TY - JOUR A1 - Dietrich, Paul A1 - Unger, Wolfgang T1 - Summary of ISO/TC 201 technical report: ISO/TR 19693 surface chemical analysis—characterization of functional glass substrates for biosensing applications JF - Surface and Interface Analysis N2 - ISO/TR 19693:2018—Surface chemical analysis—Characterization of functional glass substrates for biosensing applications gives an overview of methods, strategies, and guidance to identify possible sources of problems related to substrates, device production steps (cleaning, activation, and chemical modification), and shelf life (storage conditions and aging). It is particularly relevant for surface chemical analysts characterizing glass‐based biosensors, and developers or quality managers in the biosensing device production community. Based on quantitative and qualitative surface chemical analysis, strategies for identifying the cause of poor Performance during device manufacturing can be developed and implemented. A review of measurement capabilities of surface analytical methods is given to assist readers from the biosensing community. KW - Bio sensing device KW - Surface chemical analysis KW - XPS KW - SIMS KW - Standardization PY - 2018 DO - https://doi.org/10.1002/sia.6481 SN - 0142-2421 SN - 1096-9918 VL - 50 IS - 8 SP - 835 EP - 838 PB - John Wiley & Sons, Ltd. AN - OPUS4-45829 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Schaepe, Kaija A1 - Jungnickel, H. A1 - Heinrich, Thomas A1 - Tentschert, J. A1 - Luch, A. A1 - Unger, Wolfgang ED - Hodoroaba, Vasile-Dan ED - Unger, Wolfgang ED - Shard, A. G. T1 - Secondary ion mass spectrometry T2 - Characterization of nanoparticles - Measurement processes for nanoparticles N2 - This chapter provides an introduction in secondary ion mass spectrometry as one of the leading surface chemical analysis and imaging techniques with molecular specificity in the field of material sciences. The physical basics of the technique are explained along with a description of the typical instrumental setups and their modes of operation. The application paragraph specifically focuses on nanoparticle analysis by SIMS in terms of surface spectrometry, imaging, analysis in organic and complex media, and depth profiling. A review of the existing literature is provided, and selected studies are showcased. Limitations and pitfalls as well as current technical developments of SIMS application in nanoparticle surface chemical analysis are equally discussed. KW - Time-of-flight secondary ion mass spectrometry KW - Surface chemical analysis KW - Imaging KW - Nanomaterials KW - Nanoparticles KW - Core-shell PY - 2020 SN - 978-0-12-814182-3 DO - https://doi.org/10.1016/B978-0-12-814182-3.00025-0 SP - 481 EP - 509 PB - Elsevier CY - Amsterdam AN - OPUS4-50187 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang T1 - Metrology for spatially resolved chemical analysis at the micro and nanometre scales Surface Analysis Working Group (SAWG) - Report for 16th Meeting (2017/18) N2 - Following the 2017 meeting, progress with the Key Comparison CCQM-K153 related to the BET specific surface lead by UNIIM and the Pilot Study P-190 “Thickness Measurement of nm HfO2 Films” lead by KRISS will be discussed. The 16th meeting of SAWG will focus on •survey on CMC claims submitted with reference to K-129 and K-136. •the overall and SAWG specific aspects of the CCQM Strategy process, •a consideration of comparisons on convention methods as recommended by the CCQM Plenary Meeting 2017, •the 2019 CCQM Workshop and paper(s) for Metrologia’s Special Issue, •discussion of future comparisons. T2 - 24th meeting of the CCQM 2018 CY - Paris, France DA - 19.04.2018 KW - Surface chemical analysis KW - Metrology KW - Inter-laboratory comparisons PY - 2018 AN - OPUS4-44998 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang T1 - Metrology for spatially resolved chemical analysis at the micro and nanometre scales Surface Analysis Working Group (SAWG) - Report for 17th Meeting (2018/19) N2 - The SAWG was established as an ad-hoc working group in 2003 before being established as a permanent working group. The first comparison was in 2007. Dr Unger recalled the terms of reference for the group, which paralleled those of the CCQM itself, with a focus on spatially resolved chemical surface analysis at the micro- and nano-scale. The group also had a remit to act as a forum for exchange of information on research and development of surface analysis, establish contact with relevant stakeholders and promote the development of SI traceable chemical surface measurements. The group currently had participants from 18 institutes, although five had not sent participants to recent meetings. Reporting progress on studies, Dr Unger said that P-190CCQM-K-157 (measurement of HfO2 in thin film) had been completed, and the subsequent K-157 approved is ongoing and that for CCQM-K153 (Measurement of Specific Adsorption of N2 and Kr on nonporous SiO2 at liquid nitrogen temperature by BET) was at the draft B was completed stageand distributed to CCQM WG chairpersons for approval. Dr Unger reported that CCQM-K-153 had covered measurement of specific absorption of nitrogen or krypton on nonporous silica at liquid nitrogen [ambient] temperature. This included an application of the BET method, a standard method for determination of surface area. This fitted into the ‘nonporous’ region of the SAWG measurement space, which included microporous, mesoporous and microporous regions. Of these regions, CCQM-K136 and CCQM-K153 demonstrated capability in meso- and microporous media respectively. CCQM-K153 involved two measurands; amount of absorbed gas at liquid nitrogen temperature, expressed as specific absorption, and the BET surface area. Specific absorption could in principle be traceable to the SI; BET was operationally defined. Five institutes participated. A detailed uncertainty budget was available for both measurands. Results had been excellent, with all laboratories agreeing well within their uncertainties and all in agreement with the reference value. Reporting on CCQM P190, Dr Unger described the study objective measurand (amount of substance of HfO2 in a thin film), samples and methods. After showing transmission electron microscope images obtained in the study, he briefly reviewed the conclusions. The study identified a need to handle carbon contamination, harmonise the XPS measurement protocol, determine emission angle and identify a consensus value for attenuation length. These conclusions had informed the design of the proposed ongoing K157 study approved at the 24th Meeting of te CCQM. The group planned a number of comparisons for the next three years: 2019: A pilot study on the amount of substance in a thin organic layer (previously approved). 2020: CCQMK-157, Measurement of the amount of substance of HfO2; A Key comparison on specific gas adsorption on microporous samples and a Pilot study on Homogeneous surface composition of an ionic liquid. 2021: A key comparison measuring the amount of substance in a thin organic layer. Dr Unger additionally described a recently proposed pilot study to examine chemical composition in a deep nanoscale layer. This was important for the electronics industry. Four participants had expressed interest. The measurand will be the amount of Ir(ppy)2(acac) in a thin organic layer within an organic layer stack on a silicon substrate. He also reported that SAWG had started work on characterisation of graphene material grown by chemical vapour decomposition (CVD). The work would examine coverage on the substrate, number of layers, level of disorder, uncertainty budgets associated with the measurement, and data analysis. A link to VAMAS Technical Work Area 41 “Graphene and Related 2D Materials“ would also be established. Looking forward, Dr Unger said the group had established a task group on application of Raman spectroscopy. This had important applications but was currently seen as qualitative. He presented the terms of reference for the task group for approval by the CCQM. Dr Unger reviewed the SAWG activities that have progressed the state of the art in measurement science. He listed the past and ongoing comparisons that had addressed new and challenging measurement problems, and drew attention to a number of key publications in surface analysis. He additionally described stakeholder engagement activities, including collaboration with VAMAS, input to ISO TC 201, contributions to Euramet projects, and contributions to two recent stakeholder workshops. T2 - 25th meeting of the Consultative Committee for Amount of Substance: Metrology in Chemistry and Biology (CCQM) CY - Paris, France DA - 11.04.2019 KW - Surface chemical analysis KW - Metrology KW - International Meter Convention PY - 2019 AN - OPUS4-48020 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Unger, Wolfgang A1 - Wirth, Thomas A1 - Hodoroaba, Vasile-Dan ED - Hodoroaba, Vasile-Dan ED - Unger, Wolfgang ED - Shard, A. G. T1 - Auger electron spectroscopy T2 - Characterization of nanoparticles - Measurement processes for nanoparticles N2 - An introduction in the application of Auger Electron Spectroscopy to surface chemical analysis of nanoparticles is given. Auger Electron Spectroscopy is a mature method in the field of surface chemical analysis. The chapter addresses the physical basis of the method, the principal design of recent instruments together with modes of operation and options for the presentation of spectra, as well as different approaches for qualitative (including identification of chemical species) and quantitative surface analysis of elements. An application paragraph on surface chemical analysis of nanoparticles by AES or SAM introduces the different measurement approaches and sample preparation strategies applied by analysts. The analysis of nanoparticle ensembles, the so-called selected point analysis where a narrow primary electron beam is centered on an individual nanoparticle, and chemical mapping of individual nanoparticles (or a line scan across) are addressed. Existing literature is reviewed and informative case studies presented. Limitations and pitfalls in the application of AES in surface chemical analysis of nanoparticles are also addressed. KW - Auger Electron Spectroscopy KW - Surface chemical analysis KW - Imaging surface chemical analysis KW - Nanoparticles KW - Nanotechnology PY - 2020 SN - 978-0-12-814182-3 DO - https://doi.org/10.1016/B978-0-12-814182-3.00020-1 SP - 373 EP - 395 PB - Elsevier CY - Amsterdam AN - OPUS4-50119 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -