TY - JOUR A1 - Terborg, R. A1 - Kim, K. J. A1 - Hodoroaba, Vasile-Dan T1 - Elemental composition and thickness determination of thin films by electron probe microanalysis N2 - Electron probe microanalysis (EPMA) applies to solid samples of homogenous (bulk) chemical composition and can usually not be applied to structures which are inhomogeneous in the micrometer range such as thin film systems down to a few nm. However, in combination with the established thin film software Stratagem, the thickness as well as the elemental composition of thin films on a substrate can be determined. This has been recently successfully demonstrated for Fe-Ni on Si and Si-Ge on Al2O3 thin film systems. For both systems five samples of different elemental composition and a reference were produced and characterised by inductively coupled plasma mass spectrometry (ICP-MS), Rutherford backscattering (RBS), and transmission electron microscopy (TEM) as reference values. Last year, a new and open-source thin film evaluation programme called BadgerFilm has been released. It can also be used to determine thin film composition and thickness from intensity ratios of the unknown sample and standards (k-ratios). In this contribution, we reevaluated the data acquired for the Fe-Ni and Si-Ge systems using the BadgerFilm software package and compared the obtained elemental compositions and thickness values with the results of the Stratagem software and the reference methods. The conclusion is that the BadgerFilm software shows good agreement with the elemental composition and thickness calculated by Stratagem (mostly <2% for both composition and thickness) and with the reference values for two representative thin film systems (<1%–2% for composition and <10%–20% for thickness). KW - Elemental composition KW - EPMA KW - Film thickness KW - Thin films PY - 2023 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-576368 DO - https://doi.org/10.1002/sia.7183 SN - 0142-2421 VL - 55 SP - 496 EP - 500 PB - Wiley AN - OPUS4-57636 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Terborg, R. A1 - Kim, K. J. A1 - Hodoroaba, Vasile-Dan T1 - Determination of Thin Film Thickness and Composition using Energy Dispersive EPMA N2 - The thickness of thin films can be measured by various methods, e.g., profilometry, ellipsometry, atomic force microscopy (AFM), or X-ray reflectometry. For the additional determination of thin film composition, techniques like X-ray photoelectron spectroscopy (XPS) or mass spectrometry-based techniques can be used. An alternative non-destructive technique is electron probe microanalysis (EPMA). This method assumes a sample of homogenous (bulk) chemical composition, so that it cannot be usually applied to thin film samples. However, in combination with the thin film software StrataGEM, the thickness as well as the composition of such films on a substrate can be determined. This has been demonstrated for FeNi on Si and SiGe on Al2O3 film systems. For both systems five samples with different elemental composition and a reference were produced and characterised by Korean research institute KRISS using inductively coupled plasma mass spectrometry (ICP-MS), Rutherford backscattering (RBS), and transmission electron microscopy (TEM). These samples were used for an international round robin test. In 2021, a new and open-source thin film evaluation programme called BadgerFilm has been released. It can also be used to determine thin film composition and thickness from intensity ratios of the unknown sample and standards (k-ratios). In this contribution, we re-evaluated the data acquired for the FeNi and SiGe systems using the BadgerFilm software package and compared the resulting composition and thickness with the results of the established StrataGEM software and other reference methods. With the current evaluation, the BadgerFilm software shows good agreement with the composition and thickness calculated by StrataGEM and as the reference values provided by the KRISS. KW - Thin films KW - Elemental composition KW - Film thickness KW - EPMA (Electron Probe Microanalysis) PY - 2022 DO - https://doi.org/10.1017/S143192762200318X VL - 28 IS - Suppl. 1 SP - 672 EP - 673 PB - Cambridge University Press AN - OPUS4-55437 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Terborg, R. A1 - Procop, Mathias T1 - Theoretical calculation and experimental determination of x-ray production efficiencies for copper, zirconium, and tungsten N2 - The X-ray intensities of the K-, L- and M-lines of copper, zirconium and tungsten have been measured with an energy-dispersive X-ray spectrometer of known efficiency as function of photon energy. X-ray production efficiencies were determined from the measured intensities for Kα- and L-series of Cu and Zr and for the L- and M-series of W. These data were compared to calculated X-ray production efficiencies based on the widely used matrix correction models of Pouchou and Pichoir (XPP) and Bastin (PROZA96). Our results indicate that a replacement of the stopping power in the PROZA96 algorithm by expressions of Joy and Jablonski has only a minor influence on the calculated X-ray production efficiencies. In contrast, the modifications of the ionization cross-section show a stronger effect. We replaced the ionization cross-sections for K lines of the PROZA96 algorithm with different models. The results for L- and M-Lines are different. For the L-lines of Cu the original XPP and PROZA96 models show the best agreement while using the Bote cross-sections result in an overestimation. For the Zr-L and W-L1, -L2, -L3 X-ray production efficiencies, the Bote cross-sections lead to a significant improvement compared to all other models. The original XPP model represents the best agreement for the M5 efficiencies but underestimates the M4 efficiencies. There is no superior model or modification because the parameter sets in the models need to be aligned to each other. However, using the ionization cross-sections of Bote, which are based on quantum mechanical calculations, show promising results in many cases. KW - X-ray production efficiency KW - EPMA KW - Copper KW - Zirconium KW - Tungsten PY - 2023 DO - https://doi.org/10.1093/micmic/ozad067.110 SN - 1435-8115 VL - 29 IS - Supplement 1 SP - 245 EP - 246 PB - Oxford University Press CY - Oxford AN - OPUS4-58339 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Topolniak, Ievgeniia T1 - Direct laser writing of mussel inspired polydopamine N2 - Polydopamine (PDA) is one of the simplest and most versatile approaches for forming an excellent binding exterior to confer new functionalities to nearly any material surface. Inspired by nature, it mimics the behavior of mussels and can be easily deposited on virtually all types of inorganic and organic substrates, including superhydrophobic surfaces. Moreover, PDA exhibits high potential for surface modification and diversified secondary reactions that makes it extremely interesting for a wide range of application including biomedical field, e.g., drug delivery, adhesives, cell adhesion, biosensing. PDA has undergone significant expansion in its applications and is one of the most attractive areas within the materials field. Nevertheless, PDA integration in microdevices is still constrained by poor spatial and temporal control of excited deposition methods. Herein, we demonstrate a novel maskless approach for PDA micropatterning based on Direct Laser Writing that overcomes present limitations. The pattern is formed upon exposure of the dopamine solution by light produced by tightly-focused fs NIR laser that scans substrate surface accordingly to the selected pattern design. Neither strong oxidants, metal ions nor adjusting pH to alkaline is required by this technique to perform dopamine polymerization. Our method achieves the PDA micropatterns with the spatial resolution of 0.8 µm, at least an order of magnitude smaller than what is possible with other PDA microplanning techniques. Some examples of PDA patterns are shown in Figure 1. The here introduced PDA deposition technique will uniquely unravel applications of polydopamine and other catecholamine-based mussel-inspired materials in various multifunctional systems and microdevices (e.g., MEMS elements, microfluidics). The chemical nature of PDA was confirmed by locally recorded vibrational and x-ray photoelectron spectra. Moreover, the morphology and thickness of PDA microstructure can be controlled by the laser power and scanning velocity revealing the possibility of fabricating the structures with gradient. In most of the applied conditions the increase of the laser intensity and decrease of the scanning velocity would lead to the thicker PDA pattern. Different morphologies from smooth and bulky-like to grain like has been obtained. PDA was produced in the presence of tris buffer, phosphate buffer and DI water only. We also tested the effect of the solution pH applying pH 6.0, 7.0 and 8.5. Furthermore, the effect of antioxidants and purging of the solution with oxygen and nitrogen was investigated. Summarizing, we could see that the structures could be produced in all the given conditions, however their thickness and quality, morphology and roughness would differ. We did not observe negative impact of the antioxidants and nitrogen purging on the performance of PDA build up indicating that the PDA formation mechanism is different to common autooxidation. The current mechanism is based on the interaction of dopamine molecules with the photoinitiator added to solution as active to DLW laser light component. Apart from the glass substrate, we achieved PDA patterning at surfaces of different nature such as polychlorotrifluoroethylene, polydimethylsiloxane, polyethylene terephthalate, silicon wafers, and fluorinated glass coverslips. We also performed facile posts-modification of the PDA surface with protein enzymes like trypsin that was confirmed by XPS. Obtained bioactive pattern could be further integrated in the protein sensing devices. Presented in this work DLW-based microfabrication technique and the possibilities for further PDA surface post-functionalization empowers advanced applications of this material in single-molecule bioassays, sensors and other complex microdevices. T2 - MNE EUROSENSORS CY - Leuven, Belgium DA - 19.09.2022 KW - Polydopamine KW - Two-photon polymerisation KW - Micropatterning PY - 2022 AN - OPUS4-56421 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Topolniak, Ievgeniia T1 - Micropatterning of mussel-inspired materials - Empower selective functionality N2 - Surface-modification platforms that are universally applicable are vital for the development of new materials, surfaces, and nanoparticles. Mussel-inspired materials (MIMs) are widely used in various fields because of their strong adhesive properties and post-functionalization reactivity. However, conventional MIM coating techniques have limited deposition selectivity and lack structural control, which has limited their use in microdevices that require full control over deposition. To overcome these limitations, we developed a micropatterning technique for MIMs using multiphoton lithography, which does not require photomasks, stamps, or multistep procedures. This method enables the creation of MIM patterns with micrometer resolution and full design freedom and paves the way for innovative applications of MIMs in various multifunctional systems and microdevices, such as microsensors, MEMS, and microfluidics. T2 - BioCHIP Berlin - International Forum on Biochips and Microfabrication CY - Berlin, Germany DA - 28.05.2024 KW - Mussel inspired materials KW - Multiphoton lithography KW - Two photon polymerisation PY - 2024 AN - OPUS4-60254 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Topolniak, Ievgeniia T1 - Direct laser surface micropatterning with polydopamine N2 - Inspired by the chemistry of mussel adhesive proteins, polydopamine (PDA) is one of the simplest and most versatile approaches to confer new functionalities to nearly any material surface. Moreover, PDA exhibits high potential for surface modification and diversified secondary reactions that makes it extremely interesting for a wide range of application including biomedical field, e.g., drug delivery, adhesives, cell adhesion, biosensing. PDA has undergone significant expansion in its applications and is one of the most attractive areas within the materials field. Nevertheless, PDA integration in microdevices is still constrained by poor spatial and temporal control of excited deposition methods. Herein, we demonstrate a novel maskless approach for PDA micropatterning based on Direct Laser Writing (DLW) that overcomes present limitations. The pattern is formed upon exposure of the dopamine solution by light produced by tightly-focused fs NIR laser that scans substrate surface accordingly to the selected pattern design. Neither strong oxidants, metal ions nor adjusting pH to alkaline is required by this technique. Our method achieves the PDA micropatterns with the spatial resolution of 0.8 µm, at least an order of magnitude smaller than what is possible with other PDA microplanning techniques. The here introduced PDA deposition technique will uniquely unravel applications of polydopamine and other catecholamine-based mussel-inspired materials in various multifunctional systems and microdevices (e.g., MEMS elements, microfluidics). Adjustment of MPL parameters revealed that the morphology and thickness of resulted PDA microstructures can be controlled by altering the laser power and its scanning velocity. As a result, it also enables the production of micropatterns with structural gradient. Apart from the glass substrate, we achieved PDA patterning at surfaces of different nature such as polychlorotrifluoroethylene, polydimethylsiloxane, polyethylene terephthalate, silicon wafers, and fluorinated glass coverslips. The chemical nature of PDA was confirmed by locally recorded vibrational and x-ray photoelectron spectra. To ensure post-modification potential of MPL deposited PDA we demonstrated one-step deposition of micropatterns with trypsin. Obtained bio-functionalised surface can be further applied as a protein sensing active microelement. Presented in this work DLW-based microfabrication technique and the possibilities for further PDA surface post-functionalization empowers advanced applications of this material in single-molecule bioassays, sensors and other complex microdevices. T2 - Swiss ePrint 2022 CY - Buchs, Switzerland DA - 05.09.2022 KW - Polydopamine KW - Two-photon polymerisation KW - Micropatterning PY - 2022 AN - OPUS4-56422 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Topolniak, Ievgeniia A1 - Elert, Anna Maria A1 - Knigge, Xenia A1 - Cifci, G. C. A1 - Radnik, Jörg A1 - Sturm, Heinz T1 - Polydopamine micropatterning for selective substrate bio-functionalization N2 - Inspired by the chemistry of mussel adhesive proteins, polydopamine (PDA) exhibits strong adhesion to nearly any kind of organic or inorganic surface and shows high ability for surface post-modification and secondary reactions. As a result, PDA has been widely used as a base adlayer to enable versatile surface chemistry and functionalization. It has shown great potential in wide range of applications including biomedical field (e.g., drug delivery, adhesives, photothermal therapy, bone and tissue engineering, cell adhesion, biosensing). However, implementation of PDA in microdevices is still hindered by insufficient spatial and temporal control of excited deposition methods. In this work we present a novel approach to fabricate tunable micropatterned substrates where mussel-inspired chemistry provides base for various surface modification [2]. Current approach applies Multiphoton Lithography (MPL) to initiate local PDA formation, and, therefore, does not require use of microstamp or photomask. As a result, the microstructures of complex designs can be produced with the spatial resolution down to 0.8 μm (Figure 1). The desired design can be easily altered by adjusting the stl model or the fabrication code. Unlike the conventional deposition of PDA based on dopamine auto-oxidation, our method does not require presence of strong oxidants, metal ions or alkaline pH. Herein-demonstrated deposition approach will significantly facilitate applications of polydopamine and other mussel-inspired materials in microdevices and high-resolution active microcomponents (e.g., in MEMS and microfluidics). Adjustment of MPL parameters revealed that the morphology and thickness of resulted PDA microstructures can be controlled by altering the laser power and its scanning velocity. As a result, it also enables the production of micropatterns with structural gradient. Apart from the glass substrate, we performed PDA patterning at surfaces of different nature such as polychlorotrifluoroethylene, polydimethylsiloxane, polyethylene terephthalate, silicon wafers, and fluorinated glass coverslips. We tested different composition of dopamine solution for its ability of PDA buildup. Solutions containing Tris buffer, phosphate buffer or DI water only as well as different pH (6.0, 7.0 and 8.5) could be successfully applied for high-precision PDA micropatterning. Moreover, the effect of antioxidants and purging of the solution with oxygen and nitrogen was investigated. In all cases, no decrease of deposition efficiency was observed. The chemical nature of PDA was confirmed by locally recorded vibrational and x-ray photoelectron spectra. To ensure post-modification potential of MPL deposited PDA we demonstrated one-step deposition of micropatterns with trypsin. Obtained bio-functionalised surface can be further applied as a protein sensing active microelement. T2 - Laser Precision Microfabrication CY - Dresden, Germany DA - 07.06.2022 KW - Polydopamine KW - Two-photon polymerisation KW - Micropatterning PY - 2022 AN - OPUS4-55064 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Topolniak, Ievgeniia A1 - Elert, Anna Maria A1 - Knigge, Xenia A1 - Ciftci, G. C. A1 - Radnik, Jörg A1 - Sturm, Heinz T1 - High precision micropatterning of polydopamine by Multiphoton Lithography N2 - Mussel-inspired polydopamine (PDA) initiated a multifunctional modification route that leads to the generation of novel advanced materials and their applications. However, existing PDA deposition techniques still exhibit poor spatial control, have a very limited capability of micropatterning and do not allow to locally tune PDA topography. Herein, we demonstrate PDA deposition based on Multiphoton Lithography (MPL) that enables full spatial and temporal control with nearly total freedom of patterning design. Using MPL, we achieve 2D microstructures of complex design with pattern precision of 0.8 μm without the need of a photomask or stamp. Moreover, this approach permits adjusting the morphology and thickness of the fabricated microstructure within one deposition step, resulting in a unique tunability of materials properties. The chemical composition of PDA is confirmed and its ability for protein enzyme immobilization is demonstrated. This work presents a new methodology for high precision and complete control of PDA deposition, enabling PDA incorporation in applications where fine and precise local surface functionalization is required. Possible applications include multicomponent functional elements and devices in microfluidics or lab-on-a-chip systems. KW - Multiphoton lithography KW - Polydopamine KW - Micropatterning PY - 2022 DO - https://doi.org/10.1002/adma.202109509 VL - 34 IS - 18 SP - e2109509 PB - Wiley online library AN - OPUS4-54535 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Topolniak, Ievgeniia A1 - Knigge, Xenia A1 - Radnik, Jörg A1 - Sturm, Heinz T1 - Maskless Micropatterning of Polydopamine for versatile surface functionalization N2 - Inspired by the chemistry of mussel adhesive proteins, polydopamine (PDA has been shown as one of the most versatile platforms for altering the properties and incorporating new functionalities to nearby any material surface despite its nature. Rich chemistry of PDA enables broad variety of surface modification and diverse secondary reactions that makes it extremely interesting for a wide range of application including biomedical field, e.g., drug delivery, adhesives, cell adhesion, biosensing. Despite high potential of polydopamine, the lack of deposition control and precision in existed methods limits their applications in microdevices and miniaturized functional systems like, for example, MEMS, microfluidic and sensorics. Herein, we demonstrate a novel maskless approach for surface micropatterning with polydopamine based on Multiphoton Lithography that overcomes present limitations. Neither strong oxidants, metal ions nor adjustment of pH to alkaline is required by this technique. The spatial resolution down to 0.8 µm has been achieved which is at least an order of magnitude smaller than shown by other existed methods. We are able to control the morphology and thickness of the micropattern by altering fabrication parameters allowing structure gradient. Apart from the glass substrate, we achieved PDA patterning at surfaces of different nature such as polychlorotrifluoroethylene, polydimethylsiloxane, polyethylene terephthalate, silicon wafers, and fluorinated glass coverslips. Post-modification of polydopamine micropatterns with protein enzyme like trypsin is demonstrated to highlight its sensing potential. Presented in this work microfabrication technique empowers advanced applications of mussel-inspired materials in single-molecule bioassays, sensors and other complex microdevices. T2 - International Conference on Precision Engineering and Sustainable Manufacturing CY - Okinawa, Japan DA - 18.07.2023 KW - Multiphoton lithography KW - Polydopamine KW - Micropatterning PY - 2023 AN - OPUS4-58878 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Tu, Z. A1 - Donskyi, Ievgen A1 - Qiao, H. A1 - Zhu, Z. A1 - Unger, Wolfgang A1 - Hackenberger, C. P. R. A1 - Chen, W. A1 - Adeli, M. A1 - Haag, R. T1 - Graphene Oxide-Cyclic R10 Peptide Nuclear Translocation Nanoplatforms for the Surmounting of Multiple-Drug Resistance N2 - Multidrug resistance resulting from a variety of defensive pathways in Cancer has become a global concern with a considerable impact on the mortality associated with the failure of traditional chemotherapy. Therefore, further research and new therapies are required to overcome this challenge. In this work, a cyclic R10 peptide (cR10) is conjugated to polyglycerol-covered nanographene oxide to engineer a nanoplatform for the surmounting of multidrug resistance. The nuclear translocation of the nanoplatform, facilitated by cR10 peptide, and subsequently, a laser-triggered release of the loaded doxorubicin result in efficient anticancer activity confirmed by both in vitro and in vivo experiments. The synthesized nanoplatform with a combination of different features, including active nucleus-targeting, highloading capacity, controlled release of cargo, and photothermal property, provides a new strategy for circumventing multidrug resistant cancers. KW - Graphen Oxide KW - Nanoplatform KW - Cancer PY - 2020 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-510061 DO - https://doi.org/10.1002/adfm.202000933 VL - 30 IS - 35 SP - 2000933 PB - Wiley VCH AN - OPUS4-51006 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang T1 - International standardization and metrology as tools to address the comparability and reproducibility challenges in XPS measurements N2 - The status of standardization related to x-ray photoelectron spectroscopy (XPS, ESCA) at ASTM International (Subcommittee E42.03) and ISO (TC 201) is presented and commented upon in a structured manner. The survey also identifies other active bodies, here VAMAS Technical Working Area 2 and the Surface Analysis Working Group at the International Meter Convention, contributing to prestandardization Research and metrology of XPS and reports their specific activities. It is concluded that existing standardization is delivering good practices in the use of XPS and has a high potential to avoid the recently observed erroneous use, misapplications, and misinterpretation by new and inexperienced users of the method—which seems to be the main reason for the “reproducibility crisis” in the field of XPS applications. A need for a more proactive publicizing of international documentary standards by experienced XPS users, specifically those who are involved in standardization, is identified. Because the existing portfolio of standards addressing the use of XPS is not complete, future standardization projects planned or already ongoing are mentioned. The way the standardization bodies are identifying future needs is shortly explained. KW - Standardisation KW - Comparability KW - Reproducibility KW - XPS KW - VAMAS KW - Metrology PY - 2020 DO - https://doi.org/10.1116/1.5131074 VL - 38 IS - 2 SP - 021201-1 EP - 021201-8 PB - AVS AN - OPUS4-50560 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Fujimoto, T. T1 - The Surface Analysis Working Group at the Consultative Committee for Amount of Substance, Metrology in Chemistry and Biology: A successful initiative by Martin Seah N2 - Dr Martin Seah, NPL, was the initiator, founder, and first chairman of the Surface Analysis Working Group (SAWG) at the Consultative Committee for Amount of Substance, Metrology in Chemistry and Biology (CCQM) at the Bureau International des Poids et Mesures (BIPM), the international organization established by the Metre Convention. This tribute letter summarizes his achievements during his chairmanship and his long-running impact on the successful work of the group after his retirement. KW - CCQM (Consultative Committee for Amount of Substance) KW - Metrology in Chemistry and Biology KW - Martin Seah KW - Metrology KW - Quantitative surface chemical analysis KW - Surface Analysis Working Group PY - 2021 DO - https://doi.org/10.1002/sia.7033 SN - 0142-2421 VL - 54 IS - 4 SP - 314 EP - 319 PB - John Wiley & Sons Ltd AN - OPUS4-53714 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Senoner, M. A1 - Stockmann, Jörg Manfred A1 - Fernandez, V. A1 - Fairley, N. A1 - Passiu, C. A1 - Spencer, N. D. A1 - Rossi, A. T1 - Summary of ISO/TC 201 International Standard ISO 18516:2019 Surface chemical analysis - Determination of lateral resolution and sharpness in beam-based methods with a range from nanometres to micrometres and its implementation for imaging laboratory X-ray photoelectron spectrometers (XPS) N2 - ISO 18516:2019 Surface chemical analysis—Determination of lateral resolution and sharpness in beam-based methods with a range from nanometres to micrometres revises ISO 18516:2006 Surface chemical analysis—Auger electron spectroscopy and X-ray photoelectron spectroscopy—Determination of lateral resolution. It implements three different methods delivering parameters useful to express the lateral resolution: (1) the straight edge method, (2) the narrow line method and (3) the grating method. The theoretical background of these methods is introduced in ISO/TR 19319:2013 Surface chemical analysis—Fundamental approaches to determination of lateral resolution and sharpness in beam-based methods. The revised International Standard ISO 18516 delivers standardized procedures for the determination of the (1) effective lateral resolution by imaging of square-wave gratings, the (2) lateral resolution expressed as the parameter D12–88 characterizing the steepness of the sigmoidal edge spread function (ESF) determined by imaging a straight edge and (3) the lateral resolution expressed as the full width of half maximum of the line spread function (LSF), wLSF, determined by imaging a narrow line. The last method also delivers information on the shape of the LSF, which characterizes an individual imaging instrument. Finally, the implementation of all three standardized methods in the field of imaging laboratory X-ray photoelectron spectroscopy (XPS) is shortly presented. This part of the letter is based on the use of a new test sample developed at ETH Zurich, Switzerland. This test sample displays a micrometre scaled pattern motivated by the resolving power of recent imaging XPS instruments. KW - Grating method KW - Imaging AES KW - Imaging SIMS KW - Imaging XPS KW - Lateral resolution KW - Narrow line method KW - Noise in image KW - Resolution criterion KW - Straight edge method PY - 2021 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-536330 DO - https://doi.org/10.1002/sia.7025 SN - 1096-9918 VL - 54 IS - 4 SP - 320 EP - 327 PB - Wiley CY - Chichester AN - OPUS4-53633 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Stockmann, Jörg M. A1 - Senoner, Mathias A1 - Weimann, T. A1 - Bütefisch, S. A1 - Passiu, C. A1 - Spencer, N. D. A1 - Rossi, A. T1 - Introduction to lateral resolution and analysis area measurements in XPS N2 - Imaging and small-spot (small area) XPS have become increasingly important components of surface chemical analysis during the last three decades, and its use is growing. Some ambiguity in the use of terminology, understanding of concepts, and lack of appropriate reference materials leads to confusing and not always reproducible data. In this paper, it is shown that by using existing knowledge, appropriate test specimens, and standardized approaches, problems of comparability and such reproducibility issues recently observed for XPS data reported in the scientific literature can be overcome. The standardized methods of ISO 18516:2019, (i) the straight-edge, (ii) the narrow-line, and (iii) the grating method, can be used to characterize and compare the lateral resolution achieved by imaging XPS instruments and are described by reporting examples. The respective measurements are made using new test specimens. When running an XPS instrument in the small-spot (small area) mode for a quantitative analysis of a feature of interest, the question arises as to what contribution to the intensity originates from outside the analysis area. A valid measurement approach to control the intensity from outside the nominal analysis area is also described. As always, the relevant resolution depends on the specific question that needs to be addressed. The strengths and limitations of methods defining resolution are indicated. KW - Imaging XPS KW - Lateral resolution KW - Analysis area measurements KW - Small-spot XPS PY - 2020 DO - https://doi.org/10.1116/6.0000398 VL - 38 IS - 5 SP - 053206 AN - OPUS4-51394 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Unger, Wolfgang A1 - Wirth, Thomas A1 - Hodoroaba, Vasile-Dan ED - Hodoroaba, Vasile-Dan ED - Unger, Wolfgang ED - Shard, A. G. T1 - Auger electron spectroscopy N2 - An introduction in the application of Auger Electron Spectroscopy to surface chemical analysis of nanoparticles is given. Auger Electron Spectroscopy is a mature method in the field of surface chemical analysis. The chapter addresses the physical basis of the method, the principal design of recent instruments together with modes of operation and options for the presentation of spectra, as well as different approaches for qualitative (including identification of chemical species) and quantitative surface analysis of elements. An application paragraph on surface chemical analysis of nanoparticles by AES or SAM introduces the different measurement approaches and sample preparation strategies applied by analysts. The analysis of nanoparticle ensembles, the so-called selected point analysis where a narrow primary electron beam is centered on an individual nanoparticle, and chemical mapping of individual nanoparticles (or a line scan across) are addressed. Existing literature is reviewed and informative case studies presented. Limitations and pitfalls in the application of AES in surface chemical analysis of nanoparticles are also addressed. KW - Auger Electron Spectroscopy KW - Surface chemical analysis KW - Imaging surface chemical analysis KW - Nanoparticles KW - Nanotechnology PY - 2020 SN - 978-0-12-814182-3 DO - https://doi.org/10.1016/B978-0-12-814182-3.00020-1 SP - 373 EP - 395 PB - Elsevier CY - Amsterdam AN - OPUS4-50119 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Vladár, A. E. A1 - Hodoroaba, Vasile-Dan ED - Hodoroaba, Vasile-Dan ED - Unger, Wolfgang ED - Shard, A. G. T1 - Characterization of nanoparticles by scanning electron microscopy N2 - In this chapter sample preparation, image acquisition, and nanoparticle size and shape characterization methods using the scanning electron microscope (SEM) in reflective and transmitted working modes are described. These help in obtaining reliable, highly repeatable results. The best solutions vary case-by-case and depend on the raw (powdered or suspension) nanoparticle material, the required measurement uncertainty and on the performance of the SEM. KW - Nanoparticles KW - Sample preparation KW - Electron microscopy KW - SEM KW - Size measurement KW - Shape KW - Threshold PY - 2020 SN - 978-0-12-814182-3 DO - https://doi.org/10.1016/B978-0-12-814182-3.00002-X SP - 7 EP - 27 PB - Elsevier CY - Amsterdam AN - OPUS4-50120 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Vogel, Amelie A1 - Tentschert, Jutta A1 - Pieters, Raymond A1 - Bennet, Francesca A1 - Dirven, Hubert A1 - van den Berg, Annemijne A1 - Lenssen, Esther A1 - Rietdijk, Maartje A1 - Broßell, Dirk A1 - Haase, Andrea T1 - Towards a risk assessment framework for micro- and nanoplastic particles for human health N2 - Background Human exposure to micro- and nanoplastic particles (MNPs) is inevitable but human health risk assessment remains challenging for several reasons. MNPs are complex mixtures of particles derived from different polymer types, which may contain plenty of additives and/or contaminants. MNPs cover broad size distributions and often have irregular shapes and morphologies. Moreover, several of their properties change over time due to aging/ weathering. Case-by-case assessment of each MNP type does not seem feasible, more straightforward methodologies are needed. However, conceptual approaches for human health risk assessment are rare, reliable methods for exposure and hazard assessment are largely missing, and meaningful data is scarce. Methods Here we reviewed the state-of-the-art concerning risk assessment of chemicals with a specific focus on polymers as well as on (nano-)particles and fibres. For this purpose, we broadly screened relevant knowledge including guidance documents, standards, scientific publications, publicly available reports. We identified several suitable concepts such as: (i) polymers of low concern (PLC), (ii) poorly soluble low toxicity particles (PSLT) and (iii) fibre pathogenicity paradigm (FPP). We also aimed to identify promising methods, which may serve as a reasonable starting point for a test strategy. Results and conclusion Here, we propose a state-of-the-art modular risk assessment framework for MNPs, focusing primarily on inhalation as a key exposure route for humans that combines several integrated approaches to testing and assessment (IATAs). The framework starts with basic physicochemical characterisation (step 1), followed by assessing the potential for inhalative exposure (step 2) and includes several modules for toxicological assessment (step 3). We provide guidance on how to apply the framework and suggest suitable methods for characterization of physicochemical properties, exposure and hazard assessment. We put special emphasis on new approach methodologies (NAMs) and included grouping, where adequate. The framework has been improved in several iterative cycles by taking into account expert feedback and is currently being tested in several case studies. Overall, it can be regarded as an important step forward to tackle human health risk assessment. KW - Microplastics KW - Nanoplastics KW - Human health KW - Risk assessment KW - Integrated approaches to testing and assessment (IATAs) KW - Polymers of low concern (PLC) KW - Poorly soluble low toxicity particles (PSLT) PY - 2024 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-623790 DO - https://doi.org/10.1186/s12989-024-00602-9 SN - 1743-8977 VL - 21 IS - 1 SP - 1 EP - 21 PB - Springer Science and Business Media LLC AN - OPUS4-62379 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Voss, Heike T1 - Picosecond laser processing of hierarchical micro-nanostructures on Ti-alloy upon pre- and post-anodization N2 - Recent publications indicate that the order of electrochemical anodization (before or after the laser-processing step) plays an important role for the response of boneforming osteoblasts – an effect that can be utilized for improving permanent dental- or removable bone-implants. For exploring these different surface functionalities, multi-method chemical and structural characterizations were performed for two different characteristic micro-spikes covered by nanometric laserinduced periodic surface structures (LIPSS) on Ti-6Al-4V upon irradiation with nearinfrared ps-laser pulses (1030 nm wavelength, ~1 ps pulse duration, 66 & 80 kHz pulse repetition rate) at two distinct sets of laser fluence and beam scanning parameters. This involves morphological and topographical investigations by scanning electron microscopy (SEM) and white light interference microscopy (WLIM), near-surface chemical analysis by X-ray photoelectron spectroscopy (XPS) and hard X-ray photoelectron spectroscopy (HAXPES), as well as structural material examination via X-ray diffraction (XRD) measurements. The results allow to qualify the laser ablation depth, assess the spike geometry and surface roughness parameters, and provide detailed insights into the near-surface oxidation that may cause the different cell growth behavior for pre- or post-anodized medical implants. T2 - E-MRS Spring Meeting 2023 CY - Strasbourg, France DA - 29.05.2023 KW - Hard X-ray photoelectron spectroscopy (HAXPES) KW - Laser-induced periodic surface structures (LIPSS) KW - Ti6Al4V alloy KW - Hierarchical micro-nanostructures KW - Ultrashort laser processing PY - 2023 AN - OPUS4-60344 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Voss, Heike T1 - Morphology and regularity of high-spatial frequency laser-induced periodic surface structures (HSFL) on titanium materials N2 - Titanium and its alloys are known to allow the straightforward laser‐based manufacturing of ordered surface nanostructures, so‐called high spatial frequency laser‐induced periodic surface structures (HSFL). These structures exhibit sub‐100 nm spatial periods – far below the optical diffraction limit. The resulting surface functionalities are usually enabled by both, topographic and chemical alterations of the nanostructured surfaces. For exploring these effects, HSFL were processed on different titanium materials (bulk, film) upon irradiation with near‐infrared ps‐laser pulses (1030 nm wavelength, ≈ 1 ps pulse duration) under different laser scan processing conditions. Here we extend our previous work on chemical analyses of HSFL on titanium materials towards a more detailed morphological and topographical surface characterization. For that, scanning electron and atomic force microscopic images are subjected to a regularity analysis using our self-developed ReguΛarity software. The regularity of the HSFL is assessed with respect to the influences of sample- and laser-related parameters, as well as the imaging method used. T2 - 13th International LIPSS Workshop CY - Enschede, Netherlands DA - 29.10.2025 KW - Laser-induced periodic surface structures (LIPSS) KW - Titanium KW - Ultrashort laser pulses KW - Laser processing PY - 2025 AN - OPUS4-64631 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Voss, Heike T1 - Morphology and regularity of high-spatial frequency laser-induced periodic surface structures (HSFL) on titanium materials N2 - Titanium and its alloys are known to enable the straightforward laser‐based manufacturing of ordered surface nanostructures, so‐called high-spatial frequency laser‐induced periodic surface structures (HSFL). These structures exhibit sub‐100 nm spatial periods – far below the optical diffraction limit. The resulting surface functionalities are usually enabled by both, topographic and chemical alterations of the nanostructured surfaces. For exploring these effects, HSFL were processed on different titanium materials (bulk, film) upon irradiation with near‐infrared ps‐laser pulses (1030 nm wavelength, ≈1 ps pulse duration) under different laser scan processing conditions in normal air atmosphere. Here, we extend our previous work on chemical analyses of HSFL on titanium materials towards a more detailed large-area morphological and topographical surface characterization. For this purpose, scanning electron or atomic force microscopic images are subjected to a regularity analysis using our ReguΛarity software. The results are assessed with respect to the influences of sample- or laser-related parameters on the regularity of the HSFL. T2 - 13th International Conference on Photoexcited Processes and Applications, ICPEPA-13 CY - Lecce, Italy DA - 14.09.2025 KW - Laser-induced periodic surface structures (LIPSS) KW - Laser processing KW - Ulltrashort laser pulses KW - Titanium PY - 2025 AN - OPUS4-64173 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -