Improved quantitative XRF analysis of industrial thin film samples by calibration using thin film RMs certified by reference-free XRF enabling traceability to the SI
- Reference-free XRF is a SI traceable technique for the
determination of the mass deposition (mass per unit area) of elements in films on the nano- and micro scale. The method is radiometrically calibrated instrumentation (PTB@BESSY II, Germany) and based on reliable knowledge of all relevant atomic fundamental, experimental and instrumental parameters. No calibration sample or reference materials are necessary. The approach had been validated in the CCQM-P140 pilot study and the K129 key comparison by determination of mole fractions in Cu(In,Ga)Se2 thin films.