TY - JOUR A1 - Dietrich, Paul A1 - Nietzold, Carolin A1 - Weise, Matthias A1 - Unger, Wolfgang A1 - Alnabulsi, Saad A1 - Moulder, John T1 - XPS depth profiling of an ultrathin bioorganic film with an argon gas cluster ion beam N2 - The growing interest in artificial bioorganic Interfaces as a platform for applications in emerging Areas as personalized medicine, clinical diagnostics, biosensing, biofilms, prevention of biofouling, and other fields of bioengineering is the origin of a need for in Detail multitechnique characterizations of such layers and interfaces. The in-depth analysis of biointerfaces is of special interest as the properties of functional bioorganic coatings can be dramatically affected by in-depth variations of composition. In worst cases, the functionality of a device produced using such coatings can be substantially reduced or even fully lost. KW - XPS KW - Ar gas cluster gun KW - Depth profiling KW - Bioorganic film PY - 2016 UR - http://scitation.aip.org/content/avs/journal/bip/11/2/10.1116/1.4948341 DO - https://doi.org/10.1116/1.4948341 SN - 1934-8630 VL - 11 IS - 2 SP - 029603-1 EP - 029603-5 PB - American Vacuum Society CY - New York AN - OPUS4-36218 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang T1 - Metrology for spatially resolved chemical analysis at the micro and nanometre scales N2 - CCQM has established a framework of comparisons to demonstrate the international comparability of chemical measurements. The key point is the establishment of comparable measurements, with traceability to internationally or nationally stated references. The Surface Analysis Working Group (SAWG) has been formally founded in 2003. CCQM ratified the group as a full working group of CCQM in April 2003 with these terms of reference: - to develop pilot studies and carry out key comparisons of national measurement standards for surface and micro/nano-analysis; - to assist in identifying and establishing inter-laboratory work to improve the traceability of surface and micro/nano-analysis; - to establish and update a work plan to be adopted by CCQM; - to discuss and review the scope of the working group and to liase with other working groups related to nanotechnology. Following the 2015 meeting of the CCQM, the pilot study CCQM-P130 “WD and ED Electron Probe Micro Analysis on Au-Cu alloys” lead by BAM&NIST has been finalized. The Key Comparison K-129 “Measurement of atomic fractions in Cu(In,Ga)Se2 Films” lead by KRISS has made substantial progress and is about to be finalized. The new Key Comparison K-136 on “BET specific surface of ” lead by UNIIM&BAM has made strong progress in 2015 and will be finished in 2016. T2 - 22nd Meeting of CCQM CY - Sevres, France DA - 21.4.16 KW - Surface chemical analysis KW - Metrology PY - 2016 AN - OPUS4-35865 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang T1 - 2-D materials standardization N2 - The implementation of new 2-D materials based technologies in production processes requires the development of quality management tools. These have to be underpinned by appropriate measurements. Consequently there is a need for the development of the metrology for measurement methods, the development of certified reference materials (CRM) and finally standardization. This chain represents the ideal way to practically useful standards. The presentation will give an overview on the main players in the field and summarize the recent status of activities. At the highest level the metrology of chemical characterization of 2D materials is in the scope of the International Meter Convention, specifically the Consultative Committee for Amount of Substance: Metrology in Chemistry and Biology (CCQM). Pre-standardization is an activity field of the Versailles Project on Advanced Materials and Standards (VAMAS). Standardization is mainly addressed by addressed ISO Technical Committees. A summary on available CRMs relevant to the characterization of nano materials has been prepared by BAM. Examples from the work of BAM’s Division 6.1 “Surface Analysis and Interfacial Chemistry” showcasing the characterization of chemically modified graphene surfaces are given and specific needs for the development of metrology are addressed. In the discussion the audience is invited to define specific needs which will be streamlined to the respective bodies! T2 - Science-Industry-Workshop 2D Materials CY - EMPA Akademie, Dübendorf, Switzerland DA - 21.3.16 KW - Standardization KW - Graphene PY - 2016 AN - OPUS4-35866 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Dietrich, Paul A1 - Glamsch, Stephan A1 - Ehlert, Christopher A1 - Lippitz, Andreas A1 - Kulak, N. A1 - Unger, Wolfgang T1 - Synchrotron-radiation XPS analysis of ultra-thin silane films: Specifying the organic silicon N2 - The analysis of chemical and elemental in-depth variations in ultra-thin organic layers with thicknesses below 5 nm is very challenging. Energy- and angle-resolved XPS (ER/AR-XPS) opens up the possibility for non-destructive chemical ultra-shallow depth profiling of the outermost surface layer of ultra-thin organic films due to its exceptional surface sensitivity. For common organic materials a reliable chemical in-depth analysis with a lower limit of the XPS information depth z95 of about 1 nm can be performed. As a proof-of-principle example with relevance for industrial applications the ER/AR-XPS analysis of different organic monolayers made of amino- or benzamidosilane molecules on silicon oxide surfaces is presented. It is demonstrated how to use the Si 2p core-level region to non-destructively depth-profile the organic (silane monolayer) – inorganic (SiO2/Si) interface and how to quantify Si species, ranging from elemental silicon over native silicon oxide to the silane itself. The main advantage of the applied ER/AR-XPS method is the improved specification of organic from inorganic silicon components in Si 2p core-level spectra with exceptional low uncertainties compared to conventional laboratory XPS. KW - Synchrotron radiation XPS KW - Depth profiling KW - Silanes KW - Monolayer KW - Amines KW - Amides PY - 2016 DO - https://doi.org/10.1016/j.apsusc.2015.12.052 SN - 0169-4332 SN - 1873-5584 VL - 363 SP - 406 EP - 411 PB - Elsevier B.V. CY - Amsterdam AN - OPUS4-35262 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Stockmann, Jörg M. A1 - Senoner, Mathias A1 - Weimann, T. A1 - Bütefisch, S. A1 - Passiu, C. A1 - Spencer, N. D. A1 - Rossi, A. T1 - Introduction to lateral resolution and analysis area measurements in XPS N2 - Imaging and small-spot (small area) XPS have become increasingly important components of surface chemical analysis during the last three decades, and its use is growing. Some ambiguity in the use of terminology, understanding of concepts, and lack of appropriate reference materials leads to confusing and not always reproducible data. In this paper, it is shown that by using existing knowledge, appropriate test specimens, and standardized approaches, problems of comparability and such reproducibility issues recently observed for XPS data reported in the scientific literature can be overcome. The standardized methods of ISO 18516:2019, (i) the straight-edge, (ii) the narrow-line, and (iii) the grating method, can be used to characterize and compare the lateral resolution achieved by imaging XPS instruments and are described by reporting examples. The respective measurements are made using new test specimens. When running an XPS instrument in the small-spot (small area) mode for a quantitative analysis of a feature of interest, the question arises as to what contribution to the intensity originates from outside the analysis area. A valid measurement approach to control the intensity from outside the nominal analysis area is also described. As always, the relevant resolution depends on the specific question that needs to be addressed. The strengths and limitations of methods defining resolution are indicated. KW - Imaging XPS KW - Lateral resolution KW - Analysis area measurements KW - Small-spot XPS PY - 2020 DO - https://doi.org/10.1116/6.0000398 VL - 38 IS - 5 SP - 053206 AN - OPUS4-51394 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Senoner, M. A1 - Stockmann, Jörg Manfred A1 - Fernandez, V. A1 - Fairley, N. A1 - Passiu, C. A1 - Spencer, N. D. A1 - Rossi, A. T1 - Summary of ISO/TC 201 International Standard ISO 18516:2019 Surface chemical analysis - Determination of lateral resolution and sharpness in beam-based methods with a range from nanometres to micrometres and its implementation for imaging laboratory X-ray photoelectron spectrometers (XPS) N2 - ISO 18516:2019 Surface chemical analysis—Determination of lateral resolution and sharpness in beam-based methods with a range from nanometres to micrometres revises ISO 18516:2006 Surface chemical analysis—Auger electron spectroscopy and X-ray photoelectron spectroscopy—Determination of lateral resolution. It implements three different methods delivering parameters useful to express the lateral resolution: (1) the straight edge method, (2) the narrow line method and (3) the grating method. The theoretical background of these methods is introduced in ISO/TR 19319:2013 Surface chemical analysis—Fundamental approaches to determination of lateral resolution and sharpness in beam-based methods. The revised International Standard ISO 18516 delivers standardized procedures for the determination of the (1) effective lateral resolution by imaging of square-wave gratings, the (2) lateral resolution expressed as the parameter D12–88 characterizing the steepness of the sigmoidal edge spread function (ESF) determined by imaging a straight edge and (3) the lateral resolution expressed as the full width of half maximum of the line spread function (LSF), wLSF, determined by imaging a narrow line. The last method also delivers information on the shape of the LSF, which characterizes an individual imaging instrument. Finally, the implementation of all three standardized methods in the field of imaging laboratory X-ray photoelectron spectroscopy (XPS) is shortly presented. This part of the letter is based on the use of a new test sample developed at ETH Zurich, Switzerland. This test sample displays a micrometre scaled pattern motivated by the resolving power of recent imaging XPS instruments. KW - Grating method KW - Imaging AES KW - Imaging SIMS KW - Imaging XPS KW - Lateral resolution KW - Narrow line method KW - Noise in image KW - Resolution criterion KW - Straight edge method PY - 2021 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-536330 DO - https://doi.org/10.1002/sia.7025 SN - 1096-9918 VL - 54 IS - 4 SP - 320 EP - 327 PB - Wiley CY - Chichester AN - OPUS4-53633 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang T1 - Improved quantitative XRF analysis of industrial thin film samples by calibration using thin film RMs certified by reference-free XRF enabling traceability to the SI N2 - Reference-free XRF is a SI traceable technique for the determination of the mass deposition (mass per unit area) of elements in films on the nano- and micro scale. The method is radiometrically calibrated instrumentation (PTB@BESSY II, Germany) and based on reliable knowledge of all relevant atomic fundamental, experimental and instrumental parameters. No calibration sample or reference materials are necessary. The approach had been validated in the CCQM-P140 pilot study and the K129 key comparison by determination of mole fractions in Cu(In,Ga)Se2 thin films. T2 - Annual Meeting of ISO TC 201 SC 10 XRR/XRF CY - Seoul, Korea DA - 12.10.2016 KW - Reference-free XRF KW - CIGS thin films PY - 2016 AN - OPUS4-38265 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang T1 - Testing lateral resolution and field of view in imaging and small area analysis: reference materials and standardization N2 - The certified reference material BAM-L200, a nanoscale stripe pattern for length calibration and specification of lateral resolution, is described. BAM-L200 is prepared from a cross-sectioned epitaxially grown layer stack of AlxGa1-xAs and InxGa1 xAs on a GaAs substrate. The surface of BAM-L200 provides a flat pattern with stripe widths ranging down to 1 nm. Calibration distances, grating periods and stripe widths have been certified by TEM with traceability to the length unit. The combination of gratings, isolated narrow stripes and sharp edges of wide stripes offers a plenty of options for the determination of lateral resolution, sharpness and calibration of length scale at selected settings of imaging surface analytical instruments. The feasibility of the reference material for an analysis of the lateral resolution is demonstrated in detail by evaluation of ToF-SIMS, AES and EDX images. Other applications developed in the community are summarized, too. BAM-L200 fully supports the implementation of the revised International Standard ISO 18516 (in preparation) which is based on knowledge outlined in the Technical Report ISO/TR 19319:2013. T2 - 7th International Symposium on Practical Surface Analysis(PSA-16) CY - Daejeon, Korea DA - 17.10.2016 KW - BAM L200 KW - SIMS KW - AES KW - XPS PY - 2016 AN - OPUS4-38266 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Schwarz, F. A1 - Heinrich, Thomas A1 - Kaufmann, J. O. A1 - Lippitz, Andreas A1 - Puttreddy, R. A1 - Rissanen, K. A1 - Schalley, C. A. T1 - Photocontrolled on-surface pseudorotaxane formation with well-ordered macrocycle multilayers N2 - The photoinduced pseudorotaxane formation between a photoresponsive axle and a tetralactam macrocycle was investigated in solution and on glass surfaces with immobilized multilayers of macrocycles. In the course of this reaction, a novel photoswitchable binding station with azobenzene as the photoswitchable unit and diketopiperazine as the binding station was synthesized and studied by NMR and UV/Vis spectroscopy. Glass surfaces have been functionalized with pyridine-terminated SAMs and subsequently withmultilayers of macrocycles through layer-by-layer self assembly. A preferred orientation of the macrocycles could be confirmed by NEXAFS spectroscopy. The photocontrolled Deposition of the axle into the surface-bound macrocycle-multilayers was monitored by UV/Vis spectroscopy and led to an increase of the molecular order, as indicated by more substantial linear dichroism effects in angle-resolved NEXAFS spectra. KW - Well-ordered macrocycle multilayers KW - XPS KW - NEXAFS PY - 2016 DO - https://doi.org/10.1002/chem.201603156 SN - 0947-6539 SN - 1521-3765 VL - 22 IS - 40 SP - 14383 EP - 14389 PB - Wiley-VCH Verlag GmbH & Co. KGaA CY - Weinheim AN - OPUS4-38270 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Pelster, A. A1 - Tyler, B.J. A1 - Kösgen, M. A1 - Kassenböhmer, R. A1 - Peterson, R.E. A1 - Stöver, M. A1 - Arlinghaus, H. F. T1 - Improved 3D-imaging of a sirolimus/probucol eluting stent coating using laser postionization secondary neutral mass spectrometry and time-of-flight secondary ion mass spectrometry N2 - Implantable drug delivery systems that provide controlled and sustained release of a therapeutic agent are used in a wide variety of applications. Drug eluting stents, which are used to treat coronary artery disease, are among the most widespread of these devices, with an estimated 3x10⁶ implants annually worldwide. Controlling the rate of drug release from these devices relies on precise control of the three dimensional (3D)-distribution of the drug, so methods for measuring this distribution are of great importance. The aims of this work were to determine how 3D-imaging of polymer-free sirolimus/probucol drug eluting stent coatings could be improved through the use of laser postionization secondary neutral mass spectrometry (Laser- SNMS) and Ar cluster sputtering with time-of-flight secondary ion mass spectrometry (ToF-SIMS) and to optimize conditions for this analysis. In this study, 3D-imaging of a sirolimus/probucol dual drug eluting stent has been investigated using Laser-SNMS and ToF-SIMS. Laser-SNMS studies of pure sirolimus and probucol were undertaken using 30 keV Bi₃⁺ primary Ions and a 157 nm excimer postionization laser. Under optimal conditions, a greater than 100-fold increase in detected ion yield was observed for Laser-SNMS when compared to ToF-SIMS, although ToF-SIMS provided equal or greater yields for higher mass characteristic ions. Although the optimal laser power density for detecting probucol (5x10⁶W/cm²) was significantly lower than the optimum for sirolimus(7x10⁷W/cm²), an intermediate laser power density of 1x10⁷W/cm² was sufficient to allow imaging of both drugs. Using individual selected ion signals, ToF-SIMS and Laser-SNMS produced similar images of the two drug species. When using, however, a multivariate approach (Maximum autocorrelation factors), Laser-SNMS provided significant improvements in image contrast and small area detection when compared to ToF-SIMS. Following optimization of the technique, 3D-images of the dual drug eluting stent coating were obtained using 10 keV Ar₂₀₀₀⁺ cluster ions for sputtering and 30 keV Bi₃⁺ cluster ions for Analysis for both ToF-SIMS and Laser-SNMS. This work demonstrates the advantages of Laser-SNMS for 3D-imaging of pharmaceutical devices, which has not been previously published. Both ToF-SIMS and Laser-SNMS revealed that the outermost surface of the drug eluting coating contained pure sirolimus to a depth of a few tens of nanometers, with a few channels of sirolimus extending to a depth of around 1 lm. Below about 1 lm, the two drugs were uniformly mixed. Using the 10 keV Ar₂₀₀₀⁺ sputter beam, the authors were able to sputter through the complete drug coating (~6 μm) without observing any accumulated damage in the organic layer. The two techniques showed complementary strengths: ToF-SIMS offers faster data collection and better detected ion yield for larger characteristic ions than Laser-SNMS, and Laser-SNMS offers significantly enhanced detected ion yield for smaller fragment ions, allowing for improved Image contrast and Resolution of smaller features. KW - Imaging ToF SIMS KW - Eluting stent PY - 2016 DO - https://doi.org/10.1116/1.4964687 SN - 1934-8630 SN - 1559-4106 VL - 11 IS - 4 SP - 041001-1 EP - 041001-10 PB - AVS: Science & Technology of Materials, Interfaces, and Processing AN - OPUS4-38272 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -