatial distribution of elemental composition in order to minimize matrix effects or analysis related uncertainties. The procurement of such certified similar calibration samples or reference materials including their required traceability is a challenge due to limited number of available calibration samples or reference materials, in particular at the nanoscale. There are only few providers of calibration standards for layer or coating thicknesses which are suitable for XRF analysis. The limited number of available certified reference materials (CRMs) for XRF thin film analysis and in parallel the growing market of novel thin film materials induces a growing gap of required calibration samples for XRF analysis. The exploitation of process-near samples benefits from a leverage effect: on one hand reference materials are needed for calibration and alignment procedures for X-ray fluorescence devices. They are customized for the special need of the end-user, e.g. a company producing thin film solar cells. On the other hand the market for EDXRF devices develops positively by providing novel thin film calibration samples for industry and end user-related production processes or application. Two aspects are hereby being addressed; the improvement of product quality which in certain sectors like aerospace and automotive industry directly translates to product safety as well as the expansion of the sales potential of EDXRF measuring devices.zeige mehrzeige weniger

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Metadaten
Autor*innen:C. Streeck
Koautor*innen:B. Beckhoff, Wolfgang Unger
Dokumenttyp:Vortrag
Veröffentlichungsform:Präsentation
Sprache:Englisch
Jahr der Erstveröffentlichung:2017
DDC-Klassifikation:Naturwissenschaften und Mathematik / Chemie / Analytische Chemie
Freie Schlagwörter:Calibration; Traceability; XRF
Veranstaltung:Annual Meeting ISO TC 201 SC10
Veranstaltungsort:Brescia, Italy
Beginndatum der Veranstaltung:17.09.2017
Enddatum der Veranstaltung:17.09.2017
Verfügbarkeit des Dokuments:Datei im Netzwerk der BAM verfügbar ("Closed Access")
Datum der Freischaltung:11.12.2017
Referierte Publikation:Nein
Eingeladener Vortrag:Nein
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