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A thin-layer reference material for hydrogen analysis
- In many areas of material sciences, hydrogen analysis is of particular importance. For example, hydrogen is most abundant as impurity in thin film materials depending on the deposition process and has great influence on the chemical, physical and electrical properties of many materials. Existing bulk reference materials (RMs) are not suited for surface sensitive analytical methods like elastic recoil detection analysis (ERDA) or nuclear reaction analysis (NRA). To overcome this serious lack of (certified) thin-layer reference materials for the determination of hydrogen in the near-surface region (12 µm depth), we produced stable, homogeneous amorphous silicon layers on Si-wafers (aSi:HSi) by means of chemical vapour deposition (CVD), while about 10% of hydrogen was incorporated in the Si-layer. Homogeneity and stability were proved by NRA whereas traceability of reference values has been assured by an international interlaboratory comparison.
Autor*innen: | Uwe Reinholz, Wolfram Bremser, Klaus-Werner Brzezinka, Erik Strub, Hans-Peter Weise, Silke Merchel |
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Dokumenttyp: | Zeitschriftenartikel |
Veröffentlichungsform: | Verlagsliteratur |
Sprache: | Englisch |
Titel des übergeordneten Werkes (Englisch): | Nuclear instruments and methods in physics research B |
Jahr der Erstveröffentlichung: | 2008 |
Verlag: | Elsevier |
Verlagsort: | Amsterdam |
Jahrgang/Band: | 266 |
Ausgabe/Heft: | 10 |
Erste Seite: | 2418 |
Letzte Seite: | 2423 |
Freie Schlagwörter: | Depth profiling; Hydrogen; Ion beam analysis; Nuclear reaction analysis; Reference material |
DOI: | 10.1016/j.nimb.2008.03.015 |
ISSN: | 0168-583X |
ISSN: | 1872-9584 |
Verfügbarkeit des Dokuments: | Physisches Exemplar in der Bibliothek der BAM vorhanden ("Hardcopy Access") |
Bibliotheksstandort: | Sonderstandort: Publica-Schrank |
Datum der Freischaltung: | 19.02.2016 |
Referierte Publikation: | Ja |
Datum der Eintragung als referierte Publikation: | 05.06.2008 |