TY - CONF A1 - Bonse, Jörn T1 - Ultrafast optical probing of laser-induced formation of periodic surface nanostructures N2 - Laser-induced Periodic Surface Structures (LIPSS, ripples) are a universal phenomenon and can be generated in a contactless, single-step process on almost any type of solid upon irradiation with intense laser pulses. They represent a (quasi-)periodic modulation of the surface topography in the form of a linear grating and are typically formed in a “self-ordered” way in the focus of a coherent laser beam. Thus, they are often accompanying laser material processing applications. The structural sizes of LIPSS typically range from several micrometers down to less than 100 nanometers – far beyond the optical diffraction limit – while their orientations exhibit a clear correlation with the local polarization direction of the laser radiation. From a theoretical point of view, a controversial debate has emerged during the last decades, whether LIPSS originate from electromagnetic effects (seeded already during the laser irradiation) – or whether they emerge from matter-reorganization processes (distinctly after the laser irradiation). From a practical point of view, however, LIPSS represent a simple and robust way for the nanostructuring of solids that allows creating a wide range of different surface functionalities featuring applications in optics, tribology, medicine, energy technologies, etc. The presentation provides an overview of current theories on LIPSS and the quest to achieve ever smaller surface nanostructures. The historical development of the fundamental ideas behind LIPSS is presented, together with experimental approaches that make it possible to distinguish between the various LIPSS formation scenarios. Time-resolved experimental methods are required to investigate the dynamics of their formation. The presentation focuses on ultrafast time-resolved optical (pump-probe) techniques that can be used for localized point measurements or microscopic imaging, utilizing the reflection, diffraction, or coherent scattering of the probe radiation at the emerging LIPSS, while simultaneously capturing information about rapid melting, ablation, and solidification phenomena. However, given the sub-micrometric spatial periods of LIPSS, their analysis using optical radiation employed in far-field techniques remained a challenge. Therefore, short wavelengths of the probe beam in the UV range or even below are required to overcome the diffraction limit imposed in the optical spectral range. Fourth-generation light sources, namely short-wavelength (XUV or X-ray) short-pulse free-electron lasers (FELs), offer new and fascinating possibilities for resolving laser-induced structure formation on surfaces in the sub-micrometer to nanometer range and in time domains from picoseconds to several nanoseconds with a resolution in the sub-picosecond regime. On laser-irradiated semiconductor surfaces, this unique spatio-temporal resolution enables the detection of early signs of coherent/plasmonic electromagnetic scattering effects, followed by the excitation of hydrodynamic capillary waves – providing new insights into the above-mentioned debate. Recent experiments at the European XFEL used fs-time-resolved small-angle X-ray scattering (fs-SAXS) and even fs-time-resolved grazing incidence small-angle X-ray scattering (fs-GISAXS), combined with grazing-incidence diffraction (fs-GID), to reveal the dynamics of the formation of nanometric LIPSS on metals. T2 - CINSaT Herbstkolloquium 2025 CY - Kassel, Germany DA - 05.11.2025 KW - Laser-induced periodic surface structures (LIPSS) KW - Ultrashort laser pulses KW - Pump-probe measurements KW - Free-electron laser KW - Small angle X-ray scattering (SAXS) PY - 2025 AN - OPUS4-64633 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Bonse, Jörn T1 - Ultrakurzpulslaser induzierte Oxidschichten zur Reduktion von Reibung und Verschleiß auf Metalloberflächen N2 - Die Reduktion von Reibung und Verschleiß in technischen Systemen bietet ein großes Potenzial zur Reduktion von CO2-Emissionen. Dieser Beitrag diskutiert die Erzeugung und tribologische Charakterisierung von Ultrakurzpuls-generierten Nano- und Mikrostrukturen auf Metallen (Stahl, Titan). Besonderes Augenmerk wird dabei auf die Rolle der laserinduzierten Oxidschicht im Zusammenspiel mit verschleißreduzierenden Additiven in ölbasierten Schmiermitteln gerichtet. T2 - Workshop "Nachhaltigkeit durch Tribologische Schichten" - Europäische Forschungsgesellschaft Dünne Schichten e.V. CY - Karlsruhe, Germany DA - 17.05.2022 KW - Laser-induzierte periodische Oberflächenstrukturen KW - Reibungsreduktion KW - Verschleißreduktion KW - Oberflächenmodifikation KW - Oxidation KW - Additive PY - 2022 AN - OPUS4-54849 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Kraft, S. A1 - Böttcher, Katrin A1 - Bonse, Jörn A1 - Schille, J. A1 - Löschner, U. A1 - Krüger, Jörg T1 - Unwanted X-ray emission in ultrashort pulse laser processing: From metallic to biological materials N2 - X-rays can be generated as an unwanted side effect during ultrashort pulse laser material processing of technical work pieces and even biological samples with laser intensities above 10^13 W/cm^2. First studies demonstrate the need to address this effect in industrial as well as in medical applications. This secondary hazard should be considered in work safety and risk assessment. T2 - Lasers in Manufacturing 2023 (LiM 2023) CY - Munich, Germany DA - 26.06.2023 KW - Ultrashort pulse laser processing KW - Laser-induced X-ray emission KW - Secondary hazard PY - 2023 SP - LiM 2023 - 1 EP - LiM 2023 - 6 PB - Wissenschaftliche Gesellschaft Lasertechnik und Photonik e.V. (WLT) AN - OPUS4-58358 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hülagü, Deniz A1 - Hirahara, Kenta A1 - Fischer, Daniel A1 - Florian, Camilo A1 - Schusterbauer, Robert A1 - Ermilova, Elena A1 - Krüger, Jörg A1 - Unterreiner, Andreas-Neil A1 - Bonse, Jörn A1 - Hertwig, Andreas T1 - Using imaging ellipsometry to understand femtosecond laser materials processing of group IV materials N2 - Laser materials processing is an important tool for creating and shaping new materials. Laser machining, especially with ultrashort pulses offers the modification of surfaces, thin coatings, and bulk materials with an unprecedented precision and control. The most desired feature of pulsed laser processing in the femtosecond range is that the heat-affected zone in the irradiated material will be extremely small. To better understand the mechanisms involved during laser irradiation, it is important to analyse the outcome of light-matter interaction with spectroscopic methods. Ellipsometry, especially spectroscopic imaging ellipsometry (SIE), has become an important tool for this in recent times, as it gives access to local layer thicknesses, materials dielectric functions, and features like changes in surface roughness. This work includes an overview over our recent studies examining near-infrared fs-laser surface processing of different group IV materials. The superficial phase change of silicon from crystalline to amorphous has been investigated in the past as the result of laser processing strongly depends on the crystal orientation. Moreover, SIE is capable of determining the properties of buried a-Si interfaces with micrometer lateral and sub-nanoneter vertical precision. Additionally, the growth of native and laser-induced oxides can be revealed. T2 - ICSE10 - 10th International Conference on Spectroscopic Ellipsometry CY - Boulder, CO, USA DA - 08.06.2025 KW - Laser surface ablation KW - Amorphous Carbon KW - Silicon KW - Correlative Imaging Ellipsometry PY - 2025 AN - OPUS4-63633 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Böttcher, Katrin A1 - Schmitt Rahner, M. A1 - Stolzenberg, U. A1 - Kraft, Sebastian A1 - Bonse, Jörn A1 - Feist, C. A1 - Albrecht, D. A1 - Pullner, B. A1 - Krüger, Jörg T1 - Worst-case X-ray photon energies in ultrashort pulse laser processing N2 - Ultrashort pulse laser processing can result in the secondary generation of unwanted X-rays if a critical laser irradiance of about 10^13 W/cm^2 is exceeded. Spectral X-ray emissions were investigated during the processing of tungsten and steel using three complementary spectrometers (based on CdTe and silicon drift detectors) simultaneously for the identification of a worst-case spectral scenario. Therefore, maximum X-ray photon energies were determined, and corresponding dose equivalent rates were calculated. An ultrashort pulse laser workstation with a pulse duration of 274 fs, a center wavelength of 1030 nm, pulse repetition rates between 50 kHz and 200 kHz, and a Gaussian laser beam focused to a spot diameter of 33 µm was employed in a single pulse and burst laser operation mode. Different combinations of laser pulse energy and repetition rate were utilized, keeping the average laser power constant close to the maximum power of 20 W. Peak irradiances ranging from 7.3 × 10^13 W/cm^2 up to 3.0 × 10^14 W/cm^2 were used. The X-ray dose equivalent rate increases for lower repetition rates and higher pulse energy if a constant average power is used. Laser processing with burst mode significantly increases the dose rates and the X-ray photon energies. A maximum X-ray photon energy of about 40 keV was observed for burst mode processing of tungsten with a repetition rate of 50 kHz and a peak irradiance of 3 × 10^14 W/cm^2. KW - Ultrashort pulsed laser KW - X-ray emission KW - X-ray spectrum KW - X-ray energies KW - Radiation protection PY - 2022 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-566176 DO - https://doi.org/10.3390/ma15248996 VL - 15 IS - 24 SP - 1 EP - 17 PB - MDPI AN - OPUS4-56617 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Böttcher, Katrin A1 - Kraft, Sebastian A1 - Weise, Matthias A1 - Bonse, Jörn A1 - Krüger, Jörg T1 - X-ray emission during ultrafast laser grooving N2 - Ultrashort pulse lasers offer the possibility to process materials with minimal heat input and high precision. However, the X-ray emission at high laser peak intensities represents an undesirable side effect. A laser system (1030 nm wavelength, 40 W maximum average laser power, 925 fs pulse duration, 100 μJ maximum pulse energy, 400 kHz pulse repetition frequency) was used to analyze the X-ray skin dose rates for applied peak intensities between 9.2 × 10^12 W/cm^2 and 1.3 × 10^14 W/cm^2 for mild steel, stainless steel and tungsten during groove processing. The lowest laser peak intensity at which X-ray emission could be measured was 9.2 × 10^12 W/cm^2 for processing of stainless steel. The X-ray emission showed a characteristic evolution in dependence on the number of overscans at the same line positions. For low peak intensities, a measurable X-ray emission only begins after a few passes. The number of scans to reach the maximum dose rate increases with lower laser peak intensity. Analysis of the evolving surface topography by white light interference microscopy in connection with ray-tracing simulations led to the interpretation that the increase in X-ray emission is due to the local intensity redistribution by multiple reflection within the laser-generated grooves which is promoted by a particular choice of the linear laser polarization. KW - Ultrashort pulsed laser KW - Laser-induced X-rays KW - X-ray hazard KW - X-ray emission PY - 2025 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-639483 DO - https://doi.org/10.1007/s00339-025-08728-z SN - 1432-0630 VL - 131 IS - 8 SP - 1 EP - 12 PB - Springer CY - Berlin AN - OPUS4-63948 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Stolzenberg, U. A1 - Schmitt Rahner, M. A1 - Pullner, B. A1 - Legall, Herbert A1 - Bonse, Jörn A1 - Kluge, M. A1 - Ortner, A. A1 - Hoppe, B. A1 - Krüger, Jörg T1 - X-ray emission hazards from ultrashort pulsed laser material processing in an industrial setting N2 - Interactions between ultrashort laser pulses with intensities larger than 10^13 W/cm^2 and solids during material processing can lead to the emission of X-rays with photon energies above 5 keV, causing radiation hazards to operators. A framework for inspecting X-ray emission hazards during laser material processing has yet to be developed. One requirement for conducting radiation protection inspections is using a reference scenario, i.e., laser settings and process parameters that will lead to an almost constant and high level of X-ray emissions. To study the feasibility of setting up a reference scenario in practice, ambient dose rates and photon energies were measured using traceable measurement equipment in an industrial setting at SCHOTT AG. Ultrashort pulsed (USP) lasers with a maximum average power of 220 W provided the opportunity to measure X-ray emissions at laser peak intensities of up to 3.3 × 10^15 W/cm^2 at pulse durations of ~1 ps. The results indicate that increasing the laser peak intensity is insufficient to generate high dose rates. The investigations were affected by various constraints which prevented measuring high ambient dose rates. In this work, a list of issues which may be encountered when performing measurements at USP-laser machines in industrial settings is identified. KW - X-ray emission hazards KW - Ultrashort pulsed laser KW - Radiation protection KW - Industrial applications KW - Protection housing PY - 2021 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-538632 DO - https://doi.org/10.3390/ma14237163 SN - 1996-1944 VL - 14 SP - 1 EP - 17 PB - MDPI CY - Basel AN - OPUS4-53863 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Legall, Herbert A1 - Schwanke, Christoph A1 - Bonse, Jörn A1 - Krüger, Jörg T1 - X-ray radiation protection aspects during ultrashort laser processing N2 - Ultrashort pulse laser processing of materials allows for precise machining with high accuracy. By increasing the repetition rate to several 100 kHz, laser machining becomes quick and cost-effective. Ultrafast laser processing at high repetition rates and peak intensities above 10^13 W/cm^2 can cause a potential hazard by generation of unwanted x-ray radiation. Therefore, radiation protection must be considered. For 925 fs pulse duration at a center wavelength of 1030 nm, the x-ray emission in air at a repetition rate of 400 kHz was investigated up to a peak intensity of 2.6 × 10^14 W/cm^2. Based on the presented measurements, the properties of potential shielding materials will be discussed. By extending our previous works, a scaling of the x-ray radiation emission to higher peak intensities up to 10^15 W/cm^2 is described, and emitted x-ray doses are predicted. KW - Laser ablation KW - Ultrashort pulse laser processing KW - Laser-induced x-ray emission KW - Radiation protection PY - 2020 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-505677 DO - https://doi.org/10.2351/1.5134778 VL - 32 IS - 2 SP - 022004 AN - OPUS4-50567 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Kraft, Sebastian A1 - Schille, J. A1 - Bonse, Jörn A1 - Löschner, U. A1 - Krüger, Jörg T1 - X‑ray emission during the ablative processing of biological materials by ultrashort laser pulses N2 - The ablative laser processing with ultrashort pulsed laser beams may cause secondary emission of hazardous X-rays. While the effect has recently been proven to be considered in working safety regulations when processing technical materials, such as metals, the X-ray emission rates during the ablative processing of biological tissue materials are widely unexplored yet. Therefore, biological materials like water, isotonic saline solution, pig eyes, and human teeth were ablated with ultrashort laser pulses of 1030 nm wavelength, 600 fs pulse duration and 5 kHz pulse repetition rate, aiming to mimic typical surgery situations. Simultaneously, in-situ X-ray dose rate measurements were performed at a short distance from the plasma to display potential X-ray emission. For all four studied biological materials, our measurements prove the secondary emission of laser-induced X-rays. KW - Ultrashort pulsed laser KW - Laser-induced X-ray emission KW - Ophthalmology KW - Dentistry KW - Secondary hazard PY - 2023 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-569960 DO - https://doi.org/10.1007/s00339-023-06440-4 SN - 0947-8396 VL - 129 IS - 3 SP - 1 EP - 8 PB - Springer AN - OPUS4-56996 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -