TY - JOUR A1 - Unger, Wolfgang A1 - Senoner, Mathias A1 - Wirth, Thomas A1 - Bütefisch, S. A1 - Busch, I. T1 - Lateral resolution delivered by imaging surface-analytical instruments as SIMS, AES and XPS: Application of the BAM-L200 Certified Reference Material and related ISO Standards JF - Journal of Surface Analysis N2 - The certified reference material BAM-L200, a nanoscale stripe pattern for length calibration and specification of lateral resolution, is described. BAM-L200 is prepared from a cross-sectioned epitaxially grown layer stack of AlxGa1-xAs and InxGa1 xAs on a GaAs substrate. The surface of BAM-L200 provides a flat pattern with stripe widths ranging down to 1 nm. Calibration distances, grating periods and stripe widths have been certified by TEM with traceability to the length unit. The combination of gratings, isolated narrow stripes and sharp edges of wide stripes offers a plenty of options for the determination of lateral resolution, sharpness and calibration of length scale at selected settings of imaging surface analytical instruments. The feasibility of the reference material for an analysis of the lateral resolution is demonstrated in detail by evaluation of ToF-SIMS, AES and EDX images. Other applications developed in the community are summarized, too. BAM-L200 fully supports the implementation of the revised International Standard ISO 18516 (in preparation) which is based on knowledge outlined in the Technical Report ISO/TR 19319:2013. KW - Standardization KW - AES KW - XPS KW - SIMS KW - Lateral resolution KW - Certified reference material PY - 2017 SN - 1341-1756 VL - 24 IS - 2 SP - 123 EP - 128 AN - OPUS4-43138 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang T1 - Advanced surface chemical analysis of plasma modified polymers and plasma-polymers N2 - A comprehensive characterization of plasma modified polymer surfaces or plasma-polymerized thin films needs access to parameters as - concentration of saturated/unsaturated carbon species (e.g. aromaticity) or other double bonds as C=N or C=O, - branching, and - losses of crystallinty or other degrees of structural order. Furthermore the complex ageing phenomena of plasma modified polymers/plasma-polymers and the measurement of an in-depth distribution of chemical species are challenges for the analyst. The talk will display selected examples where such challenges have been met by using advanced methods of surface chemical analyses as Photoelectron Spectroscopy with variable excitation energy (“SyncXPS”), X-ray Absorption Spectroscopy (NEXAFS) at C, N and O K-edges and Time-of-Flight Secondary Mass Spectroscopy (ToF-SIMS) combined with Principal Component analysis (PCA). T2 - IAP workshop – IAP 2016 "Organic surface modifications by plasmas and plasma-polymers" CY - Nancy, France DA - 08.06.2016 KW - XPS KW - NEXAFS KW - SIMS KW - Plasmapolymer PY - 2016 AN - OPUS4-36725 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang A1 - Senoner, Mathias A1 - Wirth, Thomas A1 - Bütefisch, S. A1 - Busch, I. A1 - Rossi, A. A1 - Passiu, C. A1 - Spencer, N.D. T1 - Testing lateral resolution and field of view in imaging and small area analysis: reference materials and standardization N2 - The certified reference material BAM-L200, a nanoscale stripe pattern for length calibration and specification of lateral resolution, is described. BAM-L200 is prepared from a cross-sectioned epitaxially grown layer stack of AlxGa1-xAs and InxGa1 xAs on a GaAs substrate. The surface of BAM-L200 provides a flat pattern with stripe widths ranging down to 1 nm. Calibration distances, grating periods and stripe widths have been certified by TEM with traceability to the length unit. The combination of gratings, isolated narrow stripes and sharp edges of wide stripes offers a plenty of options for the determination of lateral resolution, sharpness and calibration of length scale at selected settings of imaging surface analytical instruments. The feasibility of the reference material for an analysis of the lateral resolution is demonstrated in detail by evaluation of ToF-SIMS, AES and EDX images. Other applications developed in the community are summarized, too. BAM-L200 fully supports the implementation of the revised International Standard ISO 18516 (in preparation) which is based on knowledge outlined in the Technical Report ISO/TR 19319:2013. T2 - 7th International Symposium on Practical Surface Analysis(PSA-16) CY - Daejeon, Korea DA - 17.10.2016 KW - BAM L200 KW - SIMS KW - AES KW - XPS PY - 2016 AN - OPUS4-38266 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang A1 - Wirth, Thomas A1 - Senoner, Mathias T1 - Lateral resolution delivered by imaging surface-analytical instruments as SIMS, AES and XPS: Application of the BAM-L200 Certified Reference Material and related ISO Standards N2 - The certified reference material BAM-L200, a nanoscale stripe pattern for length calibration and specification of lateral resolution, is described. BAM-L200 is prepared from a cross-sectioned epitaxially grown layer stack of AlxGa1-xAs and InxGa1-xAs on a GaAs substrate. The surface of BAM-L200 provides a flat pattern with stripe widths ranging down to 1 nm. Calibration distances, grating periods and stripe widths have been certified by TEM with traceability to the length unit. The combination of gratings, isolated narrow stripes and sharp edges of wide stripes offers a plenty of options for the determination of lateral resolution, sharpness and calibration of length scale at selected settings of imaging surface analytical instruments. The feasibility of the reference material for an analysis of the lateral resolution is demonstrated in detail by evaluation of ToF-SIMS, AES and EDX images. Other applications developed in the community are summarized, too. BAM-L200 fully supports the implementation of the revised International Standard ISO 18516 (in preparation) which is based on knowledge outlined in the Technical Report ISO/TR 19319:2013. Fundamental approaches to determination of lateral resolution and sharpness in beam-based methods T2 - SIMS Europe 2016 CY - Münster, Germany DA - 18.09.2016 KW - ISO standards KW - XPS KW - AES KW - SIMS KW - Lateral resolution PY - 2016 AN - OPUS4-37507 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Unger, Wolfgang T1 - Measuring organic layers N2 - Many innovative products - from touchscreens to solar panels to pharmaceuticals – utilise multiple organic layers to create complex functionality. New techniques have been developed to remove and measure layers individually enabling improved product development and assisting with quality assurance. However, manufacturers cannot be certain of the depth of layer being removed and new reference materials for these techniques are needed to increase uptake, and remove a major barrier to innovation. KW - Organic layers KW - XPS KW - SIMS PY - 2016 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-388656 UR - http://www.euramet.org/metrology-for-societys-challenges/metrology-for-industry/impact-case-studies-emrp-industry-theme/ SP - 1 EP - 2 CY - Teddington AN - OPUS4-38865 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang T1 - Acquiring and Documenting Reproducible Spectra, Depth Profiles and Images: XPS, AES and SIMS N2 - In this talk sample prep/handling, instrument calibration and data acquisition methods with examples from XPS, Auger and SIMS will be addressed in terms of their contributions to the reproducibility of data delivered by the methods. Active parties in the field are VAMAS TWA 2 “Surface chemical analysis” (http://www.vamas.org/twa2/index.html), ISO/TC 201 “Surface chemical analysis” (https://www.iso.org/committee/54618.html) and the Surface Analysis Working Group (SAWG) at the International Meter Convention (https://www.bipm.org/en/ committees/cc/wg/sawg.html). The tools to improve the reproducibility of spectra, depth profiles and images at these international platforms are inter-laboratory comparisons, validated SOPs, standards and certified reference materials (CRM) as well as uncertainty budgets and establishment of traceability chains. The last point is of specific importance because all the methods, XPS, Auger and SIMS, are not primary methods. To address quantitative XPS, AES and SIMS results of relevant inter-laboratory comparisons organized by SAWG considering measurands as alloy surface composition and thickness of thin films will be introduced. These comparisons delivered results which are viewed to be benchmarking, some of them resulted in ISO/TC 201 standards. For quantitative XPS and AES the principal outline of an uncertainty budget will be discussed together with the audience. Another issue of quantitative XPS which definitely needs consideration are valid methods for a determination of the transmission function of the instruments and even for the emission angle in the respective experiments. Concerning the field of depth profiling it has to be investigated together with the audience whether the ISO (or ASTM) standards we have are sufficient to guarantee comparable results. Having in mind the number of different sputter ion species available today and range of samples of interest (metals, semiconductors, organic films) this might be questionable. And, how do depth profiling by AR-XPS and variable excitation energy XPS compete here? For imaging surface chemical analysis, the characterization of the imaging system is an issue to be investigated. Here the determination of lateral resolution is a relevant topic. Finally, the future needs to develop metrology for new applications e.g., ambient-pressure XPS, bio samples, and core-shell nanoparticles, will be issues raised for a discussion with the audience. T2 - 17th Topical Conference on Quantitative Surface Analysis (QSA 17) CY - Long Beach, CA, USA DA - 21.10.2018 KW - Depth Profiles and Images KW - X-ray Photoelectron Spectroscopy (XPS) KW - Auger Electron Spectroscopy (AES) KW - SIMS KW - Reproducible Spectra PY - 2018 AN - OPUS4-46470 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Stephan-Scherb, Christiane A1 - Falk, Florian A1 - Lehmusto, J. A1 - Sobol, Oded A1 - Pint, B. T1 - Elucidation of competitive oxidation/sulfidation reactions on binary ferritic alloys N2 - Ferritic-austenitic chromia-forming alloys are frequently used as boiler tubes and heat exchanger materials for fossil-,biomass, and co-fired power plants. In all applied environments several strongly corrosive gaseous species such as CO2, SO2, SO3, H2O, O2 exist, causing materials degradation by high-temperature corrosion. The elucidation of degradation mechanisms introduced by multiple gases is challenging due to the presence of different oxidizing agents contributing to the competing reactions for oxidation, sulfurization or carburization. The degradation processes can be divided into initial stages, a transitional stage and the further proceeding steady-state oxidation reaction. Especially the long-term steady-state oxidation and further materials’ life-time are strongly dependent on the initial stages. The adsorption and absorption of the reactive species at the alloy surface and the growing oxide in the initial reaction is further influenced by dissociation and re-reactions of the gas phase molecules. To understand these mechanisms from a fundamental point of view in more detail, dedicated experiments and advanced characterization techniques on various length scale need to be applied. Real-time approaches using highly energetic synchrotron X-ray diffraction showed a high potential to enlighten competitively mechanisms by following the corrosion reactions in-situ in the environment they occur. Despite various other thin film characterization techniques, time of flight secondary ion mass spectroscopy (ToF-SIMS) is a powerful tool to visualize light atoms or labeled isotopes enabling the Differentiation between different oxidizing species. It was especially shown to be applicable in challenging atmospheres containing KCl deposits or in CO/CO2/O2 environments. The present study analyses the competing oxidation/sulfidation process in a humid atmosphere on two ferritic alloys with 2 and 9 % in weight chromium by in situ energy dispersive X-ray diffraction (EDXRD) and comparative tube furnace exposure using S16O2 and H2 18O atmosphere. T2 - Conference on High Temperature Corrosion and Protection of Materials HTCPM 2021 CY - Online Meeting DA - 29.03.2021 KW - Oxidation KW - High Temperature Corrosion KW - Ferritic Alloys KW - SIMS KW - EDXRD PY - 2021 AN - OPUS4-52363 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Kuhmann, J. F. A1 - Chiang, C. H. A1 - Harde, P. A1 - Reier, F. A1 - Österle, Werner A1 - Urban, Ingrid A1 - Klein, A. T1 - Pt thin-film metallization for FC-bonding using SnPb60/40 solder bump metallurgy JF - Materials Science and Engineering N2 - Platinum does not form any adherent oxides and can be easily wetted by tin-based solders. Platinum is also an available metallization in semiconductor laboratories. Therefore we investigated the diffusion of platinum thin-film metallizations into eutectic tin–lead solder by using a high-resolution secondary ion mass spectroscopy (SIMS) profiling from the back side. It is shown that an intermetallic phase (PtSn4) is formed during soldering, which controls the consumption of platinum during soldering and in operation. The consumption of platinum follows the well-known parabolic diffusion law. The activation energy of this process is 0.63 eV. Even at extended heating cycles of 2 min at 250°C, 190 nm from the original 300 nm of the platinum film remain undissolved. This high stability makes platinum a very attractive thin-film metallization for flip-chip (FC) bonding of new microsystems. KW - Pt thin film metallization KW - FC solder bonding KW - Diffusion KW - SIMS PY - 1998 SN - 0921-5093 VL - A242 SP - 22 EP - 25 PB - Elsevier AN - OPUS4-38540 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Holzweber, Markus A1 - Nietzold, Carolin A1 - Dietrich, Paul A1 - Lippitz, Andreas A1 - Kamalakumar, A. A1 - Ivanov-Pankov, S. A1 - Blanchard, V. A1 - Weigel, W. A1 - Panne, Ulrich A1 - Unger, Wolfgang T1 - Surface chemical characterization and shelf life studies of reference glycan microarrays using ToF-SIMS, XPS and fluorescence spectroscopy N2 - Covalent modification of surfaces with carbohydrates (glycans) is a prerequisite for a variety of glycomics-based biomedical applications, including functional biomaterials, glycan-arrays, and glycan-based biosensors. The chemistry of glycan immobilization plays an essential role in the bioavailability and function of surface bound carbohydrate moieties. For biomedical applications the stability over time (shelf life) of a glycan-array is a crucial factor. Basic requirements for the production of microarrays are first of all stable signals without any loss of quality. Therefore, the investigation of the shelf life for carbohydrate microarrays is an important part in the development of glycan-arrays. Motivated by the need of reliable quality control for glycan microarrays, we developed reference arrays using fluorescent model glycans. Since the long term stability of glycan microarrays is a crucial factor for their clinical application the shelf life at different storage conditions of glycan microarrays was studied in detail using the two model glycan compounds. Herein, we present a shelf life study of model glycan microarrays on epoxy modified glass surfaces over a period of 320 days. This was carried out using different analyzing techniques such as Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS), X-ray Photoelectron Spectroscopy (XPS) and Fluorescence Spectroscopy. To analyze and interpret the ToF-SIMS dataset the multivariate technique principal component analysis (PCA) was used. The dependence of the array´s shelf life upon storage conditions was specifically studied. T2 - SIMS Europe 2016 CY - Münster, Germany DA - 18.9.2016 KW - Glycan microarray KW - XPS KW - SIMS KW - Fluorescence spectroscopy PY - 2016 AN - OPUS4-37638 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hodoroaba, Vasile-Dan A1 - Sachse, René A1 - Matjacic, L. A1 - McMahon, G. A1 - Hertwig, Andreas A1 - Kraehnert, R. T1 - Correlative analysis of mesoporous thin IrOx-TiOx mixed oxide films for understanding the impact of synthesis conditions N2 - Porous materials play an important role in several fields of technology, especially for energy applications like photovoltaics, electrolysis or batteries. The activity of thin porous films is affected by properties like porosity, film thickness, chemical composition of the material as well as the homogenous dispersion of the active species within the porous matrix. The complex morphology of such porous films constitutes a challenge even for modern analytical techniques and requires new approaches employing the combination/complementation of data of different analytical methods. In this contribution we characterize thin mesoporous iridium-titanium mixed oxide film properties by complementary analysis of SEM/EDS, ToF-SIMS, NanoSIMS, AES and spectroscopic ellipsometry. Mesoporous iridium oxide - titanium oxide (IrOx-TiOx) films can be prepared by a well-established Synthesis route via soft-templating. IrOx-TiOx films are very sensitive to the conditions of synthesis. Analysis by SEM and NanoSIMS imaging suggests IrOx-TiOx films with and without a homogenous dispersion of IrOx within the TiOx film matrix under different synthesis conditions. Auger electron spectroscopy (AES) analysis in the depth-profile mode as well as cross-section line-scan AES measurements of an inhomogeneous IrOx-TiOx film indicate the presence of an IrOx-rich Phase dispersion both at the surface of IrOx-TiOx film as well as within the film. The contribution will assess in detail the sensitivity of the synthesis conditions and the characterization of the thin metal oxide films. Moreover, the correlation between and comparison to other measurement techniques will be discussed. T2 - European Conference on Applications of Surface and Interface Analysis ECASIA 2019 CY - Dresden, Germany DA - 15.09.2019 KW - Mesoporous films KW - Iridium oxide KW - SIMS KW - SEM/EDS KW - Titanium dioxide KW - Ellipsometry KW - Auger Electron Spectroscopy PY - 2019 AN - OPUS4-49234 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -