TY - JOUR A1 - Kovacevic, E. A1 - Strunskus, T. A1 - Santhosh, N. M. A1 - Zavasnik, Z. A1 - Unger, Wolfgang A1 - Sauvage, T. A1 - Ammar, M.-R. A1 - Cvelbar, U. A1 - Berndt, J. T1 - Thermal stability studies of plasma deposited hydrogenated carbon nitride nanostructures N2 - Thermally stable carbon nitride nanostructures have potential applications in surface coatings and automotive fields. In this work, hydrogenated nitrogen-rich carbon nitride nanoparticles have been synthesised via low-pressure low-power plasma vapour deposition technique from methane/Nitrogen gas mixture in a dry process. Thermal stability of the initially prepared hydrogenated carbon Nitride structures has been analysed by near-edge X-ray absorption fine-structure spectroscopy (NEXAFS, insitu), Raman spectroscopy, scanning and transmission electron microscopy and nuclear reaction Analysis (NRA). Thermal studies reveal the excellent stability of the material and nitrogen-rich characteristics (N/C ratio 0.5e0.2 ± 0.01). The obtained results suggest transformation of sp3-rich as-deposited carbon Nitride into sp2-carbon phase with more graphitic features upon thermal annealing. Such in-situ thermal studies of plasma deposited carbon nitrides confirm the conversion of sp3-rich phase to sp2-rich carbon phase at the critical temperature (about 450 K), without a huge loss in nitrogen content. The analysis revealed that the material is a stable plasma deposit after this critical temperature up to >1100 K. Additionally, super hydrophilic carbon nitride nanostructure transforms into a hydrophobic surface after thermal annealing. These thermally stable hydrophobic carbon nitride nanoparticles could be used as a promising material for the hydrophobic coatings for various applications, especially for harsh conditions. KW - Carbon nanoparticles KW - Hydrogenated nanostructures KW - Plasma deposition KW - NEXAFS KW - Thermal annealing PY - 2021 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:kobv:b43-536163 SN - 0008-6223 VL - 184 SP - 82 EP - 90 PB - Elsevier Ltd. AN - OPUS4-53616 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -