TY - CONF A1 - Beck, Uwe A1 - Hidde, Gundula A1 - Lange, Thorid A1 - Gargouri, H. A1 - Kärkkänen, I. A1 - Naumann, F. T1 - Plasma Activation and Plasma-assisted ALD Surface Modification of Polymers for Improved Bonding and Adhesive Strength N2 - Bonding strength is crucial on polymers of low surface energy, for clean surfaces limited to 0.5, 1, and 2 MPa for PTFE, PP, and PE. Plasma treatment may improve bonding strength by a factor of 2 (PTFE) or 5 (PP and PE). The efficiency of treatment is usually 10% as both low pressure and atmospheric pressure processes show low topographic conformity. Besides, lifetime of activation/modification is rather short. Hence, bonding has to be carried out immediately after plasma treatment. The concept of plasma-assisted ALD (atomic layer deposition) interlayers was introduced in the project HARFE of SENTECH (modification/deposition/in-situ monitoring) and BAM (bonding, characterization, testing). ALD deposition has a high surface conformity and for dielectric films of Al2O3 also a good long-term stability given that the films are dense enough. Based on TMA and O2/O3 precursors, ALD layer stacks from 60 to 375 monolayers were prepared under different conditions. For a transfer time of 24 hours from deposition to measurement, bonding strength could be increased up to 5 MPa (PTFE) respectively 10 MPa (PP, PE). The huge potential of ALD layers as adhesive interlayers was demonstrated for Al2O3 on stainless steel with bonding strength beyond 15 MPa, i.e. interface strength within the ALD stack is also in this range. This is a prerequisite for subsequent PVD/CVD-deposition in hybrid systems. By means of the SI ALD LL system of SENTECH thermal and plasma-supported ALD processes can be alternatively realized. Ellipsometric in-situ monitoring provides monolayer sensitivity and reveals that the efficient bonding of the lower ALD layers on the polymer has to be further improved. Testing of bonding strength was realized by CAT (centrifugal adhesion testing) technology. It was shown that ALD modification correlates with the increase of surface energy and bonding strength. T2 - PSE 2018 - 16th Conference on Plasma Surface Engineering CY - Garmisch-Partenkirchen, Germany DA - 17.09.2018 KW - Plasma activation KW - Plasma-assisted ALD modification KW - Adhesive ALD interlayer KW - Bonding strength KW - Adhesive strength PY - 2018 AN - OPUS4-46015 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Hielscher, Stefan A1 - Lange, Thorid A1 - Rietz, U. A1 - Lerche, D. T1 - State-of-the-Art in Multiple-Sample Evaluation of Adhesive and Bonding Strength N2 - The paper addresses the “State-of-the-Art in Multiple-Sample Evaluation of Adhesive and Bonding Strength” and the following points are discussed in more detail: 1. Motivation (coatings, varnishes, tapes, laminates, CFRP, adhesive-bonded joints) 2. Conventional single-sample testing (evaluation of adhesive and bonding strength; failure pattern) 3. Multiple-sample handling (MSH), bonding (MSB), and testing: centrifugal adhesion testing (CAT) (multiple-sample approach, tensile test within a centrifuge) 4. Application examples of CAT-Technology™ (laminates, optical coatings, CFRP joints) Finally, a summary is given regarding status quo and benefits of CAT-technology under tensile stress conditions whereas examples of testing in a centrifuge under compressive stress conditions are mentioned in the outlook. T2 - The 5th International Conference Competitive Materials and Technology Processes CY - Miskolc-Lillafüred, Hungary DA - 08.10.2018 KW - Centrifugal Adhesion Testing KW - CAT KW - Multiple-sample handling (MSH) KW - Multiple-sample bonding (MSB) KW - Tensile strength of laminates KW - Tensile strength of coatings KW - Adhesive strength KW - Bonding strength PY - 2018 AN - OPUS4-46336 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Hielscher-Hofinger, Stefan A1 - Lange, Thorid A1 - Weise, Matthias A1 - Lerche, D. A1 - Rietz, U. T1 - CAT-Technologie zur Bestimmung der Haftfestigkeit Dünner Schichten N2 - Der Vortrag widmet sich der „CAT-TECHNOLOGIE ZUR BESTIMMUNG DER HAFTFESTIGKEIT DÜNNER SCHICHTEN“ und beschreibt die Punkte „Motivation –CAT-Technologie“ (CAT: Centrifugal Adhesion Testing) und die „Haftfestigkeit von Schichten“, (Ag-Schichten auf N-BK7 Glas, Cr- und Al-Schichten auf Borofloat 33 Glas, Au-Schichten auf N-BK7 Glas und SiO2-Schichten auf CR39 Polymer) im Einzelnen. T2 - EFDS, Workshop: Haft- und Antihaftschichten CY - Dresden, Germany DA - 31.01.2019 KW - CAT-Technologie KW - Centrifugal Adhesion Testing KW - Dünne Schichten KW - Haftfestigkeit PY - 2019 AN - OPUS4-47489 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Hielscher-Hofinger, Stefan A1 - Lange, Thorid A1 - Hidde, Gundula A1 - Lerche, D. A1 - Rietz, U. T1 - CAT-Technologie zur Bestimmung der Klebfestigkeit N2 - Der Vortrag widmet sich der „ CAT-TECHNOLOGIE ZUR BESTIMMUNG DER KLEBFESTIGKEIT“ und beschreibt die Punkte „Motivation –CAT-Technologie (Centrifugal Adhesion Testing), Klebfestigkeit ( Materialscreening verschiedener Werkstoffklassen, Klebstoffscreening fürV2A gegenV2A als Referenz, Klebstoffscreening für Niedrigenergie-Polymere und Oberfächenmodifizierung von Niedrigenergie-Polymeren) und Verbundfestigkeit (“Stirnabzug vs. Zug-Scher-Prüfung an CFK) im Einzelnen. T2 - 17. Praxisseminar KLEBEN CY - IWF Jena, Germany DA - 30.01.2019 KW - CAT-Technologie KW - Klebfestigkeit KW - Verbundfestigkeit KW - Niedrigenergie-Polymeren PY - 2019 AN - OPUS4-47466 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Griepentrog, Michael A1 - Hertwig, Andreas A1 - Hielscher-Hofinger, S. A1 - Lange, Thorid A1 - Weise, Matthias T1 - Uncertainty budgets in surface techno-logy: step height, layer thickness, indentation hardness, adehesive strength N2 - The object (sample) and the measurement/testing procedure may always have unknown degrees of freedom, i.e. instead of 𝐯 ≥ n – 1 in many cases 𝐯 ≫ n - 1 may apply, in particular in the micro- and nano-world! T2 - 10. VDI-Fachtagung, Messunsicherheit und Prüfprozesse CY - Erfurt, Germany DA - 10.11.2021 KW - Methodology in metrology KW - Methodology in testing KW - Spectroscopic Ellipsometry KW - Instrumented Indentation (IIT) KW - Centrifugal Adhesion Testing (CAT) PY - 2021 AN - OPUS4-53739 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Griepentrog, Michael A1 - Hertwig, Andreas A1 - Sahre, Mario A1 - Unger, Wolfgang A1 - Hodoroaba, Vasile-Dan A1 - Krüger, Jörg T1 - Plasma Germany, Fachausschuss Normung, Berichtszeitraum Frühjahr 2018 - Herbst 2018 N2 - Der Vortrag gibt den aktuellen Stand der Normung im Bereich der Oberflächen-technik insbesondere der Oberflächenanalytik und der Oberflächenmess- und -prüftechnik wider. Vorgestellt wird der Status technischer Berichte, Normenentwürfe und Normen u.a. zur Charakterisierung von funktionellen Glasoberflächen für bioanalytische Anwendungen, zur Messung der Schichtdicke von Nanomaterialien mittels Ellipsometrie, zur Kalibrierung von Interferometern und Interferenzmikroskopen für die Formmessung, zur Rockwelleindringprüfung zur Bewertung der Schicht-haftung, zu den Grundlagen der Ellipsometrie, zur Messung der Schichtdicke mittels Wirbelstromverfahren, zur Schichtpotentialmessung von Mehrfach-Nickelschichten, zu Filtern und Augenschutzgeräten gegen Laserstrahlung sowie zur Bestimmung der Schichthaftung mittels Zugversuch. T2 - Fachausschuss Normung, Herbstsitzung CY - Jena, Germany DA - 06.11.2018 KW - Stand der Normung KW - Oberflächentechnik KW - Oberflächenanalytik KW - Oberflächenmesstechnik KW - Oberflächenprüftechnik PY - 2018 AN - OPUS4-48894 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Griepentrog, Michael A1 - Hertwig, Andreas A1 - Weise, Matthias T1 - White light interference microscopy, ellipsometry, and instrumented indentation testing as reference procedures N2 - The paper addresses “WHITE LIGHT INTERFERENCE MICROSCOPY, ELLIPSOMETRY, AND INSTRUMENTED INDENTATION TESTING AS REFERENCE PROCEDURES“ and is subdivided in the following sections: 1. Measurement vs. testing vs. reference procedures, 2. White light interference microscopy (WLIM) for determination of step height h, 3. Spectroscopic ellipsometry (SE) for determination of layer thickness d and 4. Instrumented indentation testing (IIT) for determination of indentation hardness HIT. The following points are discussed in more detail: methodology of measurement and testing, uncertainty budgets for direct (WLIM), model-based (SE) and formula-based (IIT) reference procedures by means of specific examples. It is shown that standardization efforts are connected to reference procedures. T2 - Referenzverfahren CY - BAM, Berlin, Germany DA - 21.02.2018 KW - Reference procedures KW - Uncertainty budgets KW - White light interference microscopy KW - Spectroscopic ellipsometry KW - Instrumented indentation testing PY - 2018 AN - OPUS4-44256 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Griepentrog, Michael A1 - Hertwig, Andreas A1 - Sahre, Mario A1 - Unger, Wolfgang A1 - Hodoroaba, Vasile-Dan A1 - Krüger, Jörg T1 - Plasma Germany, Fachausschuss Normung, Berichtszeitraum Herbst 2018 – Frühjahr 2019 N2 - Der Vortrag gibt den aktuellen Stand der Normung im Bereich der Oberflächentechnik insbesondere der Oberflächenanalytik und der Oberflächenmess- und -prüftechnik wider. Vorgestellt wird der Status technischer Berichte, Normenentwürfe und Normen u.a. zur Bewertung von Auflösung und Schärfe mit strahlbasierten Methoden im Nanometer- und Mikrometerbereich, zur Messung von Schichtdicken und Nanopartikeln in kritischen Dimensionen einschließlich Größen- und Formverteilungen mittels REM, zur Messung der Schichtdicke von Nanomaterialien und zur Klassifizierung von Kohlenstoffschichten mittels Ellipsometrie, zur Standardisierung der Ellipsometrie, zur Kalibrierung von Konfokalmikros-kopen für die Formmessung, zur linear elastisch dynamischen instrumentierten Eindringprüfung, zur Messung der flächenbezogenen Masse mittels AAS und ICP, zur Schichtpotentialmessung von Mehrfach-Nickelschichten, zur Schichtdicken und Flächen-widerstandsbestimmung sowie zur Bestimmung der Schichthaftung mittels Zentrifugentechnologie. T2 - Plasma Germany, Fachausschuss Normung, CY - Karlsruhe, Germany DA - 09.04.2019 KW - Stand der Normung KW - Oberflächenanalytik KW - Oberflächenmesstechnik KW - Qualitätssicherung PY - 2019 AN - OPUS4-48874 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Hertwig, Andreas A1 - Winkler, J. T1 - Standardization of ellipsometry N2 - The talk addresses the STANDARDIZATION OF ELLIPSOMETRY and the following points are discussed in more detail: historical background of ellipsometry, history of International Conferences on Ellipsometry, Workshops Ellipsometry in Germany and Europe, information on German/European Working Group Ellipsometry, technical/industrial importance of ellipsometry, applications on non-ideal material systems and standardization activities on ellipsometry. T2 - DIN NA Dünne Schichten für die Optik, Mainz CY - Mainz, Germany DA - 06.06.2018 KW - Standardization KW - Ellipsometry KW - Modelling KW - Accreditation PY - 2018 AN - OPUS4-45167 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Hertwig, Andreas A1 - Kormunda, M. A1 - Ryšánek, P. A1 - Ivanov, L. T1 - Characterisation of magnetron sputtered SnZnOx by means of spectroscopic ellipsometry - how can we analyse TCO materials optically? N2 - Transparent conductive oxide (TCO) films are a vital part of a large part of modern technology. The production of TCO materials has sparked much development in plasma coating technology. Quality control measurements of these layers are therefore important in many fields of optics and electronics such as high efficiency thin film photovoltaics. In this presentation, we report on optical measurements of ZnSnOx layers generated by DC/RF magnetron plasma co-sputtering. By changing the respective power on two different targets, the overall power, the gas composition and post-treatment, the properties of this type of layers can be varied in a number of parameters. The optical, electrical, and chemical properties of TCO layers are the technically most important properties together with the layer thickness. The dielectric function of layers is accessible by means of spectroscopic ellipsometry, which also yields the very important value for the layer thickness at the same time. It would be a significant step forward in quality control to use this non-destructive method also as a fast test for electrical properties. Therefore, we report on the optical properties connected to the production parameters, and also on our preliminary results connecting the optical dielectric function (in the visible and near infrared) to the electrical conductivity of the layers. We discuss the effect of deposition parameters on the optical properties of the layers and present an approach for correlating optical and electrical properties. Further, we discuss the question of accuracy of optical properties gained from model-fit-based optical methods and the use of different parameterised models for the dielectric function to achieve this. T2 - PSE 2018 - 16th Conference on Plasma Surface Engineering CY - Garmisch-Partenkirchen, Germany DA - 17.09.2018 KW - Mixed Oxides KW - TCO KW - Quality Control KW - Ellipsometry KW - Optical Constants PY - 2018 AN - OPUS4-46388 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -