Ion Assisted vs. Plasma Assisted PVD: Preparation of Optical Multilayers in a Versatile Cluster System Implementing Electron Beam and Sputter Technology
- Functionality of optical systems requires optical coatings of
high quality which have to be adapted to the application in
terms of the performance of optical parameters such as
reflectivity (AR, low, defined, high), the substrate material of
interest (polymers, ceramics, and glass), the environmental
conditions (such as temperature or humidity), and the service
conditions (such spectral range and power density). Moreover,
in many cases, additional non-optical requirements have
to be met, including mechanical features such as scratch
resistance, hardness and modulus.
Consequently, thickness and overall uniformity requirements
are steadily increasing. In general, these demands can usually
not be achieved by a single film or coating. Instead, films with
specific design features (such as gradients), layer stacks and
multilayers are a prerequisite for high quality layers and their
reliability. For the development of such layer systems, a
versatile cluster deposition system consisting ofFunctionality of optical systems requires optical coatings of
high quality which have to be adapted to the application in
terms of the performance of optical parameters such as
reflectivity (AR, low, defined, high), the substrate material of
interest (polymers, ceramics, and glass), the environmental
conditions (such as temperature or humidity), and the service
conditions (such spectral range and power density). Moreover,
in many cases, additional non-optical requirements have
to be met, including mechanical features such as scratch
resistance, hardness and modulus.
Consequently, thickness and overall uniformity requirements
are steadily increasing. In general, these demands can usually
not be achieved by a single film or coating. Instead, films with
specific design features (such as gradients), layer stacks and
multilayers are a prerequisite for high quality layers and their
reliability. For the development of such layer systems, a
versatile cluster deposition system consisting of three clusters
and a cluster-to-cluster handler has been designed. Besides a
PECVD cluster for DLC coatings, two PVD clusters implement
ion assisted electron beam evaporation and plasmabased
sputter technology. In addition to metallic films, preparation
of oxide and nitride optical coatings (SiO2, TiO2, Ta2O5,
ITO, Al2O3, TiN, AlN) in various process modifications (nonreactive,
partially reactive, full-reactive; rf-, dc-, mf- mode;
PEM control) has been carried out.
Within this paper, the effect of several process parameters on
layer quality (optical constants, density, and uniformity) is
discussed for selected applications examples (AR- and HR
coatings, applications at elevated temperatures and applications
of enhanced mechanical performance).
It has been shown that specific features of ion and plasma
assisted PVD processes, including ion-beam and plasma preand
post-treatment of substrates and layer systems, may
widen the application range and improve functionality features
of given coating/substrate systems.…
Autor*innen: | Uwe Beck, Andreas HertwigORCiD, Georg Reiners, Matthias Weise, J. Hartung, E. Reinhold, J. Strümpfel |
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Dokumenttyp: | Zeitschriftenartikel |
Veröffentlichungsform: | Verlagsliteratur |
Sprache: | Englisch |
Titel des übergeordneten Werkes (Englisch): | Society of vacuum coaters |
Jahr der Erstveröffentlichung: | 2004 |
Herausgeber (Institution): | Society of Vacuum Coaters |
Verlagsort: | Albuquerque, NM |
Erste Seite: | 86 |
Letzte Seite: | 90 |
Freie Schlagwörter: | Cluster deposition system; Ion assisted PVD; Optical multilayers; Plasma assisted PVD |
Veranstaltung: | 47th Annual Technical Conference Proceedings |
Veranstaltungsort: | Dallas, TX, United States of America |
Beginndatum der Veranstaltung: | 2004-04-24 |
Enddatum der Veranstaltung: | 2004-04-29 |
URL: | http://www.knovel.com/knovel2/Toc.jsp?BookID=1082 |
ISSN: | 0737-5921 |
ISSN: | 1539-2236 |
Verfügbarkeit des Dokuments: | Physisches Exemplar in der Bibliothek der BAM vorhanden ("Hardcopy Access") |
Bibliotheksstandort: | Sonderstandort: Publica-Schrank |
Datum der Freischaltung: | 19.02.2016 |
Referierte Publikation: | Nein |