TY - CONF A1 - Beck, Uwe A1 - Griepentrog, Michael A1 - Hertwig, Andreas A1 - Hielscher-Hofinger, Stefan A1 - Lange, Thorid A1 - Weise, Matthias T1 - Uncertainty budgets in surface technology: stepheigt, layerthickness, indentation hardness, adehesive strength N2 - The object (sample) and the measurement/testing procedure may always have unknown degrees of freedom, i.e. instead of 𝐯 ≄ n – 1 in many cases 𝐯 ≫ n - 1 may apply, in particular in the micro- and nano-world! T2 - 10. VDI-Fachtagung, Messunsicherheit und PrĂŒfprozesse CY - Erfurt, Germany DA - 10.11.2021 KW - Methodology in metrology KW - Methodology in testing KW - Spectroscopic Ellipsometry KW - Instrumented Indentation Testing (IIT) KW - Centrifugal Adhesion Testing (CAT) PY - 2021 AN - OPUS4-53986 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Sachse, RenĂ© A1 - Moor, MaĂ«lle A1 - Kraehnert, Ralph A1 - Hodoroaba, Vasile-Dan A1 - Hertwig, Andreas T1 - Ellipsometry-based approach for the characterization of mesoporous thin films for H2 technologies N2 - Porous thin layer materials are gaining importance in different fields of technology and pose a challenge to the accurate determination of materials properties important for their function. In this work, we demonstrate a hybrid measurement technique using ellipsometry together with other independent methods for validation. Ellipsometry provides information about the porosity of different mesoporous films (PtRuNP/OMC = 45%; IrOx = 46%) as well as about the pore size (pore radius of ca. 5 nm for PtRuNP/OMC). In addition, the electronic structure of a material, such as intraband transitions of a mesoporous IrOx film, can be identified, which can be used to better understand the mechanisms of chemical processes. In addition, we show that ellipsometry can be used as a scalable imaging and visualization method for quality assurance in production. These require accurate and traceable measurements, with reference materials playing an important role that include porosity and other related properties. We show that our novel analytical methods are useful for improving analytical work in this entire field. KW - Porous materials KW - Electrolysis KW - Spectroscopic ellipsometry KW - Hybrid metrology measurement KW - Electron microscopy PY - 2021 DO - https://doi.org/10.1002/adem.202101320 SP - 1 EP - 17 PB - Wiley-VCH AN - OPUS4-53960 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Frisch, M. A1 - Raza, M. H. A1 - Ye, M.-Y. A1 - Sachse, RenĂ© A1 - Paul, B. A1 - Gunder, R. A1 - Pinna, N. A1 - Kraehnert, R. T1 - ALD-coated mesoporous iridium-titanium mixed oxides: Maximizing iridium utilization for an outstanding OER performance N2 - With the increasing production of renewable energy and concomitant depletion of fossil resources, the demand for efficient water splitting electrocatalysts continues to grow. Iridium (Ir) and iridium oxides (IrOₓ) are currently the most promising candidates for an efficient oxygen evolution reaction (OER) in acidic medium, which remains the bottleneck in water electrolysis. Yet, the extremely high costs for Ir hamper a widespread production of hydrogen (H₂) on an industrial scale. Herein, the authors report a concept for the synthesis of electrode coatings with template-controlled mesoporosity surface-modified with highly active Ir species. The improved utilization of noble metal species relies on the synthesis of soft-templated metal oxide supports and a subsequent shape-conformal deposition of Ir species via atomic layer deposition (ALD) at two different reaction temperatures. The study reveals that a minimum Ir content in the mesoporous titania-based support is mandatory to provide a sufficient electrical bulk conductivity. After ALD, a significantly enhanced OER activity results in dependency of the ALD cycle number and temperature. The most active developed electrocatalyst film achieves an outstanding mass-specific activity of 2622 mA mg(Ir)⁻Âč at 1.60 V(RHE) in a rotating-disc electrode (RDE) setup at 25 °C using 0.5 m H₂SO₄ as a supporting electrolyte. KW - Acidic oxygen evolution reaction KW - Atomic layer deposition KW - Electrocatalysis KW - Iridium oxide KW - Soft-templated mesoporous films PY - 2022 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-542651 DO - https://doi.org/10.1002/admi.202102035 SN - 2196-7350 SP - 1 EP - 11 PB - Wiley-VCH CY - Weinheim AN - OPUS4-54265 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Griepentrog, Michael A1 - Hertwig, Andreas A1 - Hielscher-Hofinger, S. A1 - Lange, Thorid A1 - Weise, Matthias T1 - Uncertainty budgets in surface techno-logy: step height, layer thickness, indentation hardness, adehesive strength N2 - The object (sample) and the measurement/testing procedure may always have unknown degrees of freedom, i.e. instead of 𝐯 ≄ n – 1 in many cases 𝐯 ≫ n - 1 may apply, in particular in the micro- and nano-world! T2 - 10. VDI-Fachtagung, Messunsicherheit und PrĂŒfprozesse CY - Erfurt, Germany DA - 10.11.2021 KW - Methodology in metrology KW - Methodology in testing KW - Spectroscopic Ellipsometry KW - Instrumented Indentation (IIT) KW - Centrifugal Adhesion Testing (CAT) PY - 2021 AN - OPUS4-53739 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Ermilova, Elena A1 - Hertwig, Andreas A1 - Beck, Uwe A1 - Schneider, S. A1 - Peters, S. T1 - Development of a standard series for ellipsometry N2 - Ellipsometry is a powerful tool, which allows the investigation of material properties over a broad spectral range. Over the course of several years, the ellipsometry lab at BAM has become an accredited testing lab according to ISO/IEC 17025 laying bare the need of better methods for accuracy and traceability. Despite its wide range of application in both research and development as well as industry, there have been no generally accepted standards dealing with model validation and measurement uncertainties. Based on the first German standard DIN 50989 – 1: 2018 Ellipsometry - Part 1: Principles (currently international standard ISO 23131: 2021) and under consideration of GUM [1] a series of standards for ellipsometry was developed. The entire 6-part series covers several model-based application cases. This standards series avoids having narrow and material specific application cases but instead classifies applications of ellipsometry according to the sample complexity. The concept of ellipsometric transfer quantities (Κ and Δ or alternatively the elements of transfer matrices) is implemented in the series. For each application case a model-based validation strategy was developed. Thus, the standards are applicable to all materials, instruments and measuring principles. The uniform structure concept of the series facilitates its practical applicability for users. The standards include the model-based GUM-compliant determination/estimation of the measurement uncertainties. In addition, the appendices of the documents contain numerous measurement and simulation examples as well as recommendations for measuring practice. In this contribution we present the application cases and basic structure of the standards developed in collaboration with Accurion GmbH and SENTECH Instruments GmbH in the project SNELLIUS. T2 - 11th Workshop Ellipsometry (WSE 11) CY - Steyr, Austria DA - 06.09.2021 KW - Standardization of ellipsometry KW - DIN 50989 Parts 1 – 6 KW - ISO 23131: 2021 KW - Validation concepts of ellipsometric measurements KW - Uncertainty budgets KW - GUM-compliance PY - 2021 AN - OPUS4-53250 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - RPRT A1 - Beck, Uwe A1 - Ermilova, Elena A1 - Schneider, S. A1 - Peters, S. T1 - Gemeinsamer Abschlussbericht WIPANO-Vorhaben „Standardisierung und Normung der Ellipsometrie als universeller Spektroskopie“ N2 - Im Vorhaben SNELLIUS wurden in enger Zusammenarbeit der BAM mit den Firmen Accurion und SENTECH Instruments aufbauend auf der Norm DIN 50989-1 „Ellipsometrie - Teil 1: Grundlagen; Ellipsometry – Part 1: Principles“ insgesamt fĂŒnf NormenentwĂŒrfe erarbeitet, die fĂŒnf Modell-basierten AnwendungsfĂ€llen der Ellipsometrie entsprechen. Unter BerĂŒcksichtigung des neuartigen Modell-basierten Normungskonzepts wurde in den NormenentwĂŒrfen erstmals eine GUM- und DIN EN ISO/IEC 17025:2018 konforme Bestimmung bzw. AbschĂ€tzung der Messunsicherheit umgesetzt. Dies erforderte neben der textlichen Erstellung auch umfangreiche experimentelle Arbeiten bei den Firmen, Vergleichsversuche und komplementĂ€re Modell- und Datenevaluierungen, da sowohl die verwendete ellipsometrische Hardware (unterschiedliche ellipsometrische Funktionsprinzipien) als auch die ellipsometrische Software (Modell-Randbedingungen, Fitalgorithmus) firmenspezifisch zum Teil sehr unterschiedlich sind. Hierbei mussten in einem Konsensprozess Lösungen gefunden werden, die die beiden deutschen Ellipsometer-Anbieter Accurion (Imaging-Ellipsometrie) und SENTECH Instruments (Mapping Ellipsometrie) gleichermaßen akzeptieren konnten und die zudem einen Transfer auf die Internationale Ebene (ISO Norm) ermöglichen, also vom Grundsatz her auch auf weitere Ellipsometerhersteller wie (J. A. Woollam Co., USA; SEMILAB, Ungarn; HORIBA, Japan) mit wieder anderen ellipsometrischen Funktionsprinzipien, Hard- und Softwarelösungen anwendbar sind. Die weitgehende UnabhĂ€ngigkeit von ellipsometrischen Funktionsprinzipien, Hard- und Softwarelösungen wurde dadurch erreicht, dass normativ festgelegt wurde, dass die ellipsometrischen GrĂ¶ĂŸen PSI und DELTA im Sinne von DIN ENISO/IEC 17025 als Rohdaten fungieren. KW - Ellipsometrie-Norm KW - Messunsicherheit ellipsometrischer Messungen KW - Validierungskonzepte ellipsometrischer Messungen KW - DIN 50989, Teile 1 bis 6 KW - DIN EN ISO/IEC 17025:2018 und GUM KompatibilitĂ€t PY - 2021 SP - 1 EP - 16 AN - OPUS4-52857 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Baier, Jennifa A1 - Fischer, Daniel A1 - Griepentrog, Michael A1 - Hertwig, Andreas A1 - Hielscher-Hofinger, Stefan A1 - Sahre, Mario A1 - Stockmann, Jörg Manfred A1 - Weise, Matthias T1 - Mapping und Imaging modifizierter OberflĂ€chen: Generische KenngrĂ¶ĂŸen, Fehlstellen, Reinigungszustand und Haftfestigkeit N2 - Der Vortrag widmet sich dem Mapping und Imaging modifizierter OberflĂ€chen: Generische KenngrĂ¶ĂŸen, Fehlstellen, Reinigungszustand und Haftfestigkeit. Es werden Untersuchungsmethoden zu ihrer PrĂŒfung dargestellt. T2 - 37. ak-adp 2021, Jena CY - Online meeting DA - 16.06.2021 KW - QualitĂ€tssicherung KW - Mapping modifizierter OberflĂ€chen KW - Generische KenngrĂ¶ĂŸen KW - Haftfestigkeit KW - Klebfestigkeit PY - 2021 AN - OPUS4-52870 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Baier, Jennifa A1 - Fischer, Daniel A1 - Griepentrog, Michael A1 - Hertwig, Andreas A1 - Hielscher-Hofinger, Stefan A1 - Stockmann, Jörg Manfred A1 - Weise, Matthias T1 - Mapping und Imaging modifizierter OberflĂ€chen: Generische KenngrĂ¶ĂŸen, Fehlstellen, Reinigungszustand und Haftfestigkeit N2 - Der Vortrag widmet sich dem Mapping und Imaging modifizierter OberflĂ€chen: generische KenngrĂ¶ĂŸen, Fehlstellen, Reinigungszustand und Haftfestigkeit. Es werden Untersuchungsmethoden zu ihrer PrĂŒfung dargestellt. T2 - 37. ak-adp 2021 CY - Jena, Germany DA - 16.06.2021 KW - QualitĂ€tssicherung KW - Mapping modifizierter OberflĂ€chen KW - Imaging modifizierter OberflĂ€chen KW - Generische KenngrĂ¶ĂŸen KW - Haftfestigkeit KW - Klebfestigkeit PY - 2021 SP - 1 EP - 10 AN - OPUS4-52893 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Duwe, M. A1 - Florian, C. A1 - Fischer, Daniel A1 - Freiberg, K. A1 - Sahre, Mario A1 - Schneider, S. A1 - Hertwig, Andreas A1 - KrĂŒger, Jörg A1 - Rettenmayr, M. A1 - Beck, Uwe A1 - Undisz, A. A1 - Bonse, Jörn T1 - Thickness Profiling of the Superficial Amorphization and Re-Crystallization of Silicon Induced by Femtosecond Laser Pulses N2 - Crystalline Silicon undergoes a complex phase-change dynamic of melting, amorphization, ablation and re-crystallization upon irradiation with high intensity ultra-short laser pulses [1]. The final state of such a modified surface spot depends on many factors, most notably the local fluence and the surface’s crystal orientation. In this study, we induced superficial structure and phase changes in Silicon <111> and <100> wafers using single femtosecond laser pulses (790 nm, 30 fs) for a range of different peak fluences. The resulting surface modifications were studied in great detail using a number of different techniques, including spectroscopic imaging ellipsometry (SIE), atomic force microscopy, high-resolution transmission electron microscopy (HRTEM), and energy dispersive X-ray spectroscopy within scanning transmission electron microscopy (STEM-EDX). Playing a pivotal role in this work, SIE provided non-destructive measurements for the calculation of the radial amorphous layer-thickness profiles of the irradiated spots using a two-layer thin-film model (Silicon dioxide and amorphous Silicon on a crystalline Silicon substrate). The measurements further allowed for the analysis of the oxide-layer modifications induced by the laser treatment. The results of the SIE-calculations were cross-checked by an in-depth material lamella via HRTEM and STEM-EDX. T2 - 11th Workshop Ellipsometry (WSE 11) CY - Steyr, Austria DA - 06.09.2021 KW - Femtosecond Laser KW - Spectroscopic imaging ellipsometry KW - Amorphization KW - Ablation KW - Re-crystallization PY - 2021 AN - OPUS4-53363 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Mirabella, Francesca A1 - Mezera, Marek A1 - Wasmuth, Karsten A1 - Hertwig, Andreas A1 - Richter, Anja A1 - Schwibbert, Karin A1 - KrĂŒger, Jörg A1 - Bonse, Jörn A1 - Hodoroaba, Vasile-Dan T1 - ToF-SIMS as a new tool for nano-scale investigation of ps-laser-generated surface structures on titanium substrates N2 - In recent years, the fabrication of laser-generated surface structures on metals such as titanium surfaces have gained remarkable interests, being technologically relevant for applications in optics, medicine, fluid transport, tribology, and wetting of surfaces. The morphology of these structures, and so their chemistry, is influenced by the different laser processing parameters such as the laser fluence, wavelength, pulse repetition rate, laser light polarization type and direction, angle of incidence, and the effective number of laser pulses per beam spot area. However, the characterization of the different surface structures can be difficult because of constraints regarding the analytical information from both depth and the topographic artifacts which may limit the lateral and depth resolution of elemental distributions as well as their proper quantification. A promising technique to investigate these structures even at the nano-scale is Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS), a very surface sensitive technique that at the same time allows to perform depth-profiling, imaging and 3D-reconstruction of selected ion-sputter fragment distributions on the surface. In this study we combine chemical analyses such as Energy Dispersive X-ray spectroscopy (EDX) and high-resolution scanning electron microscopy (SEM) analyses with ToF-SIMS to fully characterize the evolution of various types of laser-generated micro- and nanostructures formed on Ti and Ti alloys at different laser fluence levels, effective number of pulses and at different pulse repetition rates (1 – 400 kHz), following irradiation by near-infrared ultrashort laser pulses (925 fs, 1030 nm) in air environment or under argon gas flow. We show how this combined surface analytical approach allows to evaluate alteration in the surface chemistry of the laser-generated surface structures depending on the laser processing parameters and the ambient environment. T2 - European Materials Research Society (EMRS) Fall Meeting 2021 CY - Online meeting DA - 20.09.2021 KW - ToF SIMS KW - Nano characterization PY - 2021 AN - OPUS4-53366 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hertwig, Andreas A1 - Ermilova, Elena A1 - Sachse, RenĂ© A1 - Beck, Uwe T1 - Accuracy, traceability, and standardization in spectroscopic ellipsometry N2 - Ellipsometry has been an extremely successful and fast expanding method in the past decades along with other related techniques using polarisation sensitive measurements. Opening new fields of application for a successful measurement technique brings some requirements and issues that have to be solved. From a metrological point of view, ellipsometry has the problem that uncertainties are difficult to determine for model-based analysis techniques in general. In this presentation, we will explore how the usefulness of polarimetric methods like ellipsometry can be increased. Ellipsometry as a method could profit from several current developments which will be discussed in this presentation: ‱ Standardisation initiatives on national and international level developing standards for best practice when using ellipsometry. A series of at least six standards is currently developed on national German and international level covering different levels of sample complexity. ‱ Projects on traceability of ellipsometry and structured surface spectrometry as well as new dielectric function database initiatives. ‱ Metadata handling and data ontology providing a better framework for exchange and collaborative use of research data. We will also explore the quantification of measurement uncertainty using examples from projects in which BAM is involved. Examples will be presented of multilayer and non-ideal materials as well as the determination of layer properties for technical applications such as thin layer catalysts and complex polymers. The definition of reference materials will be discussed. T2 - 11th Workshop Ellipsometry (WSE 11) CY - Steyr, Austria DA - 06.09.2021 KW - Ellipsometry KW - Uncertainty KW - Surface analytics KW - Data science PY - 2021 AN - OPUS4-53295 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Hertwig, Andreas A1 - Othake, N. A1 - Hiratsuka, M. T1 - Ellipsometrische Klassifizierung von Kohlenstoffschichten N2 - Der Vortrag widmet sich der „ELLIPSOMETRISCHE KLASSIFIZIERUNG VON KOHLENSTOFFSCHICHTEN“ und beschreibt die Punkte: 1. Anwendungen Kohlenstoffschichten–Carbon–based films (DLC) aus dem Vortrag N. Ohtakeet. al. (ISO TC 107, Tokyo 2017),2. PrĂ€paration der Kohlenstoffschichten fĂŒr ISO TC 107 Ringversuch aus Vortrag M. Hiratsuka et. al. (ISO TC 107, Tokyo 2017), 3. Ellipsometrische Charakterisierung von Kohlenstoffschichten, Ergebnisse des Ringversuchs (ISO TC 107, Tokyo 2017) Vortrag Beck et. al. und 4.Deutsche NormungsaktivitĂ€ten national/international zur Ellipsometrie DIN NA 062-01-061 (DIN 50989-1)/TC 107 (PWI DE)“ im Einzelnen. T2 - Netzwerksymposium “schĂŒtzen und Veredeln von OberflĂ€chen”, Wildau CY - TH Wildau, Germany DA - 01.03.2018 KW - Anwendung von Kohlenstoffschichten KW - Klassifizierung von Kohlenstoffschichten KW - Ringversuch Ellipsometrie KW - Normung Ellipsometrie PY - 2018 AN - OPUS4-44340 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Griepentrog, Michael A1 - Hertwig, Andreas A1 - Weise, Matthias T1 - White light interference microscopy, ellipsometry, and instrumented indentation testing as reference procedures N2 - The paper addresses “WHITE LIGHT INTERFERENCE MICROSCOPY, ELLIPSOMETRY, AND INSTRUMENTED INDENTATION TESTING AS REFERENCE PROCEDURES“ and is subdivided in the following sections: 1. Measurement vs. testing vs. reference procedures, 2. White light interference microscopy (WLIM) for determination of step height h, 3. Spectroscopic ellipsometry (SE) for determination of layer thickness d and 4. Instrumented indentation testing (IIT) for determination of indentation hardness HIT. The following points are discussed in more detail: methodology of measurement and testing, uncertainty budgets for direct (WLIM), model-based (SE) and formula-based (IIT) reference procedures by means of specific examples. It is shown that standardization efforts are connected to reference procedures. T2 - Referenzverfahren CY - BAM, Berlin, Germany DA - 21.02.2018 KW - Reference procedures KW - Uncertainty budgets KW - White light interference microscopy KW - Spectroscopic ellipsometry KW - Instrumented indentation testing PY - 2018 AN - OPUS4-44256 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Hertwig, Andreas A1 - Winkler, J. T1 - Preliminary work item (PWI) 23131 on standardization of ellipsometry N2 - The paper addresses the PRELIMINARY WORK ITEM (PWI) 23131 ON STANDARDIZATION OF ELLIPSOMETRY and the following points are discussed in more detail: Historical background of ellipsometry, Technical/industrial importance of ellipsometry and Standardization activities on ellipsometry. T2 - ISO TC 107 and JWG 4 meeting CY - Levi, Finland DA - 23.01.2018 KW - Standardization KW - Ellipsometrie KW - Modelling KW - Accreditation PY - 2018 AN - OPUS4-43959 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Hielscher, Stefan A1 - Lange, Thorid A1 - Grunwald, Daniel A1 - Stockmann, Jörg M. A1 - Lerche, D. A1 - Rietz, U. T1 - Die Zentrifuge als universelles PrĂŒfsystem fĂŒr Beanspruchungen auf Zug und Druck N2 - Mit der Zentrifugentechnologie ist seit einigen Jahren ein neuartiges Mehr-Proben-PrĂŒf-verfahren auf dem Markt etabliert, welches die klassische ZugprĂŒfung in den Trommelrotor einer Tischzentrifuge ĂŒbertrĂ€gt. In der Beanspruchung auf Zug ist die PrĂŒfung der Verbundfestigkeit mittels CAT-Technologie (centrifugal adhesion testing) an der BAM seit 2017 nach DIN EN ISO/IEC 17025 akkreditiert, wobei die Verbundfestigkeit von Klebungen direkt bestimmt wird und in AbhĂ€ngigkeit von den Versagensformen RĂŒckschlĂŒsse auf die Klebfestigkeit von Klebstoffen/KlebebĂ€ndern oder die Haftfestigkeit von Beschichtungen gezogen werden können. T2 - 13. ThGOT Thementage Grenz- und OberflĂ€chentechnik und 11. ThĂŒringer Biomaterial-Kolloquium CY - Zeulenroda, Germany DA - 13.03.2018 KW - Zentrifugentechnologie KW - Haftfestigkeit KW - HĂ€rteprĂŒfung KW - Mehr-Proben-PrĂŒfung KW - Beanspruchung auf Zug und Druck PY - 2018 AN - OPUS4-44570 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hielscher, Stefan A1 - Beck, Uwe A1 - Lange, Thorid A1 - Grunwald, Daniel A1 - Stockmann, Jörg M. A1 - Lerche, D. A1 - Rietz, U. T1 - Die Zentrifuge als universelles PrĂŒfsystem fĂŒr Beanspruchungen auf Zug und Druck N2 - Mit der Zentrifugentechnologie ist seit einigen Jahren ein neuartiges Mehr-Proben-PrĂŒf-verfahren auf dem Markt etabliert, welches die klassische ZugprĂŒfung in den Trommelrotor einer Tischzentrifuge ĂŒbertrĂ€gt. In der Beanspruchung auf Zug ist die PrĂŒfung der Verbundfestigkeit seit 2017 nach DIN EN ISO/IEC 17025 akkreditiert, wobei die Verbundfestigkeit von Klebungen direkt bestimmt wird und in AbhĂ€ngigkeit von den Versagensformen RĂŒckschlĂŒsse auf die Klebfestigkeit von Klebstoffen/KlebebĂ€ndern oder die Haftfestigkeit von Beschichtungen gezogen werden können. Bei der zerstörenden Beanspruchung auf Zug ist zu beachten, dass es sich bei der Verbundfestigkeit um eine Systemeigenschaft handelt, d.h. nicht nur die chemischen und topografischen OberflĂ€cheneigenschaften, sondern auch die plasto-elastischen Volumeneigenschaften des Klebstoffes und der FĂŒgeteile haben Einfluss auf die ermittelten Kennwerte. Dabei ist eine qualitative Bestimmung der Versagensformen und Bruchbilder nach DIN EN ISO 10365 zwingend erforderlich, um eine Aussage ĂŒber die Art des Versagens treffen zu können. Mit der Erweiterung der Zentrifugentechnologie um Beanspruchungen auf Druck wurde dann der Nachweis erbracht, dass auch die klassische HĂ€rteprĂŒfung in einer Zentrifuge als Mehr-Proben-PrĂŒfung durchgefĂŒhrt werden kann. Im Verbundvorhaben QUO VADIS PLUS werden derzeit invasive Beanspruchungen auf Druck zur Bestimmung der HĂ€rte von Materialien, der KompressibilitĂ€t von MetallschĂ€umen sowie der Kompaktierbarkeit von Pulvern untersucht, was das Anwendungspotential der Zentrifugentechnologie nochmals erweitert. Dazu gehören auch kombinierte Beanspruchungen wie Zug-Scher- und Druck-Scher-PrĂŒfungen. Die Verbundfestigkeit von CFK-Platten in AbhĂ€ngigkeit der Beanspruchungsart (Zug vs. Zug-Scher) bzw. der Faserorientierung (0°, 45°, 90°), die Klebfestigkeit von Klebstoffen bzw. KlebebĂ€ndern auf unterschiedlichen FĂŒgeteilwerkstoffen in AbhĂ€ngigkeit von der Vorbehandlung, die Haftfestigkeit optischer Schichten auf Kunststoffen, die Bestimmung der Vickers-, Brinell- bzw. Kugeldruck-HĂ€rte sowie die KompressibilitĂ€t von metallischen SchĂ€umen und Federn werden als ausgewĂ€hlte Beispiele diskutiert. T2 - 13. ThGOT Thementage Grenz- und OberflĂ€chentechnik und 11. ThĂŒringer Biomaterial-Kolloquium CY - Zeulenroda, Germany DA - 13.03.2018 KW - Zentrifugentechnologie KW - Haftfestigkeit KW - HĂ€rteprĂŒfung KW - Mehr-Proben-PrĂŒfung KW - Beanspruchung auf Zug und Druck PY - 2018 SN - 978-3-00-058187-8 SP - 1 EP - 5 CY - Jena AN - OPUS4-44572 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Fischer, Daniel A1 - Hertwig, Andreas A1 - Hidde, Gundula A1 - Stockmann, Jörg M. A1 - Weise, Matthias T1 - Ellipsometric imaging of low-contrast surface modifications and depolarization contrast imaging (DCI) of particulate accumulations N2 - Imaging of surfaces regarding topographical, morphological, micro-structural, and chemical features is a key requirement for quality control for the identification of contaminated, degraded, damaged or deliberately modified surface areas vs. clean, virgin, undamaged or unmodified regions. As optical functions may represent any of these changes on the micro- and nano-scale, imaging ellipsometry (IE) is the technique of choice using either intensity, phase, or/and amplitude contrast for visualization of low-contrast surface modifications [1, 2]. Defects or surface and film features whether native or artificial, intended or unintended, avoidable or unavoidable as well as surface pattern are of interest for quality control. In contrast to microscopic techniques operated at normal incidence, ellipsometry as oblique-incidence technique provides improved contrast for vertically nano-scaled add-on or sub-off features such as ultra-thin transparent films, metallic island films, carbon-based thin films, laser modification or laser induced damage, dried stain, cleaning agent or polymeric residue. Two-sample reference techniques, i.e. referenced spectroscopic ellipsometry (RSE) may further increase sensitivity and decrease measurement time. In case of particulate accumulations depolarization contrast imaging (DCI) may improve the lateral resolution beyond the Abbe limit. This has been proven for silica spheres as reference in terms of single particles, particulate accumulations or particulate monolayers and layer stacks. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) were used for reference measurements of particle diameter, particle height, or particulate layer/accumulation thickness. It has been shown that single silica particles of 250 nm in diameter, i.e. at least a factor of 4 better than the lateral resolution limit as of now, can be visualized on even substrates. However, the ellipsometric measurement of particle diameters of this size needs further efforts interpretation. T2 - Workshop Ellipsometry 2018 CY - Chemnitz, GermanĂœ DA - 19.03.2018 KW - Low-contrast surface modifications KW - Particulate distributions KW - Imaging ellipsometry(IE) KW - Depolarization contrast imaging (DCI) PY - 2018 AN - OPUS4-44548 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Baier, Jennifa A1 - Hidde, Gundula A1 - Sahre, Marion A1 - Weise, Matthias T1 - Particles in PVD-coatings: Imperfection or functional add-on feature? N2 - The application of PVD-coatings ranges from mechanical engineering, i.e. thicker tribological coatings, to precision optics, i.e. thinner optical coatings. For physical vapor deposition (PVD) technologies such as evaporation, sputtering, ion beam assisted/driven deposition, vacuum is a prerequisite for two reasons: at first process-related ones (evaporation source, plasma discharge, and mean free path) and at second coating-related ones (pure, perfect, and dense films). Usually, the goal is a homogenous coating of defined stoichiometry and micro-structure without any imperfection. However, the implementation of micro- or nano-particles may occur accidentally or delibe-rately. Independent of the particle origin, there are two fundamental rules regarding coating functionality: at first, the larger the particle diameter to coating thickness ratio the more affected the functionality of the coating, and at second, the larger the material contrast in terms of the functional feature of interest the more affected the coating performance. Hence, embedded particles have to be avoided for the majority of thin films by all means. The unintended implementation of particles usually results in a malfunction of the coating from the beginning or is at least considered as a weak point of the coating creating a time-dependent defect under service conditions. The intended implementation of particles on surfaces and in coatings may create add-on features, topographic ones and functional ones, however, the facts mentioned hold true. Examples of particle-initiated coating defects are demonstrated in dependence on the origin and the field of application. Strategies for deliberate attachment/embedding of particles on surfaces/in coatings are discussed regarding process compatibility and coating integrity. For industrial applications, both the validation of process compatibility of particle injection and the plasma resistance of particles under vacuum and plasma conditions have to be confirmed. Further points of interest are the homogeneity of particle distribution and the avoidance of particle agglomeration which is still a crucial point for dry dispersed particles. So far, technical applications are limited to PVD hybrid coatings, plasma dispersion coatings are still a challenge except for applications where homogeneity is not required as in case of product authentication. T2 - ICMCTF 2018, International Conference on Metallurgical Coatings and Thin Films CY - San Diego, CA, USA DA - 23.04.2018 KW - PVD-coatings KW - PVD-processes KW - Unintended particle generation KW - Particles as imperfections KW - Deliberate particle implementation KW - Particles as add-on features PY - 2018 AN - OPUS4-44973 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Fischer, Daniel A1 - Hertwig, Andreas A1 - Mitzkus, Anja A1 - Sahre, Mario A1 - Weise, Matthias A1 - Köppe, Enrico A1 - Bartholmai, Matthias A1 - Basedau, Frank A1 - Hofmann, Detlef A1 - Schukar, Vivien A1 - Kormunda2, M. T1 - Multi-functional coatings for optical sensor applications: Surface plasmon resonance & magneto-optical coupling N2 - Multi-functional coatings are a key requirement for surface engineering. General demands are adhesion and long-term stability under service conditions. The modification of surfaces by means of PVD-, ECD- or hybrid processes allows an add-on functionalization of surfaces by a huge diversity of materials with both lateral and vertical micro-/nano-designs. This fact is a prerequisite for micro- and sensor-systems in lab-on-chip and sensor-on-chip technology. Two layer-based sensor principles are presented, i.e. surface plasmon resonance enhanced spectroscopic ellipsometry (SPREE) for detection of hazardous gases and magneto-optical sensors on smart-coated fiber Bragg gratings (FBG) for structural health monitoring (SHM). The interdependence of substrate features, coating properties, and layer design is discussed firstly for gas sensitivity and selectivity of SPREE-sensors and secondly for sensitivity and selectivity of magneto-strictive coatings to mechanical strain or external magnetic fields resulting in an optical displacement of the Bragg wavelength of FBG-sensors. Moreover, generic features such long-term stability, crucial process-related fabrication conditions, and effects of operational and environmental parameters are discussed with respect to the sensor performance. It has been shown that appropriate layer design and adapted selection of layer materials (SnOx/Au, Fe/Ni:SnOx/Au; Ni/NiFe-Cu-Cr) result in improved sensor parameters and may enable new sensor applications. T2 - SVC TechCon 2018 CY - Orlando, FL, USA DA - 05.05.2018 KW - Multi-functional coatings for sensors KW - Surface plasmon resonance enhanced ellipsometry (SPREE) KW - Gas monitoring KW - Magneto-optical coupling (MOC) KW - Structural health monitoring (SHM) PY - 2018 AN - OPUS4-44976 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Lange, Thorid A1 - Hidde, Gundula A1 - Beck, Uwe A1 - Naumann, F. A1 - KĂ€rkkĂ€nen, I. A1 - Gargouri, H. T1 - HARFE: Haftfestigkeit Reproduzierbarkeit Festigkeit „Nanoskalige Haftvermittler zur Erhöhung der Haft- bzw. Klebfestigkeit unter Verwendung von ALD-Hybridprozessen“ N2 - Das Poster „HARFE: Haftfestigkeit Reproduzierbarkeit Festigkeit“ widmet sich den nanoskaligen Haftvermittlern zur Erhöhung der Haft- bzw. Klebfestigkeit unter Verwendung von ALD-Hybridprozessen. T2 - Netzwerksymposium “SchĂŒtzen und Veredeln von OberflĂ€chen”, Wildau CY - TH Wildau, Germany DA - 01.03.2018 KW - Verbundfestigkeit KW - OberflĂ€chenenergie KW - ALD-Beschichtung PY - 2018 AN - OPUS4-44399 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -