TY - JOUR A1 - Donėlienė, J. A1 - Rudzikas, M. A1 - Rades, Steffi A1 - Dörfel, Ilona A1 - Peplinski, Burkhard A1 - Sahre, Mario A1 - Pellegrino, F. A1 - Maurino, V. A1 - Ulbikas, J. A1 - Galdikas, A. A1 - Hodoroaba, Vasile-Dan T1 - Electron Microscopy and X-Ray Diffraction Analysis of Titanium Oxide Nanoparticles Synthesized by Pulsed Laser Ablation in Liquid N2 - A femto-second pulsed laser ablation in liquid (PLAL) procedure for the generation of titanium oxide nanoparticles (NP) is reported with the purpose of understanding morphology and structure of the newly generated NPs. Ablation duration was varied for optimization of NP generation processes between 10 and 90 min. Surface morphology of NPs as well as their size and shape (distribution) were analysed by various complementary electron microscopy techniques, i.e. SEM, TSEM and TEM. The crystalline structure of titanium oxide particles was investigated by XRD(two instruments operated in different geometries) and HR-TEM. Concentration of generated titanium oxide NPs in liquid was analysed by ICP-MS. A mix of crystalline (mainly anatase), partly crystalline and amorphous spherical titanium oxide NPs can be reported having a mean size between 10 and 20 nm, which is rather independent of the laser ablation (LA) duration. A second component consisting of irregularly shaped, but crystalline titanium oxide nanostructures is co-generated in the LA water, with more pronounced occurrence at longer LA times. The provenance of this component is assigned to those spherical particles generated in suspension and passing through the converging laser beam, being hence subject to secondary irradiation effects, e. g. fragmentation. KW - Laser ablation in liquid KW - Nanoparticles KW - Titanium oxide KW - Particle morphology PY - 2018 UR - https://www.cambridge.org/core/journals/microscopy-and-microanalysis/article/electron-microscopy-and-xray-diffraction-analysis-of-titanium-oxide-nanoparticles-synthesized-by-pulsed-laser-ablation-in-liquid/AE368446FAC70E08C514F9AEABFD131B DO - https://doi.org/10.1017/S1431927618009030 VL - 24 IS - S1 (August) SP - 1710 EP - 1711 PB - Cambridge University Press CY - New York, NY, U.S.A. AN - OPUS4-45949 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hodoroaba, Vasile-Dan A1 - Donėlienė1, J. A1 - Rudzikas, M. A1 - Rades, Steffi A1 - Dörfel, Ilona A1 - Peplinski, Burkhard A1 - Sahre, Mario A1 - Pellegrino, F. A1 - Maurino, V. A1 - Ulbikas, J. A1 - Galdikas, A. T1 - Electron Microscopy and X-Ray Diffraction Analysis of Titanium Oxide Nanoparticles Synthesized by Pulsed Laser Ablation in Liquid N2 - A femto-second pulsed laser ablation in liquid (PLAL) procedure for the generation of titanium oxide nanoparticles (NP) is reported with the purpose of understanding morphology and structure of the newly generated NPs. Ablation duration was varied for optimization of NP generation processes between 10 and 90 min. Surface morphology of NPs as well as their size and shape (distribution) were analysed by various complementary electron microscopy techniques, i.e. SEM, TSEM and TEM. The crystalline structure of titanium oxide particles was investigated by XRD and HR-TEM. Concentration of generated titanium oxide NPs in liquid was analysed by ICP-MS. A mix of crystalline (mainly anatase), partly crystalline and amorphous spherical titanium oxide NPs can be reported having a mean size between 10 and 20 nm, which is rather independent of the laser ablation (LA) duration. A second component consisting of irregularly shaped, but crystalline titanium oxide nanostructures is co-generated in the LA water, with more pronounced occurrence at longer LA times. The provenance of this component is assigned to those spherical particles generated in suspension and passing through the converging laser beam, being hence subject to secondary irradiation effects, e. g. fragmentation. T2 - Microscopy & Microanalysis 2018 CY - Baltimore, MD, USA DA - 05.08.2018 KW - Nanoparticles KW - Titanium oxide KW - Laser ablation in liquid KW - Electron microscopy KW - XRD PY - 2018 AN - OPUS4-46502 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Hielscher, Stefan A1 - Lange, Thorid A1 - Grunwald, Daniel A1 - Stockmann, Jörg M. A1 - Lerche, D. A1 - Rietz, U. T1 - Die Zentrifuge als universelles Prüfsystem für Beanspruchungen auf Zug und Druck N2 - Mit der Zentrifugentechnologie ist seit einigen Jahren ein neuartiges Mehr-Proben-Prüf-verfahren auf dem Markt etabliert, welches die klassische Zugprüfung in den Trommelrotor einer Tischzentrifuge überträgt. In der Beanspruchung auf Zug ist die Prüfung der Verbundfestigkeit mittels CAT-Technologie (centrifugal adhesion testing) an der BAM seit 2017 nach DIN EN ISO/IEC 17025 akkreditiert, wobei die Verbundfestigkeit von Klebungen direkt bestimmt wird und in Abhängigkeit von den Versagensformen Rückschlüsse auf die Klebfestigkeit von Klebstoffen/Klebebändern oder die Haftfestigkeit von Beschichtungen gezogen werden können. T2 - 13. ThGOT Thementage Grenz- und Oberflächentechnik und 11. Thüringer Biomaterial-Kolloquium CY - Zeulenroda, Germany DA - 13.03.2018 KW - Zentrifugentechnologie KW - Haftfestigkeit KW - Härteprüfung KW - Mehr-Proben-Prüfung KW - Beanspruchung auf Zug und Druck PY - 2018 AN - OPUS4-44570 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hielscher, Stefan A1 - Beck, Uwe A1 - Lange, Thorid A1 - Grunwald, Daniel A1 - Stockmann, Jörg M. A1 - Lerche, D. A1 - Rietz, U. T1 - Die Zentrifuge als universelles Prüfsystem für Beanspruchungen auf Zug und Druck N2 - Mit der Zentrifugentechnologie ist seit einigen Jahren ein neuartiges Mehr-Proben-Prüf-verfahren auf dem Markt etabliert, welches die klassische Zugprüfung in den Trommelrotor einer Tischzentrifuge überträgt. In der Beanspruchung auf Zug ist die Prüfung der Verbundfestigkeit seit 2017 nach DIN EN ISO/IEC 17025 akkreditiert, wobei die Verbundfestigkeit von Klebungen direkt bestimmt wird und in Abhängigkeit von den Versagensformen Rückschlüsse auf die Klebfestigkeit von Klebstoffen/Klebebändern oder die Haftfestigkeit von Beschichtungen gezogen werden können. Bei der zerstörenden Beanspruchung auf Zug ist zu beachten, dass es sich bei der Verbundfestigkeit um eine Systemeigenschaft handelt, d.h. nicht nur die chemischen und topografischen Oberflächeneigenschaften, sondern auch die plasto-elastischen Volumeneigenschaften des Klebstoffes und der Fügeteile haben Einfluss auf die ermittelten Kennwerte. Dabei ist eine qualitative Bestimmung der Versagensformen und Bruchbilder nach DIN EN ISO 10365 zwingend erforderlich, um eine Aussage über die Art des Versagens treffen zu können. Mit der Erweiterung der Zentrifugentechnologie um Beanspruchungen auf Druck wurde dann der Nachweis erbracht, dass auch die klassische Härteprüfung in einer Zentrifuge als Mehr-Proben-Prüfung durchgeführt werden kann. Im Verbundvorhaben QUO VADIS PLUS werden derzeit invasive Beanspruchungen auf Druck zur Bestimmung der Härte von Materialien, der Kompressibilität von Metallschäumen sowie der Kompaktierbarkeit von Pulvern untersucht, was das Anwendungspotential der Zentrifugentechnologie nochmals erweitert. Dazu gehören auch kombinierte Beanspruchungen wie Zug-Scher- und Druck-Scher-Prüfungen. Die Verbundfestigkeit von CFK-Platten in Abhängigkeit der Beanspruchungsart (Zug vs. Zug-Scher) bzw. der Faserorientierung (0°, 45°, 90°), die Klebfestigkeit von Klebstoffen bzw. Klebebändern auf unterschiedlichen Fügeteilwerkstoffen in Abhängigkeit von der Vorbehandlung, die Haftfestigkeit optischer Schichten auf Kunststoffen, die Bestimmung der Vickers-, Brinell- bzw. Kugeldruck-Härte sowie die Kompressibilität von metallischen Schäumen und Federn werden als ausgewählte Beispiele diskutiert. T2 - 13. ThGOT Thementage Grenz- und Oberflächentechnik und 11. Thüringer Biomaterial-Kolloquium CY - Zeulenroda, Germany DA - 13.03.2018 KW - Zentrifugentechnologie KW - Haftfestigkeit KW - Härteprüfung KW - Mehr-Proben-Prüfung KW - Beanspruchung auf Zug und Druck PY - 2018 SN - 978-3-00-058187-8 SP - 1 EP - 5 CY - Jena AN - OPUS4-44572 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Baier, Jennifa A1 - Hidde, Gundula A1 - Sahre, Marion A1 - Weise, Matthias T1 - Particles in PVD-coatings: Imperfection or functional add-on feature? N2 - The application of PVD-coatings ranges from mechanical engineering, i.e. thicker tribological coatings, to precision optics, i.e. thinner optical coatings. For physical vapor deposition (PVD) technologies such as evaporation, sputtering, ion beam assisted/driven deposition, vacuum is a prerequisite for two reasons: at first process-related ones (evaporation source, plasma discharge, and mean free path) and at second coating-related ones (pure, perfect, and dense films). Usually, the goal is a homogenous coating of defined stoichiometry and micro-structure without any imperfection. However, the implementation of micro- or nano-particles may occur accidentally or delibe-rately. Independent of the particle origin, there are two fundamental rules regarding coating functionality: at first, the larger the particle diameter to coating thickness ratio the more affected the functionality of the coating, and at second, the larger the material contrast in terms of the functional feature of interest the more affected the coating performance. Hence, embedded particles have to be avoided for the majority of thin films by all means. The unintended implementation of particles usually results in a malfunction of the coating from the beginning or is at least considered as a weak point of the coating creating a time-dependent defect under service conditions. The intended implementation of particles on surfaces and in coatings may create add-on features, topographic ones and functional ones, however, the facts mentioned hold true. Examples of particle-initiated coating defects are demonstrated in dependence on the origin and the field of application. Strategies for deliberate attachment/embedding of particles on surfaces/in coatings are discussed regarding process compatibility and coating integrity. For industrial applications, both the validation of process compatibility of particle injection and the plasma resistance of particles under vacuum and plasma conditions have to be confirmed. Further points of interest are the homogeneity of particle distribution and the avoidance of particle agglomeration which is still a crucial point for dry dispersed particles. So far, technical applications are limited to PVD hybrid coatings, plasma dispersion coatings are still a challenge except for applications where homogeneity is not required as in case of product authentication. T2 - ICMCTF 2018, International Conference on Metallurgical Coatings and Thin Films CY - San Diego, CA, USA DA - 23.04.2018 KW - PVD-coatings KW - PVD-processes KW - Unintended particle generation KW - Particles as imperfections KW - Deliberate particle implementation KW - Particles as add-on features PY - 2018 AN - OPUS4-44973 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Lange, Thorid A1 - Hidde, Gundula A1 - Beck, Uwe A1 - Naumann, F. A1 - Kärkkänen, I. A1 - Gargouri, H. T1 - HARFE: Haftfestigkeit Reproduzierbarkeit Festigkeit „Nanoskalige Haftvermittler zur Erhöhung der Haft- bzw. Klebfestigkeit unter Verwendung von ALD-Hybridprozessen“ N2 - Das Poster „HARFE: Haftfestigkeit Reproduzierbarkeit Festigkeit“ widmet sich den nanoskaligen Haftvermittlern zur Erhöhung der Haft- bzw. Klebfestigkeit unter Verwendung von ALD-Hybridprozessen. T2 - Netzwerksymposium “Schützen und Veredeln von Oberflächen”, Wildau CY - TH Wildau, Germany DA - 01.03.2018 KW - Verbundfestigkeit KW - Oberflächenenergie KW - ALD-Beschichtung PY - 2018 AN - OPUS4-44399 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hielscher-Bofinger, Stefan A1 - Beck, Uwe A1 - Lerche, D. A1 - Rietz, U. T1 - Multiple-sample Testing: Adhesive Strength of Coatings and Bonding Strength of Adhesives evaluated by Centrifugal Adhesion Testing (CAT) N2 - The quantitative determination of adhesion and cohesion properties is a key requirement for adhesive-bonded joints and coated components in both R&D and Quality assurance. Because of the huge variety of layer/substrate Systems in terms of materials and large thickness range, adhesion tests display the same diversity as layer/substrate systems. There are only two tensile testing procedures available, that determine adhesive strength in terms of force per area (N/mm²), the single-sample pull-off test in a tensile testing machine and the multiple-sample-test using the Centrifugal Adhesion Testing (CAT) Technology. The CAT Technology is a testing method which uses centrifugal force as tensile testing force in a multiple-sample arrangement within a drum rotor of a Desktop centrifuge. Hence, the adhesive/bonding strength A/B can be determined on a statistical basis under identical testing conditions for up to eight samples. A variety of examples for bonding strength of adhesives, adhesive strength of coatings and compound strength of composite materials is discussed such as metalto-metal and glass-to-metal bonding, sputtered SiO2-layers on CR39 Polymer and carbon fiber reinforced polymer. T2 - Colloquium Department 6. CY - Berlin, BAM, Germany DA - 03.09.2020 KW - Centrifugal Adhesion Testing (CAT) KW - Adhesive strength KW - Bonding strength KW - Composite strength KW - Interlaboratory comparision PY - 2020 AN - OPUS4-51178 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Griepentrog, Michael T1 - Towards the standardization of dynamic instrumented indentation testing N2 - Nowadays the Instrumented Indentation Testing (IIT) is one of the most commonly used methods to determine the mechanical properties of materials in the nano range. This method is already extensive standardized in EN ISO 14577 part 1-4. Because of the great interest of researchers and industries in investigations of time depending material behavior mostly all suppliers of IIT equipment are offering the possibility of dynamic testing. Realizing this development ISO/TC 164/SC3 Hardness Testing has proposed to start the new standardization project “Linear elastic dynamic instrumented indentation testing DIIT”. The development of this standard is accompanied by the first international intercomparing exercise comparing results of dynamic instrumented indentation testing from testing machines using different hardware solutions and different models for data evaluation. The draft of part 5 of ISO 14577 “Linear elastic dynamic instrumented indentation testing DIIT” specifies verification and calibration of testing machines for carrying out the measurement of the dynamic material response when an oscillatory force or displacement, with amplitudes small in comparison to the prescribed target values, is imparted to the indenter while the indenter is continuously loaded to a prescribed target load or target depth or while the load or displacement is held constant at a prescribed target value. In case of a material showing plastic-elastic behavior, the measured dynamic response is used for continuous evaluation of the dynamic stiffness of the contact as a function of depth and frequency. Using the dynamic stiffness of the contact a reduced dynamic modulus will be calculated. In case of a material showing visco-elastic behavior from the measured dynamic response also the dynamic contact damping coefficient as function of depth and frequency is evaluated continuously. Using dynamic contact stiffness and dynamic contact damping coefficient reduced lost and storage modulus for visco-elastic materials will be calculated. The main normative requirements of the draft will be presented and discussed in the light of the first results of the intercomparing excise. T2 - IIW6, International Indentation Workshop 6 CY - Sapporo, Japan DA - 02.07.2018 KW - ISO 14577 KW - Instrumented indentation testing KW - Nanoindentation KW - IIT KW - Mechanical properties KW - Dynamic testing KW - Visco-elastic KW - Loss module KW - Storage module PY - 2018 AN - OPUS4-45850 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Rietz, U. A1 - Lerche, D. A1 - Hielscher, Stefan A1 - Grunwald, Daniel A1 - Beck, Uwe T1 - Determination of coating properties by using analytical centrifugation N2 - The majority of all products have coated surfaces designed to fulfil different requirements. Building constructions are exposed to external influences like a wide temperature and humidity range, rain and UV radiation to name a few. The extension of machine life for metal cutting tools, like drills or milling cutters is another field of application for coated surfaces. The surfaces have to be modified in a way to maintain their specific functionality. Although adhesion testing of coatings is of great interest, it is still a challenge to obtain reliable quantitative results and to meet economic requirements. In this talk we deal with the curing behaviour of different 2-component epoxy paint systems for corrosion protection of metal constructions. After preparation of specimens the strength was determined in specified time intervals during curing. It could be shown that epoxy paints differ significantly on curing time as well as final strength. The second experimental study deals with coating systems on glass fibre reinforced plastics which are used for wind power turbines to reduce abrasive wear and ice adhesion for aerodynamic and safety reasons. All measurements have been carried out by CAT-TechnologyTM (Centrifugal Adhesion Testing), which uses the radially directed centrifugal force as test-load. The multi-sample test instrument analyses up to eight test specimen under identical testing conditions. By varying the rotational speed (100 rpm up to 13,000 rpm), forces from 0.1 N to 6.5 kN are applied. Upon reaching the critical rupture force, the stamp separates from the substrate and a sample related IR-signal is sent from the spinning rotor. For each test specimen breaking force is calculated and displayed in real-time. The innovative measurement principle meets the requirements of DIN EN 15870 and ISO 4624. T2 - EURADH 2018 CY - Lisbon, Portugal DA - 05.07.2018 KW - Adhesive strength determination KW - CAT-technology KW - Centrifugal adhesion testing KW - Metal coatings KW - Decorative coatings on polymer substrates PY - 2018 AN - OPUS4-46001 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Hidde, Gundula A1 - Lange, Thorid A1 - Gargouri, H. A1 - Kärkkänen, I. A1 - Naumann, F. T1 - Plasma Activation and Plasma-assisted ALD Surface Modification of Polymers for Improved Bonding and Adhesive Strength N2 - Bonding strength is crucial on polymers of low surface energy, for clean surfaces limited to 0.5, 1, and 2 MPa for PTFE, PP, and PE. Plasma treatment may improve bonding strength by a factor of 2 (PTFE) or 5 (PP and PE). The efficiency of treatment is usually 10% as both low pressure and atmospheric pressure processes show low topographic conformity. Besides, lifetime of activation/modification is rather short. Hence, bonding has to be carried out immediately after plasma treatment. The concept of plasma-assisted ALD (atomic layer deposition) interlayers was introduced in the project HARFE of SENTECH (modification/deposition/in-situ monitoring) and BAM (bonding, characterization, testing). ALD deposition has a high surface conformity and for dielectric films of Al2O3 also a good long-term stability given that the films are dense enough. Based on TMA and O2/O3 precursors, ALD layer stacks from 60 to 375 monolayers were prepared under different conditions. For a transfer time of 24 hours from deposition to measurement, bonding strength could be increased up to 5 MPa (PTFE) respectively 10 MPa (PP, PE). The huge potential of ALD layers as adhesive interlayers was demonstrated for Al2O3 on stainless steel with bonding strength beyond 15 MPa, i.e. interface strength within the ALD stack is also in this range. This is a prerequisite for subsequent PVD/CVD-deposition in hybrid systems. By means of the SI ALD LL system of SENTECH thermal and plasma-supported ALD processes can be alternatively realized. Ellipsometric in-situ monitoring provides monolayer sensitivity and reveals that the efficient bonding of the lower ALD layers on the polymer has to be further improved. Testing of bonding strength was realized by CAT (centrifugal adhesion testing) technology. It was shown that ALD modification correlates with the increase of surface energy and bonding strength. T2 - PSE 2018 - 16th Conference on Plasma Surface Engineering CY - Garmisch-Partenkirchen, Germany DA - 17.09.2018 KW - Plasma activation KW - Plasma-assisted ALD modification KW - Adhesive ALD interlayer KW - Bonding strength KW - Adhesive strength PY - 2018 AN - OPUS4-46015 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Fischer, Daniel A1 - Beck, Uwe A1 - Schneider, S. A1 - Duwe, M T1 - Visualisierung von mikro- und nanoskalierten Oberflächenstrukturen mittels abbildender Ellipsometry N2 - In den letzten Jahren hat die Einbindung der abbildenden Ellipsometrie in die Gruppe der optischen Verfahren zur Oberflächencharakterisierung ein enormes Potential bei der Analyse von topologischen Strukturänderungen gezeigt. Der dabei abgebildete Kon-trast wurde typischerweise auf Änderungen im Brechungsindex, Absorptionseffekte oder Schichtdickenänderungen zurückgeführt. In späteren Studien wurde festgestellt, dass auch andere Faktoren, wie etwa die Krümmung der Oberfläche oder Kanten von Struktu-ren einen signifikanten Einfluss auf die Messung der ellipsometrischen Paramater haben. Um diese Effekte aus der ellipsometrischen Messung extrahieren zu können, wird auf die Analyse der Müller-Matrix zurückgegriffen. In dem hier vorliegenden Beitrag wird gezeigt, wie die Müller-Matrix-Imaging Ellipsomet-rie (MM-IE) zur Charakterisierung von Oberflächenstrukturen verwendet werden kann. Dazu werden mikro- und nanoskaliert gekrümmte Oberflächen zunächst mit verschiede-nen Referenzmethoden, wie Rasterelektronenmikroskopie (SEM), Lichtmikroskopie (OM), Weißlichtinterferenzmikroskopie (WLIM) und Rasterkraftmikroskopie (AFM) vali-diert erfasst. Der anschließende Vergleich mit den Ergebnissen der Müller-Matrix-Ima-ging-Ellipsometrie ermöglicht eine Korrelation der zugrunde liegenden Strukturphäno-mene mit den ellipsometrischen Daten. In diesem Artikel wird das Prinzip an drei industriell relevanten Strukturgruppen demonstriert: Sub-Mikropartikel, Mikropartikel und sub-mikroskalierte Vertiefungen. T2 - 14. ThGOT Thementage Grenz- und Oberflächentechnik CY - Zeulenroda, Germany DA - 12.03.2019 KW - Ellipsometrie KW - Nanoskaliert KW - Mikroskaliert KW - Oberflächengeometrie KW - Brechungsindex KW - Müller-Matrix-Ellipsometrie PY - 2019 AN - OPUS4-47645 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Fischer, Daniel A1 - Beck, Uwe T1 - Visualisierung von mikro- und nanoskalierten Oberflächenstrukturen mittels abbildender Ellipsometrie N2 - In den letzten Jahren hat die Einbindung der abbildenden Ellipsometrie in die Gruppe der optischen Verfahren zur Oberflächencharakterisierung ein enormes Potential bei der Analyse von topologischen Strukturänderungen gezeigt. Der dabei abgebildete Kon-trast wurde typischerweise auf Änderungen im Brechungsindex, Absorptionseffekte oder Schichtdickenänderungen zurückgeführt. In späteren Studien wurde festgestellt, dass auch andere Faktoren, wie etwa die Krümmung der Oberfläche oder Kanten von Struktu-ren einen signifikanten Einfluss auf die Messung der ellipsometrischen Paramater haben. Um diese Effekte aus der ellipsometrischen Messung extrahieren zu können, wird auf die Analyse der Müller-Matrix zurückgegriffen. In dem hier vorliegenden Beitrag wird gezeigt, wie die Müller-Matrix-Imaging Ellipsomet-rie (MM-IE) zur Charakterisierung von Oberflächenstrukturen verwendet werden kann. Dazu werden mikro- und nanoskaliert gekrümmte Oberflächen zunächst mit verschiede-nen Referenzmethoden, wie Rasterelektronenmikroskopie (SEM), Lichtmikroskopie (OM), Weißlichtinterferenzmikroskopie (WLIM) und Rasterkraftmikroskopie (AFM) vali-diert erfasst. Der anschließende Vergleich mit den Ergebnissen der Müller-Matrix-Ima-ging-Ellipsometrie ermöglicht eine Korrelation der zugrunde liegenden Strukturphäno-mene mit den ellipsometrischen Daten. In diesem Artikel wird das Prinzip an drei industriell relevanten Strukturgruppen demonstriert: Sub-Mikropartikel, Mikropartikel und sub-mikroskalierte Vertiefungen. T2 - 14. ThGOT Thementage Grenz- und Oberflächentechnik und 6. Kolloquium Dünne Schichten in der Optik CY - Zeulenroda, Germany DA - 12.03.2019 KW - Ellipsometrie KW - Nanoskaliert KW - Mikroskaliert KW - Oberflächengeometrie KW - Brechungsindex KW - Müller-Matrix-Ellipsometrie PY - 2019 SN - 978-3-00-062102-4 SP - 1 EP - 5 AN - OPUS4-47646 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Lange, Thorid A1 - Hidde, Gundula A1 - Beck, Uwe A1 - Naumann, F. A1 - Kärkkänen, I. A1 - Gargouri, H. T1 - Nanoskalige Haftvermittler zur Erhöhung der Haft- bzw. Klebfestigkeit unter Verwendung von ALD-Hybridprozessen N2 - Ziel des Projektes HARFE (Haftfestigkeit Reproduzierbarkeit Festigkeit) war es, eine Er-höhung der Haft- bzw. Klebfestigkeit auf Niedrigenergie-Polymeren (PE, PP, PTFE) zu erreichen. SENTECH realisierte dazu plasmachemische Oberflächenaktivierungen mit O2 und die Abscheidung von Aluminiumoxidschichten (Al2O3) mittels Atomic Layer Deposition (ALD), wobei die Ellipsometrie zum in-situ Monitoring der ALD-Prozesse diente. Die BAM charakterisierte die modifizierten Oberflächen bezüglich der Oberflächenenergie (OFE) und bestimmte die Verbund- bzw. Klebfestigkeit mittels der Zentrifugentechnologie T2 - 14. ThGOT Thementage Grenz- und Oberflächentechnik und 6. Kolloquium Dünne Schichten in der Optik CY - Zeulenroda, Germany DA - 12.03.2019 KW - Haftvermittler KW - ALD-Hybridprozesse KW - Klebfestigkeit KW - Atomic Layer Deposition KW - Al2O3-Schichten KW - Oberflächenenergie PY - 2019 AN - OPUS4-47653 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Lange, Thorid A1 - Hidde, Gundula A1 - Beck, Uwe A1 - Naumann, F. A1 - Kärkkänen, I. A1 - Gargouri, H. T1 - Nanoskalige Haftvermittler zur Erhöhung der Haft- bzw. Klebfestigkeit unter Verwendung von ALD-Hybridprozessen N2 - Ziel des Projektes HARFE (Haftfestigkeit Reproduzierbarkeit Festigkeit) war es, eine Er-höhung der Haft- bzw. Klebfestigkeit auf Niedrigenergie-Polymeren (PE, PP, PTFE) zu erreichen. SENTECH realisierte dazu plasmachemische Oberflächenaktivierungen mit O2 und die Abscheidung von Aluminiumoxidschichten (Al2O3) mittels Atomic Layer Deposition (ALD), wobei die Ellipsometrie zum in-situ Monitoring der ALD-Prozesse diente. Die BAM charakterisierte die modifizierten Oberflächen bezüglich der Oberflächenenergie (OFE) und bestimmte die Verbund- bzw. Klebfestigkeit mittels der Zentrifugentechnologie T2 - 14. ThGOT Thementage Grenz- und Oberflächentechnik und 6. Kolloquium Dünne Schichten in der Optik CY - Zeulenroda, Germany DA - 12.03.2019 KW - Haftvermittler KW - ALD-Hybridprozesse KW - Klebfestigkeit KW - Atomic Layer Deposition KW - Al2O3-Schichten KW - Oberflächenenergie PY - 2019 SN - 978-3-00-062102-4 SP - 1 EP - 2 CY - Zeulenroda, Germany AN - OPUS4-47656 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Mitzkus, Anja A1 - Sahre, Mario A1 - Basedau, Frank A1 - Hofman, Detlef A1 - Beck, Uwe T1 - Fiber Bragg Gratings for In-Situ Stress Monitoring of Electrochemical Deposition N2 - The in-situ monitoring of electrochemical deposition (ECD) processes is still a challenge regarding the measurement of the effective temperature of the substrate and the formation of mechanical stress in the layer under given plating conditions. Monitoring problems can be solved by applying a pre-coated fiber Bragg grating (FBG) to the electrolytic process as the shift of the Bragg wavelength is affected by both the temperature of the electrolyte near the substrate and the stress formation in the growing layer. The experimental FBG set-up and the quantitative determination of temperature- and stress-related strain is described for a nickel-iron electrolyte. KW - Fiber Bragg grating (FBG) KW - Electrochemical deposition (ECD) KW - Optical fibers PY - 2019 DO - https://doi.org/10.1149/2.0111906jes SN - 0013-4651 VL - 166 IS - 6 SP - B312 EP - B315 PB - Electrochemical Society CY - Pennington, NJ AN - OPUS4-47738 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Sachse, René A1 - Bernsmeier, D. A1 - Schmack, R. A1 - Häusler, I. A1 - Hertwig, Andreas A1 - Kraffert, K. A1 - Nissen, J. A1 - Kraehnert, R. T1 - Colloidal bimetallic platinum–ruthenium nanoparticles in ordered mesoporous carbon films as highly active electrocatalysts for the hydrogen evolution reaction N2 - Hydrogen features a very high specific energy density and is therefore a promising candidate for clean fuel from renewable resources. Water electrolysis can convert electrical energy into storable and transportable hydrogen gas. Under acidic conditions, platinum is the most active and stable monometallic catalyst for the hydrogen evolution reaction (HER). Yet, platinum is rare and needs to be used efficiently. Here, we report a synthesis concept for colloidal bimetallic platinum–ruthenium and rhodium–ruthenium nanoparticles (PtRuNP, RhRuNP) and their incorporation into ordered mesoporous carbon (OMC) films. The films exhibit high surface area, good electrical conductivity and well-dispersed nanoparticles inside the mesopores. The nanoparticles retain their size, crystallinity and composition during carbonization. In the hydrogen evolution reaction (HER), PtRuNP/OMC catalyst films show up to five times higher activity per Pt than Pt/C/Nafion® and PtRu/C/Nafion® reference catalysts. KW - Ordered mesoporous carbon KW - Bimetallic noble metal nanoparticles KW - Platinum-ruthenium colloid KW - Electrolysis KW - Hydrogen evolution reaction PY - 2020 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-506868 DO - https://doi.org/10.1039/C9CY02285F SN - 2044-4753 VL - 10 IS - 7 SP - 2057 EP - 2068 PB - Royal Society of Chemistry AN - OPUS4-50686 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Griepentrog, Michael A1 - Hertwig, Andreas A1 - Hielscher, Stefan A1 - Weise, Matthias T1 - Auf dem Weg zu Industrie 4.0: Bestimmung von Messunsicherheitsbudgets in der Oberflächentechnik N2 - Vorgestellt wurde die Bestimmung von Messunsicherheitsbudgets für sehr unterschiedliche physikalische Größen, die in der Oberflächentechnik von hoher Relevanz sind: Stufenhöhe h, Schichtdicke d, Eindringhärte HIT und Haftfestigkeit. Die Unterschiede betreffen die Art der Prüfmethodik (optisch zerstörungsfrei vs. mechanisch invasiv/zerstörend), die laterale Größe des Integrationsgebietes der Messung (lokal: nano bis sub-mikro vs. global: mikro bis makro) und die Art der Bestimmung von Messunsicherheitsbudgets (physikalische Größen: direkt rückführbar; Werkstoffkenngröße: genormt; Systemkenngröße: genormt). Im Rahmen von Industrie 4.0 werden ausgehend der geforderten Spezifikation des beschichteten Produkts (Mittelwert mit Vertrauensbereich oder Mindestwert) durchgehende Toleranzbänder zur Oberflächenmodifizierung/Beschichtung des Substrats, einhergehend mit Prozessfenstern, die diese Toleranzbänder garantieren, erforderlich, die zuverlässig erfasst werden müssen. Die Frage der anzuwendenden Mess- und Prüftechnik und die damit notwendige Betrachtung von Messunsicherheitsbudgets ist für die Digitalisierung von Konditionierungs-, Zustands-, Regel- und Steuergrößen unverzichtbar. Mit Blick auf die Einhaltung von Prozessfenstern und die dafür notwendige Prozessführung wird technologisches Kern-Know-how digitalisiert, das es unbedingt zu schützen gilt. Nur lokale Netze können diese Sicherheit garantieren, in globalen Netzen ist die Datensicherheit bestenfalls maximierbar T2 - 14. ThGOT Thementage Grenz- und Oberflächentechnik und 6. Kolloquium Dünne Schichten in der Optik CY - Zeulenroda, Germany DA - 12.03.2019 KW - Oberflächentechnik KW - Messunsicherheit KW - Messtechnik KW - Prüftechnik KW - Haftfestigkeit PY - 2019 SN - 978-3-00-058187-8 VL - 2019 SP - 1 EP - 10 AN - OPUS4-47670 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Griepentrog, Michael A1 - Hertwig, Andreas A1 - Weise, Matthias T1 - White light interference microscopy, ellipsometry, and instrumented indentation testing as reference procedures N2 - The paper addresses “WHITE LIGHT INTERFERENCE MICROSCOPY, ELLIPSOMETRY, AND INSTRUMENTED INDENTATION TESTING AS REFERENCE PROCEDURES“ and is subdivided in the following sections: 1. Measurement vs. testing vs. reference procedures, 2. White light interference microscopy (WLIM) for determination of step height h, 3. Spectroscopic ellipsometry (SE) for determination of layer thickness d and 4. Instrumented indentation testing (IIT) for determination of indentation hardness HIT. The following points are discussed in more detail: methodology of measurement and testing, uncertainty budgets for direct (WLIM), model-based (SE) and formula-based (IIT) reference procedures by means of specific examples. It is shown that standardization efforts are connected to reference procedures. T2 - Referenzverfahren CY - BAM, Berlin, Germany DA - 21.02.2018 KW - Reference procedures KW - Uncertainty budgets KW - White light interference microscopy KW - Spectroscopic ellipsometry KW - Instrumented indentation testing PY - 2018 AN - OPUS4-44256 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Hertwig, Andreas A1 - Winkler, J. T1 - Standardization of ellipsometry N2 - The talk addresses the STANDARDIZATION OF ELLIPSOMETRY and the following points are discussed in more detail: historical background of ellipsometry, history of International Conferences on Ellipsometry, Workshops Ellipsometry in Germany and Europe, information on German/European Working Group Ellipsometry, technical/industrial importance of ellipsometry, applications on non-ideal material systems and standardization activities on ellipsometry. T2 - DIN NA Dünne Schichten für die Optik, Mainz CY - Mainz, Germany DA - 06.06.2018 KW - Standardization KW - Ellipsometry KW - Modelling KW - Accreditation PY - 2018 AN - OPUS4-45167 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Hertwig, Andreas A1 - Kormunda, M. A1 - Ryšánek, P. A1 - Ivanov, L. T1 - Characterisation of magnetron sputtered SnZnOx by means of spectroscopic ellipsometry - how can we analyse TCO materials optically? N2 - Transparent conductive oxide (TCO) films are a vital part of a large part of modern technology. The production of TCO materials has sparked much development in plasma coating technology. Quality control measurements of these layers are therefore important in many fields of optics and electronics such as high efficiency thin film photovoltaics. In this presentation, we report on optical measurements of ZnSnOx layers generated by DC/RF magnetron plasma co-sputtering. By changing the respective power on two different targets, the overall power, the gas composition and post-treatment, the properties of this type of layers can be varied in a number of parameters. The optical, electrical, and chemical properties of TCO layers are the technically most important properties together with the layer thickness. The dielectric function of layers is accessible by means of spectroscopic ellipsometry, which also yields the very important value for the layer thickness at the same time. It would be a significant step forward in quality control to use this non-destructive method also as a fast test for electrical properties. Therefore, we report on the optical properties connected to the production parameters, and also on our preliminary results connecting the optical dielectric function (in the visible and near infrared) to the electrical conductivity of the layers. We discuss the effect of deposition parameters on the optical properties of the layers and present an approach for correlating optical and electrical properties. Further, we discuss the question of accuracy of optical properties gained from model-fit-based optical methods and the use of different parameterised models for the dielectric function to achieve this. T2 - PSE 2018 - 16th Conference on Plasma Surface Engineering CY - Garmisch-Partenkirchen, Germany DA - 17.09.2018 KW - Mixed Oxides KW - TCO KW - Quality Control KW - Ellipsometry KW - Optical Constants PY - 2018 AN - OPUS4-46388 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Fischer, Daniel A1 - Hertwig, Andreas A1 - Mitzkus, Anja A1 - Sahre, Mario A1 - Weise, Matthias A1 - Köppe, Enrico A1 - Bartholmai, Matthias A1 - Basedau, Frank A1 - Hofmann, Detlef A1 - Schukar, Vivien A1 - Kormunda2, M. T1 - Multi-functional coatings for optical sensor applications: Surface plasmon resonance & magneto-optical coupling N2 - Multi-functional coatings are a key requirement for surface engineering. General demands are adhesion and long-term stability under service conditions. The modification of surfaces by means of PVD-, ECD- or hybrid processes allows an add-on functionalization of surfaces by a huge diversity of materials with both lateral and vertical micro-/nano-designs. This fact is a prerequisite for micro- and sensor-systems in lab-on-chip and sensor-on-chip technology. Two layer-based sensor principles are presented, i.e. surface plasmon resonance enhanced spectroscopic ellipsometry (SPREE) for detection of hazardous gases and magneto-optical sensors on smart-coated fiber Bragg gratings (FBG) for structural health monitoring (SHM). The interdependence of substrate features, coating properties, and layer design is discussed firstly for gas sensitivity and selectivity of SPREE-sensors and secondly for sensitivity and selectivity of magneto-strictive coatings to mechanical strain or external magnetic fields resulting in an optical displacement of the Bragg wavelength of FBG-sensors. Moreover, generic features such long-term stability, crucial process-related fabrication conditions, and effects of operational and environmental parameters are discussed with respect to the sensor performance. It has been shown that appropriate layer design and adapted selection of layer materials (SnOx/Au, Fe/Ni:SnOx/Au; Ni/NiFe-Cu-Cr) result in improved sensor parameters and may enable new sensor applications. T2 - SVC TechCon 2018 CY - Orlando, FL, USA DA - 05.05.2018 KW - Multi-functional coatings for sensors KW - Surface plasmon resonance enhanced ellipsometry (SPREE) KW - Gas monitoring KW - Magneto-optical coupling (MOC) KW - Structural health monitoring (SHM) PY - 2018 AN - OPUS4-44976 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Hertwig, Andreas A1 - Othake, N. A1 - Hiratsuka, M. T1 - Ellipsometrische Klassifizierung von Kohlenstoffschichten N2 - Der Vortrag widmet sich der „ELLIPSOMETRISCHE KLASSIFIZIERUNG VON KOHLENSTOFFSCHICHTEN“ und beschreibt die Punkte: 1. Anwendungen Kohlenstoffschichten–Carbon–based films (DLC) aus dem Vortrag N. Ohtakeet. al. (ISO TC 107, Tokyo 2017),2. Präparation der Kohlenstoffschichten für ISO TC 107 Ringversuch aus Vortrag M. Hiratsuka et. al. (ISO TC 107, Tokyo 2017), 3. Ellipsometrische Charakterisierung von Kohlenstoffschichten, Ergebnisse des Ringversuchs (ISO TC 107, Tokyo 2017) Vortrag Beck et. al. und 4.Deutsche Normungsaktivitäten national/international zur Ellipsometrie DIN NA 062-01-061 (DIN 50989-1)/TC 107 (PWI DE)“ im Einzelnen. T2 - Netzwerksymposium “schützen und Veredeln von Oberflächen”, Wildau CY - TH Wildau, Germany DA - 01.03.2018 KW - Anwendung von Kohlenstoffschichten KW - Klassifizierung von Kohlenstoffschichten KW - Ringversuch Ellipsometrie KW - Normung Ellipsometrie PY - 2018 AN - OPUS4-44340 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Schönhals, Andreas A1 - Madkour, Sherif A1 - Gawek, Marcel A1 - Szymoniak, Paulina A1 - Hertwig, Andreas T1 - Growth Kinetics and molecular mobility of irreversibly adsorbed layers in thin Polymer films investigated by Nanosized relaxation spectroscopy and complimentary methods N2 - In well-annealed thin polymer films, with non-repulsive polymer/substrate interactions, an irreversibly adsorbed layer is expected to from. These adsorbed layers have shown greate potential for technological applications. However, their growth kinetics and molecular dynamics are still not fully understood. This is partly due to the hard accessibility of these layers in thin films. Here, the irreversibly adsorbed layers of homopolymer thin films are revealed by solvent-leaching experiments. First, the growth kinetics of these layers is investigated as a function of annealing time, annealing temperature, leaching time and the original filme thickness. The film thickness, topography and the quality of the adsorbed layer is controlled by Atomic Force Microscopy (AFM). Secondly, the molecular mobility of the adsorbed layer is investigated by Broadband Dielectric Spectroscopy (BDS). A recently developed nanostructured capacitor arrangement is employed to measure the layer with a free surface. The results are quantitatively compared and discussed with respect to recently published work. T2 - Polymers on the nanoscale CY - Princeton, New Jersey, USA DA - 31.10.2019 KW - Thin polymer films PY - 2019 AN - OPUS4-49559 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Mirabella, Francesca A1 - Mezera, Marek A1 - Wasmuth, Karsten A1 - Hertwig, Andreas A1 - Richter, Anja A1 - Schwibbert, Karin A1 - Krüger, Jörg A1 - Bonse, Jörn A1 - Hodoroaba, Vasile-Dan T1 - ToF-SIMS as a new tool for nano-scale investigation of ps-laser-generated surface structures on titanium substrates N2 - In recent years, the fabrication of laser-generated surface structures on metals such as titanium surfaces have gained remarkable interests, being technologically relevant for applications in optics, medicine, fluid transport, tribology, and wetting of surfaces. The morphology of these structures, and so their chemistry, is influenced by the different laser processing parameters such as the laser fluence, wavelength, pulse repetition rate, laser light polarization type and direction, angle of incidence, and the effective number of laser pulses per beam spot area. However, the characterization of the different surface structures can be difficult because of constraints regarding the analytical information from both depth and the topographic artifacts which may limit the lateral and depth resolution of elemental distributions as well as their proper quantification. A promising technique to investigate these structures even at the nano-scale is Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS), a very surface sensitive technique that at the same time allows to perform depth-profiling, imaging and 3D-reconstruction of selected ion-sputter fragment distributions on the surface. In this study we combine chemical analyses such as Energy Dispersive X-ray spectroscopy (EDX) and high-resolution scanning electron microscopy (SEM) analyses with ToF-SIMS to fully characterize the evolution of various types of laser-generated micro- and nanostructures formed on Ti and Ti alloys at different laser fluence levels, effective number of pulses and at different pulse repetition rates (1 – 400 kHz), following irradiation by near-infrared ultrashort laser pulses (925 fs, 1030 nm) in air environment or under argon gas flow. We show how this combined surface analytical approach allows to evaluate alteration in the surface chemistry of the laser-generated surface structures depending on the laser processing parameters and the ambient environment. T2 - European Materials Research Society (EMRS) Fall Meeting 2021 CY - Online meeting DA - 20.09.2021 KW - ToF SIMS KW - Nano characterization PY - 2021 AN - OPUS4-53366 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Fischer, Daniel A1 - Hertwig, Andreas A1 - Hidde, Gundula A1 - Stockmann, Jörg M. A1 - Weise, Matthias T1 - Ellipsometric imaging of low-contrast surface modifications and depolarization contrast imaging (DCI) of particulate accumulations N2 - Imaging of surfaces regarding topographical, morphological, micro-structural, and chemical features is a key requirement for quality control for the identification of contaminated, degraded, damaged or deliberately modified surface areas vs. clean, virgin, undamaged or unmodified regions. As optical functions may represent any of these changes on the micro- and nano-scale, imaging ellipsometry (IE) is the technique of choice using either intensity, phase, or/and amplitude contrast for visualization of low-contrast surface modifications [1, 2]. Defects or surface and film features whether native or artificial, intended or unintended, avoidable or unavoidable as well as surface pattern are of interest for quality control. In contrast to microscopic techniques operated at normal incidence, ellipsometry as oblique-incidence technique provides improved contrast for vertically nano-scaled add-on or sub-off features such as ultra-thin transparent films, metallic island films, carbon-based thin films, laser modification or laser induced damage, dried stain, cleaning agent or polymeric residue. Two-sample reference techniques, i.e. referenced spectroscopic ellipsometry (RSE) may further increase sensitivity and decrease measurement time. In case of particulate accumulations depolarization contrast imaging (DCI) may improve the lateral resolution beyond the Abbe limit. This has been proven for silica spheres as reference in terms of single particles, particulate accumulations or particulate monolayers and layer stacks. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) were used for reference measurements of particle diameter, particle height, or particulate layer/accumulation thickness. It has been shown that single silica particles of 250 nm in diameter, i.e. at least a factor of 4 better than the lateral resolution limit as of now, can be visualized on even substrates. However, the ellipsometric measurement of particle diameters of this size needs further efforts interpretation. T2 - Workshop Ellipsometry 2018 CY - Chemnitz, Germaný DA - 19.03.2018 KW - Low-contrast surface modifications KW - Particulate distributions KW - Imaging ellipsometry(IE) KW - Depolarization contrast imaging (DCI) PY - 2018 AN - OPUS4-44548 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Hertwig, Andreas A1 - Winkler, J. T1 - Preliminary work item (PWI) 23131 on standardization of ellipsometry N2 - The paper addresses the PRELIMINARY WORK ITEM (PWI) 23131 ON STANDARDIZATION OF ELLIPSOMETRY and the following points are discussed in more detail: Historical background of ellipsometry, Technical/industrial importance of ellipsometry and Standardization activities on ellipsometry. T2 - ISO TC 107 and JWG 4 meeting CY - Levi, Finland DA - 23.01.2018 KW - Standardization KW - Ellipsometrie KW - Modelling KW - Accreditation PY - 2018 AN - OPUS4-43959 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Gawek, Marcel A1 - Madkour, Sherif A1 - Hertwig, Andreas A1 - Schönhals, Andreas T1 - Growth Kinetics and Molecular Mobility of Irreversibly Adsorbed Layers in Thin Polymer Films N2 - In well-annealed thin polymer films, with non-repulsive polymer/substrate interactions, an irreversibly adsorbed layer is expected to form. These adsorbed layers have shown great potential for technological applications. However, their growth kinetics and molecular dynamics are still not fully understood. This is partially due to the hard accessibility of these layers in thin films. Here, the irreversibly adsorbed layers of homopolymer thin films are revealed by solvent-leaching experiments. First, the growth kinetics of these layers is investigated as a function of annealing times and original film thickness. The thickness, topography and quality of the adsorbed layer is controlled with Atomic Force Microscopy (AFM). Secondly, the molecular mobility of the adsorbed layer is investigated with Broadband Dielectric Spectroscopy (BDS). A recently developed nanostructured capacitor is employed to measure the adsorbed layers with a free surface layer. The results are quantitatively compared and discussed with respect to recently published work. T2 - Meeting of the American Physical Society CY - Los Angeles, CA, USA DA - 05.03.2018 KW - Thin polymeric films KW - Adsorbed layer PY - 2018 AN - OPUS4-44488 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Gawek, Marcel A1 - Madkour, Sherif A1 - Hertwig, Andreas A1 - Schönhals, Andreas T1 - Growth Kinetics and Molecular Mobility of Irreversibly Adsorbed Layers in Thin Polymer Films N2 - In well-annealed thin polymer films, with non-repulsive polymer/substrate interactions, an irreversibly adsorbed layer is expected to form. These adsorbed layers have shown great potential for technological applications. However, their growth kinetics and molecular dynamics are still not fully understood. This is partially due to the hard accessibility of these layers in thin films. Here, the irreversibly adsorbed layers of homopolymer thin films are revealed by solvent-leaching experiments. First, the growth kinetics of these layers is investigated as a function of annealing times and original film thickness. The thickness, topography and quality of the adsorbed layer is controlled with Atomic Force Microscopy (AFM). Secondly, the molecular mobility of the adsorbed layer is investigated with Broadband Dielectric Spectroscopy (BDS). A recently developed nanostructured capacitor is employed to measure the adsorbed layers with a free surface layer. The results are quantitatively compared and discussed with respect to recently published work. T2 - Spring Meeting of German Physical Society CY - Berlin, Germany DA - 12.03.2018 KW - Thin polymeric films KW - Dielectric spectroscopy PY - 2018 AN - OPUS4-44489 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hertwig, Andreas A1 - Ermilova, Elena A1 - Sachse, René A1 - Beck, Uwe T1 - Accuracy, traceability, and standardization in spectroscopic ellipsometry N2 - Ellipsometry has been an extremely successful and fast expanding method in the past decades along with other related techniques using polarisation sensitive measurements. Opening new fields of application for a successful measurement technique brings some requirements and issues that have to be solved. From a metrological point of view, ellipsometry has the problem that uncertainties are difficult to determine for model-based analysis techniques in general. In this presentation, we will explore how the usefulness of polarimetric methods like ellipsometry can be increased. Ellipsometry as a method could profit from several current developments which will be discussed in this presentation: • Standardisation initiatives on national and international level developing standards for best practice when using ellipsometry. A series of at least six standards is currently developed on national German and international level covering different levels of sample complexity. • Projects on traceability of ellipsometry and structured surface spectrometry as well as new dielectric function database initiatives. • Metadata handling and data ontology providing a better framework for exchange and collaborative use of research data. We will also explore the quantification of measurement uncertainty using examples from projects in which BAM is involved. Examples will be presented of multilayer and non-ideal materials as well as the determination of layer properties for technical applications such as thin layer catalysts and complex polymers. The definition of reference materials will be discussed. T2 - 11th Workshop Ellipsometry (WSE 11) CY - Steyr, Austria DA - 06.09.2021 KW - Ellipsometry KW - Uncertainty KW - Surface analytics KW - Data science PY - 2021 AN - OPUS4-53295 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Sachse, René A1 - Bernsmeier, D. A1 - Hertwig, Andreas A1 - Hodoroaba, Vasile-Dan A1 - Kraehnert, R. T1 - Spectroscopic ellipsometry for the determination of thickness and porosity of mesoporous metal oxide films N2 - Thin mesoporous metal oxide films are versatile and attractive candidates for several energy applications like photovoltaics, electrolysis or batteries. Due to their high surface area and ordered pore structure, mesoporous metal oxides demonstrate higher activities. The performance of the porous films is affected by properties like size and shape of the mesopores as well as the crystallinity of the framework. The exact determination and metrological evaluation of the complex morphology of thin mesoporous films requires a new analytical approach employing to combined data of different analytical methods. In this contribution we present a novel evaluation procedure for spectroscopic ellipsometry (SE) to analyse thin mesoporous iridium oxide films. Mesoporous iridium oxide films were prepared via dip-coating of a solution containing a triblock-copolymer as structure directing agent and an iridium precursor in ethanol. Deposited films were calcined in air at temperatures between 300 and 600 °C. Their morphology was studied with SEM and an electron probe microanalysis (EPMA)and correlated via SE with a Bruggeman effective medium approximation (BEMA). The developed SE model described the film thickness as well as the porosity. Figure 1a shows a top-view SEM image of mesoporous IrO2 film calcined at 375 °C. The image reveals that the films exhibit a well-ordered mesopore structure with an average pore diameter of 16 nm and a periodic distance between pore centres of 24 nm (FFT inset). Figure 1b is a parity plot of film thicknesses determined by cross-section SEM versus SE of IrO2 film samples prepared at different calcination temperatures. The porosity from the SE model is in good agreement to the porosity values obtained by EPMA. The contribution will assess in detail the novel approach to analyse the morphology and porosity of thin metal oxide films with spectroscopic ellipsometry. Moreover, the advantages of the new developed approach will be discussed as well as combination of datasets from multiple measurements to development new methods for innovative energy technologies. T2 - 30. Deutsche Zeolith-Tagung und Jahrestreffen der ProcessNet-Fachgruppe Adsorption CY - Kiel, Germany DA - 28.02.2018 KW - Mesoporous materials KW - Iridium oxide films KW - Electro catalyst KW - Spectroscopic ellipsometry KW - Thin film metrology KW - Multi-sample analysis PY - 2018 AN - OPUS4-45101 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Sachse, René A1 - Hertwig, Andreas A1 - Hodoroaba, Vasile-Dan A1 - Kraehnert, R. T1 - Spectroscopic ellipsometry for the determination of thickness and porosity of mesoporous metal oxide films N2 - Thin mesoporous metal oxide films are versatile and attractive candidates for several energy applications like photovoltaics, electrolysis or batteries. Due to their high surface area and ordered pore structure, mesoporous metal oxides demonstrate higher activities. The performance of the porous films is affected by properties like size and shape of the mesopores as well as the crystallinity of the framework. The exact determination and metrological evaluation of the complex morphology of thin mesoporous films requires a new analytical approach employing to combined data of different analytical methods. In this contribution we present a novel evaluation procedure for spectroscopic ellipsometry (SE) to analyse thin mesoporous iridium oxide films. Mesoporous iridium oxide films were prepared via dip-coating of a solution containing a triblock-copolymer as structure directing agent and an Iridium precursor in ethanol. Deposited films were calcined in air at temperatures between 300 and 600 °C. Their morphology was studied with SEM and an electron probe microanalysis (EPMA) and correlated via SE with a Bruggeman effective medium approximation (BEMA). The developed SE model described the film thickness as well as the porosity. ... The contribution will assess in detail the novel approach to analyse the morphology and porosity of thin metal oxide films with spectroscopic ellipsometry. Moreover, the advantages of the new developed approach will be discussed as well as combination of datasets from multiple measurements to development new methods for innovative energy technologies. T2 - 10th Workshop Ellipsometry 2018 CY - Chemnitz University of Technology, Germany DA - 19.03.2018 KW - Mesoporous materials KW - Iridium oxide films KW - Electro catalyst KW - Spectroscopic ellipsometry KW - Thin film metrology KW - Multi-sample analysis PY - 2018 AN - OPUS4-45143 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Sachse, René A1 - Bernsmeier, Denis A1 - Hertwig, Andreas A1 - Hodoroaba, Vasile-Dan A1 - Kraehnert, Ralph T1 - Spectroscopic ellipsometry for the determination of thickness and porosity of mesoporous metal oxide films N2 - Thin mesoporous metal oxide films are versatile and attractive candidates for several energy applications like photovoltaics, electrolysis or batteries. Due to their high surface area and ordered pore structure, mesoporous metal oxides demonstrate higher activities. The performance of the porous films is affected by properties like size and shape of the mesopores as well as the crystallinity of the framework. The exact determination and metrological evaluation of the complex morphology of thin mesoporous films requires a new analytical approach employing to combined data of different analytical methods. In this contribution we present a novel evaluation procedure for spectroscopic ellipsometry (SE) to analyse thin mesoporous iridium oxide films. Mesoporous iridium oxide films were prepared via dip-coating of a solution containing a triblock-copolymer as structure directing agent and an iridium precursor in ethanol. Deposited films were calcined in air at temperatures between 300 and 600 °C. Their morphology was studied with SEM and an electron probe microanalysis (EPMA) and correlated via SE with a Bruggeman effective medium approximation (BEMA). The developed SE model described the film thickness as well as the porosity. ... The contribution will assess in detail the novel approach to analyse the morphology and porosity of thin metal oxide films with spectroscopic ellipsometry. Moreover, the advantages of the new developed approach will be discussed as well as combination of datasets from multiple measurements to development new methods for innovative energy technologies. T2 - 30. Deutsche Zeolith-Tagung gemeinsam mit dem Jahrestreffen der ProcessNet-Fachgruppe Adsorption CY - Christian-Albrechts-Universität zu Kiel, Germany DA - 28.02.2018 KW - Mesoporous materials KW - Iridium oxide films KW - Electro catalyst KW - Spectroscopic ellipsometry KW - Thin film metrology KW - Multi-sample analysis PY - 2018 AN - OPUS4-45134 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hertwig, Andreas T1 - Multi-methods surface analysis involving spectroscopic ellipsometry: New measurements for optical and energy applications N2 - Surface analysis is still gaining importance, as most modern technology is in essence surface and thin film technology. In microelectronics and optics but also in many fields of energy storage and conversion, thin surface layers or structured surfaces are key components. Optical surface measurements are useful because of their reliability, robustness, and scalability – properties, which are especially desirable in a production environment. However, many of these methods take require considerable effort in data analysis. Spectroscopic ellipsometry (SE) is maybe the prime example of this class of methods. To combine the advantages of SE with metrological trueness and traceability, we combine it in a group of other methods, such as electron microscopy, instrumental surface analysis, X-ray diffraction. This presentation will give an overview on the principles of SE, its available quantities and the general properties of this measurement technique. Several examples from current and past projects of BAM-6.7 will show how a measurement community involving ellipsometry can benefit many fields of interest, from polymer science to energy applications. In the context of creating a “measurement landscape”, standardisation and standard compliance play an important role. The efforts of BAM in standardisation and accrediting of ellipsometry will be shown demonstrating the possible impact on quality assurance in different fields of technology. T2 - Abteilungskolloquium 2018, BAM CY - BAM, Berlin, Germany DA - 12.12.2018 KW - Spectroscopic ellipsometry KW - Surface analysis KW - Thin film technology KW - Reference materials PY - 2018 AN - OPUS4-47671 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Schönhals, Andreas A1 - Madkour, Sherif A1 - Gawek, Marcel A1 - Szymoniak, Paulina A1 - Hertwig, Andreas T1 - Growth kinetics and molecular mobility of irreversibly adsorbed layers in thin polymer films N2 - In well-annealed thin polymer films, with non-repulsive polymer/substrate interactions, an irreversibly adsorbed layer is expected to from. These adsorbed layers have shown greate potential for technological applications. However, their growth kinetics and molecular dynamics are still not fully understood. This is partly due to the hard accessibility of these layers in thin films. Here, the irreversibly adsorbed layers of homopolymer thin films are revealed by solvent-leaching experiments. First, the growth kinetics of these layers is investigated as a function of annealing time, annealing temperature, leaching time and the original filme thickness. The film thickness, topography and the quality of the adsorbed layer is controlled by Atomic Force Microscopy (AFM). Secondly, the molecular mobility of the adsorbed layer is investigated by Broadband Dielectric Spectroscopy (BDS). A recently developed nanostructured capacitor arrangement is employed to measure the layer with a free surface. The results are quantitatively compared and discussed with respect to recently published work. T2 - 10th Conference on Broadband Dielectric Spectroscopy and its Applications CY - Brussles, Belgium DA - 26.08.2018 KW - Thin polymer films PY - 2018 AN - OPUS4-45837 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Sachse, René A1 - Hertwig, Andreas A1 - Kraehnert, R. A1 - Hodoroaba, Vasile-Dan T1 - Analysis of mesoporous iridium oxide thin films by the combined methodical approach SEM/EDS/STRATAGem N2 - For the determination of porosity of Ir oxide thin films, electron probe microanalysis (EPMA) can be used as part of a combined SEM/EDS/STRATAGem analysis. The mass deposition (in μg cm-2) of films was calculated with the analysis software STRATAGem via k-values measured with EDS. The average density of coated films was obtained from the mass deposition and the film thickness as measured by the cross-section SEM. The porosity was calculated by dividing the average film density by the bulk (theoretical) density of the film material. Film porosities were counterchecked by spectroscopic ellipsometry (SE) using the Bruggeman effective medium approximation (BEMA). The results obtained by both analytical approaches/methods used, SEM/EDS/STRATAGem and SE were in good agreement. KW - Porous thin films KW - Iridium oxide KW - Electron probe microanalysis (EPMA) KW - Spectroscopic ellipsometry PY - 2018 UR - https://www.cambridge.org/core/journals/microscopy-and-microanalysis/article/analysis-of-mesoporous-iridium-oxide-thin-films-by-the-combined-methodical-approach-semedsstratagem/7607018338B542D8B8C4D944392781EF DO - https://doi.org/10.1017/S1431927618004300 SN - 1431-9276 SN - 1435-8115 VL - 24 IS - S1 (August) SP - 762 EP - 763 PB - Cambridge University Press CY - New York, NY, U.S.A. AN - OPUS4-45951 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hodoroaba, Vasile-Dan A1 - Sachse, René A1 - Hertwig, Andreas A1 - Kraehnert, R. T1 - Analysis of Mesoporous Iridium Oxide Thin Films by the Combined Methodical Approach SEM/EDS/STRATAGem N2 - For the determination of porosity of Ir oxide thin films, electron probe microanalysis (EPMA) can be used as part of a combined SEM/EDS/STRATAGem analysis. The mass deposition (in μg cm-2) of films was calculated with the analysis software STRATAGem via k-values measured with EDS. The average density of coated films was obtained from the mass deposition and the film thickness as measured by the cross-section SEM. The porosity was calculated by dividing the average film density by the bulk (theoretical) density of the film material. Film porosities were counterchecked by spectroscopic ellipsometry (SE) using the Bruggeman effective medium approximation (BEMA). The results obtained by both analytical approaches/methods used, SEM/EDS/STRATAGem and SE were in good agreement. T2 - Microscopy & Microanalysis 2018 CY - Baltimore, MD, USA DA - 05.08.2018 KW - Electron probe microanalysis (EPMA) KW - Iridium oxide KW - Porous thin films KW - Spectroscopic ellipsometry PY - 2018 AN - OPUS4-46509 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Juds, Carmen A1 - Schmidt, J. A1 - Weller, Michael G. A1 - Lange, Thorid A1 - Beck, Uwe A1 - Conrad, T. A1 - Boerner, H. G. T1 - Combining phage display and next-generation sequencing for materials sciences: A case study on probing polypropylene surfaces N2 - Phage display biopanning with Illumina next-generation sequencing (NGS) is applied to reveal insights into peptide-based adhesion domains for polypropylene (PP). One biopanning round followed by NGS selects robust PP-binding peptides that are not evident by Sanger sequencing. NGS provides a significant statistical base that enables motif analysis, statistics on positional residue depletion/enrichment, and data analysis to suppress false-positive sequences from amplification bias. The selected sequences are employed as water-based primers for PP-metal adhesion to condition PP surfaces and increase adhesive strength by 100% relative to nonprimed PP. KW - Polymers KW - Polypropylene KW - Glue KW - Plastics KW - Surface Activation KW - Primer KW - Peptide Library KW - Epoxy KW - Solid-binding Peptides KW - Functionalization KW - Polymer-binding Peptides KW - Adhesion KW - Material-binding Peptides KW - Adhesives PY - 2020 DO - https://doi.org/10.1021/jacs.0c03482 SN - 0002-7863 SN - 1520-5126 VL - 142 IS - 24 SP - 10624 EP - 10628 PB - ACS CY - Washington, DC, USA AN - OPUS4-51123 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Duwe, M. A1 - Florian, C. A1 - Fischer, Daniel A1 - Freiberg, K. A1 - Sahre, Mario A1 - Schneider, S. A1 - Hertwig, Andreas A1 - Krüger, Jörg A1 - Rettenmayr, M. A1 - Beck, Uwe A1 - Undisz, A. A1 - Bonse, Jörn T1 - Thickness Profiling of the Superficial Amorphization and Re-Crystallization of Silicon Induced by Femtosecond Laser Pulses N2 - Crystalline Silicon undergoes a complex phase-change dynamic of melting, amorphization, ablation and re-crystallization upon irradiation with high intensity ultra-short laser pulses [1]. The final state of such a modified surface spot depends on many factors, most notably the local fluence and the surface’s crystal orientation. In this study, we induced superficial structure and phase changes in Silicon <111> and <100> wafers using single femtosecond laser pulses (790 nm, 30 fs) for a range of different peak fluences. The resulting surface modifications were studied in great detail using a number of different techniques, including spectroscopic imaging ellipsometry (SIE), atomic force microscopy, high-resolution transmission electron microscopy (HRTEM), and energy dispersive X-ray spectroscopy within scanning transmission electron microscopy (STEM-EDX). Playing a pivotal role in this work, SIE provided non-destructive measurements for the calculation of the radial amorphous layer-thickness profiles of the irradiated spots using a two-layer thin-film model (Silicon dioxide and amorphous Silicon on a crystalline Silicon substrate). The measurements further allowed for the analysis of the oxide-layer modifications induced by the laser treatment. The results of the SIE-calculations were cross-checked by an in-depth material lamella via HRTEM and STEM-EDX. T2 - 11th Workshop Ellipsometry (WSE 11) CY - Steyr, Austria DA - 06.09.2021 KW - Femtosecond Laser KW - Spectroscopic imaging ellipsometry KW - Amorphization KW - Ablation KW - Re-crystallization PY - 2021 AN - OPUS4-53363 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - RPRT A1 - Beck, Uwe A1 - Fischer, Daniel T1 - MISTRAL-Müller-Matrix-basierte Identifizierung von Inhomogenitäten und strukturellen Anomalien N2 - Mit abbildender Ellipsometrie (imaging ellipsometry: IE) können Nanometer-Beschichtungen/ Degradationen visualisiert und bezüglich Brechungsindex n, Extinktionskoeffizient k und Schichtdicke d charakterisiert werden. Materialseitig werden lokal Homogenität und Isotropie innerhalb eines/mehrerer Bildpunkte (field of analysis: FOA) und messtechnisch global die Ebenheit der Proben bezüglich aller Bildpunkte des Messfeldes vorausgesetzt. Für die Müller-Matrix-basierte abbildende Ellipsometrie (MM-IE), die den optischen Response anisotroper Materialien in jedem Bildpunkt über die bis zu 16 Müller-Matrix-Elemente erfasst, ist dies von besonderer Relevanz. Reale Substrate sind aber oft nicht eben, können lokal Noppen/Mulden (im FOA) aufweisen oder sind global konvex/ konkav im möglichen Messfeld (field of view: FOV) gekrümmt. Diese lokalen/globalen strukturellen Anomalien des Substrats werden schon für die IE messtechnisch/modellseitig oft nicht beherrscht und sind für die MM-IE in der Wirkung auf die MM-Elemente unbekannt. Diese Defizite sollen messtechnisch bzw. modellmäßig behoben und somit die Messung lokal/global gekrümmter Oberflächen ermöglicht werden (MM-CSIE, CS curved surface). KW - Abbildende Ellipsometrie (IE) KW - Müller-Matrix Ellipsometrie (MM-IE) KW - Gekrümmte Oberflächen KW - Schichtdicke KW - Optische Konstanten PY - 2020 SP - 1 EP - 7 AN - OPUS4-51574 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Hielscher-Hofinger, Stefan A1 - Hidde, Gundula A1 - Lange, Thorid A1 - Weise, Matthias A1 - Lerche, D. A1 - Rietz, U. T1 - Adhesion of Coatings vs. Strength of Composite Materials – A Review of Applications Evaluated by Centrifugal Adhesion Testing (CAT) N2 - Sufficient adhesion/tensile strength are basic requirements for any coating/composite material. For coatings, adhesive strength in N/mm2 is of Major interest for various applications such as decorative and water-repellent coatings on wood (paints and varnishes), optical coatings on glass and polymers (reflectors and filters), electrical coatings on semiconductors, glass and polymers (conducting and bondable layers), mechanical coatings on metals and polymers (wear-reduction, scratch-resistance) and adhesion-promoting layers. For composite materials, tensile strength in N/mm2 is also a key quantity for carbon fiber reinforced composites (CFC), laminates and adhesive-bonded joints. Centrifugal adhesion testing (CAT) transfers the single-sample tensile test from a tensile or universal testing machine into an analytical centrifuge as multiple-sample test of up to eight test pieces. The one-sided sample support instead of a two-sided sample clamping and the absence of mounting- and testing-correlated shear forces provides fast and reliable results both for adhesive strength and bonding strength by means of bonded test stamps. For bonding strength, the evaluation of failure pattern from microscopic inspection is required in order to determine the failure pattern according to ISO 10365 such as adhesive failure (AF), delamination failure (DF) and cohesive failure (CF). Hence, one test run by CAT-technology provides either statistics or ranking of up to eight samples at once. For adhesive strength of coatings, a variety of examples is discussed such as ALD-Al203 layers as adhesion promoters, evaporated Ag-layers on N-BK7 glass, sputtered Cr- and Al-layers on Borofloat 33 glass, evaporated Au-films on N-BK7 glass and sputtered SiO2 -layers on CR39 Polymer. Provided adhesive or bonding strength are high enough, the substrate or the joining part may also fail. T2 - Special PSE 2020 CY - Online meeting DA - 07.09.2020 KW - Centrifugal adhesion testing (CAT) KW - Adhesive strength KW - Pull-off test KW - Failure pattern KW - Compound strength PY - 2020 AN - OPUS4-51231 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Weise, Matthias A1 - Hertwig, Andreas A1 - Beck, Uwe T1 - Characterization of Surface Topometry and Determination of Layer Thickness by Scanning White Light Interference Microscopy N2 - 3D coherence scanning interferometry (CSI) is an optical, non-contact and rapide measurement technique using a defined bandwidth of white light at normal incidence. Based on this operational principle, white light interference microscopy (WLIM) provides three-dimensional surface topometry data up to a resolution of 0.4 μm lateral and 0.1 nm vertical. Three operating modi, i.e. surface, films and advanced films, enable measurements of step heights, roughness, wear volume, cone angle, surface pattern and layer thickness of transparent coatings. The determination of layer thickness by WLIM requires the knowledge of optical constants, i.e.the refractive index n and the extinction coefficient k. For technical surfaces, data base values - if available at all - have to be determined or validated by spectroscopic ellipsometry (SE). From this oblique incidence technique both optical constants and layer thickness can be derived based on a model for at least semi-transparent coatings. For different layer thicknesses, a comparison is made between WLIM and SE. Measurement uncertainty is discussed for both topometric features and layer thickness for different use cases. Traceability to SI system is ensured by certified standards (PTB/NIST) within a DAkkS DIN EN ISO/IEC 17025:2018 accredited lab. T2 - 17th International Conference on Plasma Surface Engineering (PSE) CY - Erfurt, Germany DA - 07.09.2020 KW - Rroughness and step heights KW - Lateral surface pattern KW - Layer thickness of transparent coatings KW - Scanning white light interferometry KW - Spectroscopic ellipsometry PY - 2020 AN - OPUS4-51301 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Arinchtein, A. A1 - Schnack, R. A1 - Kraffert, K. A1 - Radnik, Jörg A1 - Dietrich, P. A1 - Sachse, René A1 - Krähnert, R. T1 - Role of Water in Phase Transformations and Crystallization of Ferrihydrite and Hematite N2 - The oxides, hydroxides, and oxo-hydroxides of iron belong to the most abundant materials on earth. They also feature a wide range of practical applications. In many environments, they can undergo facile phase transformations and crystallization processes. Water appears to play a critical role in many of these processes. Despite numerous attempts, the role of water has not been fully revealed yet. We present a new approach to study the influence of water in the crystallization and phase transformations of iron oxides. The approach employs model-type iron oxide films that comprise a defined homogeneous nanostructure. The films are exposed to air containing different amounts of water reaching up to pressures of 10 bar. Ex situ analysis via scanning electron microscopy, Transmission electron microscopy, selected area electron diffraction, and X-ray diffraction is combined with operando near-ambient pressure X-ray photoelectron spectroscopy to follow water-induced changes in hematite nd ferrihydrite. Water proves to be critical for the nucleation of ematite domains in ferrihydrite, the resulting crystallite orientation, and the underlying crystallization mechanism. KW - Iron oxide KW - Ferrihydrite KW - Hematite KW - Water KW - NAP-XPS KW - High pressure PY - 2020 DO - https://doi.org/10.1021/acsami.0c05253 VL - 12 SP - 38714 EP - 38722 PB - ACS Publication AN - OPUS4-51201 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Sachse, René A1 - Pflüger, Mika A1 - Velasco-Vélez, Juan-Jesús A1 - Sahre, Mario A1 - Radnik, Jörg A1 - Bernicke, Michael A1 - Bernsmeier, Denis A1 - Hodoroaba, Vasile-Dan A1 - Krumrey, Michael A1 - Strasser, Peter A1 - Hertwig, Andreas A1 - Kraehnert, Ralph T1 - Operando electrochemical spectroscopic ellipsometry: Material properties of highly active mesoporous IrO IrOxfilms revealed under realistic OER conditions N2 - Rising energy demand and the impending climate change require the development of a sustainable, fossil-free fuel and chemical production on a global scale. Hydrogen production via water electrolysis will be a fundamental cornerstone in this endeavor. The activity and stability of respective electrode coatings strongly depends on the coating's properties, i.e. phase composition, crystallinity, electrical conductivity, accessible surface, wettability and many other factors. The key to the development of improved catalysts is a better understanding of the relations between their performance, stability and physicochemical properties. However, those relations can be complex, and are strongly influenced also by the reaction environment. Hence, operando analysis of the catalyst material during catalysis at realistic potentials and current densities is highly desirable. Yet, many analytical techniques cannot be applied in liquid environments at realistic potentials and current densities. We propose environmental ellipsometric analysis in a dedicated electrochemical flow cell as a new method to evaluate gas evolution reactions operando under realistic working conditions. Figure 1 illustrates schematically the developed technique. Key factors to success are highly active model-type catalysts with template-controlled porosity, a suitable sample environment, a deep understanding of the spectroscopic method and respective model development, as well as concise cross validation with numerous other analytical techniques. The method was developed and validated by analyzing a calcination series (300 - 600°C) of mesoporous templated IrOx films ex-situ and operando under oxygen evolution reaction (OER) conditions. The employed environmental electrochemical spectroscopic ellipsometric analysis (ECSE) revealed during OER the change of optical and electronic properties, i.e. the dielectric functions (real ε1 and imaginary part ε2), electrical and electronic properties such as resistivity (ρ) and band-to-band transitions (p-d band transitions). Film thickness and porosity were validated by means of scanning electron microscopy (SEM), X-ray reflectometry (XRR) or ellipsometric porosimetry (EP), electrical and electronic properties by means of conductivity measurements, X-ray photoelectron spectroscopy (XPS) or UV-Vis-NIR absorption spectroscopy. The electronic structures of the catalysts from valence electron energy loss spectra (VEELS) derived from the real (ε1) and imaginary part (ε2) of the dielectric function from SE measurements reveal a direct correlation with electrochemical activities in OER. In the presentation reversible and irreversible potential-dependent changes of the catalyst properties during operation will be discussed along with the dynamics of gas formation, transport and dissolution at different potentials. T2 - 54. Jahrestreffen deutscher Katalytiker CY - Online meeting DA - 16.03.2021 KW - Spectroscopic ellipsometry KW - Electrocatalysis KW - Oxygen evolution reaction KW - Mesoporous iridium oxide films KW - Non-destructive operando analysis PY - 2021 AN - OPUS4-52928 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Sachse, René A1 - Pflüger, Mika A1 - Velasco-Vélez, Juan-Jesús A1 - Sahre, Mario A1 - Radnik, Jörg A1 - Bernicke, Michael A1 - Bernsmeier, Denis A1 - Hodoroaba, Vasile-Dan A1 - Krumrey, Michael A1 - Strasser, Peter A1 - Hertwig, Andreas A1 - Kraehnert, Ralph T1 - Operando electrochemical spectroscopic ellipsometry: Material properties of highly active mesoporous IrO IrOxfilms revealed under realistic OER conditions N2 - Rising energy demand and the impending climate change require the development of a sustainable, fossil-free fuel and chemical production on a global scale. Hydrogen production via water electrolysis will be a fundamental cornerstone in this endeavor. The activity and stability of respective electrode coatings strongly depends on the coating's properties, i.e. phase composition, crystallinity, electrical conductivity, accessible surface, wettability and many other factors. The key to the development of improved catalysts is a better understanding of the relations between their performance, stability and physicochemical properties. However, those relations can be complex, and are strongly influenced also by the reaction environment. Hence, operando analysis of the catalyst material during catalysis at realistic potentials and current densities is highly desirable. Yet, many analytical techniques cannot be applied in liquid environments at realistic potentials and current densities. We propose environmental ellipsometric analysis in a dedicated electrochemical flow cell as a new method to evaluate gas evolution reactions operando under realistic working conditions. Figure 1 illustrates schematically the developed technique. Key factors to success are highly active model-type catalysts with template-controlled porosity, a suitable sample environment, a deep understanding of the spectroscopic method and respective model development, as well as concise cross validation with numerous other analytical techniques. The method was developed and validated by analyzing a calcination series (300 - 600°C) of mesoporous templated IrOx films ex-situ and operando under oxygen evolution reaction (OER) conditions. The employed environmental electrochemical spectroscopic ellipsometric analysis (ECSE) revealed during OER the change of optical and electronic properties, i.e. the dielectric functions (real ε1 and imaginary part ε2), electrical and electronic properties such as resistivity (ρ) and band-to-band transitions (p-d band transitions). Film thickness and porosity were validated by means of scanning electron microscopy (SEM), X-ray reflectometry (XRR) or ellipsometric porosimetry (EP), electrical and electronic properties by means of conductivity measurements, X-ray photoelectron spectroscopy (XPS) or UV-Vis-NIR absorption spectroscopy. The electronic structures of the catalysts from valence electron energy loss spectra (VEELS) derived from the real (ε1) and imaginary part (ε2) of the dielectric function from SE measurements reveal a direct correlation with electrochemical activities in OER. In the presentation reversible and irreversible potential-dependent changes of the catalyst properties during operation will be discussed along with the dynamics of gas formation, transport and dissolution T2 - E MRS 2021 SPRING MEETING CY - Online meeting DA - 31.05.2021 KW - Spectroscopic ellipsometry KW - Ectrocatalysis KW - Oxygen evolution reaction KW - Mesoporous iridium oxide films KW - Non-destructive operando analysis PY - 2021 AN - OPUS4-52929 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - RPRT A1 - Beck, Uwe A1 - Ermilova, Elena A1 - Schneider, S. A1 - Peters, S. T1 - Gemeinsamer Abschlussbericht WIPANO-Vorhaben „Standardisierung und Normung der Ellipsometrie als universeller Spektroskopie“ N2 - Im Vorhaben SNELLIUS wurden in enger Zusammenarbeit der BAM mit den Firmen Accurion und SENTECH Instruments aufbauend auf der Norm DIN 50989-1 „Ellipsometrie - Teil 1: Grundlagen; Ellipsometry – Part 1: Principles“ insgesamt fünf Normenentwürfe erarbeitet, die fünf Modell-basierten Anwendungsfällen der Ellipsometrie entsprechen. Unter Berücksichtigung des neuartigen Modell-basierten Normungskonzepts wurde in den Normenentwürfen erstmals eine GUM- und DIN EN ISO/IEC 17025:2018 konforme Bestimmung bzw. Abschätzung der Messunsicherheit umgesetzt. Dies erforderte neben der textlichen Erstellung auch umfangreiche experimentelle Arbeiten bei den Firmen, Vergleichsversuche und komplementäre Modell- und Datenevaluierungen, da sowohl die verwendete ellipsometrische Hardware (unterschiedliche ellipsometrische Funktionsprinzipien) als auch die ellipsometrische Software (Modell-Randbedingungen, Fitalgorithmus) firmenspezifisch zum Teil sehr unterschiedlich sind. Hierbei mussten in einem Konsensprozess Lösungen gefunden werden, die die beiden deutschen Ellipsometer-Anbieter Accurion (Imaging-Ellipsometrie) und SENTECH Instruments (Mapping Ellipsometrie) gleichermaßen akzeptieren konnten und die zudem einen Transfer auf die Internationale Ebene (ISO Norm) ermöglichen, also vom Grundsatz her auch auf weitere Ellipsometerhersteller wie (J. A. Woollam Co., USA; SEMILAB, Ungarn; HORIBA, Japan) mit wieder anderen ellipsometrischen Funktionsprinzipien, Hard- und Softwarelösungen anwendbar sind. Die weitgehende Unabhängigkeit von ellipsometrischen Funktionsprinzipien, Hard- und Softwarelösungen wurde dadurch erreicht, dass normativ festgelegt wurde, dass die ellipsometrischen Größen PSI und DELTA im Sinne von DIN ENISO/IEC 17025 als Rohdaten fungieren. KW - Ellipsometrie-Norm KW - Messunsicherheit ellipsometrischer Messungen KW - Validierungskonzepte ellipsometrischer Messungen KW - DIN 50989, Teile 1 bis 6 KW - DIN EN ISO/IEC 17025:2018 und GUM Kompatibilität PY - 2021 SP - 1 EP - 16 AN - OPUS4-52857 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Baier, Jennifa A1 - Fischer, Daniel A1 - Griepentrog, Michael A1 - Hertwig, Andreas A1 - Hielscher-Hofinger, Stefan A1 - Sahre, Mario A1 - Stockmann, Jörg Manfred A1 - Weise, Matthias T1 - Mapping und Imaging modifizierter Oberflächen: Generische Kenngrößen, Fehlstellen, Reinigungszustand und Haftfestigkeit N2 - Der Vortrag widmet sich dem Mapping und Imaging modifizierter Oberflächen: Generische Kenngrößen, Fehlstellen, Reinigungszustand und Haftfestigkeit. Es werden Untersuchungsmethoden zu ihrer Prüfung dargestellt. T2 - 37. ak-adp 2021, Jena CY - Online meeting DA - 16.06.2021 KW - Qualitätssicherung KW - Mapping modifizierter Oberflächen KW - Generische Kenngrößen KW - Haftfestigkeit KW - Klebfestigkeit PY - 2021 AN - OPUS4-52870 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Baier, Jennifa A1 - Fischer, Daniel A1 - Griepentrog, Michael A1 - Hertwig, Andreas A1 - Hielscher-Hofinger, Stefan A1 - Stockmann, Jörg Manfred A1 - Weise, Matthias T1 - Mapping und Imaging modifizierter Oberflächen: Generische Kenngrößen, Fehlstellen, Reinigungszustand und Haftfestigkeit N2 - Der Vortrag widmet sich dem Mapping und Imaging modifizierter Oberflächen: generische Kenngrößen, Fehlstellen, Reinigungszustand und Haftfestigkeit. Es werden Untersuchungsmethoden zu ihrer Prüfung dargestellt. T2 - 37. ak-adp 2021 CY - Jena, Germany DA - 16.06.2021 KW - Qualitätssicherung KW - Mapping modifizierter Oberflächen KW - Imaging modifizierter Oberflächen KW - Generische Kenngrößen KW - Haftfestigkeit KW - Klebfestigkeit PY - 2021 SP - 1 EP - 10 AN - OPUS4-52893 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Sachse, René T1 - Towards hydrogen economy: correlative ex-situ ellipsometric analysis and operando investigation during oxygen evolution reaction of mesoporous iridium oxides films N2 - In the face of rising energy demand and the impending climate change the development of a sustainable, fossil-free fuel and chemical production is of global importance. One possible goal is the development of electrochemical conversion processes using catalysts. Porous materials play an important role in such energy applications. The key to the development of improved catalysts is a better understanding of the relations between their performance, stability and physico-chemical properties. However, the complex morphology of such catalysts constitutes a challenge even for modern analytical techniques. Spectroscopic ellipsometry (SE) is a versatile method for studying material properties by using appropriate models (e.g. film thickness, optical and electronic properties). The fact that the material properties cannot be taken directly from the measured spectra, the developed models have to be validated. In a first step, the model for the ellipsometric fit studies of a calcination series of mesoporous iridium oxide films (300 – 600 °C) was investigated and validated with respect to their material properties. Moreover, the electronic structures of the catalysts reveal a direct correlation with electrochemical activities. The development of an environmental cell offers the possibility of investigations under real conditions. This will allow changes in the optical and electronic properties during the electrocatalytic oxygen evolution reaction. T2 - Colloquium Department Seminar 6. CY - BAM, Berlin, Germany DA - 03.03.2020 KW - Hydrogen economy KW - Correlative ex-situ ellipsometric analysis KW - Ellipsometric operando investigation KW - Oxygen evolution reaction KW - Mesoporous iridium oxides films PY - 2020 AN - OPUS4-51215 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - RPRT A1 - Beck, Uwe A1 - Hielscher, Stefan A1 - Lerche, D. T1 - Abschlussbericht zum BMWi - MNPQ – Verbundprojekt QUO VADIS PLUS (Mehr-Proben-Festigkeitsprüfung zur Qualitätssicherung in der Materialtechnik und Validierung der Zentrifugentechnologie bei Druck- bzw. Zugbeanspruchung) N2 - Im Fokus des Vorhabens steht das mit dem Innovationspreis Berlin-Brandenburg 2012 ausgezeichnete Mehr-Proben-Prüfverfahren zur Festigkeitsprüfung unter Verwendung einer analytischen Zentrifuge mit dem Ziel des Einsatzes in der Qualitätssicherung. Nachdem im MNPQ-Projekt QUO VADIS die grundsätzliche Anwendbarkeit der Zentrifugentechnologie auf Beanspruchungen auf Zug (Kleb-, Haft- und Verbundfestigkeit) nachgewiesen worden war, wurden im Vorhaben QUO VADIS PLUS folgende erweiterte Prüfszenarien und technische Weiterentwicklungen etabliert: 1. Beanspruchung auf Druck (Härte von Materialien, Kompressibilität von Schäumen, Kompaktierbarkeit von Pulvern), 2. Erweiterung der Beanspruchung auf Zug (Kombination von Normal- und Lateralkräften), 3. Erweiterung auf die Bewertung plasto-elastischenn Materialverhaltens, 4. Vermeidung von Schockwellen im Hochlastbereich KW - Analytische Zentrifuge KW - Mehr-Proben-Prüfverfahren KW - Härte KW - Kompressibilität KW - Kompaktierbarkeit KW - Haftfestigkeit KW - Klebfestigkeit KW - Verbundfestigkeit PY - 2019 N1 - Das Dokument unterliegt der Vertraulichkeit und kann nicht zugänglich gemacht werden Projektlaufzeit: 01.05.2015 bis 28.02.2019 The document is subject to confidentiality restrictions and cannot be made accessible Project runtime: 01.05.2015 to 28.02.2019 SP - 1 EP - 20 AN - OPUS4-50406 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Duwe, M. A1 - Quast, J.-H. A1 - Schneider, S. A1 - Fischer, Daniel A1 - Beck, Uwe T1 - Thin-film metrology of tilted and curved surfaces by imaging Mueller-matrix ellipsometry N2 - For the vast majority of ellipsometric measurements, the application of planar substrates is mandatory and requires a proper sample alignment prior to the measurement. Here, the authors present a generalized approach of how to extract the isotropic ellipsometric sample parameters from an imaging Mueller-matrix measurement even if the sample is significantly misaligned. They validate the method by layer-thickness calculations based on imaging Mueller-matrix measurements of flat crystalline silicon samples that were misaligned on purpose. Furthermore, they also exploit this method’s capabilities to perform spatially resolved layer-thickness measurements of a single-layer indium-tin-oxide coating on a fused-silica microlens without the need of realignment or repositioning of the sample during the measurement. T2 - 8th International conference on spectroscopic ellipsometry (ICSE-8) CY - Barcelona, Spain DA - 26.05.2019 KW - Metrology KW - Thin films KW - Polarization spectroscopy KW - Spectroskopic Imaging KW - Mueller-Matrix imaging ellipsometry PY - 2019 DO - https://doi.org/10.1116/1.5122757 SN - 2166-2746 SN - 2327-9877 VL - 37 IS - 6 SP - 062908 PB - AIP CY - New York, NY AN - OPUS4-50209 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -