TY - RPRT A1 - Kim, K. J. A1 - Yu, H. A1 - Lee, S. M. A1 - Kwon, J. H. A1 - Ruh, H. A1 - Radnik, Jörg A1 - Archanjo, B. S. A1 - Annese, E. A1 - Damasceno, J. C. A1 - Achete, C. A. A1 - Yao, Y. A1 - Ren, L. A1 - Gao, H. A1 - Windover, D. A1 - Matsuzaki, H. A1 - Azuma, Y. A1 - Zhang, L. A1 - Fujimoto, T. A1 - Jordaan, W. A. A1 - Reed, B. A1 - Shard, A. G. A1 - Cibik, L. A1 - Gollwitzer, C. A1 - Krumrey, M. T1 - Final report of CCQM-K157 for the measurement of the amount of substance of HfO2 expressed as the thickness of nm films N2 - The key comparison CCQM-K157 for the thickness measurement of HfO2 films was performed by the Surface Analysis Working Group (SAWG) of the Consultative Committee for Amount of Substance (CCQM). The aim of CCQM-K157 is to establish the measurement traceability and to ensure the equivalency in the measurement capability of national metrology institutes for the thickness measurement of HfO2 films. In this key comparison, the thicknesses of six HfO2 films with the nominal thickness range from 0.7 nm to 6 nm were compared by x-ray photoelectron spectroscopy (XPS), x-ray reflectometry (XRR), transmission electron microscopy (TEM), spectroscopic ellipsometry (SE) and medium energy ion scattering spectrometry (MEIS). To reach the main text of this paper, click on Final Report. Note that this text is that which appears in Appendix B of the BIPM key comparison database https://www.bipm.org/kcdb/. The final report has been peer-reviewed and approved for publication by the CCQM, according to the provisions of the CIPM Mutual Recognition Arrangement (CIPM MRA). KW - CCQM KW - Thin Films KW - HfO2 KW - thickness KW - XPS PY - 2023 DO - https://doi.org/10.1088/0026-1394/60/1A/08010 VL - 60 SP - 08010 PB - IOP AN - OPUS4-63049 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - RPRT A1 - Hodoroaba, Vasile-Dan A1 - Fontanges, R. A1 - Delvallée, A. A1 - Deumer, J. A1 - Salzmann, C. A1 - Crouzier, L. A1 - Gollwitzer, C. A1 - Klein, T. A1 - Koops, R. A1 - Sebaihi, N. A1 - Pauw, Brian Richard A1 - Smales, Glen Jacob A1 - Artous, S. A1 - Taché, O. A1 - Feltin, N. T1 - Report on full algorithm sequences for nanoparticle detection and size measurement as developed on both a physical basis and by machine learning N2 - he main objective of the nPSize project is to improve the measurement capabilities for nanoparticle size based on both measurement methods traceable to SI units and new reference materials. Two basic approaches have been used in order to develop measurement procedures resulting in traceable results of the nanoparticle size distribution: physical modelling for the methods used in the project (TSEM, SEM, AFM and SAXS) and machine learning. Physical modelling: In this part, the physical models associated with different shape measurements for the techniques TSEM, SEM, AFM and SAXS have been collected and further developed with the aim to simulate the resulting signal as measured by the individual methods. Uncertainties and traceability associated with each model were investigated and evaluated. In the following, the progress on these physical models is reported for each individual method. Machine Learning modelling: The aim of this part is to use machine learning to enable automatic measurement of nanoparticle shape from expert a-priori information only. No physical model will be used as a-priori information in this task. The accuracy and traceability of the size results obtained by each technique will be analyzed and compared with the physical modelling. A machine learning database will then be used to create automatic detection algorithms. KW - Nanoparticles KW - Particle size distribution KW - SEM KW - TSEM KW - TEM KW - SAXS KW - AFM PY - 2022 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-546531 DO - https://doi.org/10.5281/zenodo.5807864 SP - 1 EP - 20 PB - Zenodo CY - Geneva AN - OPUS4-54653 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -