TY - JOUR A1 - Silbernagl, Dorothee A1 - Szymoniak, Paulina A1 - Tavasolyzadeh, Zeynab A1 - Sturm, Heinz A1 - Topolniak, Ievgeniia T1 - Multiphoton Lithography of Interpenetrating Polymer Networks for Tailored Microstructure Thermal and Micromechanical Properties N2 - Multiphoton lithography (MPL), an emerging truly 3D microfabrication technique, exhibits substantial potential in biomedical applications, including drug delivery and tissue engineering. Fabricated micro-objects are often expected to undergo shape morphing or bending of the entire structure or its parts. Furthermore, ensuring precise property tuning is detrimental to the realization of the functionality of MPL microstructures. Herein, novel MPL materials based on interpenetrating polymer networks (IPNs) are presented that effectively combine the advantages of acrylate and epoxy systems. IPNs with varying component ratios are investigated for their microfabrication performance and structural integrity with respect to thermal and micromechanical properties. A variety of high-resolution techniques is applied to comprehensively evaluate IPN properties at the bulk, micron, and segmental levels. This study shows that the MPL laser scanning velocity and power, photoinitiator content, and multi-step exposure can be used to tune the morphology and properties of the IPN. As a result, a library of 3D MPL IPN microstructures with high 3D structural stability and tailored thermal and micromechanical properties is achieved. New IPN microstructures with Young’s moduli of 3–4 MPa demonstrate high-to-fully elastic responses to deformations, making them promising for applications in morphable microsystems, soft micro-robotics, and cell engineering. KW - Interpenetrating polymer network KW - Multiphoton lithography KW - Atomic force microscopy KW - Intermodulation AFM KW - Fast scanning calorimetry PY - 2024 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-600593 DO - https://doi.org/10.1002/smll.202310580 SN - 1613-6810 SP - 1 EP - 12 PB - Wiley VHC-Verlag AN - OPUS4-60059 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Gawek, Marcel A1 - Madkour, Sherif A1 - Szymoniak, Paulina A1 - Radnik, Jörg A1 - Schönhals, Andreas T1 - Energy Dependent XPS Measurements on Thin Films of a Poly(vinyl methyl ether)/Polystyrene Blend in Dependence on Film Thickness – Concentration Profile on a Nanometer Resolution to Understand the Behavior of Nanofilms N2 - The composition of the surface layer in dependence from the distance of the polymer/air interface in thin films with thicknesses below 100 nm of miscible polymer blends in a spatial region of a few nanometers is not investigated completely. Here, thin films of the blend poly vinyl methyl ether) (PVME)/polystyrene (PS) with a composition of 25/75 wt% are investigated by Energy Resolved X-ray Photoelectron Spectroscopy (ER-XPS) at a synchrotron storage ring using excitation energies lower than 1 keV. By changing the energy of the photons the information depth is varied in the range from ca. 1 nm to 10 nm. Therefore, the PVME concentration could be estimated in dependence from the distance of the polymer/air interface for film thicknesses below 100 nm. Firstly, as expected for increasing information depth the PVME concentration decreases. Secondly, it was found that the PVME concentration at the surface has a complicated dependence on the film thickness. It increases with decreasing film thickness until 30 nm where a maximum is reached. For smaller film thicknesses the PVME concentration decreases. A simplified layer model is used to calculate the effective PVME concentration in the different spatial regions of the surface layer. KW - Energy dependent XPS KW - Soft X-ray KW - Thin films PY - 2021 DO - https://doi.org/10.1039/d1sm00656h VL - 17 IS - 29 SP - 6985 EP - 6994 PB - The Royal Chemical Society AN - OPUS4-53039 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Roszak, I. A1 - Oswald, L. A1 - Ouahabi, A. A. A1 - Bertin, Annabelle A1 - Laurent, E. A1 - Felix, O. A1 - Carvin-Sergent, I. A1 - Charles, L. A1 - Lutz, J.-F. T1 - Synthesis and sequencing of informational poly(amino phosphodiester)s N2 - Sequence-defined poly(amino phosphodiester)s containing main-chain tertiary amines were synthesized by automated solid-phase phosphoramidite chemistry. These polymers were prepared using four monomers with different substituents. The formed polymers were characterized by HPLC and mass spectrometry. These methods evidenced preparation of molecularly-defined polymers. Furthermore, the presence of tertiary amines in the polymer backbones facilitates sequencing by tandem mass spectrometry. KW - Poly(amino phosphodiester) KW - Synthesis KW - HPLC KW - Mass spectrometry PY - 2021 DO - https://doi.org/10.1039/d1py01052b SN - 1759-9954 VL - 12 IS - 37 SP - 5279 EP - 5282 PB - Royal Society of Chemistry AN - OPUS4-53732 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Topolniak, Ievgeniia A1 - Elert, Anna Maria A1 - Knigge, Xenia A1 - Ciftci, G. C. A1 - Radnik, Jörg A1 - Sturm, Heinz T1 - High precision micropatterning of polydopamine by Multiphoton Lithography N2 - Mussel-inspired polydopamine (PDA) initiated a multifunctional modification route that leads to the generation of novel advanced materials and their applications. However, existing PDA deposition techniques still exhibit poor spatial control, have a very limited capability of micropatterning and do not allow to locally tune PDA topography. Herein, we demonstrate PDA deposition based on Multiphoton Lithography (MPL) that enables full spatial and temporal control with nearly total freedom of patterning design. Using MPL, we achieve 2D microstructures of complex design with pattern precision of 0.8 μm without the need of a photomask or stamp. Moreover, this approach permits adjusting the morphology and thickness of the fabricated microstructure within one deposition step, resulting in a unique tunability of materials properties. The chemical composition of PDA is confirmed and its ability for protein enzyme immobilization is demonstrated. This work presents a new methodology for high precision and complete control of PDA deposition, enabling PDA incorporation in applications where fine and precise local surface functionalization is required. Possible applications include multicomponent functional elements and devices in microfluidics or lab-on-a-chip systems. KW - Multiphoton lithography KW - Polydopamine KW - Micropatterning PY - 2022 DO - https://doi.org/10.1002/adma.202109509 VL - 34 IS - 18 SP - e2109509 PB - Wiley online library AN - OPUS4-54535 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Bhattacharya, Biswajit A1 - Michalchuk, Adam A1 - Silbernagl, Dorothee A1 - Rautenberg, Max A1 - Schmid, Thomas A1 - Feiler, Torvid A1 - Reimann, K. A1 - Ghalgaoui, A. A1 - Sturm, Heinz A1 - Paulus, B. A1 - Emmerling, Franziska T1 - A Mechanistic Perspective on Plastically Flexible Coordination Polymers N2 - Mechanical flexibility in single crystals of covalently bound materials is a fascinating and poorly understood phenomenon. We present here the first example of a plastically flexible one-dimensional (1D) coordination polymer. The compound [Zn(m-Cl)2(3,5-dichloropyridine)2]n is flexible over two crystallographic faces. Remarkably, the single crystal remains intact when bent to 1808. A combination of microscopy, diffraction, and spectroscopic studies have been used to probe the structural response of the crystal lattice to mechanical bending. Deformation of the covalent polymer chains does not appear to be responsible for the observed macroscopic bending. Instead, our results suggest that mechanical bending occurs by displacement of the coordination polymer chains. Based on experimental and theoretical evidence, we propose a new model for mechanical flexibility in 1D coordination polymers. Moreover, our calculations propose a cause of the different mechanical properties of this compound and a structurally similar elastic material KW - Coordination polymer KW - Flexible crystals KW - Mechanical properties KW - Plastic deformation PY - 2020 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-504755 DO - https://doi.org/10.1002/anie.201914798 VL - 59 IS - 14 SP - 5557 EP - 5561 PB - Wiley-VCH AN - OPUS4-50475 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Solomun, Tihomir A1 - Hahn, Marc Benjamin A1 - Smiatek, J. T1 - Raman spectroscopic signature of ectoine conformations in bulk solution and crystalline state N2 - Recent crystallographic results revealed conformational changes of zwitterionic ectoine upon hydration. By means of confocal Raman spectroscopy and density functional theory calculations, we present a detailed study of this transformation process as part of a Fermi resonance analysis. The corresponding findings highlight that all resonant couplings are lifted upon exposure to water vapor as a consequence of molecular binding processes. The importance of the involved molecular groups for water binding and conformational changes upon hydration is discussed. Our approach further Shows that the underlying rapid process can be reversed by carbon dioxide saturated atmospheres. For the first time, we also confirm that the conformational state of ectoine in aqueous bulk solution coincides with crystalline ectoine in its dihydrate state, thereby highlighting the important role of a few bound water molecules. KW - Fermi resonance KW - Ectoine hydration KW - DFT calculations of Raman spectra KW - Position of carboxylate group PY - 2020 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-509855 DO - https://doi.org/10.1002/cphc.202000457 SN - 1439-4235 SN - 1439-7641 VL - 21 IS - 17 SP - 1945 EP - 1950 PB - Wiley-VCH CY - Weinheim AN - OPUS4-50985 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Hahn, Marc Benjamin T1 - Temperature in micromagnetism: Cell size and scaling effects of the stochastic Landau-Lifshitz equation N2 - The movement of the macroscopic magnetic moment in ferromagnetic systems can be described by the Landau-Lifshitz (LL) or Landau-Lifshitz-Gilbert (LLG) equation. These equations are strictly valid only at absolute zero temperature. To include temperature effects a stochastic version of the LL or LLG equation for a spin density of one per unit cell can be used instead. To apply the stochastic LL to micromagnetic simulations, where the spin density per unit cell is generally higher, a conversion regarding simulation cell size and temperature has to be established. Based on energetic considerations, a conversion for ferromagnetic bulk and thin film systems is proposed. The conversion is tested in micromagnetic simulations which are performed with the Object Oriented Micromagnetic Framework (OOMMF). The Curie temperatures of bulk Nickel, Cobalt and Iron systems as well as Nickel thin-film systems with thicknesses between 6.3 mono layer (ML) and 31ML are determined from micromagnetic simulations. The results show a good agreement with experimentally determined Curie temperatures of bulk and thin film systems when temperature scaling is performed according to the presented model. KW - Micromagnetism KW - LLG KW - LL equation KW - Landau Lifshitz equation KW - Landau Lifshitz Gilbert equation KW - Stochastic Landau Lifshitz equation KW - Stochastic Landau Lifshitz Gilbert equation KW - Curie temperature KW - Magnetic Nanoparticles KW - Thin film systems KW - Temeprature scaling KW - Phase transition KW - Magnet coupling KW - Ferromagnetism KW - Superparamagnetism KW - Paramagnetism KW - Ni KW - Co KW - Fe KW - Steel KW - Nickel KW - Cobalt KW - Iron KW - Temperature effects KW - Cell size KW - Damping factor KW - Gamma KW - Alpha KW - Spin KW - Magnetic moment KW - Magnetic interacion KW - Magnetization dynamics KW - Domain wall KW - Exchange length KW - temeprature dependent exchange length KW - Bloch wall KW - Neel wall KW - Exchange interaction KW - Magnetic anisotropy KW - Simulation KW - OOMMF KW - Object oriented micromagnetic framework PY - 2019 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-484610 DO - https://doi.org/10.1088/2399-6528/ab31e6 VL - 3 IS - 7 SP - 075009-1 EP - 075009-8 PB - IOPscience CY - England AN - OPUS4-48461 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Dudziak, Mateusz A1 - Topolniak, Ievgeniia A1 - Silbernagl, Dorothee A1 - Altmann, Korinna A1 - Sturm, Heinz T1 - Long-time behavior of surface properties of microstructures fabricated by multiphoton lithography N2 - The multiphoton lithography (MPL) technique represents the future of 3D microprinting, enabling the production of complex microscale objects with high precision. Although the MPL fabrication parameters are widely evaluated and discussed, not much attention has been given to the microscopic properties of 3D objects with respect to their surface properties and time-dependent stability. These properties are of crucial importance when it comes to the safe and durable use of these structures in biomedical applications. In this work, we investigate the surface properties of the MPL-produced SZ2080 polymeric microstructures with regard to the physical aging processes during the post-production stage. The influence of aging on the polymeric microstructures was investigated by means of Atomic Force Microscopy (AFM) and X-ray Photoelectron Spectroscopy (XPS). As a result, a time-dependent change in Young’s Modulus, plastic deformation, and adhesion and their correlation to the development in chemical composition of the surface of MPL-microstructures are evaluated. The results presented here are valuable for the application of MPL-fabricated 3D objects in general, but especially in medical technology as they give detailed information of the physical and chemical time-dependent dynamic behavior of MPL-printed surfaces and thus their suitability and performance in biological systems. KW - Multiphoton lithography KW - Additive manufacturing KW - Microfabrication KW - SZ2080 negative photo-resist KW - Young´s modulus KW - Aging KW - Surface properties KW - X-ray photoelectron spectroscopy KW - Atomic force microscopy KW - Force-distance-curve PY - 2021 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-542166 DO - https://doi.org/10.3390/nano11123285 SN - 2079-4991 VL - 11 IS - 12 SP - 1 EP - 12 PB - MDPI CY - Basel AN - OPUS4-54216 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Wurzler, Nina A1 - Sobol, Oded A1 - Altmann, Korinna A1 - Radnik, Jörg A1 - Özcan Sandikcioglu, Özlem T1 - Preconditioning of AISI 304 stainless steel surfaces in the presence of flavins—Part I: Effect on surface chemistry and corrosion behavior N2 - Stainless steel AISI 304 surfaces were studied after a mild anodic polarization for oxide growth in the presence and absence of two derivatives of vitamin B2 (riboflavin and flavin mononucleotide) that can be secreted by metal‐reducing bacteria and act as a chelating agent for iron species. The alterations in oxide chemistry were studied by means of surface‐sensitive techniques such as X‐ray photoelectron spectroscopy and time‐of‐flight secondary ion mass spectrometry analysis. The complementary electrochemical characterization revealed a preferential growth of an oxide/hydroxide iron‐rich film that is responsible for an altered pit initiation and nucleation behavior. These findings suggest that as the corrosion behavior is determined by the interplay of the chemical and electronic properties, only a mild anodic polarization in the presence of redox‐active molecules is able to alter the chemical and electronic structure of the passive film formed on stainless steel AISI 304. This helps to achieve a profound understanding of the mechanisms of microbially influenced corrosion (MIC) and especially the possible effects of the redox‐active biomolecules, as they may play an important role in the corrosion susceptibility of stainless steel surfaces. KW - Corrosion KW - Stainless steel KW - Surface analysis PY - 2021 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-528117 DO - https://doi.org/10.1002/maco.202012191 VL - 72 IS - 6 SP - 974 EP - 982 PB - Wiley AN - OPUS4-52811 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Fritzsche, Sven A1 - Topolniak, Ievgeniia A1 - Weise, Matthias A1 - Sturm, Heinz T1 - Shape deviations of DLW microstructures in dependency of fabrication parameters N2 - Deep understanding of the effects associated with fabrication parameters and their influence on the resulting structures shape is essential for the further development of direct laser writing (DLW). In particular, it is critical for development of reference materials, where structure parameters are precisely fabricated and should be reproduced with use of DLW technology. In this study we investigated the effect of various fabrication and preparation parameters on the structural precision of interest for reference materials. A well-studied photo-curable system, SZ2080 negative photo-resist with 1 wt.% Michler's ketone (Bis) photo-initiator, was investigated in this work. The correlation between applied laser power, laser velocity, fabrication direction on the deviations in the structure shape were observed by means of white light interferometry microscopy. Moreover, influence of slicing and hatching distances as well as prebake time were studied as function of sample shape. Deviations in the structure form between the theoretically expected and the one detected after DLW fabrication were observed in the range up to 15%. The observed shape discrepancies show the essential importance of fine-tuning the fabrication parameter for reference structure production. KW - Direct laser writing KW - Fabrication parameters KW - Structural precision KW - SZ2080 negative photo-resist KW - White light interferometry microscopy PY - 2021 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-535906 DO - https://doi.org/10.1088/1361-6439/ac2a14 VL - 31 IS - 12 SP - 1 EP - 8 PB - IOP Science AN - OPUS4-53590 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -