TY - JOUR A1 - Topolniak, Ievgeniia A1 - Hodoroaba, Vasile-Dan A1 - Pfeifer, Dietmar A1 - Braun, Ulrike A1 - Sturm, Heinz T1 - Boehmite Nanofillers in Epoxy Oligosiloxane Resins: Influencing the Curing Process by Complex Physical and Chemical Interactions JF - Materials Journal N2 - In this work, a novel boehmite (BA)-embedded organic/inorganic nanocomposite coating based on cycloaliphatic epoxy oligosiloxane (CEOS) resin was fabricated applying UV-induced cationic polymerization. The main changes of the material behavior caused by the nanofiller were investigated with regard to its photocuring kinetics, thermal stability, and glass transition. The role of the particle surface was of particular interest, thus, unmodified nanoparticles (HP14) and particles modified with p-toluenesulfonic acid (OS1) were incorporated into a CEOS matrix in the concentration range of 1–10 wt.%. Resulting nanocomposites exhibited improved thermal properties, with the glass transition temperature (Tg) being shifted from 30 °C for unfilled CEOS to 54 °C (2 wt.% HP14) and 73 °C (2 wt.% OS1) for filled CEOS. Additionally, TGA analysis showed increased thermal stability of samples filled with nanoparticles. An attractive interaction between boehmite and CEOS matrix influenced the curing. Real-time infrared spectroscopy (RT-IR) experiments demonstrated that the epoxide conversion rate of nanocomposites was slightly increased compared to neat resin. The beneficial role of the BA can be explained by the participation of hydroxyl groups at the particle surface in photopolymerization processes and by the complementary contribution of p-toluenesulfonic acid surface modifier and water molecules introduced into the system with nanoparticles. KW - Real-time infrared spectroscopy KW - Boehmite KW - Nanocomposite KW - Cationic photocuring KW - Cycloaliphatic epoxy oligosiloxane KW - Epoxy conversion degree PY - 2019 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-479628 DO - https://doi.org/10.3390/ma12091513 VL - 12 IS - 9 SP - 1513 PB - MDPI AN - OPUS4-47962 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Dudziak, Mateusz A1 - Topolniak, Ievgeniia A1 - Silbernagl, Dorothee A1 - Altmann, Korinna A1 - Sturm, Heinz T1 - Long-time behavior of surface properties of microstructures fabricated by multiphoton lithography JF - Nanomaterials N2 - The multiphoton lithography (MPL) technique represents the future of 3D microprinting, enabling the production of complex microscale objects with high precision. Although the MPL fabrication parameters are widely evaluated and discussed, not much attention has been given to the microscopic properties of 3D objects with respect to their surface properties and time-dependent stability. These properties are of crucial importance when it comes to the safe and durable use of these structures in biomedical applications. In this work, we investigate the surface properties of the MPL-produced SZ2080 polymeric microstructures with regard to the physical aging processes during the post-production stage. The influence of aging on the polymeric microstructures was investigated by means of Atomic Force Microscopy (AFM) and X-ray Photoelectron Spectroscopy (XPS). As a result, a time-dependent change in Young’s Modulus, plastic deformation, and adhesion and their correlation to the development in chemical composition of the surface of MPL-microstructures are evaluated. The results presented here are valuable for the application of MPL-fabricated 3D objects in general, but especially in medical technology as they give detailed information of the physical and chemical time-dependent dynamic behavior of MPL-printed surfaces and thus their suitability and performance in biological systems. KW - Multiphoton lithography KW - Additive manufacturing KW - Microfabrication KW - SZ2080 negative photo-resist KW - Young´s modulus KW - Aging KW - Surface properties KW - X-ray photoelectron spectroscopy KW - Atomic force microscopy KW - Force-distance-curve PY - 2021 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-542166 DO - https://doi.org/10.3390/nano11123285 SN - 2079-4991 VL - 11 IS - 12 SP - 1 EP - 12 PB - MDPI CY - Basel AN - OPUS4-54216 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Topolniak, Ievgeniia A1 - Elert, Anna Maria A1 - Knigge, Xenia A1 - Ciftci, G. C. A1 - Radnik, Jörg A1 - Sturm, Heinz T1 - High precision micropatterning of polydopamine by Multiphoton Lithography JF - Advanced Materials N2 - Mussel-inspired polydopamine (PDA) initiated a multifunctional modification route that leads to the generation of novel advanced materials and their applications. However, existing PDA deposition techniques still exhibit poor spatial control, have a very limited capability of micropatterning and do not allow to locally tune PDA topography. Herein, we demonstrate PDA deposition based on Multiphoton Lithography (MPL) that enables full spatial and temporal control with nearly total freedom of patterning design. Using MPL, we achieve 2D microstructures of complex design with pattern precision of 0.8 μm without the need of a photomask or stamp. Moreover, this approach permits adjusting the morphology and thickness of the fabricated microstructure within one deposition step, resulting in a unique tunability of materials properties. The chemical composition of PDA is confirmed and its ability for protein enzyme immobilization is demonstrated. This work presents a new methodology for high precision and complete control of PDA deposition, enabling PDA incorporation in applications where fine and precise local surface functionalization is required. Possible applications include multicomponent functional elements and devices in microfluidics or lab-on-a-chip systems. KW - Multiphoton lithography KW - Polydopamine KW - Micropatterning PY - 2022 DO - https://doi.org/10.1002/adma.202109509 VL - 34 IS - 18 SP - e2109509 PB - Wiley online library AN - OPUS4-54535 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Tavasolyzadeh, Zeynab A1 - Tang, Peng A1 - Hahn, Marc Benjamin A1 - Hweidi, Gada A1 - Nordholt, Niclas A1 - Haag, Rainer A1 - Sturm, Heinz A1 - Topolniak, Ievgeniia T1 - 2D and 3D Micropatterning of Mussel‐Inspired Functional Materials by Direct Laser Writing JF - Small : nano micro N2 - AbstractThis work addresses the critical need for multifunctional materials and substrate‐independent high‐precision surface modification techniques that are essential for advancing microdevices and sensing elements. To overcome existing limitations, the versatility of mussel‐inspired materials (MIMs) is combined with state‐of‐the‐art multiphoton direct laser writing (DLW) microfabrication. In this way, 2D and 3D MIM microstructures of complex designs are demonstrated with sub‐micron to micron resolution and extensive post‐functionalization capabilities. This study includes polydopamine (PDA), mussel‐inspired linear, and dendritic polyglycerols (MI‐lPG and MI‐dPG), allowing their direct microstructure on the substrate of choice with the option to tailor the patterned topography and morphology in a controllable manner. The functionality potential of MIMs is demonstrated by successfully immobilizing and detecting single‐stranded DNA on MIM micropattern and nanoarray surfaces. In addition, easy modification of MIM microstructure with silver nanoparticles without the need of any reducing agent is shown. The methodology developed here enables the integration of MIMs in advanced applications where precise surface functionalization is essential. KW - Direct laser writing KW - Mussel-inspired materials KW - Polyglycerol KW - Polydopamine KW - Micropatterning PY - 2023 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-588778 DO - https://doi.org/10.1002/smll.202309394 SN - 1613-6829 SP - 1 EP - 12 PB - Wiley-VCH CY - Weinheim AN - OPUS4-58877 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Elert, Anna Maria A1 - Chen, Yong-Cin A1 - Smales, Glen J. A1 - Topolniak, Ievgeniia A1 - Sturm, Heinz A1 - Schönhals, Andreas A1 - Szymoniak, Paulina T1 - Effects of the charge density of nanopapers based on carboxymethylated cellulose nanofibrils investigated by complementary techniques JF - ACS Omega N2 - Cellulose nanofibrils (CNFs) with different charge densities were prepared and investigated by a combination of different complementary techniques sensitive to the structure and molecular dynamics of the system. The morphology of the materials was investigated by scanning electron microscopy (SEM) and X-ray scattering (SAXS/WAXS). The latter measurements were quantitatively analyzed yielding to molecular parameters in dependence of the charge density like the diameter of the fibrils, the distance between the fibrils, and the dimension of bundles of nanofibrils, including pores. The influence of water on the properties and the charge density is studied by thermogravimetric analysis (TGA), differential scanning calorimetry (DSC) and broadband dielectric spectroscopy. The TGA measurements reveal two mass loss processes. The one at lower temperatures was related to the loss of water, and the second process at higher temperatures was related to the chemical decomposition. The resulting char yield could be correlated to the distance between the microfibrils. The DSC investigation for hydrated CNFs revealed three glass transitions due to the cellulose segments surrounded by water molecules in different states. In the second heating scan, only one broad glass transition is observed. The dielectric spectra reveal two relaxation processes. At low temperatures or higher frequencies, the β-relaxation is observed, which is assigned to localized fluctuation of the glycosidic linkage. At higher temperatures and lower frequencies, the α-relaxation takes places. This relaxation is due to cooperative fluctuations in the cellulose segments. Both processes were quantitatively analyzed. The obtained parameters such as the relaxation rates were related to both the morphological data, the charge density, and the content of water for the first time. KW - Cellulose nanofibrils PY - 2024 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-600528 DO - https://doi.org/https://doi.org/10.1021/acsomega.4c00255 SN - 2470-1343 VL - 9 SP - 20152 EP - 20166 PB - ACS AN - OPUS4-60052 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Silbernagl, Dorothee A1 - Szymoniak, Paulina A1 - Tavasolyzadeh, Zeynab A1 - Sturm, Heinz A1 - Topolniak, Ievgeniia T1 - Multiphoton Lithography of Interpenetrating Polymer Networks for Tailored Microstructure Thermal and Micromechanical Properties JF - Small N2 - Multiphoton lithography (MPL), an emerging truly 3D microfabrication technique, exhibits substantial potential in biomedical applications, including drug delivery and tissue engineering. Fabricated micro-objects are often expected to undergo shape morphing or bending of the entire structure or its parts. Furthermore, ensuring precise property tuning is detrimental to the realization of the functionality of MPL microstructures. Herein, novel MPL materials based on interpenetrating polymer networks (IPNs) are presented that effectively combine the advantages of acrylate and epoxy systems. IPNs with varying component ratios are investigated for their microfabrication performance and structural integrity with respect to thermal and micromechanical properties. A variety of high-resolution techniques is applied to comprehensively evaluate IPN properties at the bulk, micron, and segmental levels. This study shows that the MPL laser scanning velocity and power, photoinitiator content, and multi-step exposure can be used to tune the morphology and properties of the IPN. As a result, a library of 3D MPL IPN microstructures with high 3D structural stability and tailored thermal and micromechanical properties is achieved. New IPN microstructures with Young’s moduli of 3–4 MPa demonstrate high-to-fully elastic responses to deformations, making them promising for applications in morphable microsystems, soft micro-robotics, and cell engineering. KW - Interpenetrating polymer network KW - Multiphoton lithography KW - Atomic force microscopy KW - Intermodulation AFM KW - Fast scanning calorimetry PY - 2024 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-600593 DO - https://doi.org/10.1002/smll.202310580 SN - 1613-6810 SP - 1 EP - 12 PB - Wiley VHC-Verlag AN - OPUS4-60059 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -