TY - CONF A1 - Beck, Uwe T1 - Zentrifugentechnologie in der Beanspruchung auf Zug und Druck; Zug-und Zugscherprüfung von CFK N2 - Der Vortrag widmet sich der Zentrifugentechnologie und beschreibt die Punkte der Beanspruchung auf Zug und Druck, Zug- und Zugscherprüfung von geklebten CFK-Platten im Einzelnen. T2 - Videokonferenz CY - Dingolfing, Germany DA - 13.06.2016 KW - Zentrifugentechnologie KW - Klebfestigkeit KW - Härteprüfung KW - CFK PY - 2016 AN - OPUS4-37494 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe T1 - Characterization of Materials: Uncertainty Budgets in Measurement and Testing N2 - The comprehensive knowledge of material properties as engineered and the material behavior in use is of huge importance for the functionality and reliability of processes and products. Hence, the accurate determination of material properties is a prerequisite for the applicability of a given material. Nowadays, macroscopic product features are originated by material properties on the microscopic and nanoscopic scale. This is a general challenge for uncertainty budgets in measurement and testing based on a conformity assesment. Testing labs accreditated according to DIN EN ISO/IEC 17025 have to meet these demands. This paper focuses on the measurement of physical quantities (measurand with value and unit) and on the testing of material properties (qualitative, semi-quantitative or quantitative characteristics) of solid state materials. For both measurement and testing, the expression of uncertainty according to GUM is essential. Regarding the object/sample one has to subdivide in surface and bulk features, from the measurement/testing point of view destructive vs. nondestructive procedures have to be distinguished. Moreover, direct mesurement/testing and model-based determination of quantities/properties of interest require different approaches regarding the expression of uncertainty. For surface quantities and properties as discussed here, further considerations have to be made with respect to localized (lateral extension, native or artificial) or stratified (homogeneity and isotropy) material features vs. mapping (integration area) and imaging (lateral resolution and field of analysis) specifications of the measurement/testing procedure. The concept of uncertainty budgets and the expression of uncertainty is introduced and discussed in more detail for the nondestructive model-based determination of thickness by spectroscopic ellipsometry (SE), the destructive determination of adhesion by means of centrifugal adhesion testing (CAT). It is shown that the expression of uncertainty for these examples and real materials requires different approaches resulting in either quantitity values with unit or qualitative/quantititative attributes with calculated/estimated uncertainties in agreement with GUM. T2 - The 4th International Conference on Competitive Materials and Technology Processes, ic-cmtp4, 2016 CY - Miskolc-Lillafüred, Hungary DA - 03.10.2016 KW - Measurement and testing KW - Uncertainty budgets KW - Expression of uncertainty PY - 2016 AN - OPUS4-37841 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe T1 - Plasma Germany, Fachausschuss Normung, Herbstsitzung 2016 N2 - Der Stand der Normung im Bereich der Oberflächentechnik wird zusammengefasst. Aktuelle Normungsvorhaben zur chemischen Oberflächenanalyse, Rastersondenmikroskopie, Nanotechnologie, Oberflächenmesstechnik im Mikro- und Nanobereich, für Anwendungen von Kohlenstoffschichten sowie von Mess- und Prüfverfahren für metallische und anorganische Überzüge werden vorgestellt. Ein Ringversuch zur Klassifizierung von Kohlenstoffschichten mittels Ellipsometrie wird diskutiert. Abschließend wird das DIN-Terminologie Portal erläutert. T2 - Lenkungsausschuss von Plasma Germany, Fachausschuss Normung, Herbstsitzung 2016 CY - Stuttgart, Germany DA - 27.10.2016 KW - Stand der Normung KW - Oberflächentechnik KW - Schichttechnik PY - 2016 AN - OPUS4-38068 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe T1 - Ringversuch zur Klassifizierung von Kohlenstoffschichten mittels Ellipsometrie N2 - Der Vortrag widmet sich dem „Ringversuch zur Klassifizierung von Kohlenstoffschichten mittels Ellipsometrie“ und beschreibt die experimentellen Eckdaten, die Ellipsometrie als Messmethode am Beispiel DLC auf Stahl, Proben vs. n-k Ebene vs. Ergebnisse des Ringversuches, messtechnische Bewertung des Ringversuches und normative Bewertung des Ringversuches sowie Schlussfolgerungen. T2 - 9. Sitzung DIN NA 062-01-64 „Kohlenstoffschichten“ CY - Berlin, Deutschland DA - 09.05.2016 KW - Amorphe Kohlenstoffschichten KW - Optische Konstanten KW - Ellipsometrie KW - Klassifizierungssystem PY - 2016 AN - OPUS4-38041 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe T1 - Preliminary work item (PWI) 23131 on standardization of ellipsometry N2 - The paper addresses the PRELIMINARY WORK ITEM (PWI) 23131 ON STANDARDIZATION OF ELLIPSOMETRY and the following points are discussed in more detail: Historical background of ellipsometry, Technical/industrial importance of ellipsometry and Standardization activities on ellipsometry. T2 - ISO TC 107 and JWG 4 meeting CY - Levi, Finland DA - 23.01.2018 KW - Standardization KW - Ellipsometrie KW - Modelling KW - Accreditation PY - 2018 AN - OPUS4-43959 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe T1 - Die Zentrifuge als universelles Prüfsystem für Beanspruchungen auf Zug und Druck N2 - Mit der Zentrifugentechnologie ist seit einigen Jahren ein neuartiges Mehr-Proben-Prüf-verfahren auf dem Markt etabliert, welches die klassische Zugprüfung in den Trommelrotor einer Tischzentrifuge überträgt. In der Beanspruchung auf Zug ist die Prüfung der Verbundfestigkeit mittels CAT-Technologie (centrifugal adhesion testing) an der BAM seit 2017 nach DIN EN ISO/IEC 17025 akkreditiert, wobei die Verbundfestigkeit von Klebungen direkt bestimmt wird und in Abhängigkeit von den Versagensformen Rückschlüsse auf die Klebfestigkeit von Klebstoffen/Klebebändern oder die Haftfestigkeit von Beschichtungen gezogen werden können. T2 - 13. ThGOT Thementage Grenz- und Oberflächentechnik und 11. Thüringer Biomaterial-Kolloquium CY - Zeulenroda, Germany DA - 13.03.2018 KW - Zentrifugentechnologie KW - Haftfestigkeit KW - Härteprüfung KW - Mehr-Proben-Prüfung KW - Beanspruchung auf Zug und Druck PY - 2018 AN - OPUS4-44570 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe T1 - Ellipsometric imaging of low-contrast surface modifications and depolarization contrast imaging (DCI) of particulate accumulations N2 - Imaging of surfaces regarding topographical, morphological, micro-structural, and chemical features is a key requirement for quality control for the identification of contaminated, degraded, damaged or deliberately modified surface areas vs. clean, virgin, undamaged or unmodified regions. As optical functions may represent any of these changes on the micro- and nano-scale, imaging ellipsometry (IE) is the technique of choice using either intensity, phase, or/and amplitude contrast for visualization of low-contrast surface modifications [1, 2]. Defects or surface and film features whether native or artificial, intended or unintended, avoidable or unavoidable as well as surface pattern are of interest for quality control. In contrast to microscopic techniques operated at normal incidence, ellipsometry as oblique-incidence technique provides improved contrast for vertically nano-scaled add-on or sub-off features such as ultra-thin transparent films, metallic island films, carbon-based thin films, laser modification or laser induced damage, dried stain, cleaning agent or polymeric residue. Two-sample reference techniques, i.e. referenced spectroscopic ellipsometry (RSE) may further increase sensitivity and decrease measurement time. In case of particulate accumulations depolarization contrast imaging (DCI) may improve the lateral resolution beyond the Abbe limit. This has been proven for silica spheres as reference in terms of single particles, particulate accumulations or particulate monolayers and layer stacks. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) were used for reference measurements of particle diameter, particle height, or particulate layer/accumulation thickness. It has been shown that single silica particles of 250 nm in diameter, i.e. at least a factor of 4 better than the lateral resolution limit as of now, can be visualized on even substrates. However, the ellipsometric measurement of particle diameters of this size needs further efforts interpretation. T2 - Workshop Ellipsometry 2018 CY - Chemnitz, Germaný DA - 19.03.2018 KW - Low-contrast surface modifications KW - Particulate distributions KW - Imaging ellipsometry(IE) KW - Depolarization contrast imaging (DCI) PY - 2018 AN - OPUS4-44548 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe T1 - White light interference microscopy, ellipsometry, and instrumented indentation testing as reference procedures N2 - The paper addresses “WHITE LIGHT INTERFERENCE MICROSCOPY, ELLIPSOMETRY, AND INSTRUMENTED INDENTATION TESTING AS REFERENCE PROCEDURES“ and is subdivided in the following sections: 1. Measurement vs. testing vs. reference procedures, 2. White light interference microscopy (WLIM) for determination of step height h, 3. Spectroscopic ellipsometry (SE) for determination of layer thickness d and 4. Instrumented indentation testing (IIT) for determination of indentation hardness HIT. The following points are discussed in more detail: methodology of measurement and testing, uncertainty budgets for direct (WLIM), model-based (SE) and formula-based (IIT) reference procedures by means of specific examples. It is shown that standardization efforts are connected to reference procedures. T2 - Referenzverfahren CY - BAM, Berlin, Germany DA - 21.02.2018 KW - Reference procedures KW - Uncertainty budgets KW - White light interference microscopy KW - Spectroscopic ellipsometry KW - Instrumented indentation testing PY - 2018 AN - OPUS4-44256 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe T1 - Ellipsometrische Klassifizierung von Kohlenstoffschichten N2 - Der Vortrag widmet sich der „ELLIPSOMETRISCHE KLASSIFIZIERUNG VON KOHLENSTOFFSCHICHTEN“ und beschreibt die Punkte: 1. Anwendungen Kohlenstoffschichten–Carbon–based films (DLC) aus dem Vortrag N. Ohtakeet. al. (ISO TC 107, Tokyo 2017),2. Präparation der Kohlenstoffschichten für ISO TC 107 Ringversuch aus Vortrag M. Hiratsuka et. al. (ISO TC 107, Tokyo 2017), 3. Ellipsometrische Charakterisierung von Kohlenstoffschichten, Ergebnisse des Ringversuchs (ISO TC 107, Tokyo 2017) Vortrag Beck et. al. und 4.Deutsche Normungsaktivitäten national/international zur Ellipsometrie DIN NA 062-01-061 (DIN 50989-1)/TC 107 (PWI DE)“ im Einzelnen. T2 - Netzwerksymposium “schützen und Veredeln von Oberflächen”, Wildau CY - TH Wildau, Germany DA - 01.03.2018 KW - Anwendung von Kohlenstoffschichten KW - Klassifizierung von Kohlenstoffschichten KW - Ringversuch Ellipsometrie KW - Normung Ellipsometrie PY - 2018 AN - OPUS4-44340 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe T1 - Characterisation of magnetron sputtered SnZnOx by means of spectroscopic ellipsometry - how can we analyse TCO materials optically? N2 - Transparent conductive oxide (TCO) films are a vital part of a large part of modern technology. The production of TCO materials has sparked much development in plasma coating technology. Quality control measurements of these layers are therefore important in many fields of optics and electronics such as high efficiency thin film photovoltaics. In this presentation, we report on optical measurements of ZnSnOx layers generated by DC/RF magnetron plasma co-sputtering. By changing the respective power on two different targets, the overall power, the gas composition and post-treatment, the properties of this type of layers can be varied in a number of parameters. The optical, electrical, and chemical properties of TCO layers are the technically most important properties together with the layer thickness. The dielectric function of layers is accessible by means of spectroscopic ellipsometry, which also yields the very important value for the layer thickness at the same time. It would be a significant step forward in quality control to use this non-destructive method also as a fast test for electrical properties. Therefore, we report on the optical properties connected to the production parameters, and also on our preliminary results connecting the optical dielectric function (in the visible and near infrared) to the electrical conductivity of the layers. We discuss the effect of deposition parameters on the optical properties of the layers and present an approach for correlating optical and electrical properties. Further, we discuss the question of accuracy of optical properties gained from model-fit-based optical methods and the use of different parameterised models for the dielectric function to achieve this. T2 - PSE 2018 - 16th Conference on Plasma Surface Engineering CY - Garmisch-Partenkirchen, Germany DA - 17.09.2018 KW - Mixed Oxides KW - TCO KW - Quality Control KW - Ellipsometry KW - Optical Constants PY - 2018 AN - OPUS4-46388 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -