TY - CONF A1 - Wirth, Thomas T1 - Electron-probe MICROanalysis of LIghT Elements; Measurement Methods and Certified Reference Materials (MICROLITE) - Minutes of Progress Meeting: WP1.2 Production of carbide and nitride standards and WP1.4 Stability testing T2 - MICROLITE 6th Progress Meeting CY - Palmones, Spain DA - 2001-03-16 PY - 2001 AN - OPUS4-6902 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Hantsche, Harald A1 - Golze, Manfred A1 - Zabinski, A. A1 - Eckardt, Jürgen A1 - Wirth, Thomas A1 - Schmidt, Dieter T1 - Auger microprobe-surface analysis of sub-mum nitrides and carbonitrides in steel PY - 1993 SN - 0937-0633 VL - 346 SP - 29 EP - 36 PB - Springer CY - Berlin AN - OPUS4-6903 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Senoner, Mathias A1 - Wirth, Thomas A1 - Unger, Wolfgang T1 - A reference material for calibration and testing of instruments with nanometric lateral resolution T2 - SIMS Europe 2002 ; 3rd European Workshop on Secondary Ion Mass Spectrometry CY - Münster, Germany DA - 2002-09-15 PY - 2002 SP - 58 AN - OPUS4-6841 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - RPRT A1 - Almagro, J.-F. A1 - Busch, P. A1 - Gohil, D. D. A1 - Saunders, S. R. J. A1 - Sloof, W. G. A1 - Thiot, J.-F. A1 - Schneider, H. A1 - Whitwood, M. A1 - Wirth, Thomas T1 - Electron-Probe MICROanalysis of LighT Elements - Measurement Methods and Certified Reference Materials (MICROLITE) PY - 2000 IS - 266 SP - 1 EP - 35 PB - National Physical Laboratory CY - Teddington, Middlesex AN - OPUS4-6843 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Senoner, Mathias A1 - Wirth, Thomas A1 - Unger, Wolfgang A1 - Österle, Werner A1 - Kaiander, I. A1 - Sellin, R. L. A1 - Bimberg, D. ED - Wilkening, G. ED - Koenders, L. T1 - Testing the Lateral Resolution in the Nanometre Range with a New Type of Certified Reference Material T2 - NanoScale 2004 Seminar ; 6th Seminar on Quantitative Microscopy ; 2nd Seminar on Nanoscale Calibration Standards and Methods CY - Braunschweig, Germany DA - 2004-03-25 KW - Laterale Auflösung KW - Nanometrologie KW - Nanotechnologie KW - Oberflächenanalytik KW - Zertifiziertes Referenzmaterial PY - 2004 SN - 3-527-40502-X DO - https://doi.org/10.1002/3527606661.ch21 SP - 282 EP - 294 PB - Wiley-VCH CY - Weinheim AN - OPUS4-7541 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Oran, Umut A1 - Ünveren, Ercan A1 - Wirth, Thomas A1 - Unger, Wolfgang T1 - Poly-dimethyl-siloxane (PDMS) contamination of polystyrene (PS) oligomers samples: a comparison of time-of-flight static secondary ion mass spectrometry (TOF-SSIMS) and X-ray photoelectron spectroscopy (XPS) results N2 - Pure and PDMS contaminated PS oligomers films were investigated both by time-of-flight static secondary ion mass spectrometry (TOF-SSIMS) and X-ray photoelectron spectroscopy (XPS). The secondary ion spectra from the PDMS contaminated PS oligomers were almost completely related to PDMS. XPS revealed a PDMS contamination characterized by a silicon surface concentration of 6 at.%. Obviously siloxane contaminants existing on the surface of a silicon wafer may diffuse towards the PS oligomers outermost surface resulting in a rather high PDMS surface concentration of about 85%. Due to the known differences in the information depth and sensitivity of SSIMS and XPS very different detection limits are to be considered. In elimination of siloxane contaminants by ultrasonication in hexane was found to be an effective way. Another common organic cleaning procedure, which is ultrasonication in trichloroethylene (TCE), subsequently in isopropanol and finally in acetone was found to be ineffective for cleaning of PDMS contaminated silicon wafers. KW - PDMS KW - TOF-SIMS KW - Polystyrene KW - Segregation PY - 2004 DO - https://doi.org/10.1016/j.apsusc.2003.12.008 SN - 0169-4332 SN - 1873-5584 VL - 227 SP - 318 EP - 324 PB - North-Holland CY - Amsterdam AN - OPUS4-3479 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Senoner, Mathias A1 - Wirth, Thomas A1 - Unger, Wolfgang T1 - Teststreifen für den Nanokosmos KW - Laterale Auflösung KW - Nanometrologie KW - Nanotechnologie KW - Oberflächenanalytik KW - Zertifiziertes Referenzmaterial PY - 2004 UR - http://www.laborpraxis.de/ SN - 0344-1733 SN - 1610-8256 VL - 27 IS - Juli/Aug SP - 30 EP - 32, Sonderh. Nanotechnologie PB - Vogel CY - Würzburg AN - OPUS4-3808 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Kuhmann, J. A1 - Harde, P. A1 - Pech, O. A1 - Pittroff, W. A1 - Preuß, A. A1 - Adolphi, B. A1 - Wirth, Thomas A1 - Österle, Werner ED - Reichl, H. T1 - Fluxless flip-chip bonding for the photonic assembly - comparison between evaporated SnPb (60/40) and AuSn (80/20) solder T2 - 5th International Conference on Micro-Electro-, -Opto-, -Mechanical Systems and Components CY - Potsdam, Germany DA - 1996-09-17 PY - 1996 SN - 3-8007-2200-3 VL - 5 SP - 91 EP - 97 PB - VDE-Verl. CY - Berlin AN - OPUS4-2544 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Senoner, Mathias A1 - Wirth, Thomas A1 - Unger, Wolfgang A1 - Escher, M. A1 - Weber, N. A1 - Funnenmann, D. A1 - Krömker, B. T1 - Testing of Lateral Resolution in the Nanometre Range Using the BAM-L002 - Certified Reference Material: Application to ToF-SIMS IV and NanoESCA Instruments T2 - International Symposium on Practical Surface Analysis CY - Jeju, Republic of Corea DA - 2004-10-04 KW - ESCA KW - Nanometrologie KW - Nanotechnologie KW - Oberflächenanalytik KW - SIMS KW - XPS KW - Zertifiziertes Referenzmaterial PY - 2005 SN - 1341-1756 SN - 1347-8400 VL - 12 IS - 2 SP - 78 EP - 82 CY - Tsukuba AN - OPUS4-11146 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Wirth, Thomas T1 - Surface analysis of dental enamel by TOF-SIMS, SEM and TEM T2 - SIMS EUROPE 2006 CY - Münster, Germany DA - 2006-09-24 PY - 2006 AN - OPUS4-13190 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -