TY - JOUR A1 - Österle, Werner A1 - Dörfel, Ilona A1 - Urban, Ingrid A1 - Reier, T. A1 - Schultze, J. T1 - XPS and XTEM study of AlN formation by N+2 implantation of aluminium N2 - X-ray photoelectron spectroscopy (XPS) and cross-sectional transmission electron microscopy (XTEM) were used to study the formation of AlN films by N+2 ion implantation of aluminium at energies of 3 keV and 100 keV. In both cases, a two-stage mechanism was found, comprising first the oriented precipitation of small particles of the hexagonal AlN-phase, followed by growth and coalescence finally forming a continuous AlN-layer while increasing the implantation dose from 1×1017 cm-2 to 2×1017 cm-2. The results of both methods are in excellent agreement and furthermore provide complementary information concerning chemical composition and binding energies as well as microstructural details. KW - AIN KW - Aluminium KW - N2+ KW - Implantation KW - XPS KW - XTEM PY - 1998 U6 - https://doi.org/10.1016/S0257-8972(98)00355-7 SN - 0257-8972 VL - 102 IS - 1-2 SP - 168 EP - 174 PB - Elsevier Science CY - Lausanne AN - OPUS4-2363 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Dörfel, Ilona A1 - Österle, Werner A1 - Urban, Ingrid A1 - Bouzy, E. T1 - Microstructural characterization of binary and ternary hard coating systems for wear protection - Part I: PVD coatings N2 - Different wear-resistant coatings produced by physical vapour deposition (PVD) were characterized with the aid of cross-sectional transmission electron microscopy (XTEM). All coating systems were optimized by the producers and exhibited good properties with respect to their special applications. The microstructure, texture and chemical composition of binary and ternary systems produced by the arc process [TiN, CrN, Cr2N (Ti, Cr)N on steel substrates] and magnetron sputtering process [TiN, CrN on steel substrates, (Ti, Al)N on Si-substrate] were investigated. All coatings had a more or less columnar microstructure, which was interrupted by interlayers in some cases. Whereas arc coatings always did show some kind of substrate modification, the latter was not observed after magnetron sputtering. Electron diffraction normally revealed a mono-phase fcc structure, except at sites very near to the interface. Only for the systems Cr–N and (Ti, Cr)–N were different additional phases observed at low nitrogen partial pressures. KW - Arc bond sputtering KW - Arc deposition KW - Magnetron sputtering KW - TEM KW - XTEM PY - 1999 UR - http://www.sciencedirect.com/science?_ob=ArticleURL&_udi=B6TVV-3VTRSCY-G&_user=963821&_coverDate=01%2F29%2F1999&_rdoc=14&_fmt=summary&_orig=browse&_srch=doc-info(%23toc%235544%231999%23998889997%2360972%23FLA%23display%23Volume)&_cdi=5544&_sort=d&_docanch U6 - https://doi.org/10.1016/S0257-8972(98)00735-X SN - 0257-8972 VL - 111 IS - 2-3 SP - 199 EP - 209 PB - Elsevier Science CY - Lausanne AN - OPUS4-2364 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -